Techniques for sensing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus including a memory cell array comprising a plurality of memory cells. The apparatus may also include a first data sense amplifier circuitry including an amplifier transistor having a first region coupled to at least one of the plurality of memory cells via a bit line. The apparatus may further include a data sense amplifier latch circuitry including a first input node coupled to the data sense amplifier circuitry via a second region of the amplifier transistor.

Patent
   8199595
Priority
Sep 04 2009
Filed
Sep 07 2010
Issued
Jun 12 2012
Expiry
Sep 07 2030
Assg.orig
Entity
Large
7
387
all paid
1. An apparatus comprising:
a memory cell array comprising a plurality of memory cells;
first data sense amplifier circuitry comprising an amplifier transistor having a first region coupled to at least one of the plurality of memory cells via a bit line; and
data sense amplifier latch circuitry comprising a first input node coupled to the first data sense amplifier circuitry via a second region of the amplifier transistor; wherein the data sense amplifier latch circuitry stores a data state determined by the first data sense amplifier circuitry.
2. The apparatus according to claim 1, further comprising a first power source coupled to the first region of the amplifier transistor.
3. The apparatus according to claim 1, further comprising a second power source coupled to the second region of the amplifier transistor.
4. The apparatus according to claim 1, further comprising a switch transistor coupled to the first region of amplifier transistor and the second region of the amplifier transistor.
5. The apparatus according to claim 4, wherein the switch transistor comprises a first region coupled to a first power source and a second region coupled to a second power source.
6. The apparatus according to claim 1, wherein the data sense amplifier latch circuitry comprises a second input node coupled to second data sense amplifier circuitry.
7. The apparatus according to claim 6, wherein the data sense amplifier latch circuitry further comprises a plurality of transistors arranged in a cross-coupled configuration that are configured to amplify a voltage or current difference between the first input node and the second input node.
8. The apparatus according to claim 6, wherein the second data sense amplifier circuitry provides a reference voltage potential to the second input node of the data sense amplifier latch circuitry.
9. The apparatus according to claim 1, wherein the data sense amplifier latch circuitry comprises a first latch access transistor at the first input node and a second latch access transistor at the second input node.
10. The apparatus according to claim 9, wherein the data sense amplifier latch circuitry comprises an equalization transistor arranged in series with the first latch access transistor and the second latch access transistor.
11. The apparatus according to claim 1, further comprising pre-charge circuitry coupled to the bit line.
12. The apparatus according to claim 11, wherein the pre-charge circuitry comprises a first pre-charge transistor coupled to a control line.
13. The apparatus according to claim 12, wherein the pre-charge circuitry further comprises a second pre-charge transistor having a first region coupled to the bit line.
14. The apparatus according to claim 13, wherein the second pre-charge transistor comprises a second region coupled to the first pre-charge transistor.
15. The apparatus according to claim 14, wherein the second pre-charge transistor further comprises a third region coupled to the second region of the amplifier transistor.
16. The apparatus according to claim 1, further comprising input/output circuitry coupled to the data sense amplifier latch circuitry.
17. The apparatus according to claim 16, wherein the input/output circuitry comprises a first input/output transistor coupled to the first input node of the data sense amplifier latch circuitry.
18. The apparatus according to claim 17, wherein the input/output circuitry further comprises a second input/output transistor coupled to a second input node of the data sense amplifier latch circuitry.
19. The apparatus according to claim 1, wherein the data sense amplifier latch circuitry comprises a second input node coupled to the bit line.
20. The apparatus according to claim 19, wherein a voltage potential at the first input node of the data sense amplifier latch circuitry is inversely related to a voltage potential at the second input node of the data sense amplifier latch circuitry.

This patent application claims priority to U.S. Provisional Patent Application No. 61/239,999, filed Sep. 4, 2009, which is hereby incorporated by reference herein in its entirety.

The present disclosure relates generally to semiconductor memory devices and, more particularly, to techniques for sensing a semiconductor memory device.

The semiconductor industry has experienced technological advances that have permitted increases in density and/or complexity of semiconductor memory devices. Also, the technological advances have allowed decreases in power consumption and package sizes of various types of semiconductor memory devices. There is a continuing trend to employ and/or fabricate advanced semiconductor memory devices using techniques, materials, and devices that improve performance, reduce leakage current, and enhance overall scaling. Silicon-on-insulator (SOI) and bulk substrates are examples of materials that may be used to fabricate such semiconductor memory devices. Such semiconductor memory devices may include, for example, partially depleted (PD) devices, fully depleted (FD) devices, multiple gate devices (for example, double, triple, or surrounding gate), and Fin-FET devices.

A semiconductor memory device may include a memory cell having a memory transistor with an electrically floating body region wherein electrical charges may be stored. When excess majority electrical charge carriers are stored in the electrically floating body region, the memory cell may store a logic high (e.g., binary “1” data state). When the electrical floating body region is depleted of majority electrical charge carriers, the memory cell may store a logic low (e.g., binary “0” data state). Also, a semiconductor memory device may be fabricated on silicon-on-insulator (SOI) substrates or bulk substrates (e.g., enabling body isolation). For example, a semiconductor memory device may be fabricated as a three-dimensional (3-D) device (e.g., multiple gate devices, Fin-FETs, recessed gates and pillars) on a silicon-on-insulator (SOI) or bulk substrates.

Various techniques may be employed to read data from and/or write data to a semiconductor memory device having an electrically floating body. In one conventional technique, the memory cell of the semiconductor memory device may be read by applying bias signals to a source/drain region(s) and/or a gate of the memory transistor. As such, a conventional reading technique may involve sensing an amount of current provided/generated by/in the electrically floating body region of the memory cell in response to the application of the source/drain region and/or gate bias signals to determine a data state stored in the memory cell. For example, the memory cell may have two or more different current states corresponding to two or more different logical states (e.g., two different current conditions/states corresponding to two different logic states: a binary “0” data state and a binary “1” data state).

In another conventional technique, the memory cell of the semiconductor memory device may be written to by applying bias signals to the source/drain region(s) and/or the gate of the memory transistor. As such, a conventional writing technique may result in an increase/decrease of majority charge carriers in the electrically floating body region of the memory cell which, in turn, may determine the data state of the memory cell. An increase of majority charge carriers in the electrically floating body region may result from impact ionization, band-to-band tunneling (gate-induced drain leakage “GIDL”), or direct injection. A decrease of majority charge carriers in the electrically floating body region may result from charge carriers being removed via drain region charge carrier removal, source region charge carrier removal, or drain and source region charge carrier removal, for example, using back gate pulsing.

Often, conventional reading and/or writing operations may lead to relatively large power consumption and large voltage potential swings which may cause disturbance to unselected memory cells in the semiconductor memory device. Also, pulsing between positive and negative gate biases during read and write operations may reduce a net quantity of majority charge carriers in the electrically floating body region of the memory cell in the semiconductor memory device, which, in turn, may result in an inaccurate determination of the state of the memory cell. Furthermore, in the event that a bias is applied to the gate of the memory transistor that is below a threshold voltage potential of the memory transistor, a channel of minority charge carriers beneath the gate may be eliminated. However, some of the minority charge carriers may remain “trapped” in interface defects. Some of the trapped minority charge carriers may recombine with majority charge carriers, which may be attracted to the gate as a result of the applied bias. As a result, the net quantity of majority charge carriers in the electrically floating body region may be reduced. This phenomenon, which is typically characterized as charge pumping, is problematic because the net quantity of majority charge carriers may be reduced in the electrically floating body region of the memory cell, which, in turn, may result in an inaccurate determination of the state of the memory cell.

In view of the foregoing, it may be understood that there may be significant problems and shortcomings associated with conventional techniques for sensing semiconductor memory devices.

Techniques for sensing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus comprising a memory cell array comprising a plurality of memory cells. The apparatus may also comprise a first data sense amplifier circuitry including an amplifier transistor having a first region coupled to at least one of the plurality of memory cells via a bit line. The apparatus may further comprise a data sense amplifier latch circuitry including a first input node coupled to the data sense amplifier circuitry via a second region of the amplifier transistor.

In accordance with other aspects of the particular exemplary embodiment, the apparatus may further comprise a first power source coupled to the first region of the amplifier transistor.

In accordance with further aspects of this particular exemplary embodiment, the apparatus may further comprise a second power source coupled to the second region of the amplifier transistor.

In accordance with additional aspects of this particular exemplary embodiment, the apparatus may further comprise a switch transistor coupled to the first region of amplifier transistor and the second region of the amplifier transistor.

In accordance with yet another aspect of this particular exemplary embodiment, the switch transistor may comprise a first region coupled to a first power source and a second region coupled to a second power source.

In accordance with other aspects of the particular exemplary embodiment, the data sense amplifier latch circuitry may comprise a second input node coupled to second data sense amplifier circuitry.

