A capacitive filtered feedthrough assembly is formed in a solid state manner to employ highly miniaturized conductive paths each filtered by a discoid capacitive filter embedded in a capacitive filter array. A non-conductive, co-fired metal-ceramic substrate is formed from multiple layers that supports one or a plurality of substrate conductive paths and it is brazed to a conductive ferrule, adapted to be welded to a case, using a conductive, corrosion resistant braze material. The metal-ceramic substrate is attached to an internally disposed capacitive filter array that encloses one or a plurality of capacitive filter capacitor active electrodes each coupled to a filter array conductive path and at least one capacitor ground electrode. Each capacitive filter array conductive path is joined with a metal-ceramic conductive path to form a feedthrough conductive path. Bonding pads are attached to the internally disposed ends of each feedthrough conductive path, and corrosion resistant, conductive buttons are attached to and seal the externally disposed ends of each feedthrough conductive path. A plurality of conductive, substrate ground paths are formed extending through the co-fired metal-ceramic substrate between internally and externally facing layer surfaces thereof and electrically isolated from the substrate conductive paths. The capacitor ground electrodes are coupled electrically to the plurality of conductive, substrate ground paths and to the ferrule.
|
19. A filtered feedthrough assembly adapted to be fitted into an opening of a case of an electronic device, the feedthrough assembly having an internally disposed portion configured to be disposed inside the case and an externally disposed portion configured to be disposed outside the case, the assembly comprising:
an electrically conductive ferrule having a ferrule wall adapted to be fitted into the case opening with an inner wall surface defining a centrally disposed ferrule opening and extending between opposed internally and externally facing ferrule sides; a multi-layer, co-fired metal-ceramic substrate having opposed internally facing and externally facing substrate surfaces joined by a common substrate edge, the metal-ceramic substrate further comprising a plurality of metal-ceramic substrate layers each having internally and externally facing layer surfaces and a plurality of substrate conductive paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces and electrically isolated from one another; means for hermetically sealing the common substrate edge to the ferrule inner wall within the centrally disposed ferrule opening and electrically coupling the plurality of substrate ground paths to the ferrule; a discoidal capacitive filter array formed of a ceramic capacitive filter substrate having an internally facing filter substrate side and an externally facing filter substrate side joined by a common filter substrate edge, the capacitive filter array substrate further comprising: a plurality of filter array conductive paths electrically isolated from one another and extending between the internally facing filter substrate side and the externally facing filter substrate side each formed of reflow solder filling a; filter array hole; and a plurality of discoidal capacitor filters each comprising at least one capacitor active electrode formed within the filter substrate and extending outward from a filter array conductive path and a common capacitor ground electrode; means for mechanically joining the externally facing filter substrate side to the internally facing substrate side and electrically joining each filter array conductive path to a substrate conductive path comprising the reflow solder forming the plurality of filter array conductive paths; and means for electrically coupling the common capacitor ground electrode of the discoidal capacitor filters to the ferrule; whereby the filtered feedthrough assembly provides a plurality of miniaturized, electrically isolated, and capacitively filtered, feedthrough conductive paths each comprising a substrate conductive path joined to a filter array conductive path and extending between the internally disposed portion and the externally disposed portion when the feedthrough assembly is affixed into an opening in the case of the electronic device.
1. A filtered feedthrough assembly adapted to be fitted into an opening of a case of an electronic device, the feedthrough assembly having an internally disposed portion configured to be disposed inside the case and an externally disposed portion configured to be disposed outside the case, the assembly comprising:
an electrically conductive ferrule having a ferrule wall adapted to be fitted into the case opening with an inner wall surface defining a centrally disposed ferrule opening and extending between opposed internally and externally facing ferrule sides; a multi-layer, co-fired metal-ceramic substrate having opposed internally facing and externally facing substrate surfaces joined by a common substrate edge, the metal-ceramic substrate further comprising: a plurality of metal-ceramic substrate layers each having internally and externally facing layer surfaces; a plurality of substrate conductive paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces and electrically isolated from one another; and a further plurality of substrate ground paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces and electrically isolated from the substrate conductive paths; means for hermetically sealing the common substrate edge to the ferrule inner wall within the centrally disposed ferrule opening and electrically coupling the plurality of substrate ground paths to the ferrule; a discoidal capacitive filter array formed of a ceramic capacitive filter substrate having an internally facing filter substrate side and an externally facing filter substrate side joined by a common filter substrate edge, the capacitive filter array substrate further comprising: a plurality of filter array conductive paths electrically isolated from one another and extending between the internally facing filter substrate side and the externally facing filter substrate side; and a plurality of discoidal capacitor filters each comprising at least one capacitor active electrode formed within the filter substrate and extending outward from a filter array conductive path and a common capacitor ground electrode; means for mechanically joining the externally facing filter substrate side to the internally facing substrate side and electrically joining each filter array conductive path to a substrate conductive path; and means for electrically coupling the common capacitor ground electrode of the discoidal capacitor filters to the plurality of substrate ground paths; whereby the filtered feedthrough assembly provides a plurality of miniaturized, electrically isolated, and capacitively filtered, feedthrough conductive paths with low inductance each comprising a substrate conductive path joined to a filter array conductive path and extending between the internally disposed portion and the externally disposed portion when the feedthrough assembly is affixed into an opening in the case of the electronic device.
2. The filtered feedthrough assembly of
3. The filtered feedthrough assembly of
4. The filtered feedthrough assembly of
5. The filtered feedthrough assembly of
the metal-ceramic substrate further comprises a plurality of planar ceramic layers shaped in a green state to have a layer thickness and a plurality of substrate conductive path via holes and common ground via holes extending therethrough between an internally facing layer surface and an externally facing layer surface, the plurality of ceramic layers assembled together and co-fired from the green state to form the substrate; each of the plurality of substrate conductive paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces and electrically isolated from one another further comprise a plurality of electrically conductive vias extending through via holes of the plurality of layer thicknesses and a plurality of electrically conductive traces formed on certain of the internally or externally facing layer surfaces such that the conductive traces join the conductive vias to form each substrate conductive path; and each of the further plurality of substrate ground paths extending through the co-fired metal-ceramic substrate between the internally and externally facing layer surfaces comprise a plurality of electrically conductive vias extending through via holes of the plurality of layer thicknesses and at least one conductive trace formed on certain of the internally or externally facing layer surfaces and extending to the substrate edge to enable electrical joinder of the ground vias in common and to the ferrule through the means for hermetically sealing the common substrate edge to the ferrule inner wall within the centrally disposed ferrule opening.
6. The filtered feedthrough assembly of
7. The filtered feedthrough assembly of
a substrate conductor braze pad on the substrate internally facing side comprising part of the means for mechanically joining the externally facing filter substrate side to the internally facing substrate side and electrically joining each filter array conductive path to a substrate conductive path; a substrate conductor braze pad on the substrate externally facing side; and an externally disposed bonding button mechanically supported on the externally facing metal-ceramic substrate side and electrically connected with an electrical path of the metal-ceramic substrate through the braze pad on the substrate externally facing side.
8. The filtered feedthrough assembly of
9. The filtered feedthrough assembly of
10. The filtered feedthrough assembly of
11. The filtered feedthrough assembly of
each filter array conductive path further comprises a filter array hole extending between the internally facing filter substrate side and the externally facing filter substrate side and through at least one capacitor active electrode; and the means for mechanically joining the externally facing filter substrate side to the internally facing substrate side and electrically joining each filter array conductive path to a substrate conductive path comprises reflow solder filling the filter array holes and mechanically bonded with the substrate conductor braze pads on the substrate internally facing side, whereby the reflow solder within each filter array hole forms at least part of a filter array conductive path.
12. The filtered feedthrough assembly of
13. The filtered feedthrough assembly of
14. The filtered feedthrough assembly of
each capacitive filter comprises a plurality of capacitor active electrodes formed within the filter substrate and extending outward from a filter array conductive path, a further plurality of capacitor ground electrodes formed within the filter substrate and extending inward from the filter substrate edge, and a termination layer overlying the filter substrate edge electrically coupling the capacitor ground electrodes together.
15. The filtered feedthrough assembly of
each filter array conductive path further comprises a filter array hole extending between the internally facing filter substrate side and the externally facing filter substrate side and through the plurality of capacitor active electrodes, and a hole metallization layer within the hole electrically coupling the capacitor active electrodes together; and the means for mechanically joining the externally facing filter substrate side to the internally facing substrate side and electrically joining each filter array conductive path to a substrate conductive path comprises reflow solder filling the filter array holes and mechanically bonded with the hole metallization layer and the substrate conductor braze pads on the substrate internally facing side, whereby the reflow solder within each filter array hole forms at least part of a filter array conductive path.
