The disclosure describes various aspects of a shed-resistant thermal atom source. More specifically, a thermal atom source is described for uniform thermal flux of target atomic species in which a metal wadding material is used as an intermediary surface for sublimation of the atoms, preventing the source material from shedding or dropping. In an aspect, a thermal atom source may include a container with closed and open ends, and inside a source material near the closed end and a wadding between the source material and the open end; a heater coupled to the closed end; one or more clamps configured to secure the container and the heater; and a current source coupled to the container and the heater to cause a temperature to increase such that a portion of the source material is released and diffuses to the open end through the wadding prior to being emitted as a flux.
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24. A thermal atom source for quantum information processing atomic systems, comprising:
a container with a closed end and an open end, the container having inside a source of solid material of a species of atoms used in a quantum information processing atomic system near the closed end and a wadding positioned between the source of solid material and the open end of the container, the wadding being configured and positioned to prevent the source of solid material or any byproducts of the source of solid material from falling out of the container in certain orientations of the container;
a heater coupled to the closed end of the container;
one or more clamps configured to secure the container and the heater; and
a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes the source of solid material to sublimate or melt and evaporate to release some of the solid material that then diffuses to the open end of the container through the wadding prior to being emitted as a flux of the species of atoms from the open end of the container for use by the quantum information processing atomic system;
wherein the wadding is made of platinum such that the flux emitted from the open end of the container is a positive flux.
23. A thermal atom source for quantum information processing atomic systems, comprising:
a container with a closed end and an open end, the container having inside a source of solid material of a species of atoms used in a quantum information processing atomic system near the closed end and a wadding positioned between the source of solid material and the open end of the container, the wadding being configured and positioned to prevent the source of solid material or any byproducts of the source of solid material from falling out of the container in certain orientations of the container;
a heater configured to provide radiation heating and positioned near the container; and
one or more clamps configured to secure the container, wherein the radiation heating provided by the heater causes a temperature of the container to increase, which in turn causes the source of solid material to sublimate or melt and evaporate to release some of the solid material that then diffuses to the open end of the container through the wadding prior to being emitted as a flux of the species of atoms from the open end of the container for use by the quantum information processing atomic system;
wherein the wadding is made of a sintered metal or a sinter ceramic that provides a circuitous path through which the at least a portion of the source material diffuses.
1. A thermal atom source for quantum information processing atomic systems, comprising:
a container with a closed end and an open end, the container having inside a source of solid material of a species of atoms used in a quantum information processing atomic system near the closed end and a wadding positioned between the source of solid material and the open end of the container, the wadding being configured and positioned to prevent the source of solid material or any byproducts of the source of solid material from falling out of the container in certain orientations of the container;
a heater coupled to the closed end of the container;
one or more clamps configured to secure the container and the heater; and
a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes the source of solid material to sublimate or melt and evaporate to release some of the solid material that then diffuses to the open end of the container through the wadding prior to being emitted as a flux of the species of atoms from the open end of the container for use by the quantum information processing atomic system;
wherein the wadding is made of a sintered metal or a sinter ceramic that provides a circuitous path through which the at least a portion of the source of solid material diffuses.
19. A method for operating a thermal atom source for a quantum information processing atomic system, comprising:
configuring the thermal atom source for operation, the thermal atom source including:
a container with a closed end and an open end, the container having inside a source of solid material near the closed end and a wadding between the source of solid material and the open end of the container;
a heater coupled to the closed end of the container; one or more clamps configured to secure the container and the heater; and
a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes the source of solid material to sublimate or melt and evaporate to release some of the solid material that then diffuses to the open end of the container through the wadding prior to being emitted as a flux from the open end of the container;
applying, through the current source, a current to the container and the heater to produce a thermal profile that causes the temperature increase in the container and the heater; and
providing the emitted flux from the open end of the container to an ion trap of the quantum information processing atomic system to confine one or more atomic ions for quantum bits;
wherein the wadding is made of a sintered metal or a sinter ceramic that provides a circuitous path through which the at least a portion of the source of solid material diffuses.
4. The thermal atom source of
6. The thermal atom source of
7. The thermal atom source of
8. The thermal atom source of
9. The thermal atom source of
10. The thermal atom source of
11. The thermal atom source of
12. The thermal atom source of
13. The thermal atom source of
14. The thermal atom source of
15. The thermal atom source of
16. The thermal atom source of
17. The thermal atom source of
18. The thermal atom source of
20. The method of
21. The method of
the thermal atom source further includes one or more additional heaters along a length of the container, and
controlling the thermal profile at least along the length of the container by controlling the one or more additional heaters.
