A display substrate, a method for manufacturing the same, a display panel and a display device are disclosed. The display substrate includes a pixel unit, and the pixel unit includes a light emitting layer and a pixel definition layer surrounding the light emitting layer. The pixel definition layer includes a first region and a second region. The first region has a first thickness, the second region has a second thickness. The first thickness is greater than the second thickness.
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1. A display substrate, comprising a pixel unit having a plurality of sub-pixels, wherein the pixel unit comprises
a light emitting layer and a pixel definition layer surrounding the light emitting layer,
wherein the pixel definition layer comprises a first region and a second region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness,
wherein the pixel definition layer further comprises a third region located between two adjacent sub-pixels, the third region has a third thickness, and the third thickness is less than the first thickness and less than the second thickness,
wherein the pixel unit comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, the first sub-pixel is arranged in a first column, and the second sub-pixel and the third sub-pixel are arranged in a second column, and
wherein the first sub-pixel, the second sub-pixel and the third sub-pixel are rectangular, an area of the first sub-pixel is greater than an area of the second sub-pixel and greater than an area of the third sub-pixel; a first side of the first sub-pixel is parallel to the second column in which the second sub-pixel and the third sub-pixel are arranged, and a second side of the first sub-pixel is perpendicular to the first side; and in the pixel definition layer, a region adjacent to the second side of the first sub-pixel is the first region, a region between two adjacent sub-pixels is the third region, and a remaining region is the second region.
9. A method for manufacturing a display substrate, comprising:
forming a pixel definition layer of a pixel unit to surround a region for forming a light emitting layer, wherein the pixel definition layer comprises a first region and a second region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness; and
forming the light emitting layer of the pixel unit by a vapor deposition, wherein a vapor deposition material is selectively shielded by the first region and the second region during the vapor deposition,
wherein the pixel unit comprises a first sub-pixel, a second sub-pixel, and a third sub-pixel, the first sub-pixel, the second sub-pixel and the third sub-pixel are rectangular; the second sub-pixel and the third sub-pixel are arranged in a same column; an area of the first sub-pixel is greater than an area of the second sub-pixel and greater than an area of the third sub-pixel; a first side of the first sub-pixel is parallel to the column in which the second sub-pixel and the third sub-pixel are arranged, and a second side of the first sub-pixel is perpendicular to the first side; the pixel definition layer further comprises a third region located between two adjacent sub-pixels; in the pixel definition layer, a region adjacent to the second side of the first sub-pixel is the first region, a region between two adjacent sub-pixels is the third region, and a remaining region is the second region; and the third region has a third thickness, and the third thickness is less than the first thickness and less than the second thickness.
2. The display substrate according to
3. The display substrate according to
the light emitting layer comprises a plurality of portions respectively provided in the plurality of sub-pixels.
4. The display substrate according to
5. The display substrate according to
6. The display substrate according to
7. The display substrate according to
8. The display substrate according to
10. The method according to
11. The method according to
positioning the display substrate such that the display substrate is angled with respect to a horizontal plane by a first predetermined angle and located above a vapor deposition source and faces towards the vapor deposition source, wherein the second sub-pixel is located above the third sub-pixel;
forming a light emitting layer in the second sub-pixel by a vapor deposition, wherein the second region shields the third sub-pixel, and the first region shields the first sub-pixel;
turning over the display substrate such that the display substrate is angled with respect to the horizontal plane by a second predetermined angle and located above the vapor deposition source and faces towards the vapor deposition source, wherein the third sub-pixel is located above the second sub-pixel;
forming a light emitting layer in the third sub-pixel by a vapor deposition, wherein the second region shields the second sub-pixel, and the first region shields the first sub-pixel;
turning over the display substrate such that the display substrate is angled with respect to the horizontal plane by a third predetermined angle and located above the vapor deposition source and faces towards the vapor deposition source, wherein the first sub-pixel is located above the second sub-pixel and the third sub-pixel; and
forming a light emitting layer in the first sub-pixel by a vapor deposition, wherein the second region shields the second sub-pixel and the third sub-pixel.