In accordance with further aspects of this particular exemplary embodiment, the data sense amplifier latch circuitry may further comprise a plurality of transistors arranged in a cross-coupled configuration that may be configured to amplify a voltage or current difference between the first input node and the second input node.

In accordance with additional aspects of this particular exemplary embodiment, the second data sense amplifier circuitry may provide a reference voltage potential to the second input node of the data sense amplifier latch circuitry.

In accordance with yet another aspect of this particular exemplary embodiment, the data sense amplifier latch circuitry may comprise a first latch access transistor at the first input node and a second latch access transistor at the second input node.

In accordance with other aspects of the particular exemplary embodiment, the data sense amplifier latch circuitry may comprise an equalization transistor arranged in series with the first latch access transistor and the second latch access transistor.

In accordance with further aspects of this particular exemplary embodiment, the apparatus may further comprise pre-charge circuitry coupled to the bit line.

In accordance with additional aspects of this particular exemplary embodiment, the pre-charge circuitry may comprises a first pre-charge transistor coupled to a control line.

In accordance with yet another aspect of this particular exemplary embodiment, the pre-charge circuitry may further comprise a second pre-charge transistor having a first region coupled to the bit line.

In accordance with other aspects of the particular exemplary embodiment, the second pre-charge transistor may comprise a second region coupled to the first pre-charge transistor.

In accordance with further aspects of this particular exemplary embodiment, the second pre-charge transistor may further comprise a third region coupled to the second region of the amplifier transistor.

In accordance with additional aspects of this particular exemplary embodiment, the apparatus may further comprise an input/output circuitry coupled to the data sense amplifier latch circuitry.

In accordance with yet another aspect of this particular exemplary embodiment, the input/output circuitry may comprise a first input/output transistor coupled to the first input node of the data sense amplifier latch circuitry.

In accordance with other aspects of the particular exemplary embodiment, the input/output circuitry may further comprise a second input/output transistor coupled to a second input node of the data sense amplifier latch circuitry.

In accordance with further aspects of this particular exemplary embodiment, the data sense amplifier latch circuitry may comprise a second input node coupled to the bit line.

In accordance with additional aspects of this particular exemplary embodiment, a voltage potential at the first input node of the data sense amplifier latch circuitry may be inversely related to a voltage potential at the second input node of the data sense amplifier latch circuitry.

The present disclosure will now be described in more detail with reference to exemplary embodiments thereof as shown in the accompanying drawings. While the present disclosure is described below with reference to exemplary embodiments, it should be understood that the present disclosure is not limited thereto. Those of ordinary skill in the art having access to the teachings herein will recognize additional implementations, modifications, and embodiments, as well as other fields of use, which are within the scope of the present disclosure as described herein, and with respect to which the present disclosure may be of significant utility.

In order to facilitate a fuller understanding of the present disclosure, reference is now made to the accompanying drawings, in which like elements are referenced with like numerals. These drawings should not be construed as limiting the present disclosure, but are intended to be exemplary only.

FIG. 1 shows a schematic block diagram of a semiconductor memory device including a memory cell array, data write and sense circuitry, and memory cell selection and control circuitry in accordance with an embodiment of the present disclosure.

FIG. 2 shows a schematic block diagram of a portion of a semiconductor memory device in accordance with an embodiment of the present disclosure.

FIG. 3 shows a schematic diagram of data sense amplifier circuitry in accordance with an embodiment of the present disclosure.

FIG. 4 shows a schematic diagram of a plurality of data sense amplifier circuits in accordance with an embodiment of the present disclosure.

FIG. 5 shows control signal voltage waveforms for performing a sensing operation on one or more active memory cells in accordance with an embodiment of the present disclosure.

FIG. 6 shows a schematic diagram of data sense amplifier circuitry in accordance with another embodiment of the present disclosure.

FIG. 7 shows a schematic diagram of data sense amplifier latch circuitry in accordance with an embodiment of the present disclosure.

FIG. 8 shows control signal voltage waveforms for performing a sensing operation on one or more active memory cells in accordance with another embodiment of the present disclosure.

FIG. 9 shows a schematic diagram of data sense amplifier circuitry in accordance with another embodiment of the present disclosure.

FIG. 10 shows a schematic block diagram of a portion of a semiconductor memory device in accordance with an embodiment of the present disclosure.

FIG. 11 shows control signal voltage waveforms for performing a read operation on a memory cell in accordance with an embodiment of the present disclosure.

Referring to FIG. 1, there is shown a schematic block diagram of a semiconductor memory device 10 comprising a memory cell array 20, data write and sense circuitry 36, and memory cell selection and control circuitry 38 in accordance with an embodiment of the present disclosure. The memory cell array 20 may comprise a plurality of memory cells 12 each coupled to the memory cell selection and control circuitry 38 via a word line (WL) 28, and/or a carrier injection line (EP) 34, and the data write and sense circuitry 36 via a source line (CN) 30 and/or a bit line (EN) 32. It may be appreciated that the source line (CN) 30 and the bit line (EN) 32 are designations used to distinguish between two signal lines and they may be used interchangeably.

The data write and sense circuitry 36 may read data from and may write data to selected memory cells 12. In an exemplary embodiment, the data write and sense circuitry 36 may include a plurality of data sense amplifiers. Each data sense amplifier may receive at least one bit line (EN) 32 and a current or voltage reference signal. For example, each data sense amplifier may be a cross-coupled type sense amplifier to sense a data state stored in a memory cell 12. Also, each data sense amplifier may employ voltage and/or current sensing circuitry and/or techniques. In an exemplary embodiment, each data sense amplifier may employ current sensing circuitry and/or techniques. For example, a current sense amplifier may compare current from a selected memory cell 12 to a reference current (e.g., the current of one or more reference cells). From that comparison, it may be determined whether the selected memory cell 12 contains a logic high (e.g., binary “1” data state) or a logic low (e.g., binary “0” data state). It may be appreciated by one having ordinary skill in the art that various types or forms of data write and sense circuitry 36 (including one or more sense amplifiers, using voltage or current sensing techniques, using or not reference cells, to sense a data state stored in a memory cell 12) may be employed to read data stored in memory cells 12 and/or write data to memory cells 12. The data write and sense circuitry 36 will be discussed further in detail below.

The memory cell selection and control circuitry 38 may select and/or enable one or more predetermined memory cells 12 to facilitate reading data therefrom and/or writing data thereto by applying control signals on one or more word lines (WL) 28, and/or carrier injection lines (EP) 34. The memory cell selection and control circuitry 38 may generate such control signals from address signals, for example, row address signals. Moreover, the memory cell selection and control circuitry 38 may include a word line decoder and/or driver. For example, the memory cell selection and control circuitry 36 may include one or more different control/selection techniques (and circuitry therefore) to select and/or enable one or more predetermined memory cells 12. Notably, all such control/selection techniques, and circuitry therefore, whether now known or later developed, are intended to fall within the scope of the present disclosure.

In an exemplary embodiment, the semiconductor memory device 10 may implement a two step write operation whereby all the memory cells 12 in a row of memory cells 12 may be first written to a first predetermined data state. For example, the memory cells 12 in an active row of the memory cell array 20 may be first written to a logic high (e.g., binary “1” data state) by executing a logic high (e.g., binary “1” data state) write operation. Thereafter, selected memory cells 12 in the active row of the memory cell array 20 may be selectively written to a second predetermined data state. For example, selected memory cells 12 in the active row of the memory cell array 20 may be selectively written to a logic low (e.g., binary “0” data state) by executing a logic low (e.g., binary “0” data state) write operation. The semiconductor memory device 10 may also implement a one step write operation whereby selected memory cells 12 in an active row of memory cells 12 may be selectively written to either a logic high (e.g., binary “1” data state) or a logic low (e.g., binary “0” data state) without first implementing a “clear” operation. The semiconductor memory device 10 may employ any of the exemplary writing, refreshing, holding, and/or reading techniques described herein.

The memory cells 12 may comprise N-type, P-type and/or both types of transistors. Circuitry that is peripheral to the memory array 20 (for example, sense amplifiers or comparators, row and column address decoders, as well as line drivers (not illustrated herein)) may also include P-type and/or N-type transistors. Regardless of whether P-type or N-type transistors are employed in memory cells 12 in the memory array 20, suitable voltage potentials (for example, positive or negative voltage potentials) for reading from and/or writing to the memory cells 12 may be applied.