16. The filtered feedthrough assembly of
the filter conductive paths further comprise a plurality of internally disposed bonding pads supported along the Internally facing filter substrate side, each internally disposed bonding pad electrically conducted with a filter array conductive path of the capacitive filter array; and the substrate conductive paths further comprise a plurality of externally disposed bonding buttons supported along the externally facing metal-ceramic substrate side, each externally disposed bonding button electrically conducted with a substrate conductive path.
17. The filtered feedthrough assembly of
18. The filtered feedthrough assembly of
|
This invention relates to electrical feedthroughs of improved design and to their method of fabrication, particularly for use with implantable medical devices.
Electrical feedthroughs serve the purpose of providing an electrical circuit path extending from the interior of a hermetically sealed case or housing to an external point outside the case. Implantable medical devices (IMDs) such as implantable pulse generators (IPGs) for cardiac pacemakers, implantable cardioverter/defibrillators (ICDs), nerve, brain, organ and muscle stimulators and implantable monitors, or the like, employ such electrical feedthroughs through their case to make electrical connections with leads, electrodes and sensors located outside the case.
Such feedthroughs typically include a ferrule adapted to fit within an opening in the case, one or more conductor and a non-conductive hermetic glass or ceramic seal which supports and electrically isolates each such conductor from the other conductors passing through it and from the ferrule. The IMD case is typically formed of a biocompatible metal, e.g., titanium, although non-conductive ceramics materials have been proposed for forming the case. The ferrule is typically of a metal that can be welded or otherwise adhered to the case in a hermetically sealed manner.
Typically, single pin feedthroughs supported by glass, sapphire and ceramic were used with the first hermetically sealed IMD cases for IPGs. As time has passed, the IPG case size has dramatically reduced and the number of external leads, electrodes and sensors that are to be coupled with the circuitry of the IPG has increased. Consequently, use of the relatively large single pin feedthroughs is no longer feasible, and numerous multiple conductor feedthroughs have been used or proposed for use that fit within the smaller sized case opening and provide two, three, four or more conductors.
Many different insulator structures and conductor structures are known in the art of multiple conductor feedthroughs wherein the insulator structure also provides a hermetic seal to prevent entry of body fluids through the feedthrough and into the housing of the medical device. The conductors typically comprise electrical wires or pins that extend through a glass and/or ceramic layer within a metal ferrule opening as shown, for example, in commonly assigned U.S. Pat. Nos. 4,991,582, 5,782,891, and 5,866,851 or through a ceramic case as shown in the commonly assigned '891 patent and in U.S. Pat. No. 5,470,345. It has also been proposed to use co-fired ceramic layer substrates that are provided with conductive paths formed of traces and vias as disclosed, for example, in U.S. Pat. Nos. 4,420,652, 5,434,358, 5,782,891, 5,620,476, 5,683,435, 5,750,926, and 5,973,906.
Such multi-conductor feedthroughs have an internally disposed portion configured to be disposed inside the case for connection with electrical circuitry and an externally disposed portion configured to be disposed outside the case that is typically coupled electrically with connector elements for making connection with the leads, electrodes or sensors. The elongated lead conductors extending from the connector elements effectively act as antennae that tend to collect stray electromagnetic interference (EMI) signals that may interfere with normal IMD operations. At certain frequencies, for example, EMI can be mistaken for telemetry signals and cause an IPG to change operating mode.
This problem has been addressed in certain of the above-referenced patents by incorporating a capacitor structure upon the internally facing portion of the feedthrough ferrule coupled between each feedthrough conductor and a common ground, the ferrule, to filter out any high frequency EMI transmitted from the external lead conductor through the feedthrough conductor. The feedthrough capacitors originally were discrete capacitors but presently can take the form of chip capacitors that are mounted as shown in the above-referenced '891, '435, '476, and '906 patents and in further U.S. Pat. Nos. 5,650,759, 5,896,267 and 5,959,829, for example. Or the feedthrough capacitors can take the form of discrete discoidal capacitive filters or discoidal capacitive filter arrays as shown in commonly assigned U.S. Pat. Nos. 5,735,884, 5,759,197, 5,836,992, 5,867,361, and 5,870,272 and further U.S. Pat. Nos. 5,287,076, 5,333,095, 5,905,627 and 5,999,398.
These patents disclose use of discoidal filters and filter arrays in association with conductive pins which are of relatively large scale and difficult to miniaturize without complicating manufacture. It is desirable to further miniaturize and simplify the fabrication of the multi-conductor feedthrough assembly
Although feedthrough filter capacitor assemblies of the type described above have performed in a generally satisfactory manner, the manufacture and installation of such filter capacitor assemblies has been relatively time consuming and therefore costly. For example, installation of the discoidal capacitor Into the small annular space between the terminal pin and ferrule as shown in a number of these patents can be a difficult and complex multi-step procedure to ensure formation of reliable, high quality electrical connections.
Other problems have arisen when chip capacitors have been coupled to conductive trace and via pathways of co-fired multi-layer metal-ceramic substrates disclosed in the referenced '652, '358, '891, '476, '435, '926, and '906 patents. The conductive paths of the feedthrough arrays and attached capacitors suffer from high inductance which has the effect of failing to attenuate EMI and other unwanted signals, characterized as "poor insertion loss".
A high integrity hermetic seal for medical implant applications Is very critical to prevent the ingress of body fluids into the IMD. Even a small leak rate of such body fluid penetration can, over a period of many years, build up and damage sensitive internal electronic components. This can cause catastrophic failure of the implanted device. The hermetic seal for medical implant (as well as space and military) applications is typically constructed of highly stable alumina ceramic or glass materials with very low bulk permeability. The above-described feedthroughs formed using metal-ceramic co-fired substrates, however, have not been hermetic because the metal component of the substrate corrodes in body fluids, and the substrates have cracked from stresses that developed from brazing and welding processes.
Withstanding the high temperature and thermal stresses associated with the welding of a hermetically sealed terminal with a premounted ceramic feedthrough capacitor is very difficult to achieve with the '551, '095 and other prior art designs. The electrical/mechanical connection to the outside perimeter or outside diameter of the feedthrough capacitor has a very high thermal conductivity as compared to air. The welding operation typically employed in the medical implant industry to install the filtered hermetic terminal into the IMD case opening can involve a welding operation in very close proximity to this electrical/mechanical connection area. Accordingly, in the prior art, the ceramic feedthrough capacitors are subjected to a dramatic temperature rise. This temperature rise produces mechanical stress in the capacitor due to the mismatch in thermal coefficients of expansion of the surrounding materials.
In addition, in the prior art, the capacitor lead connections must be of very high temperature materials to withstand the high peak temperatures reached during the welding operation (as much as 500°C C.). A similar, but less severe, situation is applicable in military, space and commercial applications where similar prior art devices are soldered instead of welded by the user into a bulkhead or substrate. Many of these prior art devices employ a soldered connection to the outside perimeter or outside diameter of the feedthrough capacitor. Excessive and unevenly applied soldering heat has been known to damage such prior art devices. Accordingly, there is a need for a filter capacitor and feedthrough array in a single assembly that addresses the drawbacks noted above in connection with the prior art.
In particular, a capacitive filtered feedthrough array is needed that is subjected to far less temperature rise during the manufacture thereof. Moreover, such an improvement would make the assembly relatively immune to the aforementioned stressful installation techniques.
Moreover, a capacitive filtered feedthrough array is needed which is of simplified construction, utilizing a straightforward and uncomplicated assembly, that can result in manufacturing cost reductions. Of course the new design must be capable of effectively filtering out undesirable EMI. The present invention fulfills these needs and provides other related advantages.
A capacitive filtered feedthrough assembly is formed in accordance with the present invention in a solid state manner to employ highly miniaturized conductive paths each filtered by a discoid capacitive filter embedded in a capacitive filter array. A non-conductive, co-fired metal-ceramic substrate is formed from multiple layers that supports one or a plurality of substrate conductive paths and it is brazed to a conductive ferrule, adapted to be welded to a case, using a conductive, corrosion resistant braze material. The metal-ceramic substrate is attached to an internally disposed capacitive filter array that encloses one or a plurality of capacitive filter capacitor active electrodes each coupled to a filter array conductive path and at least one capacitor ground electrode. Each capacitive filter array conductive path is joined with a metal-ceramic conductive path to form a feedthrough conductive path. Bonding pads are attached to the internally disposed ends of each feedthrough conductive path, and corrosion resistant, conductive buttons are attached to and seal the externally disposed ends of each feedthrough conductive path. Each capacitor ground electrode is electrically coupled with the ferrule.
Preferably, a plurality of such feedthrough conductive paths are formed, and each capacitive filter comprises a plurality of capacitor active and ground electrodes, wherein the capacitor ground electrodes are electrically connected in common.