12. The method according to
during the vapor deposition, two of four sides of each of the first sub-pixel, the second sub-pixel and the third sub-pixel are parallel to a horizontal direction, and the other sides are perpendicular to the horizontal direction;
the first predetermined angle=90°-arctan (the second thickness/a length of a side of the third sub-pixel perpendicular to the horizontal direction during the vapor deposition);
the second predetermined angle=90°-arctan (the second thickness/a length of a side of the second sub-pixel perpendicular to the horizontal direction during the vapor deposition); and
the third predetermined angle=90°-arctan (the second thickness/a length of a side of the second sub-pixel or the third sub-pixel perpendicular to the horizontal direction during the vapor deposition).
13. The method according to
14. The method according to
17. The method according to
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This application is a Section 371 National Stage Application of International Application No. PCT/CN2017/090822, filed on Jun. 29, 2017, entitled “DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, AND DISPLAY DEVICE”, which claims priority to Chinese Patent Application No. 201610805295.9 filed on Sep. 6, 2016 with SIPO, incorporated herein by reference in entirety.
Embodiments of the present disclosure relate to a field of display technology, and more particularly, to a display substrate and a method for manufacturing the same, and a display device.
In recent years, organic light emitting panels are widely used. During manufacturing an organic light emitting panel, it is necessary to vapor-deposit a light emitting material. In the conventional method, a vapor deposition is performed using a fine metal mask (FMM). If a fine metal mask is used, there is a problem that the mask has an expensive production cost and the mask is easily deformed by gravity to cause color mixing.
The embodiments of the present disclosure provide a display substrate, a method for manufacturing the display substrate, a display panel and a display device.
According to a first aspect of the present disclosure, there is provided a display substrate, comprising a pixel unit, wherein the pixel unit comprises a light emitting layer and a pixel definition layer surrounding the light emitting layer; and
wherein the pixel definition layer comprises a first region and a second region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness.
In an embodiment of the present disclosure, the first region and the second region are configured to selectively shield a vapor deposition material during formation of the light emitting layer by a vapor deposition process so that the light emitting layer has a predetermined shape.
In an embodiment of the present disclosure, the pixel unit comprises a plurality of sub-pixels, the light emitting layer comprises a plurality of portions respectively provided in the plurality of sub-pixels; and
the pixel definition layer further comprises a third region located between two adjacent sub-pixels, the third region has a third thickness, and the third thickness is less than the first thickness and less than the second thickness.
In an embodiment of the present disclosure, the first region, the second region and the third region are configured to selectively shield a vapor deposition material during formation of the light emitting layer by a vapor deposition process, to respectively form the portions of the light emitting layer.
In an embodiment of the present disclosure, the pixel unit comprises a first sub-pixel, a second sub-pixel and a third sub-pixel, the first sub-pixel is arranged in a column, and the second sub-pixel and the third sub-pixel are arranged in another column.
In an embodiment of the present disclosure, the first sub-pixel is a blue sub-pixel, the second sub-pixel is a red sub-pixel, and the third sub-pixel is a green sub-pixel.
In an embodiment of the present disclosure, the first sub-pixel, the second sub-pixel and the third sub-pixel are rectangular, an area of the first sub-pixel is greater than an area of the second sub-pixel and greater than an area of the third sub-pixel;
a first side of the first sub-pixel is parallel to a column in which the second sub-pixel and the third sub-pixel are arranged, and a second side of the first sub-pixel is perpendicular to the first side; and
in the pixel definition layer, a region adjacent to the second side of the first sub-pixel is the first region, a region between two adjacent sub-pixels is the third region, and the other region is the second region.
In an embodiment of the present disclosure, adjacent sides of the second sub-pixel and the third sub-pixel are equal to each other in length.
In an embodiment of the present disclosure, a setting value of the first thickness is greater than or equal to 1.8 μm and less than or equal to 2.2 μm, a setting value of the second thickness is greater than or equal to 0.7 μm and less than or equal to 1.2 μm, and a setting value of the third thickness is greater than or equal to 0.1 μm and less than or equal to 0.3 μm.
In an embodiment of the present disclosure, a setting value of the first thickness is 2 μm, a setting value of the second thickness is lμm, and a setting value of the third thickness is 0.1 μm.
According to a second aspect of the present disclosure, there is provided a method for manufacturing a display substrate, comprising:
forming a pixel definition layer of a pixel unit to surround a region for forming a light emitting layer, wherein the pixel definition layer comprises a first region and a second region, the first region has a first thickness, the second region has a second thickness, and the first thickness is greater than the second thickness; and
forming the light emitting layer of the pixel unit by a vapor deposition, wherein a vapor deposition material is selectively shielded by the first region and the second region during the vapor deposition.