Referring to FIG. 2, there is shown a schematic block diagram of a portion of a semiconductor memory device 20 in accordance with an embodiment of the present disclosure. As discussed above, the semiconductor memory device 20 may include the memory cell selection and control circuitry 38 controllable and/or selectively coupled to one or more memory cell arrays 10 via one or more word lines (WL) 28 and/or carrier injection lines (EP) 34. The semiconductor memory device 20 may also include the data write and sense circuitry 36 controllable and/or selectively coupled to one or more memory cell arrays 10 via one or more bit lines (EN) 32 and/or source line (CN) 30 (not shown). In an exemplary embodiment, the data write and sense circuitry 36 may be coupled to a plurality of memory cell arrays 10 via a plurality of corresponding bit lines (EN) 32. The data write and sense circuitry 36 may include one or more data sense amplifier circuits 204 coupled to each memory cell array 10, data sense amplifier latch circuitry 206, one or more pre-charge circuits 208, and/or input/output circuitry 210.

The one or more data sense amplifier circuits 204 may sample, sense, read, and/or determine a data state (e.g., a logic low (binary “0” data state) or a logic high (binary “1” data state)) stored in a memory cell 12. The one or more data sense amplifier circuits 204 may sense raising phase of the current spikes and sinking phase of the current spikes on the bit line (EN) 32 in order to determine a data state stored in the memory cell 12. In an exemplary embodiment, the one or more data sense amplifier circuits 204 may include a PNP bipolar junction transistor to sense sourced current spikes on the bit line (EN) 32 in order to determine a data state stored in the memory cell 12. In another exemplary embodiment, the one or more data sense amplifier circuits 204 may include an NPN bipolar junction transistor to sense sunk current spikes on the bit line (EN) 32 in order to determine a data state stored in the memory cell 12.

For example, during a sample, sense, read, and/or data state determining operation, the data sense amplifier circuitry 204 may be pre-charged via the pre-charge circuitry 208. For example, the pre-charge circuitry 208 may pre-charge the data sense amplifier circuitry 204 to an equalization voltage potential or a reference voltage potential. The data sense amplifier circuitry 204 may compare a current generated by a memory cell 12 with an applied pre-charged reference current. In an exemplary embodiment, the pre-charged reference voltage and/or current applied to the data sense amplifier circuitry 204 may have a magnitude between a magnitude of voltage/current that may represent a logic low (binary “0” data state) and a magnitude of voltage/current that may represent a logic high (binary “1” data state) stored in the memory cell 12. In another exemplary embodiment, the pre-charged reference voltage and/or current applied to the data sense amplifier circuitry 204 may have a magnitude equal to the magnitude of the voltage/current that may represent a logic low (binary “0” data state) or a magnitude of voltage/current that may represent a logic high (binary “1” data state) stored in the memory cell 12.

The one or more data sense amplifier circuits 204 may output the data state of a memory cell 12 to the data sense amplifier latch circuitry 206 and stored. In another exemplary embodiment, the data sense amplifier latch circuitry 206 may be directly coupled to the bit line (EN) 32 associated with a memory cell 12. For example, the data sense amplifier latch circuitry 206 may receive a voltage potential or current on the bit line (EN) 32. The voltage potential or current received from the bit line (EN) 32 may be provided as a reference voltage potential and/or current for the data sense amplifier latch circuitry 206.

The data sense amplifier latch circuitry 206 may perform a write operation to the memory cell 12. For example, during a write operation, a data state may be loaded into the data sense amplifier latch circuitry 206 via the input/output circuitry 210. The data state may be written to the memory cell 12 via the data sense amplifier latch circuitry 206. Also for example, during a write-back operation, a data state stored in the data sense amplifier latch circuitry 206 may be written back to the memory cell 12 via the bit line (EN) 32.

The input/output circuitry 210 may allow external access to the plurality of memory cells 12 in the plurality of memory cell arrays 10 via the data sense amplifier latch circuitry 206. The input/output circuitry 210 may selectively and/or controllably output a data state stored in the memory cells 12 of the memory cell arrays 10. Also, the input/output circuitry 208 may selectively and/or controllably input (e.g., write or write-back) a data state to the memory cells 12 of the memory cell arrays 10. In an exemplary embodiment, the input/output circuitry 210 may include various gates and/or switch circuitry to facilitate and/or implement various operations on the memory cells 12 of the memory cell arrays 10.

The memory cell selection and control circuitry 38 may control one or more selected memory cells 12 of the memory cell arrays 10 coupled to the data write and sense circuitry 36. In an exemplary embodiment, the memory cell selection and control circuitry 38 may include a plurality of word lines (WL) 28, a plurality of carrier injection lines (EP) 34, word line (WL) decoders and/or drivers, and/or carrier injection line (EP) decoders and/or drivers. The memory cell selection and control circuitry 38 may apply one or more control signals via the plurality of word lines (WL) 28 and/or the plurality of carrier injection lines (EP) 34. Also, the memory cell selection and control circuitry 38 may include pass gates and/or row switch circuitry (not shown) to selectively activate the memory cells 12 in order to perform various operations.

Referring to FIG. 3, there is shown a schematic diagram of data sense amplifier circuitry 304 in accordance with an embodiment of the present disclosure. The data sense amplifier circuitry 304 may include one or more power source input circuits (Ib) and (Ic) 306, a switch transistor 308, and/or an amplifier transistor 310.

The one or more power source input circuits (Ib) and (Ic) 306 may be implemented as a voltage potential power source or a current power source. The one or more power source input circuits (Ib) and (Ic) 306 may include one or more transistors biased to supply the power to the data sense amplifier circuitry 304. In an exemplary embodiment, the one or more power source input circuits (Ib) and (Ic) 306 may include one or more metal-oxide semiconductor field-effect (MOSFET) transistors in order to supply power to the data sense amplifier circuitry 304.

The data sense amplifier circuitry 304 may include an input node (BP) coupled to bit line (EN) 32. In an exemplary embodiment, the input node (BP) may be set to and/or maintained at a voltage potential and/or current provided by a memory cell 12. The data sense amplifier circuitry 304 may include an output node (OUT) in order to output a data state detected by the data sense amplifier circuitry 304. The data sense amplifier circuitry 304 may include a switch control line (CTRLSW) coupled to the switch transistor 308 in order to control an operation of the switch transistor 308.

The data sense amplifier circuitry 304 may be pre-charged to a reference voltage and/or current before a sample, sense, read, and/or data state determining operation. Pre-charging the data sense amplifier circuitry 304 may ensure proper biasing for the amplifier transistor 310 of the data sense amplifier circuitry 304 and an active memory cell 12. In an exemplary embodiment, a control signal may be applied to the switch transistor 308 via the switch control line (CTRLSW). The control signal may cause the switch transistor 308 to turn to an “ON” state from an “OFF” state. The switch transistor 308, after being turned to an “ON” state, may couple a voltage potential on the bit line (EN) 32 to the output node (OUT) of the data sense amplifier circuitry 304. Also, switch transistor 308, after being turned to an “ON” state, may charge the bit line (EN) 32 to a predetermined voltage potential and/or current. For example, current (I1) from the power source (Ib) 306 and current (IM1) from the switch transistor 308 may charge the bit line (EN) 32 to a predetermined current and/or a predetermined voltage potential.

The data sense amplifier circuitry 304 may be pre-charged after reaching an equalization voltage potential or current. For example, the voltage potential on the bit line (EN) 32 may reach an PN junction threshold voltage potential of the amplifier transistor 310 and may cause the base current (IB1) and the collector current (IC1) of the amplifier transistor 310 to increase. The increase of the collector current (IC1) of the amplifier transistor 310 may cause a decrease of the current (IM1) from the switch transistor 308 (e.g., current (IM1)=current (I2) from power source (Ic) 306−collector current (IC1) of the amplifier transistor 310). The decrease of the current from the switch transistor 308 may decrease the base current (IB1) of the amplifier transistor 310 (e.g., the base current (IB1)=current (I1) from the power source (Ib) 306+the current (IM1) from the switch transistor 308). The equalization voltage potential or current may be reached because of the feedback operation of the current (IM1) from the switch transistor 308, the base current (IB1) of the amplifier transistor 310, and the collector current (IC1) of the amplifier transistor 310.

In an exemplary embodiment, the equalization voltage potential and current may be achieved at the end of the feedback operation of the current (IM1) from the switch transistor 308, the base current (IB1) of the amplifier transistor 310, and the collector current (IC1) of the amplifier transistor 310. For example, the equalization voltage potential may be achieved when the voltage potential on the bit line (EN) 32 may equal to the output voltage potential (OUT) of the data sense amplifier circuitry 304 and the voltage potential (VBE) at the base and emitter junction of the amplifier transistor 310. In an exemplary embodiment, the equalization voltage potential may be approximately 0.7V. Also, the equalization voltage potential and/or current may equal to the reference voltage potential and/or current that the data sense amplifier circuitry 304 may pre-charged to.