Moreover, preferably, a plurality of conductive, substrate ground paths are formed extending through the co-fired metal-ceramic substrate between internally and externally facing layer surfaces thereof and electrically isolated from the substrate conductive paths. The capacitor ground electrodes are coupled electrically to the plurality of conductive, substrate ground paths and to the ferrule.
In addition, preferably, the capacitive filter array conductive paths are formed by solder filling holes extending through the filter array substrate between internally and externally facing array surfaces thereof. The application of the solder also joins the externally facing array surface with the internally facing metal-ceramic substrate layer surface and electrically joins the capacitive filter array conductive paths with the metal-ceramic conductive paths to form the feedthrough conductive paths.
Utilization of an internally grounded, metal-ceramic substrate providing a plurality of conductive substrate paths in stacked, aligned, relation to a capacitive filter array as disclosed herein provides a number of advantages:
A hermetic seal is achieved by brazing a co-fired metal-ceramic substrate with low permeability to a metallic ferrule. The inventive ferrule-substrate braze joint design minimizes the tensile stresses in the co-fired substrate, thus preventing cracking of the co-fired substrate during brazing and welding. In addition, the ferrule has a thin flange which minimizes stress applied to the co-fired substrate during welding. Corrosion of the co-fired metal phase of the substrate is prevented by protecting the exposed metal vias and pads with corrosion resistant metallizations and braze materials.
Because the capacitive filter array Is displaced from the ferrule and supported by the metal-ceramic substrate, the heat imparted to the ferrule flange during welding causes minimal temperature elevation of the capacitive filter array, and does not cause damage to it.
The attachment of the conductive paths of the outward facing capacitive filter surface to the metallized layers of the inward facing surface of the metal-ceramic substrate using reflow soldering provides secure attachment and low resistance electrical connection and simplifies manufacturing. The use of conductive epoxy compounds for adhesion is thereby avoided. Conductive epoxy adhesion layers can bridge the non-conductive ceramic between adjacent conductive paths and cause electrical shorts. And voids can occur in bridging the conductive paths of the metal-ceramic substrate and the capacitive filter elements.
The reflow soldering attachment of the of the conductive paths of the outward facing capacitive filter surface to the metallized layers of the inward facing surface of the metal-ceramic substrate also is advantageous in that the solder flow takes place in an oven under uniformly applied temperature to the entire assembly, thereby avoiding damage that can be caused in hand soldering such parts together.
The capacitor ground electrodes of the discoidal capacitors of the capacitive filter array are electrically coupled together and through the plurality of substrate ground paths of the metal-ceramic substrate and then through the braze to the ferrule. The plurality of substrate ground paths are selected in total cross-section area to provide a total ground via cross-section area that minimizes the inductance of the filtered feedthrough assembly, resulting in favorable insertion loss of EMI and unwanted signals.
Size of the feedthrough is decreased by eliminating the pins, the pin braze joints, and the welds between the pins. The pin-to-pin spacing of two single pin or unipolar feedthroughs is typically on the order of 0.125 inches. The above-described capacitive filtered feedthrough array provides a spacing of 0.050 inches between adjacent conductive paths.
These and other advantages and features of the present invention will be appreciated as the same becomes better understood by reference to the following detailed description of the preferred embodiment of the invention when considered in connection with the accompanying drawings, in which like numbered reference numbers designate like parts throughout the figures thereof, and wherein:
The filtered feedthrough assembly 10 shown in
The ferrule 20 is preferably formed of a conductive material selected from the group consisting of niobium, titanium, titanium alloys such as titanium-6Al-4V or titanium-vanadium, platinum, molybdenum, zirconium, tantalum, vanadium, tungsten, iridium, rhodium, rhenium, osmium, ruthenium, palladium, silver, and alloys, mixtures and combinations thereof. Niobium is the optimal material for forming the ferrule 20 because it has a coefficient of thermal expansion (CTE) that is compatible with the CTE of the substrate 40 so that heat-induced during brazing of the metal-ceramic substrate edge to the ferrule inner wall surface 24 does not damage the substrate 40.
The multi-layer, co-fired metal-ceramic substrate 40 shown in detail in
The metal-ceramic substrate 40 is formed of a plurality of planar ceramic layers 52, 54, 56, 58 and 60. Each ceramic layer is shaped in a green state to have a layer thickness and a plurality of via holes extending therethrough between an internally facing layer surface and an externally facing layer surface. The co-fired metal-ceramic substrate ceramic material comprises one of the group consisting essentially of alumina, aluminum nitride, beryllium oxide, silicon dioxide, and glass-ceramic materials that has a CTE compatible with the CTE of the material of the ferrule.
A plurality (nine in the depicted example) of conductive paths, e.g. path 50 shown in
A further plurality (twenty in the depicted example) of ground paths 118 each comprising substrate ground paths 118 extending through all layers 52-60 spaced apart around the periphery of the co-fired metal-ceramic substrate 40. The ground paths 118 also comprise one or more ground trace, e.g. ground plane traces or layers 132, 134 and 136 shown in
Each such conductive path 50 extends all the way through the substrate 40 between the internally facing side 42 and the externally facing side 44. On the externally facing side 44, ceramic layer 60 is formed in the green state with a plurality of button cavities 80 each aligned with a via 68 of layer 58. A substrate conductor pad or button 70 is fitted within each button cavity 80 of the layer 60 and adhered to via 68 by a button braze joint 78 formed of gold or a nickel-gold alloy. The pads or bonding buttons 70 are preferably formed of a conductive material selected from the group consisting of niobium, platinum or a platinum-iridium alloy, titanium, titanium alloys such as titanium-6Al-4V or titanium-vanadium, molybdenum, zirconium, tantalum, vanadium, tungsten, iridium, rhodium, rhenium, osmium, ruthenium, palladium, silver, and alloys, mixtures and combinations thereof. In this way, a plurality of externally disposed bonding buttons 70 are supported along the externally disposed feedthrough portion 14, and each externally disposed bonding button 70 is electrically conducted with an electrically conductive path 50 of the metal-ceramic substrate 40.
A substrate conductor plated pad 82 is formed of gold or a gold alloy on the internally facing surface of layer 52 and electrically coupled to via 62. A solder layer 128 adheres to plated pad 82 during assembly of the feedthrough assembly 10 described below with reference to FIG. 12. The plurality of ceramic layers are shaped punched with holes, and printed with the traces and vias and assembled together in the ceramic green state, and the assembly is then co-fired from the green state to form the substrate 40 as further described below in reference to FIG. 10.
The discoidal capacitive filter array 90 is formed of a ceramic capacitive filter array substrate 92 having an internally facing filter substrate side 94 and an externally facing filter substrate side 96 joined by a common filter substrate edge 98. The discoidal capacitor filter array 90 is formed with a plurality of discoidal capacitive filters, e.g., capacitive filter 100, that are electrically connected with a respective one of the substrate conductive paths, e.g., conductive path 50, and provide a filtered electrically conductive path between the internally disposed bonding pad 120 and the externally disposed button 70. The number of conductive paths so formed can vary from the nine that are depicted in
The capacitive filter array substrate 92 is preferably formed of layers of barium titanate and precious metal traces in the manner described below with reference to FIG. 11. The plurality of capacitive filters 100 and the filter array conductive paths 110 associated therewith are formed in and electrically isolated from one another by the ceramic material and extend between the Internally facing filter substrate side 94 and the externally facing filter substrate side 96. Each filter array conducive path 110 is formed of melted solder pre-forms as described below that fill a respective capacitor filter hole 108 extending between the internally facing filter substrate side 94 and an externally facing filter substrate side 96.
Each discoidal capacitive filter 100 comprises at least one capacitor electrode formed within the filter substrate and extending outward from a filter array conductive path 110 in overlapping spaced relation to at least one common ground plate. The number and dielectric thickness spacing of the capacitor electrode sets varies in accordance with the capacitance value and the voltage rating of the discoidal capacitor. The capacitor active and ground electrodes are formed of silver thick films, silver-palladium alloy thick films, or silver-platinum alloy thick films disposed on inner capacitive filter layer surfaces during the fabrication of the capacitive filter array 90. The numbers of capacitor active and ground electrodes, the sizes of each and the spacing and overlapping relation can be varied for each discoidal capacitive filter 100 within the capacitive filter array 90 and between differing models of such capacitive filter arrays 90 to tailor the filter characteristics to the circuitry of the particular IMD. In the depicted example, the capacitive filters 100 either have three capacitor active electrodes 112, 114, 116 or two capacitor active electrodes 122, 124 that are spaced from three ground electrodes 102, 104, 106 that extend inward from the filter substrate edge 98. In operation, the discoidal capacitor permits passage of relatively low frequency electrical signals along the conductive path it is coupled with, while shielding and decoupling/attenuating undesired interference signals of typically high frequency.