22. The method of
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The present application claims priority to and the benefit of U.S. Provisional Patent Application No. 62/616,049, entitled “SHED-RESISTANT THERMAL ATOM SOURCE,” and filed on Jan. 11, 2018, the contents of which are incorporated herein by reference in their entirety.
Aspects of the present disclosure generally relate to atomic systems, and more specifically, to a shed-resistant thermal atom source used in such systems.
Individual optically-active quantum systems such as trapped atoms are one of the leading implementations for quantum information processing. Other implementations may include superconducting circuits. Atomic-based qubits can be used as quantum memories, can host quantum gates in quantum computers and simulators, and can act as nodes for quantum communication networks. Qubits based on trapped atomic ions enjoy a rare combination of attributes. For example, qubits based on trapped atomic ions have very good coherence properties, can be prepared and measured with nearly 100% efficiency, and are readily entangled with each other by modulating their Coulomb interaction or remote photonic interconnects. Lattice of cold (e.g., laser-cooled) trapped atoms have also proven useful for precision metrology, including sensors of small forces and atomic clocks.
To produce the atomic ions for quantum information processing (QIP) systems based on trapped ion technology, or for other neutral and ion systems such as clocks or sensors, sources of atomic species are used. These sources, however, may have limitations in the way they are oriented since material used as the source of atoms can shed or fall out, disrupting operations and/or causing particulates to contaminate various parts of the system. Accordingly, sources of atoms for QIP systems or other atomic systems that prevent source material from shedding or dropping are desirable.
The following presents a simplified summary of one or more aspects in order to provide a basic understanding of such aspects. This summary is not an extensive overview of all contemplated aspects, and is intended to neither identify key or critical elements of all aspects nor delineate the scope of any or all aspects. Its purpose is to present some concepts of one or more aspects in a simplified form as a prelude to the more detailed description that is presented later.
In an aspect of the disclosure, various techniques are described for a shed-resistant thermal atom source, also referred to as an atomic oven source or simply as an oven. The thermal atom source described in this disclosure is configured to provide a directed thermal flux of a target atomic species by using a metal wadding material as an intermediary surface for sublimation of the atoms, preventing the source material from shedding/dropping.
For example, a thermal atom source for atomic systems (e.g., QIP systems, clocks. sensors) is described that includes a container (e.g., a cylindrical tube) with a closed end and an open end, where the container has positioned inside a source material near the closed end and a wadding between the source material and the open end of the container. The thermal atom source may also include a heater (e.g., a filament) coupled to the closed end of the container, one or more clamps configured to secure the container and the heater, and a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes at least a portion of the source material to be released and diffuse to the open end of the container through the wadding prior to being emitted as a flux from the open end of the container.
In another example, a method for operating a thermal atom source for an atomic system is described that includes, configuring the thermal atom source for operation, the thermal atom source including a container with a closed end and an open end, where the container has positioned inside a source material near the closed end and a wadding between the source material and the open end of the container, a heater coupled to the closed end of the container, one or more clamps configured to secure the container and the heater, and a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes at least a portion of the source material to be released and diffuse to the open end of the container through the wadding prior to being emitted as a flux from the open end of the container. The method may also include applying, through the current source, a current to the container and the heater to produce a thermal profile that causes the temperature increase in the container and the heater, and providing the emitted flux from the open end of the container to an ion trap of the atomic system to confine one or more atomic ions for quantum bits.
In another example, a thermal atom source for atomic systems is described that includes a container with a closed end and an open end, the container having inside a source material near the closed end and a wadding between the source material and the open end of the container, a heater or heating means configured to provide radiation heating and positioned near the container; and one or more clamps configured to secure the container, wherein the radiation heating provided by the heater causes a temperature of the container to increase, which in turn causes at least a portion of the source material to be released and diffuse to the open end of the container through the wadding prior to being emitted as a flux from the open end of the container.
Each of the aspects described above can also be implemented using means for performing the various functions described in connection with those aspects.
The appended drawings illustrate only some implementation and are therefore not to be considered limiting of scope.