After pre-charging the data sense amplifier circuitry 304, the data sense amplifier circuitry 304 may be prepared to perform a sample, sense, read, and/or data state determining operation. The control signal applied to the switch control line (CTRLSW) may be withdrawn and the switch transistor 308 may be turned to an “OFF” state. A control signal may be applied to a memory cell 12 via a corresponding word line (WL) 28 to active the memory cell 12 in order to perform a data state determining operation. The data sense amplifier circuitry 304 may detect a current spike or an absence of a current spike on a bit line (EN) 32 corresponding to the active memory cell 12. For example, the current spike on the bit line (EN) 32 may modulate the base current (IB1) of the amplifier transistor 310. The modulation of the base current (IB1) of the amplifier transistor 310 may cause a change in the collector current (IC1) of the amplifier transistor 310. The change in the collector current (IC1) of the amplifier transistor 310 may cause a change in the output signal at the output node (OUT) to determine a data state stored in the active memory cell 12.

In an exemplary embodiment, in the event that a logic high (binary “1” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may cause a current spike (IBC) on the corresponding bit line (EN) 32. The sinking of the current spike (IBC) on the corresponding bit line (EN) 32 may cause a decrease in the base current (IB1) of the amplifier transistor 310 (e.g., the base current (IB1) of the amplifier transistor 310=the current (I1) from the power source (Ib) 306+the current (ICAP) from the capacitance on the bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The decrease in the base current (IB1) of the amplifier transistor 310 may cause a decrease in the collector current (IC1) of the amplifier transistor 310. The decrease of the collector current (IC1) of the amplifier transistor 310 may cause an increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 304. The increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 304 may indicate that a logic high (binary “1” data state) is stored in the active memory cell 12.

In another exemplary embodiment, in the event that a logic low (binary “0” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may not cause a current spike (IBC) on the corresponding bit line (EN) 32. The absence of a current spike (IBC) on the corresponding bit line (EN) 32 may cause an increase in the base current (IB1) of the amplifier transistor 310 (e.g., the base current (IB1) of the amplifier transistor 310=the current (I1) from the power source (Ib) 306+the current (ICAP) from the capacitance of the bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The increase in the base current (IB1) of the amplifier transistor 310 may cause an increase in the collector current (IC1) of the amplifier transistor 310. The increase of the collector current (IC1) of the amplifier transistor 310 may cause a decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 304. The decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 304 may indicate that a logic low (binary “0” data state) is stored in the active memory cell 12.

Referring to FIG. 4, there is shown a schematic diagram of a plurality of data sense amplifier circuits 404 in accordance with an embodiment of the present disclosure. As discussed above, the data sense amplifier circuitry 404a may include one or more power source input circuits (Ib) and (Ic) 406a, a switch transistor 408a, and/or an amplifier transistor 410a. The data sense amplifier circuitry 404a may be coupled to an active memory cell 12a via a corresponding bit line (EN) 32a. The data sense amplifier circuitry 404b may include one or more power source input circuits (Ib) and (Ic) 406b, a switch transistor 408b, and/or an amplifier transistor 410b. The data sense amplifier circuitry 404b may be coupled to an inactive memory cell 12b via a corresponding bit line (EN) 32b. The data sense amplifier circuitry 404a and the data sense amplifier circuitry 404b may be coupled to data sense amplifier latch circuitry 414. In an exemplary embodiment, the data sense amplifier circuitry 404b may provide a matching load to the data sense amplifier circuitry 404a. In another exemplary embodiment, the data sense amplifier 404b may be a duplicate of the data sense amplifier circuitry 404a.

The data sense amplifier latch circuitry 414 may include an input node (OUT) coupled to the data sense amplifier circuitry 404a and an input node (OUT_REF) coupled to the data sense amplifier circuitry 404b. In an exemplary embodiment, the input node (OUT) of the data sense amplifier latch circuitry 414 may be set to and/or maintained at a voltage and/or current provided by the active memory cell 12a, while the input node (OUT_REF) may be set to and/or maintained at a reference voltage and/or current provided by the data sense amplifier circuitry 404b. In another exemplary embodiment, the input node (OUT_REF) may be set to and/or maintained at a voltage and/or current provided by the inactive memory cell 12, while the input node (OUT) may be set to and/or maintained at a reference voltage and/or current provided by the data sense amplifier circuitry 404a. The data sense amplifier latch circuitry 414 may store a data state determined by either the data sense amplifier circuitry 404a or the data sense amplifier circuitry 404b.

The voltage potential and/or current provided by the active memory cell 12a at the input node (OUT) and the reference voltage potential and/or current provided by the data sense amplifier circuitry 404b at the input node (OUT_REF) may produce a voltage potential and/or a current differential between the input node (OUT) and the input node (OUT_REF). In an exemplary embodiment, the data sense amplifier circuitry 404b may output the reference voltage potential and/or current to the data sense amplifier latch circuitry 414 via the input node (OUT_REF). For example, a control signal may be applied to the switch transistor 408b via the switch control line (CTRLSW2). The control signal applied to the switch control line (CTRLSW2) may be a constant voltage potential (VDD) or a constant current and cause the output of the data sense amplifier circuitry 404b to be constant. The control signal applied via the control line (CTRLSW2) may cause the switch transistor 408b to turn to an “ON” state from an “OFF” state. The switch transistor 408b, after being turned to an “ON” state, may couple a voltage potential on the bit line (EN) 32b to the output node (OUT_REF) of the data sense amplifier circuitry 404b. Also, switch transistor 408b, after being turned to an “ON” state, may charge the bit line (EN) 32 to a predetermined voltage potential and/or current. For example, current (I1) from the power source (Ib) 406b and current (IM2) from the switch transistor 408b may charge the bit line (EN) 32 to a predetermined current.

The data sense amplifier circuitry 404b may reach an equalization voltage potential or current. For example, the voltage potential on the bit line (EN) 32b may reach an PN junction threshold voltage potential of the amplifier transistor 410b and may cause the base current (IB2) and the collector current (IC2) of the amplifier transistor 410b to increase. The increase of the collector current (IC2) of the amplifier transistor 410b may cause a decrease of the current (IM2) from the switch transistor 408b (e.g., current (I2)=current (I2) from power source (Ic) 406b−collector current (IC2) of the amplifier transistor 410b). The decrease of the current from the switch transistor 408b may decrease the base current (IB2) of the amplifier transistor 410b (e.g., the base current (IB2)=current (I1) from the power source (Ib) 406b+the current (IM2) from the switch transistor 408b). The equalization voltage potential or current may be reached because of the feedback operation of the current (IM2) from the switch transistor 408b, the base current (IB2) of the amplifier transistor 410b, and the collector current (IC2) of the amplifier transistor 410b.

In an exemplary embodiment, the equalization voltage potential and current may be achieved at the end of the feedback operation of the current (IM2) from the switch transistor 408b, the base current (IB2) of the amplifier transistor 410b, and the collector current (IC2) of the amplifier transistor 410b. For example, the equalization voltage potential may be achieved when the voltage potential on the bit line (EN) 32b may equal to the output voltage potential at output node (OUT_REF) of the data sense amplifier circuitry 404b and the voltage potential (VBE) at the base and emitter junction of the amplifier transistor 410b. In an exemplary embodiment, the equalization voltage potential may be approximately 0.7V. The output of the data sense amplifier circuitry 404b to the input node (OUT_REF) of the data sense amplifier latch circuitry 414 may be constant throughout the sample, sense, read, and/or data state determining operation. The output of the data sense amplifier circuitry 404b may provide a tracking mechanism for the output signals of the data sense amplifier circuitry 404a during a pre-charging phase of the sample, sense, read, and/or data state determining operation. The data sense amplifier circuitry 404a may be pre-charged in a similar manner as the data sense amplifier circuitry 304 described above with respect to FIG. 3.

After pre-charging the data sense amplifier circuitry 404a, the data sense amplifier circuitry 404a may determine a data state stored in the active memory cell 12a. As discussed above with respect to FIG. 3, the data sense amplifier circuitry 404a may cause the output signal at the output node (OUT) to decrease when a logic low (binary “0” data state) is stored in the active memory cell 12a. The data sense amplifier circuitry 404a may cause the output signal at the output node (OUT) to increase when a logic high (binary “1” data state) is stored in the active memory cell 12a. The variation in the output signal at the output node (OUT) may be a transient condition and the data sense amplifier latch circuitry 414 may be used to store a data state stored in the active memory cell 12a.

The data sense amplifier latch circuitry 414 may be enabled by applying a control signal to a control latch line (CTRLLTC). The data sense amplifier latch circuitry 414 may be configured to further amplify the variation of the input signals at the input node (OUT) supplied by the data sense amplifier circuitry 404a. In an exemplary embodiment, the data sense amplifier latch circuitry 414 may include a cross-coupled latch that provides a feedback loop for the input signals at the input node (OUT). The cross coupled latch of the data sense amplifier latch circuitry 414 may amplify the input signals at the input node (OUT) supplied by the data sense amplifier circuitry 404a. The data sense amplifier latch circuitry 414 may determine a data state of the active memory cell 12a based at least in part on the input signals at the input node (OUT) supplied by the data sense amplifier circuitry 404a.