In an embodiment of the present disclosure, the pixel definition layer is formed using an ink jet printing process.
In an embodiment of the present disclosure, the pixel definition layer is formed using a photolithography with a gray scale mask.
In an embodiment of the present disclosure, the pixel unit comprises a first sub-pixel, a second sub-pixel, and a third sub-pixel,
the first sub-pixel, the second sub-pixel and the third sub-pixel are rectangular; the second sub-pixel and the third sub-pixel are arranged in a same column; an area of the first sub-pixel is greater than an area of the second sub-pixel and greater than an area of the third sub-pixel; a first side of the first sub-pixel is parallel to the column in which the second sub-pixel and the third sub-pixel are arranged, and a second side of the first sub-pixel is perpendicular to the first side;
the pixel definition layer further comprises a third region located between two adjacent sub-pixels; and
in the pixel definition layer, a region adjacent to the second side of the first sub-pixel is the first region, a region between two adjacent sub-pixels is the third region, and the other region is the second region; the third region has a third thickness, and the third thickness is less than the first thickness and less than the second thickness.
In an embodiment of the present disclosure, the step of forming the light emitting layer of the pixel unit by the vapor deposition comprises:
positioning the display substrate such that the display substrate is angled with respect to a horizontal plane by a first predetermined angle and located above a vapor deposition source and faces towards the vapor deposition source, wherein the second sub-pixel is located above the third sub-pixel;
forming a light emitting layer in the second sub-pixel by a vapor deposition, wherein the second region shields the third sub-pixel, and the first region shields the first sub-pixel;
turning over the display substrate such that the display substrate is angled with respect to the horizontal plane by a second predetermined angle and located above the vapor deposition source and faces towards the vapor deposition source, wherein the third sub-pixel is located above the second sub-pixel;
forming a light emitting layer in the third sub-pixel by a vapor deposition, wherein the second region shields the second sub-pixel, and the first region shields the first sub-pixel;
turning over the display substrate such that the display substrate is angled with respect to the horizontal plane by a third predetermined angle and located above the vapor deposition source and faces towards the vapor deposition source, wherein the first sub-pixel is located above the second sub-pixel and the third sub-pixel; and
forming a light emitting layer in the first sub-pixel by a vapor deposition, wherein the second region shields the second sub-pixel and the third sub-pixel.
In an embodiment of the present disclosure, during the vapor deposition, two of four sides of each of the first sub-pixel, the second sub-pixel and the third sub-pixel are parallel to a horizontal direction, and the others are perpendicular to the horizontal direction;
the first predetermined angle=90°-arctan (the second thickness/a length of a side of the third sub-pixel perpendicular to the horizontal direction during the vapor deposition);
the second predetermined angle=90°-arctan (the second thickness/a length of a side of the second sub-pixel perpendicular to the horizontal direction during the vapor deposition); and
the third predetermined angle=90°-arctan (the second thickness/a length of a side of the second sub-pixel or the third sub-pixel perpendicular to the horizontal direction during the vapor deposition).
In an embodiment of the present disclosure, during the vapor deposition, the display substrate is at a predetermined distance from the vapor deposition source.
In an embodiment of the present disclosure, the predetermined distance is 1 m.
According to a third aspect of the present disclosure, there is provided a display panel, comprising the above-described display substrate or the display substrate manufactured by the above-described method for manufacturing the display substrate.
According to a fourth aspect of the present disclosure, there is provided a display device, comprising the above-described display panel.
In order to more clearly describe the technical solutions in the embodiments of the present disclosure, the accompanying drawings required for describing the embodiments will be briefly introduced. It will be appreciated that the accompanying drawings in the following description only represent a portion of embodiments of the present disclosure, rather than limiting the present disclosure. In the drawings:
In order to make the technical solutions and advantages of the embodiments of the present disclosure more clear, the technical solutions in the embodiments of the present disclosure will be clearly and completely described below with reference to the accompanying drawings. It is apparent that the described embodiments only represent a portion of the present disclosure, rather than the entire contents of the present disclosure. All other embodiments obtained by those skilled in the art based on the described embodiments of the present disclosure without any creative efforts fall within the scope of the present disclosure.