The ground solder joint 130, preferably formed of solder or a conductive epoxy, adheres against a metallized layer 111 formed on the filter substrate edge 98 as described below in reference to
The substrate-ferrule braze joint 48 is preferably formed of 99.9% or purer gold or a nickel-gold alloy that adheres to the metallization layer 140 on substrate edge 46 and to the ferrule wall 22 and provides a hermetic seal of the ferrule 20 with the metal-ceramic substrate 40. The substrate-ferrule braze joint 48 may also be formed of: (a) gold alloys comprising gold and at least one of titanium, niobium, vanadium, nickel, molybdenum, platinum, palladium, ruthenium, silver, rhodium, osmium, indium, and alloys, mixtures and thereof; (b) copper-silver alloys, including copper-silver eutectic alloys, comprising copper and silver and optionally at least one of indium, titanium, tin, gallium, palladium, platinum, and alloys, mixtures and combinations thereof; and (c) silver-palladium-gallium alloys.
The filtered feedthrough assembly 10 thus provides a plurality of miniaturized, electrically isolated, and capacitively filtered, electrical conductors formed of conductive path 50 and 110 extending between a respective internal bonding pad 120 of the internally disposed portion 12 and bonding button 70 of the externally disposed portion 14 when the feedthrough assembly 10 is affixed into an opening 204 in the case 202 of the electronic device, e.g., the IMD 200 of
In step S102, the holes that will be filled with conductive material to form the vias 62-68 of each conductive path 50 and the aligned ground vias, as well as the button cavities 80 of the layer 60 are made, using any conventional technique, such as drilling, punching, laser cutting, etc., through each of the green sheets from which the ceramic layers 52-60 are formed. The vias 42 may have a size appropriate for the path spacing, with about a 0.004 inch diameter hole being appropriate for 0.020 inch center to center path spacing.
In step S104, the via holes are filled with a paste of refractory metal, e.g., tungsten, molybdenum, or tantalum paste, preferably using screen printing. In step S104, the conductive traces, e.g. traces 72, 74, 76, are also applied to particular surface areas of the ceramic layers 52-60 over the vias. The traces may comprise an electrical conductor, such as copper, aluminum, or a refractory metal paste, that may be deposited on the green sheets using conventional techniques. The traces may be deposited, sprayed, screened, dipped, plated, etc. onto the green sheets. The traces may have a center to center spacing as small as about 0.020 inch (smaller spacing may be achievable as trace forming technology advances) so that a conductive path density of associated vias and traces of up to 50 or more paths per inch may be achieved.
In these ways, the via holes are filled and the conductive traces are applied to the green sheets before they are stacked and laminated in step S106 using a mechanical or hydraulic press for firing. The stacked and laminated ceramic layers are trimmed to the external edge dimensions sufficient to fit within the ferrule opening, taking into account any shrinkage that may occur from co-firing of the stacked layers. In step S110, the assembly of the stacked, laminated and trimmed green sheets is co-fired to drive off the resin and sinter the particulate together into a multi-layer metal-ceramic substrate 40 of higher density than the green sheets forming the layers 52-60. The green sheets shrink in thickness when fired such that a 0.006 inch thick green sheet typically shrinks to a layer thickness of about 0.005 inch. The green sheets may be fired using conventional techniques, with low temperature co-fired ceramic techniques being recommended when copper or aluminum are used.
In step S112, the outer edge 46 and the inward and outward facing substrate surfaces 42 and 44 are machined and polished to size and finish specifications. Then, in step S114, the various regions of the outward facing surface 44 are metallized to form the button braze joints 78 for each conductive path 50 and the band-shaped, ground plane layer 136 electrically connecting all of the substrate ground paths 118 together at the outward facing ends thereof. The substrate edge 46 is also metallized with metallization layer 140. These metallization layers are preferably sputtered films of niobium, titanium, tungsten, molybdenum or alloys thereof. The machining and polishing of the outer edge 46 which is then metallized improves the dimensional tolerances of the co-fired substrate 40 which in turn enables the reliable use of the substrate-ferrule braze joint 48 that is formed in step S300 of FIG. 12.
In a preferred embodiment of the present invention, where pure gold is employed to form the substrate-ferrule braze joint 48, a 25,000 Angstrom thick layer of niobium is preferably sputtered onto substrate edge 46 and on edge bands of the inward facing surface 44 to form the band-shaped, ground plane or trace layers 132 and 136 by vacuum deposition using a Model No. 2400 PERKIN-ELMER® sputtering system. The niobium layer is most preferably between about 15,000 and about 32,000 Angstroms thick. These metallization layers may not be required if metals such as: (i) gold alloys comprising gold and at least one of titanium, niobium, vanadium, nickel, molybdenum, platinum, palladium, ruthenium, silver, rhodium, osmium, iridium., and alloys, mixtures and thereof; (ii) copper-silver alloys, including copper-silver eutectic alloys, comprising copper and silver and optionally at least one of indium, titanium, tin, gallium, palladium, platinum; or (iii) alloys, mixtures or combinations of (i) or (ii) are employed for the substrate-ferrule braze joint 48.
In step S200, the barium titanate ceramic layers are tape cast, and the capacitor active and ground electrodes are screen printed on the surfaces thereof in step S202. The capacitor electrodes are formed of silver thick films, silver-palladium alloy thick films, or silver-platinum alloy thick films. The layers are stacked and laminated using a mechanical or hydraulic press in step S204, and the stacked and laminated layers are machined and drilled to form the capacitor conductive path receiving, capacitive filter holes 108 in steps S206 and S208.
The partly completed capacitor filter array 90 is fired in step S210 to form the monolithic structure. Then, in steps S212 and S214, the edges of the active capacitive filter electrodes 112, 114, 116 or 122, 124 exposed by the capacitor holes 108 and the capacitive filter ground electrodes 102, 104 and 106 are coupled together electrically in common or "terminated". A conductive metal frit that contains one of silver, palladium, platinum, gold and nickel alloys thereof, is placed in the capacitor holes 118 and along the array side 98 and melted to form the termination layers 109 and 111 shown in
In step S300, the ferrule 20, braze preforms that melt to form the substrate-ferrule braze joint 48, the metal-ceramic substrate 40, and the externally disposed contact buttons 70 in the button cavities 80 are stacked into a braze fixture. Advantageously, these components that are assembled together in step S300 self center and support one another in the braze fixture. This improves the ease of manufacturing and increases manufacturing batch yields. The stacked assembly is subjected to brazing temperatures in a vacuum or inert gas furnace in step S302, whereby the braze preforms melt to form the substrate-ferrule braze joint 48 and the buttons 70 fill the button cavities 80 and adhere to the braze joints 78. As the assembly cools, the ferrule contracts more than the co-fired substrate, which puts the co-fired substrate in a state of compression.
In step S304, the conductive plated pads 82 and the band-shaped, ground plane or trace layer 132 electrically connecting all of the substrate ground paths 118 together at each inward facing end thereof are adhered onto the surface 42 as metallization layers. Each metallization layer preferably comprises sputtered films, first of titanium, then of nickel, and finally of gold, so that a three film metallization layer is formed in each case.
In step S306, the discoid capacitive filter array 90, reflow solder, and the interior contact pads 120 are assembled onto the inward facing surfaces of the sub-assembly formed in step S304, and these components are heated in step S308. The heating causes the solder to flow into and fill the capacitive filter conductive path holes 108 to complete the formation of the capacitive filter conductive paths 110 and the solder pads 128 shown in FIG. 7 and to adhere the internally disposed bonding pad 120. The solder may be an indium-lead or tin-lead alloy, and the internally disposed bonding pads 120 may be formed of Kovar alloy plated with successive layers of nickel and gold. The final layer that is exposed to air and that lead wires are bonded or welded to as shown in
In step S310, the ground solder joint 130 is molded around and against the filter substrate edge 98 and the band-shaped, ground plane or trace layer 132. The ground solder joint 130 electrically connects the three ground electrodes 102, 104, 106 together and to the ferrule 20 through the plurality of substrate ground paths 118 and the substrate-ferrule braze joint 48. The ground solder joint 130 also mechanically bonds the discoid capacitive filter array 90 with the multi-layer metal-ceramic substrate 40. Since the ground solder joint 130 does not need to provide a hermetic seal, it may be formed of a number of materials as described above.
In the sputtering steps of the present invention, a DC magnetron sputtering technique is preferred, but RF sputtering techniques may less preferably be employed. A DC magnetron machine that may find application in the present invention is an Model 2011 DC magnetron sputtering device manufactured by ADVANCED ENERGY of Fort Collins, Colo.