For example, assuming that a logic high (binary “1” data state) is stored in the active memory cell 12a. When the data amplifier latch circuitry 414 senses low, the input node (OUT) may be pre-charged to a voltage potential of approximately 0V and the input node (OUT_REF) may be pre-charged to a voltage potential of approximately 100 mV. The logic high (binary “1” data state) stored in the active memory cell 12a may cause the voltage potential at the input node (OUT) to rise to approximately 200 mV. The data amplifier latch circuitry 414 may read a logic high (binary “1” data state) is stored in the active memory cell 12a.

In another exemplary embodiment, assuming that a logic low (binary “0” data state) is stored in the active memory cell 12a. When the data amplifier latch circuitry 414 senses high, the output node (OUT) may be pre-charged to a voltage potential of approximately VDD voltage potential and the input node (OUT_REF) may be pre-charged to a voltage potential of approximately half of the VDD voltage potential. By pre-charging the input node (OUT_REF) to midway of the VDD voltage potential may enable fast settling for the data sense amplifier latch circuitry 414. The logic low (binary “0” data state) stored in the memory cell 12 may not cause the voltage potential at the input node (OUT) to change and the voltage potential at the input node (OUT) may maintain at approximately VDD voltage potential. The data amplifier latch circuitry 414 may read a logic low (binary “0” data state) is stored in the active memory cell 12a. Also, the pre-charged voltage potential at the input node (OUT_REF) may change (e.g., rise or fall) to a voltage potential either higher than (e.g., when a logic high (binary “1” data state) is stored in the active memory cell 12a and the data sense amplifier latch circuitry 414 senses low) or below (e.g., when a logic high (binary “1” data state) is stored in the active memory cell 12a and the data sense amplifier latch circuitry 414 senses high) the pre-charged voltage potential at the input node (OUT_REF).

The pre-charged voltage potential at the input node (OUT_REF) may be selected based on when the data amplifier latch circuitry 414 senses high or low. For example, the pre-charged voltage potential at the input node (OUT_REF) may be selected to be lower than the pre-charged voltage potential at the input node (OUT) when the data sense amplifier latch circuitry 414 senses high. Also, the pre-charged voltage potential at the input node (OUT_REF) may be selected to be higher than the pre-charged voltage potential at the input node (OUT) when the data sense amplifier latch circuitry 414 senses low.

Referring to FIG. 5, there are shown control signal voltage waveforms for performing a sensing operation on one or more active memory cells 12a in accordance with an embodiment of the present disclosure. The sensing operation may include one or more phases. For example, the sensing operation may include a pre-charge phase, a sense phase, and/or a latching phase. In an exemplary embodiment, during the pre-charge phase a control signal may be applied to the switch control line (CTRLSW1) coupled to the switch transistor 408a in order to turn the switch transistor 408a to an “ON” state. As discussed above, after the switch transistor 408a is turned to an “ON” state, the data sense amplifier circuitry 404a may reach an equalization voltage potential and/or current. The data sense amplifier circuitry 404a may output the equalization voltage potential and/or current via the output node (OUT) to the data sense amplifier latch circuitry 414. Also, the data sense amplifier circuitry 404b may be biased to reach and maintain an equalization voltage potential and/or current throughout the various phases of the sensing operation. The data sense amplifier circuitry 404b may output the equalization voltage potential and/or current via the output node (OUT_REF) to the data sense amplifier latch circuitry 414.

After pre-charging the data sense amplifier circuitry 404a, the data sense amplifier circuitry 404b, and the data sense amplifier latch circuitry 414, a sense phase of the sensing operation may begin. For example, a control signal may be applied to the active memory cell via the word line (WL) 28a. The control signal applied via the word line (WL) 28a may cause a current spike (IBC) on the bit line (EN) 32a when a logic high (binary “1” data state) is stored in the active memory cell 12a. The control signal applied via the word line (WL) 28a may not cause a current spike (IBC) on the bit line (EN) 32a when a logic low (binary “1” data state) is stored in the active memory cell 12a. As explained above, the output signal at the output node (OUT) of the data sense amplifier circuitry 404a may vary depending on the data state stored in the active memory cell 12a. In an exemplary embodiment, the output signal at the output node (OUT) of the data sense amplifier circuitry 404a may increase when a logic high (binary “1” data state) is stored in the active memory cell 12a. In another exemplary embodiment, the output signal at the output node (OUT) of the data sense amplifier circuitry 404a may decrease when a logic low (binary “0” data state) is stored in the active memory cell 12a.

During latching phase of the sensing operation, a control signal may be applied to the data sense amplifier latch circuitry 414 via a control latch line (CTRLLTC). The control signal applied to the data sense amplifier latch circuitry 414 may amplify a variation in the output signal of the data sense amplifier circuitry 404a. In an exemplary embodiment, the data sense amplifier latch circuitry 414 may include a cross-coupled latch that may provide a feedback loop to amplify the variation in the output signal of the data sense amplifier circuitry 404a. The data sense amplifier latch circuitry 414 may determine a data state stored in the active memory cell 12a and store the data state.

Referring to FIG. 6, there is shown a schematic diagram of data sense amplifier circuitry 604 in accordance with another embodiment of the present disclosure. The data sense amplifier circuitry 604 may be implemented with the structure and techniques similar to that of the data sense amplifier circuitry 404 shown in FIG. 4, except that the input node (OUT_REF) of the data sense amplifier latch circuitry 614 may be coupled to the bit line (EN) 32. As illustrated in FIG. 6, the data sense amplifier circuitry 604 may include one or more power source input circuits (Ib) and (Ic) 606, a switch transistor 608, and/or an amplifier transistor 610.

By directly coupling the input node (OUT_REF) of the data sense amplifier latch circuitry 614 to the bit line (EN) 32, additional circuitry (e.g., data sense amplifier circuitry 404b shown in FIG. 4) may be eliminated. The amplifier transistor 610 may ensure that the required phase inversion to drive the input node (OUT) and input node (OUT_REF) of the data sense amplifier latch circuitry 414. For example, an increase in the voltage potential on the bit line (EN) 32 may cause the voltage potential at the input node (OUT_REF) of the data sense amplifier latch circuitry 414 to increase. However, the increase in the voltage potential on the bit line (EN) 32 may cause the voltage potential at the input node (OUT) of the data sense amplifier latch circuitry 414 to decrease (e.g., via the amplifier transistor 410). Thus, an increase of the voltage potential on the bit line (EN) 32 may cause a voltage potential differential between the input node (OUT) and the input node (OUT_REF) of the data sense amplifier latch circuitry 414. The voltage potential differential may be sufficient to enable the data sense amplifier latch circuitry 414 to determine a data state of the memory cell 12.

Referring to FIG. 7, there is shown a schematic diagram of data sense amplifier latch circuitry 714 in accordance with an embodiment of the present disclosure. The data sense amplifier latch circuitry 714 may include a plurality of transistors (716-724) coupled to each other in order to store a data state stored in the memory cell 12. For example, the latch access transistor 716 may be coupled to the output node (OUT) of the data sense amplifier circuitry 404a, shown in FIG. 4. The latch access transistor 720 may be coupled to the output node (OUT_REF) of the data sense amplifier circuitry 404b, shown in FIG. 4. The equalization transistor 718 may ensure that the voltage potential at the output node (OUT) of the data sense amplifier circuitry 404a and the voltage potential at the output node (OUT_REF) of the data sense amplifier circuitry 404b may be the same before the sensing phase of the sensing operation. The latch access transistor 716 and 720 and the equalization transistor 718 may be biased to perform the function of the switch transistor 608, shown in FIG. 6.

The isolation transistors 722 and 724 may be configured to prevent the data sense amplifier latch circuitry 714 sinking currents when the data sense amplifier latch circuitry 714 is in an equalization phase. The data sense amplifier latch circuitry 714 may include a plurality of outputs (e.g., Q and inverse Q). The data state stored in the data sense amplifier latch circuitry 714 may be outputted to a memory input/output content (not shown). The data sense amplifier latch circuitry 714 may receive a data state from the memory input/output content (not shown).

Referring to FIG. 8, there are shown control signal voltage waveforms for performing a sensing operation on one or more active memory cells 12a in accordance with another embodiment of the present disclosure. The sensing operation may include one or more phases. For example, the sensing operation may include a pre-charge phase, a sense phase, and a latching phase. In an exemplary embodiment, during the pre-charge phase a control signal may be applied to the switch control line (CTRLSW) coupled to the switch transistor 608 in order to turn the switch transistor 608 to an “ON” state. After the switch transistor 608 turned to an “ON” state, the data sense amplifier circuitry 604 may reach an equalization voltage potential and/or current, in a similar manner as discussed above with respect to the data sense amplifier circuitry 304, shown in FIG. 3. The data sense amplifier circuitry 604 may output the equalization voltage potential and/or current via the output node (OUT) to the data sense amplifier latch circuitry 614. The input node (OUT_REF) of the data sense amplifier latch circuitry 614 may be coupled to the bit line (EN) 32 in order to receive a reference voltage potential and/or current from the bit line (EN) 32. The voltage potential on the bit line (EN) 32 may remain constant throughout the sensing operation.