The detailed description set forth below in connection with the appended drawings is intended as a description of various configurations and is not intended to represent the only configurations in which the concepts described herein may be practiced. The detailed description includes specific details for the purpose of providing a thorough understanding of various concepts. However, it will be apparent to those skilled in the art that these concepts may be practiced without these specific details. In some instances, well known components are shown in block diagram form in order to avoid obscuring such concepts.
As described above, trapped atoms may be used to implement quantum information processing. Atomic-based qubits can be used as different type of devices, including but not limited to quantum memories, the host of quantum gates in quantum computers and simulators, and nodes for quantum communication networks. Qubits based on trapped atomic ions (e.g., atoms with a net state of electrical charge) can have very good coherence properties, can be prepared and measured with nearly 100% efficiency, and can be readily entangled with each other by modulating their Coulomb interaction or remote photonic interconnects. Lattices of cold (e.g., laser-cooled) trapped atoms have also proven useful for precision metrology, including sensors of small forces and atomic clocks. As used in this disclosure, the terms “atoms,” “atomic ions,” and “ions” may be used interchangeably to describe the particles that are isolated and controlled, to be confined, or are actually confined, in a trap individually or as multiples with the latter forming a diffuse cloud, a crystal lattice or similar arrangement or configuration. Where the charge state of the atom (neutral atom or any charge state of the atomic ion) is not relevant, the disclosure describes techniques that can be used for any type of neutral atom or atomic ion or other type of optically active quantum system. More specifically, this disclosure describes techniques for a shed-resistant thermal atom source used in atomic systems such as QIP systems, clocks, or sensors.
In the case of atomic ions, the typical ion trap geometry or structure used for quantum information and metrology purposes is the linear radio-frequency (RF) Paul trap (also referred to as an RF trap or simply a Paul trap), where nearby electrodes hold static and dynamic electrical potentials that lead to an effective inhomogeneous harmonic confinement of the ions. The RF Paul trap is a type of trap that uses electric fields to trap or confine one or more charged particles in a particular region, position, or location. When multiple atomic ions are loaded into such a trap and are laser-cooled to very low temperatures, the atomic ions form a stationary lattice of qubits (e.g., a structured arrangement of qubits), with Coulomb repulsion balancing the external confinement force. For sufficient trap anisotropy, the ions can form a linear lattice along the weak direction of confinement, and this is the arrangement typically employed for applications in quantum information and metrology. As the trap anisotropy is reduced, the atomic ions undergo a series of phase transitions in their static conformation in space, evolving to a two-dimensional (2D) zig-zag or jagged type structure, then a three-dimensional (3D) helical structure, ultimately toward a spherical lattice when the three directions of confinement approach isotropy.
Atomic ions are typically loaded into traps by creating a neutral atomic flux of the desired particle, and ionizing them once in the trapping volume. Ions can remain confined for months, with lifetimes often limited by the level of vacuum.
In
Laser radiation tuned just below resonance in these optical transitions allows for Doppler laser cooling to confine the atomic ions near the bottom of the trapping potential. Other more sophisticated forms of laser cooling can bring the atomic ions to be nearly at rest in the trap.
The QIP system 205 can include a source 260 that provides atomic species (e.g., a flux of neutral atoms) to a chamber 250 (see e.g., the vacuum chamber 100 in
Although not shown, one or more radio-frequency (RF) amplifiers may be used to provide RF potential to the ion trap 270 for operation.
The QIP system 205 may also include an algorithms component 210 that may operate with other parts of the QIP system 205 (not shown) to perform quantum algorithms or quantum operations. As such, the algorithms component 210 may provide instructions to various components of the QIP system 205 (e.g., to the optical controller 220) to enable the implementation of the quantum algorithms or quantum operations.
In an aspect, the source 330 is typically loaded or placed within the container 310 near the closed end of the container 310. The wadding 360 is also placed within the container 310 and is packed in front of the source 330. That is, the wadding 360 is placed between the source 330 and the open end of the container 310. The wadding 360 can be made of a compressed, tangled ball of thin wire. The wadding 360 is configured to provide a barrier that prevents the source 330, portions of the source 330, or byproducts from heating the source 330, from passing through the wadding 360. In an example, the wadding 360 may allow some material to diffuse through but not allow particulates (e.g., oxide layers) to diffuse and may also stop the source 330 from falling out of the container 310. When, for example, current from the current source 350 is passed through the heater filament 320 and the container 310, a temperature of the heater filament 320 and of the container 310 increases as they are both heated or warmed up, which in turn causes the source 330 and the wadding 360 to heat. In an aspect, because of the heating, the source 330 sublimates (e.g., solid turns into a gas) or melts and evaporates, coating the wadding 360 in the source material. The compressed wire of the wadding 360 then provides a circuitous path for the source material to diffuse to near the open end of the container 310 (close to the clamp 340b), after which it is emitted by the thermal atom source 265 into the thermal beam 365. In some implementations, one or more additional waddings 360 may be placed between the wadding 360 and the open end of the container 310. The wadding and the one or more additional waddings 360 can have the same composition or different composition and/or the same structure or different structures.
