Disclosed therein is a magnetostatic wave device that employs a single-crystal thin film of magnetic garnet (which contains iron) characterized in that the magnetic garnet has incorporated indium or tin in an amount of about 10 to 3000 ppm (by weight).
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1. A magnetostatic wave device comprising a single-crystal thin film of iron-containing magnetic garnet characterized in that the magnetic garnet has added therein an amount of about 10 to 3000 ppm by weight of at least one member of the group consisting of indium and tin.
4. The magnetostatic wave device of
8. A magnetostatic wave device of
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1. Field of the Invention
The present invention relates to a magnetostatic wave device.
2. Description of the Related Art
A magnetostatic wave device employs single-crystal thin film of magnetic garnet which has conventionally been YIG (yttrium iron garnet) represented by Y3 Fe5 O12. YIG is characterized most by its extremely small ferromagnetic half-width (ΔH). This leads to the fact that a magnetostatic wave device that employs a single-crystal thin film of magnetic garnet has little difference between its input signals and output signals. Another feature of YIG is that it becomes saturated upon application of input signals of comparatively small power. These characteristic properties permit a single-crystal thin film of YIG (as well as other iron-containing garnets) to be used widely for magnetostatic wave devices such as limiters and noise filters.
Recent electronic machines with a less power consumption than before need a new version of YIG which becomes saturated upon application of a very small input power.
Accordingly, it is a first object of the present invention to provide a high-performance magnetostatic wave device which becomes saturated upon application of a very small input power.
The fact that YIG becomes saturated upon application of input signals leads to a transient response, namely the phenomenon that saturation does not occur immediately after application of input signals, with input signals being outputted as such, and saturation takes place after a lapse of time. This transient response adversely affects the performance of the magnetostatic wave device.
Accordingly, it is a second object of the present invention to provide a high-performance magnetostatic wave device which is free from transient response (the phenomenon that input signals are outputted as such and saturation takes place with lapse of time).
The first aspect of the present invention resides in a magnetostatic wave device that employs a single-crystal thin film of magnetic garnet (which contains iron) characterized in that the magnetic garnet incorporates indium in an amount of about 10 to 3000 ppm (by weight), preferably at least about 500 ppm and more preferably at least about 1000 ppm.
The second aspect of the present invention resides in a magnetostatic wave device that employs a single-crystal thin film of magnetic garnet (which contains iron), characterized in that the magnetic garnet incorporates tin in an amount of about 10 to 3000 ppm (by weight), preferably at least about 500 ppm and more preferably at least about 1000 ppm.
It turned out that input power for saturation can be very small if a single-crystal thin film of YIG (as well as iron-containing magnetic garnet) for the magnetostatic wave device has incorporated indium in an amount of about 10 to 3000 ppm (by weight).
It also turned out that transient response can be minimized if single-crystal thin film of YIG (as well as iron-containing magnetic garnet) for the magnetostatic wave device has incorporated tin in an amount of about 10 to 3000 ppm (by weight).
The first aspect of the present invention is designed to make best use of YIG's capability of becoming saturated upon application of a very small input power, thereby providing a high-performance magnetostatic wave device.
The second aspect of the present invention makes best use of YIG's feature that saturation takes place without delay upon application of input signals of small power. This makes it possible to minimize the transient response, thereby enhancing the performance of the magnetostatic wave device.
These and other objects, advantages, and features of the invention may be readily ascertained by referring to the accompanying drawing and the following detailed description of embodiments and
FIG. 1 is a perspective view showing one embodiment of the present invention.
FIG. 1 is a perspective view showing one embodiment of the present invention, which is a magnetostatic wave device 10. It is composed of a rectangular substrate 12 of Gd3 Ga5 O12 and a rectangular single-crystal thin film 14 of magnetic garnet formed on one surface thereof. The magnetic garnet contains iron. On the surface of the single-crystal thin film 14 of magnetic garnet are placed an input terminal 16 and an output terminal 18 which are parallel to each other. These terminals have their ends grounded.
The magnetic garnet has a composition represented by (Y3-x1-x2 R'x1 R"x2) (Fe5-y1-y2 M'y1 M"y2)O12, wherein 0≦x1≦3, 0≦x2≦3, 0≦x1+x2≦3, 0≦y1<5, 0≦y2≦3, 0≦y1+y2<5, and x2=y2;
R' is at least one member selected from Sc, Bi, and La series;
R" is at least one member selected from the Mg, Ca, Sr, and Ba;
M' is at least one member selected from Al, Ga, and In; and
M" is at least one member selected from Si, Ti, Zr, Hf, and Ge.
The first aspect of the present invention is demonstrated by Examples 1 to 3, and the second aspect of the present invention is demonstrated by Examples 4 to 6.