After pre-charging the data sense amplifier circuitry 604 and the data sense amplifier latch circuitry 614, a sense phase of the sensing operation may begin. For example, a control signal may be applied to the active memory cell 12 via the corresponding word line (WL) 28. The control signal applied via the corresponding word line (WL) 28 may cause a current spike (IBC) on the bit line (EN) 32 when a logic high (binary “1” data state) is stored in the active memory cell 12. The control signal applied via the corresponding word line (WL) 28 may not cause a current spike (IBC) on the bit line (EN) 32 when a logic low (binary “1” data state) is stored in the active memory cell 12. The output signal at the output node (OUT) of the data sense amplifier circuitry 604 may vary depending on the data state stored in the active memory cell 12. In an exemplary embodiment, the output signal at the output node (OUT) of the data sense amplifier circuitry 604 may increase when a logic high (binary “1” data state) is stored in the active memory cell 12. In another exemplary embodiment, the output signal at the output node (OUT) of the data sense amplifier circuitry 604 may decrease when a logic low (binary “0” data state) is stored in the active memory cell 12a.

During latching phase of the sensing operation, a control signal may be applied to the data sense amplifier latch circuitry 614 via a control latch line (CTRLLTC). The control signal applied to the data sense amplifier latch circuitry 614 may amplify a variation in the output signal of the data sense amplifier circuitry 604. In an exemplary embodiment, the data sense amplifier latch circuitry 614 may include a cross-coupled latch that may provide a feedback loop to amplify the variation in the output signal of the data sense amplifier circuitry 604. The data sense amplifier latch circuitry 614 may determine a data state stored in the active memory cell 12 and store the data state.

Referring to FIG. 9, there is shown a schematic diagram of data sense amplifier circuitry 904 in accordance with another embodiment of the present disclosure. The data sense amplifier circuitry 904 may be implemented with the structure and techniques similar to that of the data sense amplifier circuitry 604 shown in FIG. 6, except that a transistor 916 may be coupled to the bit line (EN) 32 via a transistor 918. As illustrated in FIG. 9, the data sense amplifier circuitry 904 may include one or more power source input circuits (Ib) and (Ic) 906, a switch transistor 908, and/or an amplifier transistor 910. The output node (OUT) of the data sense amplifier circuitry 904 may be coupled to a data sense amplifier latch circuitry 914. The input node (OUT_REF) of the data sense amplifier latch circuitry 914 may be directly coupled to the bit line (EN) 32.

The transistor 916 and the transistor 918 may be configured to efficiently pre-charge the bit line (EN) 32 to a predetermined voltage potential and/or current. For example, the transistor 916 may be controlled via a control signal applied to the control line (CTRLBL). The transistor 918 may be controlled via the output signal at the output node (OUT) of the data sense amplifier circuitry 904 to ensure a self shut-off action, as will be discussed further in detail below.

For example, during a pre-charge phase of a sensing operation, a control signal may be applied to the transistor 916 via the control line (CTRLBL). The control signal applied on the control line (CTRLBL) may turn the transistor 916 to an “ON” state. Also during a pre-charge phase of a sensing operation, the amplifier transistor 910 may be in an “OFF” state because the bit line (EN) 32 is grounded. When the amplifier transistor 910 is in an “OFF” state, the voltage potential at the output node (OUT) of the data sense amplifier circuitry 904 may be charged to a voltage potential approximately equal to a constant voltage potential (VDD). The voltage potential at the output node of the data sense amplifier circuitry 904 may maximizing the conductance of the transistor 918 and may accelerate the pre-charging time of the bit line (EN) 32. As the bit line (EN) 32 becomes pre-charged, the voltage potential at the output node (OUT) of the data sense amplifier circuitry 904 may decrease and cause a decrease of the conductance of the transistor 918. The decrease of the conductance of the transistor 918 may self-limiting the pre-charge of the bit line (EN) 32. The control signal applied to the transistor 916 via the control line (CTRLBL) may be removed to de-activate the pre-charge path of the transistor 916 and the transistor 918.

When a control signal is applied to the switch transistor 908 via the switch control line (CTRLSW) during the pre-charge phase, the voltage potential on the bit line (EN) 32 may increase. The increase of the voltage potential on the bit line (EN) 32 may cause the amplifier transistor 910 to turn to an “ON” state from an “OFF” state. When the amplifier transistor 910 is turned to an “ON” state, the collector current (IC1) of the amplifier transistor 910 may increase. The increase in the collector current (IC1) of the amplifier transistor 910 may decrease the voltage potential at the output node (OUT) of the data sense amplifier circuitry 904. The decrease of the voltage potential at the output node (OUT) of the data sense amplifier circuitry 904 may decrease the conductance (e.g., an amount of current flowing through) of the transistor 918. The decrease of the conductance (e.g., an amount of current flowing through) of the transistor 918 may prevent over-charging the bit line (EN) (e.g., too much current on the bit line (EN) 32) and thus avoid voltage fluctuation in the data sense amplifier circuitry 904 during the pre-charge phase of a sensing operation.

Referring to FIG. 10, there is shown a schematic block diagram of a portion of a semiconductor memory device 1000 in accordance with an embodiment of the present disclosure. The semiconductor memory device 1000 may include one or more memory cell arrays 10 coupled to data sense amplifier circuitry 1004, data sense amplifier latch circuitry 1006, pre-charge circuitry 1008, and/or input/output circuitry 1010.

The data sense amplifier circuitry 1004 may include one or more power sources 1012 and/or an amplifier transistor 1014. The one or more power sources 1012 may include one or more transistors (1016-1020) to supply voltage potential and/or current to the data sense amplifier circuitry 1004.

The data sense amplifier latch circuitry 1006 may include a plurality of transistors (1022-1038) coupled to each other in order to store a data state read from the memory cell 12. For example, the latch access transistor 1022 may be coupled to the output node (OUT) of the data sense amplifier circuitry 1004. The latch access transistor 1024 at the input node (OUT_REF) of the data sense amplifier latch circuitry 1006 may be coupled to the bit line (EN) 32. The equalization transistor 1026 may ensure that the voltage potential at the input node (OUT) of the data sense amplifier latch circuitry 1006 and the voltage potential at the input node (OUT_REF) of the data sense amplifier latch circuitry 1006 may be the same before the sensing phase of the sensing operation. The plurality of transistors (1032-1038) may be arranged in a cross-coupled configuration that may amplify the voltage potential difference and/or current difference between the input node (OUT) and the input node (OUT_REF) of the data sense amplifier latch circuitry 1006.

The pre-charge circuitry 1008 may include a transistor 1040 and a transistor 1042 configured to efficiently pre-charge the data sense amplifier circuitry 1004. For example, the transistor 1040 may be controlled via a control signal applied on the control line (CTRLBL). The transistor 918 may be controlled via the output signal at the output node (OUT) of the data sense amplifier circuitry 1004 to ensure a self shut-off action.

The input/output circuitry 1010 may include a transistor 1044 and a transistor 1046 may couple the data state stored in the data sense amplifier latch circuitry 1006. The transistor 1044 and the transistor 1046 may provide data state to the data sense amplifier latch circuitry 1006 to write to the memory cell 12.

The semiconductor memory device 1000 may perform various operations. For example, the semiconductor memory device 1000 may perform a holding operation, a read operation, a write operation, and/or a write-back operation. During a holding operation, a control signal may be applied to the transistor 1018 of the power source 1012 via the control line (PAENB) to turn the transistor 1018 to an “ON” state. A control signal may be applied to the transistor 1028 of the data sense amplifier latch circuitry 1006 via the control line (LATCHENB) to turn the transistor 1028 to an “ON” state. A control signal may be applied to the latch access transistor 1022 via the control line (LATCHDIN) to turn the latch access transistor 1022 to an “OFF” state. A control signal may be applied to the latch access transistor 1024 via the control line (LATCHDINREF) to turn the latch access transistor 1024 to an “OFF” state. A control signal may be applied to the transistor 1030 via the control line (LATCHEN) to turn the transistor 1030 to an “OFF” state. A control signal may be applied to the transistor 1040 via the control line (CTRLBL) to turn the transistor 1040 to an “OFF” state.