The pin-to-pin spacing of two single pin or unipolar feedthroughs is typically on the order of 0.125 inches. The above-described capacitive filtered feedthrough array provides a spacing of 0.050 inches between adjacent conductive paths. The feedthrough assembly 10 can be formed providing the nine capacitively filter array conductive paths within a ferrule 20 that is 0.563 inches long and 0.158 inches wide.
While the present invention has been illustrated and described with particularity in terms of a preferred embodiment, it should be understood that no limitation of the scope of the invention is intended thereby. The scope of the invention is defined only by the claims appended hereto. It should also be understood that variations of the particular embodiment described herein incorporating the principles of the present invention will occur to those of ordinary skill in the art and yet be within the scope of the appended claims.
Strom, James, Wiklund, Craig L., Wolf, William D., Fraley, Mary A., Seifried, Lynn M., Volmering, James E., Malone, Patrick F., Haq, Samuel F.
Patent | Priority | Assignee | Title |
10046166, | Jan 17 2012 | Greatbatch Ltd. | EMI filtered co-connected hermetic feedthrough, feedthrough capacitor and leadwire assembly for an active implantable medical device |
10080889, | Mar 19 2009 | Greatbatch Ltd | Low inductance and low resistance hermetically sealed filtered feedthrough for an AIMD |
10092766, | Nov 23 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Capacitor and method to manufacture the capacitor |
10136702, | Jan 16 2012 | Kahtoola, Inc.; KAHTOOLA, INC | Footwear accessory binding system |
10213611, | Jun 30 2015 | OSONG MEDICAL INNOVATION FOUNDATION | Method of manufacturing feedthrough |
10249415, | Jan 06 2017 | Greatbatch Ltd.; Greatbatch Ltd | Process for manufacturing a leadless feedthrough for an active implantable medical device |
10286218, | Jul 31 2009 | Medtronic, Inc. | Connector enclosure assemblies of medical devices including an angled lead passageway |
10290400, | Aug 04 2009 | Heraeus Deutschland GmbH & Co. KG | Method of producing a cermet-containing bushing for an implantable medical device |
10350421, | Jun 30 2013 | Greatbatch Ltd | Metallurgically bonded gold pocket pad for grounding an EMI filter to a hermetic terminal for an active implantable medical device |
10350422, | Jun 09 2017 | Medtronic, Inc. | Feedthrough assembly including ferrule with tapered extension(s) |
10363425, | Jun 01 2015 | KYOCERA AVX Components Corporation | Discrete cofired feedthrough filter for medical implanted devices |
10418798, | Mar 14 2013 | Heraeus Deutschland GmbH & Co. KG | Welded feedthrough |
10420949, | Jan 16 2012 | Greatbatch Ltd. | Method of manufacturing a feedthrough insulator for an active implantable medical device incorporating a post conductive paste filled pressing step |
10449373, | Jul 31 2009 | Medtronic, Inc. | Connector enclosure assemblies of medical devices including an angled lead passageway |
10471266, | Aug 02 2011 | Medtronic, Inc.; Kyocera Corporation | Hermetic feedthrough for an implantable medical device |
10500402, | Jan 16 2012 | Greatbatch Ltd. | Hermetically sealed feedthrough with co-fired filled via and conductive insert for an active implantable medical device |
10559409, | Jan 06 2017 | Greatbatch Ltd. | Process for manufacturing a leadless feedthrough for an active implantable medical device |
10561837, | Mar 01 2011 | Greatbatch Ltd. | Low equivalent series resistance RF filter for an active implantable medical device utilizing a ceramic reinforced metal composite filled via |
10561851, | Aug 02 2011 | Medtronic INC | Interconnection of conductor to feedthrough |
10589107, | Nov 08 2016 | Greatbatch Ltd. | Circuit board mounted filtered feedthrough assembly having a composite conductive lead for an AIMD |
10596369, | Mar 01 2011 | Greatbatch Ltd.; Greatbatch Ltd | Low equivalent series resistance RF filter for an active implantable medical device |
10646719, | Jul 31 2009 | Medtronic, Inc. | Implantable medical devices including baseplates having separate bodies of material thereon |
10770879, | Mar 14 2013 | Heraeus Deutschland GmbH & Co. KG | Welded feedthrough |
10772228, | Nov 03 2015 | Medtronic, Inc. | Sealed package including electronic device and power source |
10881867, | Jan 16 2012 | Greatbatch Ltd | Method for providing a hermetically sealed feedthrough with co-fired filled via for an active implantable medical device |
10894165, | Jan 13 2016 | TODOC CO , LTD | Feedthrough device |
10905888, | Mar 22 2018 | Greatbatch Ltd | Electrical connection for an AIMD EMI filter utilizing an anisotropic conductive layer |
10912945, | Mar 22 2018 | Greatbatch Ltd.; Greatbatch Ltd | Hermetic terminal for an active implantable medical device having a feedthrough capacitor partially overhanging a ferrule for high effective capacitance area |
10921396, | Jul 26 2006 | Cardiac Pacemakers, Inc. | Systems and methods for sensing external magnetic fields in implantable medical devices |
11051905, | Jul 31 2009 | Medtronic, Inc. | Implantable medical devices with enclosures including top and bottom end caps |
11058871, | Dec 08 2003 | Cochlear Limited | Manufacturing an electrode array for a stimulating medical device |
11071858, | Mar 01 2011 | Greatbatch Ltd. | Hermetically sealed filtered feedthrough having platinum sealed directly to the insulator in a via hole |
11090499, | Jul 31 2009 | Medtronic, Inc | Implantable medical device |
11114994, | Dec 20 2018 | KYOCERA AVX Components Corporation | Multilayer filter including a low inductance via assembly |
11160988, | Jun 01 2015 | KYOCERA AVX Components Corporation | Discrete cofired feedthrough filter for medical implanted devices |
11198014, | Jun 11 2018 | Greatbatch Ltd.; Greatbatch Ltd | Hermetically sealed filtered feedthrough assembly having a capacitor with an oxide resistant electrical connection to an active implantable medical device housing |
11202914, | Dec 21 2018 | Medtronic, Inc. | Passive propagation fractal antenna for intrabody transmissions |
11224753, | Dec 28 2010 | Medtronic, Inc. | Medical devices including connector enclosures with feedthrough passageways |
11253708, | May 24 2018 | Medtronic, Inc. | Machined features of enclosures for implantable medical devices |
11344734, | Jun 11 2018 | Greatbatch Ltd. | Filtered feedthrough assembly having a capacitor ground metallization electrically connected to the gold braze portion sealing a ferrule peninsula to a matching insulator cutout |
11351387, | Jan 16 2012 | Greatbatch Ltd. | Method of manufacturing a singulated feedthrough insulator for a hermetic seal of an active implantable medical device incorporating a post conductive paste filled pressing step |
11485670, | Oct 10 2013 | Medtronic, Inc. | Hermetic conductive feedthroughs for a semiconductor wafer |
11562860, | Apr 24 2018 | TAIYO YUDEN CO , LTD | Multi-layer ceramic electronic component, method of producing the same, and circuit board |
11701519, | Feb 21 2020 | Heraeus Medical Components LLC | Ferrule with strain relief spacer for implantable medical device |
11712571, | Mar 22 2018 | Greatbatch Ltd | Electrical connection for a hermetic terminal for an active implantable medical device utilizing a ferrule pocket |
11806519, | Jul 31 2009 | Medtronic, Inc. | Machining of enclosures for implantable medical devices |
11806542, | Feb 11 2020 | INSPIRE MEDICAL SYSTEMS, INC | Feedthrough mounting for an electronic device, such as an implantable medical device, and methods of making the same |
11865639, | Dec 13 2019 | Medtronic, Inc.; Medtronic, Inc | Hermetic assembly and device including same |
11894163, | Feb 21 2020 | Heraeus Medical Components LLC | Ferrule for non-planar medical device housing |
6501638, | Aug 07 1998 | Epcos AG | Solderless, coaxial feedthrough component |
6532143, | Dec 29 2000 | Intel Corporation | Multiple tier array capacitor |
6542352, | Dec 09 1997 | CERAMIC CHIP CAPACITOR OF CONVENTIONAL VOLUME AND EXTERNAL FORM HAVING INCREASED CAPACITANCE FROM USE OF CLOSELY SPACED INTERIOR CONDUCTIVE PLANES RELIABLY CONNECTING TO POSITIONALLY TOLERANT EXTERIOR PADS THROUGH MULTIPLE REDUNDANT VIAS | |
6545854, | May 25 2001 | Presidio Components, Inc. | Fringe-field non-overlapping-electrodes discoidal feed-through ceramic filter capacitor with high breakdown voltage |