Thermal modeling of the thermal atom source 265 allows for appropriate implementation and/or selection of the dimensions and/or materials for the container 310 and/or the heater filament 320 to create the appropriate thermal profile along the thermal atom source 265 with the maximum temperature at “B” in the diagram 300, by the closed end of the container 310 near the source 330. If the maximum temperature is instead configured to take place at “A” (e.g., near the heater filament 320) or “C” e.g., near a middle portion of the container 310 and after the location of the wadding 360), then the operation of the thermal atom source 265 may be power inefficient, leading to hotter temperatures of surrounding materials, affecting vacuum pressure due to outgassing. Therefore, the container 310 and the heater filament 320 (or any other form of heating provided) are configured to produce a temperature maximum near a middle of the container 310, closer to the open end of the container 310 that a location of the wadding 360, or configured to produce a temperature maximum at another desired location on the heater filament 320 or the container 310. Selection of the dimensions and/or materials for the container 310 and/or the heater filament 320 may also affect the time profile of the heating/cooling of the thermal atom source 265 when power is applied/disconnected. The time profile can be tuned for efficient operation via time-dependent thermal modelling.
In an aspect of this disclosure, the wadding 360 can be made of, for example, platinum wire or shavings, or similar electro-negative metal, so that the emitted flux (e.g., the thermal beam 365) is positively charged. The wadding 360 may be a sintered metal or ceramic plug that provides a circuitous path for the source materials to diffuse through. The wadding 360 may be made of a compressed metal wire or other porous material such as sintered metal or sintered ceramic.
In an aspect of this disclosure, the source 330 may be made by loading two or more elements or compounds near the closed end of the container 310. During heating, the elements or components react or amalgamate, and coat the wadding 360 as a result. Further heating then causes the product to be emitted instead of the reactants.
In the example shown in the diagram 300, the heater filament 320 is shown as having a certain shape (e.g., having a shaped configuration). One possible shape is a helical or coil-like shape. The heater filament 320 can, however, be straight (e.g., having a straight configuration) or can be an arbitrary shape as required by the particular application.
In another aspect of this disclosure, the clamps 340 (e.g., clamps 340a and 340b) for the heater filament 320 and the container 310 could be connected by an insulator to make a plug-in device.
A different embodiment of the thermal atom source 265 may use instead of the heater filament 320 a different type of heating element that is not heated with direct Joule heating (e.g., Ohmic or resistive heating through the heater filament 320), but provides heating through an indirect means, such as radiation heating, for example.
In yet another aspect of this disclosure, and as shown in a diagram 303 in
In the example shown in the diagram 300, the container 310 is shown as having a straight cylindrical shape (e.g., having a straight configuration). The container 310, however, can be bent or can even have a 180 degree shape to create a multi-stage device (e.g., heat end to prime, heat middle to run). When bent, the container 310 may be said to have a shaped configuration. In some instances, one or both of the heater filament 320 and the container 310 can have a shaped configuration (e.g., are not straight).
In an aspect of this disclosure, rather than heating up the container 310 using a heater filament 320, the container 310 may be heated by a different means or type of device, such as by using a laser, for example.
As described above, it is possible to select the dimensions and/or materials for the container 310 and the heater filament 320 such that they are tuned to produce a heating profile that results in a maximum temperature at “C.” In this case material emitted from the source 330 and the wadding 360 that hits the inner walls of the container 310 before reaching the point “C” will reemit, possibly improving the efficiency of the thermal atom source 265 in emitting the source 330 at the cost of a larger emission angle (e.g., a larger angular spread of the thermal beam 365).
Referring to
The features described in
At 410, the method 400 includes configuring the thermal atom source for operation, where the thermal atom source includes a container with a closed end and an open end, the container having inside a source material near the closed end and a wadding between the source material and the open end of the container, a heater coupled to the closed end of the container, one or more clamps configured to secure the container and the heater, and a current source coupled to the container and the heater to cause a temperature of the container and the heater to increase, which in turn causes at least a portion of the source material to be released and diffuse to the open end of the container through the wadding prior to being emitted as a flux from the open end of the container.