A garnet thin film was formed by liquid phase epitaxy (LPE) on a GGG substrate (gadolinium gallium garnet--Gd3 Ga5 O12) in the following manner. First, Fe2 O3 and Y2 O3 as the raw materials of the garnet were mixed with InO2 as an additive and PbO-B2 O3 as a flux. Then the mixture was placed in a platinum crucible held in a vertical electric furnace and melted and homogenized at about 1200°C The melt was cooled to and kept at about 900° C. so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of the indium.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for the amount of input power (at 2 GHz) required for the device to become saturated. Also, the garnet film underwent chemical analysis to determine the content of indium. The results are shown in Table 1.
TABLE 1 |
______________________________________ |
Content of indium in |
Sample garnet thin film |
Amount of input power |
No. (ppm by weight) |
for saturation (mW) |
______________________________________ |
1* 0 3.2 |
2* 5 3.0 |
3 10 1.5 |
4 500 1.3 |
5 1000 1.2 |
6 1500 1.0 |
7 3000 0.9 |
8* 3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of indium in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to effectively contribute to saturation (as in Sample No. 2 which is similar to Sample No. 1 containing no indium) and a content in excess of about 3000 ppm (by weight) is unfavorable to the formation of good single-crystal thin film (as in Sample No. 8).
A garnet thin film was formed by LPE on a GGG substrate (Gd3 Ga5 O12) in the following manner. First, Fe2 O3, Y2 O3, Ga2 O3, and La2 O3 as the raw materials of the garnet were mixed with InO2 as an additive and PbO-B2 O3 as a flux. The mixture was placed in a platinum crucible held in a vertical electric furnace and then melted and homogenized at about 1200°C The melt was cooled to and kept at about 900°C so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus there was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of indium.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for the amount of input power (at 2 GHz) required for the device to become saturated. Also, the garnet film underwent chemical analysis to determine the content of indium. The results are shown in Table 2.
TABLE 2 |
______________________________________ |
Content of indium |
Amount of input |
Sample in garnet thin film |
power for |
No. Composition (ppm by weight) |
saturation (mW) |
______________________________________ |
9* Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
0 2.9 |
10* Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
5 2.8 |
11 Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
10 1.4 |
12 Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
500 1.3 |
13 Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
1000 1.2 |
14 Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
1500 1.0 |
15 Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
3000 0.9 |
16* Y2.96 La0.04 Fe4.6 Ga0.4 O12 |
3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of indium in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to effectively contribute to saturation (as in Sample No. 10 which is similar to Sample No. 9 containing no indium) and a content in excess of about 3000 ppm (by weight) is unfavorable to the formation of good single-crystal thin film (as in Sample No. 16).
A garnet thin film was formed by LPE on a GGG substrate (Gd3 Ga5 O12) in the following manner. First, Fe2 O3, Y2 O3, Ga2 O3, and Bi2 O3 as the raw materials of the garnet were mixed with InO2 as an additive and PbO-B2 O3 as a flux. The mixture was placed in a platinum crucible held in a vertical electric furnace and then melted and homogenized at about 1200°C The melt was cooled to and kept at about 900°C so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus there was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of indium.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for the amount of input power (at 2 GHz) required for the device to become saturated. Also, the garnet film underwent chemical analysis to determine the content of indium. The results are shown in Table 3.
TABLE 3 |
______________________________________ |
Content of indium |
Amount of input |
Sample in garnet thin film |
power for |
No. Composition (ppm by weight) |
saturation (mW) |
______________________________________ |
17* Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
0 3.0 |
18* Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
5 2.8 |
19 Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
10 1.4 |
20 Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
500 1.3 |
21 Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
1000 1.2 |
22 Y2.8 Bi0.2 Fe4.55 Ga0.45 O12 |
1500 1.1 |
23 Y2.8 Bi02 Fe4.55 Ga0.45 O12 |
3000 1.0 |
24* Y2.8 Bi0.2 Fe4.55 Ga045 O12 |
3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of indium in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to effectively contribute to saturation (as in Sample No. 18 which is similar to Sample No. 17 containing no indium) and a content in excess of about 3000 ppm (by weight) is unfavorable to the formation of good single-crystal thin film (as in Sample No. 24).
A garnet thin film was formed by liquid phase epitaxy (LPE) on a GGG substrate (gadolinium gallium garnet--Gd3 Ga5 O12) in the following manner. First, Fe2 O3 and Y2 O3 as the raw materials of the garnet were mixed with SnO2 as an additive and PbO-B2 O3 as a flux. The mixture was placed in a platinum crucible held in a vertical electric furnace and then melted and homogenized at about 1200°C The melt was cooled to and kept at about 900°C so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus there was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of tin.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for time required for saturation to take place (at 2 GHz). Also, the garnet film underwent chemical analysis to determine the content of tin. The results are shown in Table 4.