The semiconductor memory device 1000 may perform a sensing operation. The sensing operation may include various phases. The various phases of the sensing operation may include a pre-charge phase, an equalization phase, a sense phase, and a latching phase. During the pre-charging phase of a sensing operation, a control signal may be applied to the latch access transistor 1024 via the control line (LATCHDINREF) to turn the latch access transistor 1024 to an “ON” state. Also, a control signal may be applied to the equalization transistor 1026 via the control line (LATCHEQ) to turn the equalization transistor 1026 to an “ON” state. By turning the latch access transistor 1024 and the equalization transistor 1026 to an “ON” state, the input node (OUT_REF) of the data sense amplifier latch circuitry 1006 may be directly coupled to voltage potential on the bit line (EN) 32. Also, by turning the latch access transistor 1022, the latch access transistor 1024, and the equalization transistor 1026 to an “ON” state, the latch access transistor 1022, the latch access transistor 1024, and the equalization transistor 102 may perform the same electrical function as the switch transistor 904, shown in FIG. 9.

During the pre-charge phase of the sensing operation, a control signal is applied to the transistor 1040 via the control line (CTRLBL) to turn the transistor 104 to an “ON” state in order to pre-charge the bit line (EN) 32. By pre-charging the bit line (EN) 32, the voltage potential on the bit line (EN) 32 may increase. The increase of the voltage potential on the bit line (EN) 32 may cause the amplifier transistor 1014 to turn to an “ON” state from an “OFF” state. When the amplifier transistor 1014 is turned to an “ON” state, the collector current (IC1) of the amplifier transistor 1014 may increase. The increase in the collector current (IC1) of the amplifier transistor 910 may decrease the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The decrease of the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may decrease the conductance (e.g., an amount of current flowing through) of the transistor 1042. The decrease of the conductance (e.g., an amount of current flowing through) of the transistor 1042 may prevent over-charging the bit line (EN) 32 and thus avoid voltage fluctuation in the data sense amplifier circuitry 1004 during the pre-charge phase of a sensing operation. After pre-charging the bit line (EN) 32, the control signal applied to the transistor 1040 via the control line (CTRLBL) may be removed and the transistor 1040 may turn to an “OFF” state.

During the equalization phase of a sensing operation, a control signal may be applied to the latch access transistor 1022 via the control line (LATCHDIN) to turn the latch access transistor 1022 to an “ON” state. By turning the latch access transistor 1022 to an “ON” state, the output signal at the output node (OUT) of the data sense amplifier circuitry 1004 may be inputted to the data sense amplifier latch circuitry 1006. For example, the output signal at the output node (OUT) of the data sense amplifier circuitry 1004 may be an equalization voltage potential and/or current of the data sense amplifier circuitry 1004. In an exemplary embodiment, the equalization voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may be equal to 0.7V. At the end of the equalization phase, a control signal applied to the equalization transistor 1026 via the control line (LATCHEQ) may be removed and the equalization transistor 1026 may turn to an “OFF” state.

During the sense phase of a sensing operation, a control signal may be applied to a memory cell 12 via a corresponding word line (WL) 28 to active the memory cell 12 in order to sense a data state stored in the memory cell 12. The data sense amplifier circuitry 1004 may detect a current spike or an absence of a current spike on a bit line (EN) 32 corresponding to the active memory cell 12. For example, the current spike on the bit line (EN) 32 may modulate the base current (IB1) of the amplifier transistor 1014. The modulation of the base current (IB1) of the amplifier transistor 310 may cause a change in the collector current (IC1) of the amplifier transistor 1014. The change in the collector current (IC1) of the amplifier transistor 1014 may cause a change in the output signal at the output node (OUT) to determine a data state stored in the active memory cell 12.

In an exemplary embodiment, in the event that a logic high (binary “1” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may cause a current spike (IBC) on the corresponding bit line (EN) 32. The sinking of the current spike (IBC) on the corresponding bit line (EN) 32 may cause a decrease in the base current (IB1) of the amplifier transistor 1014 (e.g., the base current (IB1) of the amplifier transistor 1014=the current (I1) from the power source 1012+the current (ICAP) from the capacitance of bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The decrease in the base current (IB1) of the amplifier transistor 1014 may cause a decrease in the collector current (IC1) of the amplifier transistor 1014. The decrease of the collector current (IC1) of the amplifier transistor 1014 may cause an increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may indicate that a logic high (binary “1” data state) is stored in the active memory cell 12.

In another exemplary embodiment, in the event that a logic low (binary “0” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may not cause a current spike (IBC) on the corresponding bit line (EN) 32. The absence of the sinking of a current spike (IBC) on the corresponding bit line (EN) 32 may cause an increase in the base current (IB1) of the amplifier transistor 1014 (e.g., the base current (IB1) of the amplifier transistor 1014=the current (I1) from the power source 1012+the current (ICAP) from the capacitance of bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The increase in the base current (IB1) of the amplifier transistor 1014 may cause an increase in the collector current (IC1) of the amplifier transistor 1014. The increase of the collector current (IC1) of the amplifier transistor 1014 may cause a decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may indicate that a logic low (binary “0” data state) is stored in the active memory cell 12.

During the latching phase of a sensing operation, the data sense amplifier latching circuitry 1006 may receive the output signal from the data sense amplifier circuitry 1004 via the input node (OUT). After receiving the output signal from the data sense amplifier circuitry 1004, a control signal may be applied to the latch access transistor 1022 via the control line (LATCHDIN) to turn the latch access transistor 1022 to an “OFF” state from an “ON” state. A control signal may be applied to the latch access transistor 1024 via the control line (LATCHDINREF) to turn the latch access transistor 1024 to an “OFF” state from an “ON” state. By turning the latch access transistors 1022 and 1024 to an “OFF” state, the data sense amplifier latch circuitry 1006 may not receive additional input signals. A control signal may be applied to the transistor 1028 via the control line (LATENB) to turn the transistor 1028 to an “ON” state. A control signal may be applied to the transistor 1030 via the control line (LATCHEN) to turn the transistor 1030 to an “ON” state. By turning the transistors 1028 and 1030 to an “ON” state, the data state may be stored in the data sense amplifier latch circuitry 1006.

The semiconductor memory device 1000 may perform a write operation. A data state to be written to the memory cell array 10 may be inputted to the data sense amplifier latch circuitry 1006 via the input/output circuitry 1010. For example, during the writing operation, the control line (CBL) may be disconnected from the memory cell array 10 and the data state may be written to the memory cell array 10 via the control line (SAOUTB). The write operation may include various phases. For example, the various phases of the write operation may include a loading phase and/or a write phase.

During a loading phase of a write operation, a data state to be written to the memory cell array 10 may be inputted to the data sense amplifier latch circuitry 1006 via the transistors 1044 and 1046 of the input/output circuitry 1010. For example, input node (DIOB) of the transistor 1044 and the input node (DIO) of the transistor 1046 may be coupled to memory input/output content (not shown). A control signal may be applied to the transistors 1044 and 1046 via the control line (YSELECT) to couple input data state from the memory input/output content to the data sense amplifier latch circuitry 1006. The data state to be written to the memory cell array 10 may be loaded into the data sense amplifier latch circuitry 1006.

In an exemplary embodiment, in the event that a logic high (binary “1” data state) is to be written to the memory cell array 10, a control signal may be applied to the control line (SAOUTB) to cause the voltage potential on the bit line (EN) 32 to go low in order to forward bias the memory cell array 10 to receive and store the injected charges. In another exemplary embodiment, in the event that a logic low (binary “0” data state) is to be written to the memory cell array 10, a control signal may be applied to the control line (SAOUTB) to cause the voltage potential on the bit line (EN) 32 to go high in order to reverse bias the memory cell array 10 to reject the charges.

The semiconductor memory device 1000 may perform a write-back operation. The write-back operation may be performed in a similar manner as discussed above with respect to the write operation, except the data state to be written back to the memory cell array 10 is already loaded into the data sense amplifier latch circuitry 1006.

Referring to FIG. 11, there is shown control signal voltage waveforms for performing a read operation on a memory cell in accordance with an embodiment of the present disclosure. The sensing operation may include various phases. The various phases of the sensing operation may include a pre-charge phase, an equalization phase, and/or a sense phase. During the pre-charging phase of a sensing operation, a control signal may be applied to the latch access transistor 1024 via the control line (LATCHDINREF) to turn the latch access transistor 1024 to an “ON” state. Also, a control signal may be applied to the equalization transistor 1026 via the control line (LATCHEQ) to turn the equalization transistor 1026 to an “ON” state. By turning the latch access transistor 1024 and the equalization transistor 1026 to an “ON” state, the input node (OUT_REF) of the data sense amplifier latch circuitry 1006 may be directly coupled to voltage potential on the bit line (EN) 32. A control signal may be applied to the transistor 1028 via the control line (LATENB) to turn the transistor 1028 to an “OFF” state. A control signal may be applied to transistor 1018 via the control line (PANEB) to turn the transistor 1018 to an “ON” state.