6619763, | May 05 2001 | Presidio Components, Inc. | Feed-through filter capacitor with non-overlapping electrodes |
6725517, | Jun 20 2000 | Outokumpu Oyj | Method for plugging a hole and a cooling element manufactured by said method |
6751082, | Dec 09 1997 | CERAMIC CHIP CAPACITOR OF CONVENTIONAL VOLUME AND EXTERNAL FORM HAVING INCREASED CAPACITANCE FROM USE OF CLOSELY SPACED INTERIOR CONDUCTIVE PLANES RELIABLY CONNECTING TO POSITIONALLY TOLERANT EXTERIOR PADS THROUGH MULTIPLE REDUNDANT VIAS | |
6753218, | Dec 09 1997 | CERAMIC CHIP CAPACITOR OF CONVENTIONAL VOLUME AND EXTERNAL FORM HAVING INCREASED CAPACITANCE FROM USE OF CLOSELY SPACED INTERIOR CONDUCTIVE PLANES RELIABLY CONNECTING TO POSITIONALLY TOLERANT EXTERIOR PADS THROUGH MULTIPLE REDUNDANT VIAS | |
6760215, | May 25 2001 | Capacitor with high voltage breakdown threshold | |
6765779, | Feb 28 2002 | GREATBATCH, LTD NEW YORK CORPORATION | EMI feedthrough filter terminal assembly for human implant applications utilizing oxide resistant biostable conductive pads for reliable electrical attachments |
6765780, | Feb 28 2002 | GREATBATCH, LTD NEW YORK CORPORATION | EMI feedthrough filter terminal assembly having surface mounted, internally grounded hybrid capacitor |
6816356, | May 17 2002 | PRESIDIO COMPONENTS, INC | Integrated broadband ceramic capacitor array |
6831529, | May 20 2003 | Feed-through filter capacitor assembly | |
6888715, | Feb 28 2002 | GREATBATCH, LTD NEW YORK CORPORATION | EMI feedthrough filter terminal assembly utilizing hermetic seal for electrical attachment between lead wires and capacitor |
6920673, | Jan 02 2002 | GREATBATCH, LTD NEW YORK CORPORATION | Installation of filter capacitors into feedthroughs for implantable medical devices |
6963780, | Jan 31 2002 | Medtronic, Inc. | Implantable medical device including a surface-mount terminal array |
6970341, | May 17 2002 | Integrated broadband ceramic capacitor array | |
6980066, | Mar 29 2001 | TDK Corporation | High-frequency module |
6985347, | Feb 28 2002 | GREATBATCH, LTD NEW YORK CORPORATION | EMI filter capacitors designed for direct body fluid exposure |
7012192, | May 10 2004 | GREATBATCH, LTD NEW YORK CORPORATION | Feedthrough terminal assembly with lead wire bonding pad for human implant applications |
7035077, | May 10 2004 | GREATBATCH, LTD NEW YORK CORPORATION | Device to protect an active implantable medical device feedthrough capacitor from stray laser weld strikes, and related manufacturing process |
7035080, | Nov 22 2004 | Combined multilayer and single-layer capacitor for wirebonding | |
7038900, | Feb 27 2003 | GREATBATCH, LTD NEW YORK CORPORATION | EMI filter terminal assembly with wire bond pads for human implant applications |
7075776, | May 17 2002 | Integrated broadband ceramic capacitor array | |
7081660, | Jun 19 2001 | Axsun Technologies, Inc | Hermetic package with internal ground pads |
7113387, | Feb 28 2002 | GREATBATCH, LTD NEW YORK CORPORATION | EMI filter capacitors designed for direct body fluid exposure |
7187535, | Jan 30 2006 | Medtronic, Inc | Multipolar feedthrough assembly with customizable filter and method of manufacture |
7236834, | Dec 19 2003 | Medtronic, Inc. | Electrical lead body including an in-line hermetic electronic package and implantable medical device using the same |
7248459, | Dec 31 2003 | Integrated multi-capacitor network | |
7254443, | Jun 06 2003 | Medtronic, Inc | Implantable medical device including a hermetic connector block extension |
7259956, | Dec 19 2003 | AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED | Scalable integrated circuit high density capacitors |
7260434, | Sep 23 2004 | Pacesetter, Inc.; Pacesetter, Inc | Integrated 8-pole filtered feedthrough with backfill tube for implantable medical devices |
7307829, | May 17 2002 | Integrated broadband ceramic capacitor array | |
7310216, | Feb 27 2003 | Greatbatch Ltd | EMI filter terminal assembly with wire bond pads for human implant applications |
7323142, | Sep 07 2001 | MEDTRONIC MINIMED, INC | Sensor substrate and method of fabricating same |
7327553, | Jul 27 2004 | Greatbatch Ltd | Feedthrough capacitor filter assemblies with laminar flow delaminations for helium leak detection |
7391600, | Sep 17 2004 | Matsushita Electric Industrial Co., Ltd. | Feedthrough capacitor and magnetron |
7396265, | Sep 30 2002 | Cochlear Limited | Feedthrough for electrical connectors |
7430107, | Aug 21 2006 | MURATA MANUFACTURING CO , LTD | Monolithic capacitor, circuit board, and circuit module |
7535693, | Feb 28 2002 | Greatbatch Ltd | EMI filters designed for direct body fluid exposure |
7623335, | Feb 27 2003 | Greatbatch Ltd | Hermetic feedthrough terminal assembly with wire bond pads for human implant applications |
7623336, | Jun 01 2006 | Greatbatch Ltd | Feedthrough capacitor having reduced self resonance insertion loss dip |
7656643, | Dec 19 2003 | AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED | Scalable integrated circuit high density capacitors |
7668597, | Mar 31 2006 | Medtronic, Inc | Feedthrough array for use in implantable medical devices |
7693576, | Apr 11 2007 | Pacesetter, Inc. | Capacitor-integrated feedthrough assembly for an implantable medical device |
7725190, | Jan 30 2006 | Medtronic, Inc | Implantable medical device feedthrough assembly including flange plate |
7729770, | Apr 26 2006 | Medtronic, Inc. | Isolation circuitry and method for gradient field safety in an implantable medical device |
7748093, | Mar 31 2006 | Medtronic, Inc. | Filtered feedthrough assembly and method of manufacture |
7803014, | Mar 30 2006 | Cardiac Pacemakers, Inc | Implantable medical device assembly and manufacturing method |
7822460, | Nov 04 1998 | Surgi-Vision, Inc. | MRI-guided therapy methods and related systems |
7839620, | Sep 20 2007 | Medtronic, Inc. | Filtered feedthrough assemblies for implantable devices and methods of manufacture |
7950134, | Dec 08 2003 | Cochlear Limited | Implantable antenna |
7966070, | Sep 12 2003 | Medtronic, Inc | Feedthrough apparatus with noble metal-coated leads |
7978456, | Dec 19 2003 | AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED | Scalable integrated circuit high density capacitors |
7988507, | Sep 30 2002 | Cochlear Limited | Feedthrough for electrical connectors |
7996982, | Sep 30 2002 | Cochlear Limited | Method of making feedthroughs for electrical connectors |
8000083, | Dec 19 2003 | AVAGO TECHNOLOGIES GENERAL IP SINGAPORE PTE LTD | Scalable integrated circuit high density capacitors |
8049489, | Jul 26 2006 | Cardiac Pacemakers, Inc | Systems and methods for sensing external magnetic fields in implantable medical devices |
8050763, | Apr 26 2006 | Medtronic, Inc. | Isolation circuitry and method for gradient field safety in an implantable medical device |
8050771, | Dec 29 2008 | Medtronic, Inc. | Phased array cofire antenna structure and method for operating the same |
8099151, | Nov 04 1998 | Johns Hopkins University School of Medicine | System and method for magnetic-resonance-guided electrophysiologic and ablation procedures |
8112152, | Sep 12 2003 | Medtronic, Inc. | Feedthrough apparatus with noble metal-coated leads |
8131369, | Sep 12 2003 | Medtronic, Inc. | Feedthrough apparatus with noble metal-coated leads |
8160707, | Jan 30 2006 | Medtronic, Inc | Method and apparatus for minimizing EMI coupling in a feedthrough array having at least one unfiltered feedthrough |
8160708, | Apr 11 2007 | Pacesetter, Inc.; Pacesetter, Inc | Capacitor-integrated feedthrough assembly with improved grounding for an implantable medical device |
8219208, | Apr 13 2001 | Greatbatch Ltd | Frequency selective passive component networks for active implantable medical devices utilizing an energy dissipating surface |
8275466, | Jun 08 2006 | Greatbatch Ltd. | Band stop filter employing a capacitor and an inductor tank circuit to enhance MRI compatibility of active medical devices |
8326425, | Mar 30 2006 | Cardiac Pacemakers, Inc | Feedthrough connector for implantable device |
8373075, | Oct 29 2009 | Medtronic, Inc | Implantable co-fired electrical feedthroughs |
8373384, | Apr 11 2007 | Pacesetter, Inc.; Pacesetter, Inc | Capacitor-integrated feedthrough assembly with improved grounding for an implantable medical device |
8380311, | Oct 31 2006 | Medtronic, Inc | Housing for implantable medical device |