An embodiment of the present disclosure provides a display substrate, including a plurality of pixel units, wherein the pixel unit includes a light emitting layer and a pixel definition layer surrounding the light emitting layer. The pixel definition layer includes a first region and a second region. The first region has a first thickness, the second region has a second thickness. The first thickness is greater than the second thickness.
The light emitting layer can be formed by a vapor deposition process. The pixel definition layer may be configured to shield a vapor deposition material during a vapor deposition to obtain the light emitting layer having a predetermined shape. The first region with a larger thickness can shield a larger area during the vapor deposition, and the second region with a smaller thickness can shield a smaller area during the vapor deposition. By means of the arrangement of different thicknesses, the shape of the light emitting layer can be controlled better.
The pixel unit may include a plurality of sub-pixels. The light emitting layer includes a plurality of portions respectively provided in the sub-pixels. The pixel definition layer further includes a third region located between two adjacent sub-pixels, the third region has a third thickness, and the third thickness is less than the first thickness and less than the second thickness.
When the vapor deposition is implemented, the first region, the second region and the third region are configured to shield the vapor deposition material during the vapor deposition to respectively form the portions of the light emitting layer. The third region between the two adjacent sub-pixels can effectively prevent the mixing of materials of light emitting layers of different sub-pixels.
In an embodiment of the present disclosure, the first sub-pixel 1 is a blue sub-pixel B, the second sub-pixel 2 is a red sub-pixel R, and the third sub-pixel 3 is a green sub-pixel G.
According to the embodiment of the present disclosure, the area of the blue sub-pixel B is made relatively larger so that the intensity of the blue light can be ensured.
In the embodiment of the present disclosure, when the thickness of the pixel definition layer is set, the following values may be determined: the thickness (the first thickness) of the first region A1 is greater than or equal to 1.8 μm and less than or equal to 2.2 μm, the thickness (the second thickness) of the second region A2 is greater than or equal to 0.7 μm and less than or equal to 1.2 μm, and the thickness (third thickness) of the third region A3 is greater than or equal to 0.1 μm and less than or equal to 0.3 μm.
In view of the actual machining accuracy and fine adjustment of the preset values, there will be an error between the actual thickness and the set thickness. For example, the first thickness has an error of ±0.3 μm, the second thickness has an error of ±0.15 μm, and the third thickness has an error of ±0.05 μm.
In an embodiment of the present disclosure, the first thickness may be 2 times the second thickness.
In the embodiment of the present disclosure, when the thickness of the pixel definition layer is set, the following values may be determined: the first thickness is 2 μm, the second thickness is 1 μm, and the third thickness is 0.1 μm.
Thus, in view of the actual machining accuracy and fine adjustment of the preset values, the actual thicknesses may be: the first thickness of 2±0.3 μm, the second thickness of 1±0.15 μm, and the third thickness of 0.1±0.05 μm.
According to the method of the embodiment of the present disclosure, after the predetermined pixel definition layer is formed, the vapor deposition materials are shielded by the various regions with different thicknesses of the pixel definition layer during the vapor deposition, to obtain the respective sub-pixels at different positions. There is no need to use a mask, it thereby reduces costs and saves manufacturing time while ensuring accuracy.
In an embodiment of the present disclosure, the pixel definition layer PDL may be obtained using an etching process. After the deposition and patterning of a pixel layer (PXL) is completed on a glass substrate, a pixel definition layer PDL is coated and exposed to light and etched with a gray scale mask by photolithography so that different regions have different thicknesses. During the photolithography, more materials are removed at the location of the second region than at the location of the first region, and more materials are removed at the location of the third region than at the location of the second region. The thickness of the middle region of the pixel definition layer PDL between the sub-pixels of each pixel unit is 0.1 μm. The thicknesses of the region above the R and G regions, the region below the R and G regions and the region at the right side of the R and G regions are 1 μm, the thickness of the region of the left side of the B region is 1 μm, and the thickness of the region above the B region and the region below the B region are 2 μm. Then, the coating and patterning of post spacers (PS) can also be done. After that, the vapor deposition of EL materials of the light emitting layer can be implemented.
In an embodiment of the present disclosure, the pixel definition layer PDL can also be obtained by an ink jet printing process. In the ink jet printing process, more materials are sprayed at the location of the first region than at the location of the second region, and more materials are sprayed at the location of the second region than at the location of the third region.