TABLE 4 |
______________________________________ |
Content of tin in |
Time required for |
garnet thin film |
saturation to take |
Sample No. (ppm by weight) |
place (ms) |
______________________________________ |
1* 0 124 |
2* 5 123 |
3 10 80 |
4 500 68 |
5 1000 61 |
6 1500 55 |
7 3000 48 |
8* 3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of tin in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to affect the time required for saturation to take place (as in Sample No. 2 which is similar to Sample No. 1 (YIG film) containing no tin) and a content in excess of about 3000 ppm (by weight) prevents saturation itself (as in Sample No. 8), making the magnetostatic wave device inoperable.
A garnet thin film was formed by LPE on a GGG substrate (Gd3 Ga5 O12) in the following manner. First, Fe2 O3, Y2 O3, Ga2 O3, and La2 O3 as the raw materials of the garnet were mixed with SnO2 as an additive and PbO-B2 O3 as a flux. The mixture was placed in a platinum crucible held in a vertical electric furnace and then melted and homogenized at about 1200°C The melt was cooled to and kept at about 900°C so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus there was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of tin.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for time required for saturation to take place (at 2 GHz). Also, the garnet film underwent chemical analysis to determine the content of tin. The results are shown in Table 5.
TABLE 5 |
______________________________________ |
Content of tin in |
Time required |
Sample garnet thin film |
for saturation to |
No. Composition (ppm by weight) |
take place (ns) |
______________________________________ |
9* Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
0 122 |
10* Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
5 121 |
11 Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
10 78 |
12 Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
500 70 |
13 Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
1000 60 |
14 Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
1500 54 |
15 Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
3000 49 |
16* Y2.95 La0.05 Fe4.6 Ga0.4 O12 |
3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of tin in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to affect the time required for saturation to take place (as in Sample No. 10 which is similar to Sample No. 9 containing no tin) and a content in excess of about 3000 ppm (by weight) prevents saturation itself (as in Sample No. 16), making the magnetostatic wave device inoperable.
A garnet thin film was formed by LPE on a GGG substrate (Gd3 Ga5 O12) in the following manner. First, Fe2 O3, Y2 O3, Ga2 O3, and Bi2 O3 as the raw materials of the garnet were mixed with SnO2 as an additive and PbO-B2 O3 as a flux. The mixture was placed in a platinum crucible held in a vertical electric furnace and then melted and homogenized at about 1200°C The melt was cooled to and kept at about 900°C so that garnet became supersaturated. Into this melt was dipped the GGG substrate, which was rotated for a prescribed period of time for crystal growth. Finally, the substrate was raised from the melt and then spun rapidly to remove the excess melt by centrifugal force. Thus there was obtained the desired garnet thin film.
For comparison, the same procedure as above was repeated without the addition of tin.
The thus obtained garnet thin film was fabricated into the magnetostatic wave device as shown in FIG. 1. The device was measured for time required for saturation to take place (at 2 GHz). Also, the garnet film underwent chemical analysis to determine the content of tin. The results are shown in Table 6.
TABLE 6 |
______________________________________ |
Content of tin in |
Time required for |
Sample garnet thin film |
saturation to take |
No. Composition (ppm by weight) |
place (ns) |
______________________________________ |
17* Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
0 125 |
18* Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
5 122 |
19 Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
10 79 |
20 Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
500 70 |
21 Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
1000 56 |
22 Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
1500 50 |
23 Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
3000 46 |
24* Y2.8 Bi0.2 Fe4.6 Ga0.4 O12 |
3100 ** |
______________________________________ |
*Samples not conforming to the invention. |
**No satisfactory thin film was obtained. |
According to the present invention, the content of tin in the garnet is specified as above because a content less than about 10 ppm (by weight) is not enough to affect the time required for saturation to take place (as in Sample No. 18 which is similar to Sample No. 17 containing no tin) and a content in excess of about 3000 ppm (by weight) prevents saturation itself (as in Sample No. 24), making the magnetostatic wave device inoperable.
Patent | Priority | Assignee | Title |
6016088, | Sep 24 1997 | Murata Manufacturing Co., Ltd. | Magnetostatic wave device |
6052042, | Apr 10 1997 | Murata Manufacturing Co., Ltd. | Magnetostatic wave device |
6194091, | Sep 29 1997 | Murata Manufacturing Co., Ltd. | Magnetostatic wave device |
8200845, | Dec 19 2006 | Ianywhere Solutions, Inc. | Queuing of invocations for mobile web services |
Patent | Priority | Assignee | Title |
3886077, | |||
4721547, | Jun 28 1985 | Kabushiki Kaisha Toshiba | Process for producing single crystal of garnet ferrite |
4968954, | Sep 30 1988 | Shin-Etsu Chemical Co., Ltd. | Epitaxial layer-bearing wafer of rare earth gallium garnet for MSW device |
5466388, | May 07 1993 | Murata Mfg. Co., Ltd. | Material for magnetostatic-wave devices |
JP55143009, |
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