8386047, | Jul 15 2010 | Advanced Bionics | Implantable hermetic feedthrough |
8489196, | Oct 03 2003 | Medtronic, Inc | System, apparatus and method for interacting with a targeted tissue of a patient |
8494635, | Feb 02 2010 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method for sintering electrical bushings |
8497804, | Oct 31 2008 | Medtronic, Inc | High dielectric substrate antenna for implantable miniaturized wireless communications and method for forming the same |
8528201, | Feb 02 2010 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method of producing an electrical bushing with gradient cermet |
8552311, | Jul 15 2010 | Advanced Bionics | Electrical feedthrough assembly |
8570707, | Dec 19 2003 | AVAGO TECHNOLOGIES INTERNATIONAL SALES PTE LIMITED | Scalable integrated circuit high density capacitors |
8588916, | Aug 02 2011 | Medtronic, Inc. | Feedthrough configured for interconnect |
8593816, | Sep 21 2011 | Medtronic, Inc. | Compact connector assembly for implantable medical device |
8626310, | Dec 31 2008 | Medtronic, Inc | External RF telemetry module for implantable medical devices |
8644002, | May 31 2011 | Medtronic, Inc. | Capacitor including registration feature for aligning an insulator layer |
8644936, | Jan 09 2012 | Medtronic, Inc. | Feedthrough assembly including electrical ground through feedthrough substrate |
8653384, | Jan 16 2012 | Greatbatch Ltd | Co-fired hermetically sealed feedthrough with alumina substrate and platinum filled via for an active implantable medical device |
8670829, | Aug 02 2011 | Medtronic, Inc.; Kyocera Corporation | Insulator for a feedthrough |
8672667, | Jul 17 2007 | Cochlear Limited | Electrically insulative structure having holes for feedthroughs |
8698006, | Jun 04 2009 | MORGAN ADVANCED CERAMICS, INC | Co-fired metal and ceramic composite feedthrough assemblies for use at least in implantable medical devices and methods for making the same |
8710826, | Jul 26 2006 | Cardiac Pacemakers, Inc. | Systems and methods for sensing external magnetic fields in implantable medical devices |
8725263, | Jul 31 2009 | Medtronic, Inc. | Co-fired electrical feedthroughs for implantable medical devices having a shielded RF conductive path and impedance matching |
8744583, | Apr 11 2007 | Pacesetter, Inc. | Capacitor-integrated feedthrough assembly with improved grounding for an implantable medical device |
8755887, | Aug 04 2009 | HERAEUS DEUTSCHLAND GMBH & CO KG | Cermet-containing bushing for an implantable medical device |
8790528, | Feb 08 2007 | Manufacture filtration elements | |
8819919, | Dec 08 2003 | Cochlear Limited | Method of forming a non-linear path of an electrically conducting wire |
8821793, | Sep 07 2001 | Medtronic MiniMed, Inc. | Sensor substrate and method of fabricating same |
8841558, | Aug 02 2011 | Medtronic Inc.; Kyocera Corporation | Hermetic feedthrough |
8844103, | Sep 01 2011 | Medtronic, Inc.; Medtronic, Inc | Methods for making feedthrough assemblies including a capacitive filter array |
8849404, | Sep 01 2011 | Medtronic, Inc.; Medtronic, Inc | Feedthrough assembly including a lead frame assembly |
8872035, | Aug 02 2011 | Medtronic INC | Hermetic feedthrough |
8886320, | Feb 02 2010 | HERAEUS DEUTSCHLAND GMBH & CO KG | Sintered electrical bushings |
8894914, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method for the manufacture of a cermet-containing bushing |
8897887, | Apr 13 2001 | Greatbatch Ltd | Band stop filter employing a capacitor and an inductor tank circuit to enhance MRI compatibility of active medical devices |
8929987, | Aug 04 2009 | HERAEUS DEUTSCHLAND GMBH & CO KG | Electrical bushing for an implantable medical device |
8938309, | Jan 16 2012 | Greatbatch Ltd | Elevated hermetic feedthrough insulator adapted for side attachment of electrical conductors on the body fluid side of an active implantable medical device |
8983618, | Oct 31 2008 | Medtronic, Inc | Co-fired multi-layer antenna for implantable medical devices and method for forming the same |
9008779, | Aug 02 2011 | Medtronic INC | Insulator for a feedthrough |
9032614, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method for manufacturing an electrical bushing for an implantable medical device |
9040819, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Implantable device having an integrated ceramic bushing |
9048608, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method for the manufacture of a cermet-containing bushing for an implantable medical device |
9061161, | Sep 01 2011 | Medtronic, Inc | Capacitive filtered feedthrough array for implantable medical device |
9088093, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Head part for an implantable medical device |
9093295, | Nov 13 2013 | Qualcomm Incorporated | Embedded sheet capacitor |
9108066, | Jan 16 2013 | Greatbatch Ltd. | Low impedance oxide resistant grounded capacitor for an AIMD |
9119968, | Jul 09 2012 | Greatbatch Ltd | Band stop filter employing a capacitor and an inductor tank circuit to enhance MRI compatibility of active medical devices |
9126053, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Electrical bushing with cermet-containing connecting element for an active implantable medical device |
9174047, | May 12 2010 | Advanced Bionics AG | Electrical feedthrough assembly |
9215801, | Dec 13 2010 | Tokuyama Corporation | Via-holed ceramic substrate, metallized via-holed ceramic substrate, and method for manufacturing the same |
9233253, | Jan 16 2012 | Greatbatch Ltd | EMI filtered co-connected hermetic feedthrough, feedthrough capacitor and leadwire assembly for an active implantable medical device |
9242090, | Apr 13 2001 | Greatbatch Ltd | MRI compatible medical leads |
9248283, | Apr 13 2001 | Greatbatch Ltd. | Band stop filter comprising an inductive component disposed in a lead wire in series with an electrode |
9289616, | Dec 15 2010 | Advanced Bionics AG | Particulate toughened ceramic feedthrough |
9295828, | Sep 27 2010 | Greatbatch Ltd | Self-resonant inductor wound portion of an implantable lead for enhanced MRI compatibility of active implantable medical devices |
9301705, | Nov 04 1998 | Johns Hopkins University School of Medicine | System and method for magnetic-resonance-guided electrophysiologic and ablation procedures |
9306318, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Ceramic bushing with filter |
9351436, | Mar 08 2013 | Cochlear Limited | Stud bump bonding in implantable medical devices |
9352150, | Jan 16 2012 | Greatbatch Ltd. | EMI filtered co-connected hermetic feedthrough, feedthrough capacitor and leadwire assembly for an active implantable medical device |
9399143, | Oct 31 2008 | Medtronic, Inc. | Antenna for implantable medical devices formed on extension of RF circuit substrate and method for forming the same |
9403023, | Aug 07 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method of forming feedthrough with integrated brazeless ferrule |
9407076, | Feb 02 2010 | HERAEUS DEUTSCHLAND GMBH & CO KG | Electrical bushing with gradient cermet |
9418778, | Aug 02 2011 | Medtronic, Inc.; Kyocera Corporation | Method of manufacturing a feedthrough |
9427596, | Jan 16 2013 | Greatbatch Ltd. | Low impedance oxide resistant grounded capacitor for an AIMD |
9431801, | May 24 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method of coupling a feedthrough assembly for an implantable medical device |
9431814, | Feb 15 2012 | Cardiac Pacemakers, Inc. | Ferrule for implantable medical device |
9478959, | Mar 14 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Laser welding a feedthrough |
9480168, | Aug 04 2009 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method of producing a cermet-containing bushing for an implantable medical device |
9492659, | Jan 16 2012 | Greatbatch Ltd. | Co-fired hermetically sealed feedthrough with alumina substrate and platinum filled via for an active implantable medical device |
9502491, | Nov 13 2013 | Qualcomm Incorporated | Embedded sheet capacitor |
9504840, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Method of forming a cermet-containing bushing for an implantable medical device having a connecting layer |
9504841, | Dec 12 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Direct integration of feedthrough to implantable medical device housing with ultrasonic welding |