Next, the vapor deposition process of each sub-pixel will be described in detail with reference to
Firstly, the display substrate is positioned such that a plane where the display substrate is located is angled with respect to a horizontal plane by a first predetermined angle α as shown in
Two opposite sides of four sides of each of the first sub-pixel, the second sub-pixel and the third sub-pixel, which are parallel to a horizontal direction, are referred to as second sides in the present disclosure, and the other opposite sides which are perpendicular to the horizontal direction are referred to as first sides (please be noted that the first sides and the second sides are only used for simplicity of description herein).
Then, a vapor deposition is implemented in such a way that the second region of the pixel definition layer shields the third sub-pixel, and the first region shields the first sub-pixel.
As shown in
In addition, due to the shielding of the third region 7 of the pixel definition layer between the second sub-pixel 2 and the third sub-pixel 3, a blank region 9 is formed below the second sub-pixel 2. The blank region 9 can further prevent color mixing without affecting the light emitting effect of the pixel unit.
In
If there is no third region A3, then the vapor deposition materials of the second sub-pixel 2 can be vapor-deposited on the whole length indicated by L2 in the figure. Since the third region A3 is provided, a portion of the vapor deposition materials are shielded, a blank region 9 is generated, wherein L9 is a length of the blank region 9.
The angle between the plane where the display substrate is located and the horizontal plane is α, and the angle between the plane where the display substrate is located and the vertical direction is β. These angles have a fixed relationship with the thickness of the pixel definition layer and the length of the pixel region. The relationship can be expressed as follows: α=90°-β=90°-arctan(D2/L3)=90°-arctan(D3/L9), where L9=2 μm, α=90°-arctan 0.05 when L1=40 μm, L2=L3=20 μm, D1=2 μm, D2=1 μm, and D3=0.1 μm. That is, as shown in
It should be understood that the above relationships may be modified. For example, if the second sub-pixel 2 and the third sub-pixel 3 have different shapes, it may be required that L2 is not equal to L3, which can be easily achieved by changing the thicknesses of the pixel definition layer 6 and the pixel definition layer 8. For example, referring to
As an example, if the second sub-pixel 2 and the third sub-pixel 3 are square, α in
In an embodiment of the present disclosure, the display substrate may be rotated about an axis perpendicular to the display substrate by 90° so that the vapor-deposited second sub-pixel 2 and the vapor-deposited third sub-pixel 3 are located in a vapor deposition shaded area or a shielded area, thereby completing the vapor deposition of the first sub-pixel 1. The second region 10 of the pixel definition layer adjacent to the second sub-pixel 2 and the third sub-pixel 3 shields the second sub-pixel 2 and the third sub-pixel 3 during the vapor deposition process. The second region 11 of the pixel definition layer adjacent to the first sub-pixel 1 shields the second sub-pixel 2 and the third sub-pixel 3 of the adjacent pixel units.
According to the embodiments of the present disclosure, the high-precision vapor deposition process is completed in combination with the arrangement structure of the pixel unit, the thickness distribution of the pixel definition layer PDL and the form of rotation deposition. This process can omit the fine metal mask FMM. Therefore, to a large extent, the cost and difficulty for manufacturing the products can be saved or reduced, the accuracy can be improved and the color mixing can be reduced. The embodiments of the present disclosure are applicable to products that require a vapor deposition process, for example, organic light emitting diode (OLED) products, including low-temperature polysilicon active matrix organic light emitting diode (LTPS AMOLED) products that adopt a low-temperature polysilicon technology widely used in recent years.
According to an embodiment of the present disclosure, there is provided a display panel including the above-described display substrate.
According to an embodiment of the present disclosure, there is provided a display device including the above-described display panel. The display device may be any product or component having a display function, such as a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator and the like.
In the display substrate, the method for manufacturing the display substrate, the display panel and the display device according to the embodiments of the present disclosure, it is possible to perform a vapor deposition of multiple colors of light emitting materials without using a fine metal mask, and ensure relatively high vapor deposition accuracy (for example, 3 μm) while maintaining a relatively low production cost.
It should be understood that the above embodiments are merely exemplary embodiments for illustrating the principle of the present disclosure, but the present disclosure is not limited thereto. Various modifications and improvements may be made by those skilled in the art without departing from the spirit of the present disclosure, and these modifications and improvements fall within the scope of the present disclosure.
Li, Yi, Li, Xiaolong, Liu, Zheng, Xu, Xiaowei
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