At 420, the method 400 includes applying, through the current source, a current to the container and the heater to produce a thermal profile that causes the temperature increase in the container and the heater.
In an aspect of the method 400, applying, through the current source, the current to the container and the heater to produce the thermal profile that causes the temperature increase in the container and the heater includes applying the current through the one or more clamps.
At 430, the method 400 includes providing the emitted flux from the open end of the container to an ion trap of the QIP system to create a single trapped ion as a single quantum bit or an ion crystal having multiple atomic ions for quantum bits. That is, by providing the emitted flux from the open end of the container to an ion trap of the QIP system, a single trapped ion can be created as a single quantum bit or an ion crystal having multiple atomic ions for quantum bits can be created.
In an aspect of the method 400, the thermal atom source further includes one or more additional heaters along a length of the container, and controlling the thermal profile at least along the length of the container by controlling the one or more additional heaters.
In another aspect of the method 400, the thermal atom source further includes one or more thermocouples positioned in different places along the container, and the method 400 may further include monitoring temperatures of the container in those places to control the thermal profile.
Referring now to
In one example, the computer device 500 may include a processor 510 for carrying out processing functions associated with one or more of the features described herein. The processor 510 may include a single or multiple set of processors or multi-core processors. Moreover, the processor 510 may be implemented as an integrated processing system and/or a distributed processing system. The processor 510 may include a central processing unit (CPU), a quantum processing unit (QPU), a graphics processing unit (GPU), or combination of those types of processors. In one aspect, the processor 510 may refer to a general processor of the computer device 510, which may also include additional processors 510 to perform more specific functions such as control and/or monitoring of a thermal atom source, for example.
In an example, the computer device 500 may include a memory 520 for storing instructions executable by the processor 510 for carrying out the functions described herein. In an implementation, for example, the memory 520 may correspond to a computer-readable storage medium that stores code or instructions to perform one or more of the functions or operations described herein. In one example, the memory 520 may include instructions to perform aspects of a method 400 described below in connection with
Further, the computer device 500 may include a communications component 530 that provides for establishing and maintaining communications with one or more parties utilizing hardware, software, and services as described herein. The communications component 530 may carry communications between components on the computer device 500, as well as between the computer device 500 and external devices, such as devices located across a communications network and/or devices serially or locally connected to computer device 500. For example, the communications component 500 may include one or more buses, and may further include transmit chain components and receive chain components associated with a transmitter and receiver, respectively, operable for interfacing with external devices.
Additionally, the computer device 500 may include a data store 540, which can be any suitable combination of hardware and/or software, that provides for mass storage of information, databases, and programs employed in connection with implementations described herein. For example, the data store 540 may be a data repository for operating system 560 (e.g., classical OS, or quantum OS). In one implementation, the data store 540 may include the memory 520.
The computer device 500 may also include a user interface component 550 operable to receive inputs from a user of the computer device 500 and further operable to generate outputs for presentation to the user or to provide to a different system (directly or indirectly). The user interface component 550 may include one or more input devices, including but not limited to a keyboard, a number pad, a mouse, a touch-sensitive display, a digitizer, a navigation key, a function key, a microphone, a voice recognition component, any other mechanism capable of receiving an input from a user, or any combination thereof. Further, the user interface component 550 may include one or more output devices, including but not limited to a display, a speaker, a haptic feedback mechanism, a printer, any other mechanism capable of presenting an output to a user, or any combination thereof.
In an implementation, the user interface component 550 may transmit and/or receive messages corresponding to the operation of the operating system 560. In addition, the processor 510 may execute the operating system 560 and/or applications or programs, and the memory 520 or the data store 540 may store them.
When the computer device 500 is implemented as part of a cloud-based infrastructure solution, the user interface component 550 may be used to allow a user of the cloud-based infrastructure solution to remotely interact with the computer device 500.
Although the present disclosure has been provided in accordance with the implementations shown, one of ordinary skill in the art will readily recognize that there could be variations to the embodiments and those variations would be within the scope of the present disclosure. Accordingly, many modifications may be made by one of ordinary skill in the art without departing from the scope of the appended claims.
Amini, Jason Madjdi, Mizrahi, Jonathan, Hudek, Kai, Cetina, Marko
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