9509272, | Jan 31 2011 | HERAEUS DEUTSCHLAND GMBH & CO KG | Ceramic bushing with filter |
9511220, | Jan 16 2012 | Greatbatch Ltd. | Elevated hermetic feedthrough insulator adapted for side attachment of electrical conductors on the body fluid side of an active implantable medical device |
9552899, | Jan 31 2011 | Heraeus Deutschland GmbH & Co. KG | Ceramic bushing for an implantable medical device |
9572993, | Jan 26 2011 | Medtronic, Inc | Implantable medical devices and related connector enclosure assemblies utilizing conductors electrically coupled to feedthrough pins |
9597518, | Jan 26 2011 | Medtronic, Inc | Implantable medical devices and related connector enclosure assemblies utilizing conductors electrically coupled to feedthrough pins |
9610451, | Dec 12 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Direct integration of feedthrough to implantable medical device housing using a gold alloy |
9610452, | Dec 12 2013 | HERAEUS DEUTSCHLAND GMBH & CO KG | Direct integration of feedthrough to implantable medical device housing by sintering |
9627833, | Aug 02 2011 | Medtronic, Inc. | Electrical leads for a feedthrough |
9643020, | Aug 09 2013 | Medtronic, Inc. | Feedthrough assembly for an implantable medical device |
9643021, | Jan 08 2013 | Advanced Bionics AG | Electrical feedthrough assembly |
9653893, | May 24 2013 | Heraeus Deutschland GmbH & Co. KG | Ceramic feedthrough brazed to an implantable medical device housing |
9687662, | Jan 16 2012 | Greatbatch Ltd. | Hermetically sealed feedthrough with co-fired filled via and conductive insert for an active implantable medical device |
9724524, | Aug 02 2011 | Medtronic, Inc. | Interconnection of conductor to feedthrough |
9766307, | Jul 26 2006 | Cardiac Pacemakers, Inc. | Systems and methods for sensing external magnetic fields in implantable medical devices |
9814891, | Aug 07 2013 | Heraeus Deutschland GmbH & Co. KG | Feedthrough with integrated brazeless ferrule |
9849296, | Dec 12 2013 | Heraeus Deutschland GmbH & Co. KG | Directly integrated feedthrough to implantable medical device housing |
9855008, | Dec 12 2013 | Heraeus Deutschland GmbH & Co. LG | Direct integration of feedthrough to implantable medical device housing with ultrasonic welding |
9889306, | Jan 16 2012 | Greatbatch Ltd. | Hermetically sealed feedthrough with co-fired filled via and conductive insert for an active implantable medical device |
9931514, | Jun 30 2013 | Greatbatch Ltd.; Greatbatch Ltd | Low impedance oxide resistant grounded capacitor for an AIMD |
9993650, | Jan 16 2012 | Greatbatch Ltd | Hermetic filter feedthrough including MLCC-type capacitors for use with an active implantable medical device |
RE42856, | May 29 2002 | LANDMARK COMMUNITY BANK | Magnetic resonance probes |
RE44736, | May 29 2002 | LANDMARK COMMUNITY BANK | Magnetic resonance probes |
RE46699, | Jan 16 2013 | Greatbatch Ltd. | Low impedance oxide resistant grounded capacitor for an AIMD |
RE47624, | Jan 16 2012 | Greatbatch Ltd. | Co-fired hermetically sealed feedthrough with alumina substrate and platinum filled via for an active implantable medical device |
Patent | Priority | Assignee | Title |
4420652, | Sep 02 1980 | SEIKOSHA CO , LTD , 6-21, KYOBASHI 2-CHOME, CHUO-KU, TOKYO, JAPAN | Hermetically sealed package |
4991582, | Sep 22 1989 | Alfred E. Mann Foundation for Scientific Research | Hermetically sealed ceramic and metal package for electronic devices implantable in living bodies |
5287076, | May 29 1991 | Amphenol Corporation | Discoidal array for filter connectors |
5333095, | May 03 1993 | GREATBATCH, LTD NEW YORK CORPORATION | Feedthrough filter capacitor assembly for human implant |
5434358, | Dec 13 1993 | E-Systems, Inc. | High density hermetic electrical feedthroughs |
5470345, | Jun 16 1994 | Medtronic, Inc. | Implantable medical device with multi-layered ceramic enclosure |
5620476, | Nov 13 1995 | Pacesetter, Inc.; Pacesetter, Inc | Implantable medical device having shielded and filtered feedthrough assembly and methods for making such assembly |
5650759, | Nov 09 1995 | GREATBATCH, LTD NEW YORK CORPORATION | Filtered feedthrough assembly having a mounted chip capacitor for medical implantable devices and method of manufacture therefor |
5683435, | Nov 13 1995 | Pacesetter, Inc. | Implantable medical device having shielded and filtered feedthrough assembly and methods for making such assembly |
5685632, | May 31 1995 | Rayovac Corporation | Electrically conductive plastic light source |
5735884, | Oct 04 1994 | Medtronic, Inc | Filtered feedthrough assembly for implantable medical device |
5750926, | Aug 16 1995 | ALFRED E MANN FOUNDATION FOR SCIENTIFIC RESEARCH | Hermetically sealed electrical feedthrough for use with implantable electronic devices |
5751539, | Apr 30 1996 | GREATBATCH, LTD NEW YORK CORPORATION | EMI filter for human implantable heart defibrillators and pacemakers |
5759197, | Oct 04 1994 | Medtronic, Inc. | Protective feedthrough |
5782891, | Jun 16 1994 | Medtronic, Inc | Implantable ceramic enclosure for pacing, neurological, and other medical applications in the human body |
5825608, | Oct 18 1996 | Delaware Capital Formation, Inc | Feed-through filter capacitor assembly |
5836992, | Oct 04 1994 | Medtronic, Inc. | Filtered feedthrough assembly for implantable medical device |
5866851, | Jul 28 1995 | Medtronic Inc. | Implantable medical device with multi-pin feedthrough |
5867361, | May 06 1997 | Medtronic Inc.; Medtronic, Inc | Adhesively-bonded capacitive filter feedthrough for implantable medical device |
5870272, | May 06 1997 | Medtronic, Inc | Capacitive filter feedthrough for implantable medical device |
5896267, | Jul 10 1997 | GREATBATCH, LTD NEW YORK CORPORATION | Substrate mounted filter for feedthrough devices |
5905627, | Sep 10 1997 | GREATBATCH, LTD NEW YORK CORPORATION | Internally grounded feedthrough filter capacitor |
5959829, | Feb 18 1998 | GREATBATCH, LTD NEW YORK CORPORATION | Chip capacitor electromagnetic interference filter |
5973906, | Mar 17 1998 | GREATBATCH, LTD NEW YORK CORPORATION | Chip capacitors and chip capacitor electromagnetic interference filters |
5999398, | Jun 24 1998 | AVX Corporation | Feed-through filter assembly having varistor and capacitor structure |
6008980, | Nov 13 1997 | GREATBATCH, LTD NEW YORK CORPORATION | Hermetically sealed EMI feedthrough filter capacitor for human implant and other applications |
6275369, | Nov 13 1997 | GREATBATCH, LTD NEW YORK CORPORATION | EMI filter feedthough terminal assembly having a capture flange to facilitate automated assembly |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Mar 01 2000 | Medtronic, Inc. | (assignment on the face of the patent) | / | |||
May 08 2000 | VOLMERING, JAMES E | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 08 2000 | MALONE, PATRICK F | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 08 2000 | HAQ, SAMUEL F | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 10 2000 | WOLF, WILLIAM D | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 10 2000 | STROM, JAMES | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 10 2000 | WIKLUND, CRAIG L | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 10 2000 | SEIFRIED, LYNN M | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 | |
May 11 2000 | FRALEY, MARY A | Medtronic, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 010852 | /0355 |
Date | Maintenance Fee Events |
Dec 28 2005 | M1551: Payment of Maintenance Fee, 4th Year, Large Entity. |
Dec 22 2009 | M1552: Payment of Maintenance Fee, 8th Year, Large Entity. |
Jan 02 2014 | M1553: Payment of Maintenance Fee, 12th Year, Large Entity. |
Date | Maintenance Schedule |
Jul 02 2005 | 4 years fee payment window open |
Jan 02 2006 | 6 months grace period start (w surcharge) |
Jul 02 2006 | patent expiry (for year 4) |
Jul 02 2008 | 2 years to revive unintentionally abandoned end. (for year 4) |
Jul 02 2009 | 8 years fee payment window open |
Jan 02 2010 | 6 months grace period start (w surcharge) |
Jul 02 2010 | patent expiry (for year 8) |
Jul 02 2012 | 2 years to revive unintentionally abandoned end. (for year 8) |
Jul 02 2013 | 12 years fee payment window open |
Jan 02 2014 | 6 months grace period start (w surcharge) |
Jul 02 2014 | patent expiry (for year 12) |
Jul 02 2016 | 2 years to revive unintentionally abandoned end. (for year 12) |