During the pre-charge phase of the sensing operation, a control signal is applied to the transistor 1040 via the control line (CTRLBL) to turn the transistor 104 to an “ON” state in order to pre-charge the bit line (EN) 32. By pre-charging the bit line (EN) 32, the voltage potential on the bit line (EN) 32 may increase. The increase of the voltage potential on the bit line (EN) 32 may cause the amplifier transistor 1014 to turn to an “ON” state from an “OFF” state. When the amplifier transistor 1014 is turned to an “ON” state, the collector current (IC1) of the amplifier transistor 1014 may increase. The increase in the collector current (IC1) of the amplifier transistor 910 may decrease the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The decrease of the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may decrease the conductance (e.g., an amount of current flowing through) of the transistor 1042. The decrease of the conductance (e.g., an amount of current flowing through) of the transistor 1042 may prevent over-charging the bit line (EN) 32 and thus avoid voltage fluctuation in the data sense amplifier circuitry 1004 during the pre-charge phase of a sensing operation. After pre-charging the bit line (EN) 32, the control signal applied to the transistor 1040 via the control line (CTRLBL) may be removed and the transistor 1040 may turn to an “OFF” state.

During the equalization phase of a sensing operation, a control signal may be applied to the latch access transistor 1022 via the control line (LATCHDIN) to turn the latch access transistor 1022 to an “ON” state. By turning the latch access transistor 1022 to an “ON” state, the output signal at the output node (OUT) of the data sense amplifier circuitry 1004 may be inputted to the data sense amplifier latch circuitry 1006. For example, the output signal at the output node (OUT) of the data sense amplifier circuitry 1004 may be an equalization voltage potential and/or current of the data sense amplifier circuitry 1004. In an exemplary embodiment, the equalization voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may be equal to 0.7V. At the end of the equalization phase, a control signal applied to the equalization transistor 1026 via the control line (LATCHEQ) may be removed and the equalization transistor 1026 may turn to an “OFF” state.

During the sense phase of a sensing operation, a control signal may be applied to a memory cell 12 via a corresponding word line (WL) 28 to active the memory cell 12 in order to sense a data state stored in the memory cell 12. The data sense amplifier circuitry 1004 may detect a current spike or an absence of a current spike on a bit line (EN) 32 corresponding to the active memory cell 12. For example, the current spike on the bit line (EN) 32 may modulate the base current (IB1) of the amplifier transistor 1014. The modulation of the base current (IB1) of the amplifier transistor 310 may cause a change in the collector current (IC1) of the amplifier transistor 1014. The change in the collector current (IC1) of the amplifier transistor 1014 may cause a change in the output signal at the output node (OUT) to determine a data state stored in the active memory cell 12.

In an exemplary embodiment, in the event that a logic high (binary “1” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may cause a current spike (IBC) on the corresponding bit line (EN) 32. The sinking of the current spike (IBC) on the corresponding bit line (EN) 32 may cause a decrease in the base current (IB1) of the amplifier transistor 1014 (e.g., the base current (IB1) of the amplifier transistor 1014=the current (I1) from the power source 1012+the current (ICAP) from the capacitance of bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The decrease in the base current (IB1) of the amplifier transistor 1014 may cause a decrease in the collector current (IC1) of the amplifier transistor 1014. The decrease of the collector current (IC1) of the amplifier transistor 1014 may cause an increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The increase in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may indicate that a logic high (binary “1” data state) is stored in the active memory cell 12.

In another exemplary embodiment, in the event that a logic low (binary “0” data state) is stored in the memory cell 12, the control signal applied to the active memory cell 12 via the corresponding word line (WL) 28 may not cause a current spike (IBC) on the corresponding bit line (EN) 32. The absence of the sinking of a current spike (IBC) on the corresponding bit line (EN) 32 may cause an increase in the base current (IB1) of the amplifier transistor 1014 (e.g., the base current (IB1) of the amplifier transistor 1014=the current (I1) from the power source 1012+the current (ICAP) from the capacitance of bit line (EN) 32−the current spike (IBC) on the bit line (EN) 32). The increase in the base current (IB1) of the amplifier transistor 1014 may cause an increase in the collector current (IC1) of the amplifier transistor 1014. The increase of the collector current (IC1) of the amplifier transistor 1014 may cause a decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004. The decrease in the voltage potential at the output node (OUT) of the data sense amplifier circuitry 1004 may indicate that a logic low (binary “0” data state) is stored in the active memory well 12.

At this point it should be noted that providing a technique for sensing a semiconductor memory device in accordance with the present disclosure as described above may involve the processing of input data and the generation of output data to some extent. This input data processing and output data generation may be implemented in hardware or software. For example, specific electronic components may be employed in a semiconductor memory device or similar or related circuitry for implementing the functions associated with sensing a semiconductor memory device in accordance with the present disclosure as described above. Alternatively, one or more processors operating in accordance with instructions may implement the functions associated with sensing a semiconductor memory device in accordance with the present disclosure as described above. If such is the case, it is within the scope of the present disclosure that such instructions may be stored on one or more processor readable media (e.g., a magnetic disk or other storage medium), or transmitted to one or more processors via one or more signals embodied in one or more carrier waves.

The present disclosure is not to be limited in scope by the specific embodiments described herein. Indeed, other various embodiments of and modifications to the present disclosure, in addition to those described herein, will be apparent to those of ordinary skill in the art from the foregoing description and accompanying drawings. Thus, such other embodiments and modifications are intended to fall within the scope of the present disclosure. Further, although the present disclosure has been described herein in the context of a particular implementation in a particular environment for a particular purpose, those of ordinary skill in the art will recognize that its usefulness is not limited thereto and that the present disclosure may be beneficially implemented in any number of environments for any number of purposes. Accordingly, the claims set forth below should be construed in view of the full breadth and spirit of the present disclosure as described herein.

Daga, Jean-Michel, Bauser, Philippe Bruno

Patent Priority Assignee Title
10079045, Oct 26 2016 SK Hynix Inc. Sense amplifier, memory apparatus and system including the same
8351266, Apr 27 2009 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Techniques for controlling a direct injection semiconductor memory device
8400811, Apr 27 2009 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Techniques for providing a direct injection semiconductor memory device having ganged carrier injection lines
8508970, Apr 27 2009 OVONYX MEMORY TECHNOLOGY, LLC Techniques for providing a direct injection semiconductor memory device
8773913, Dec 02 2011 LONGITUDE FLASH MEMORY SOLUTIONS LTD Systems and methods for sensing in memory devices
8861247, Apr 27 2009 OVONYX MEMORY TECHNOLOGY, LLC Techniques for providing a direct injection semiconductor memory device
9425190, Apr 27 2009 OVONYX MEMORY TECHNOLOGY, LLC Techniques for providing a direct injection semiconductor memory device
Patent Priority Assignee Title
3439214,
3997799, Sep 15 1975 Semiconductor-device for the storage of binary data
4032947, Oct 20 1971 Siemens Aktiengesellschaft Controllable charge-coupled semiconductor device
4250569, Nov 15 1978 Fujitsu Limited Semiconductor memory device
4262340, Nov 14 1978 Fujitsu Limited Semiconductor memory device
4298962, Jan 25 1979 Nippon Electric Co., Ltd. Memory
4371955, Feb 22 1979 Fujitsu Limited Charge-pumping MOS FET memory device
4527181, Aug 28 1980 Fujitsu Limited High density semiconductor memory array and method of making same
4630089, Sep 27 1983 Fujitsu Limited Semiconductor memory device
4658377, Jul 26 1984 Texas Instruments Incorporated Dynamic memory array with segmented bit lines
4791610, May 24 1985 Fujitsu Limited Semiconductor memory device formed of a SOI-type transistor and a capacitor
4807195, May 18 1987 International Business Machines Corporation Apparatus and method for providing a dual sense amplifier with divided bit line isolation
4954989, Apr 12 1988 Commissariat a l'Energie Atomique MIS type static memory cell and memory and storage process
4979014, Aug 10 1987 Kabushiki Kaisha Toshiba MOS transistor
5010524, Apr 20 1989 International Business Machines Corporation Crosstalk-shielded-bit-line dram
5144390, Sep 02 1988 Texas Instruments Incorporated Silicon-on insulator transistor with internal body node to source node connection
5164805, Aug 22 1988 Massachusetts Institute of Technology Near-intrinsic thin-film SOI FETS
5258635, Sep 06 1988 Kabushiki Kaisha Toshiba MOS-type semiconductor integrated circuit device
5313432, May 23 1990 Texas Instruments Incorporated Segmented, multiple-decoder memory array and method for programming a memory array
5315541, Jul 24 1992 SanDisk Technologies LLC Segmented column memory array
5350938, Jun 27 1990 Kabushiki Kaisha Toshiba Nonvolatile semiconductor memory circuit with high speed read-out
5355330, Aug 29 1991 Renesas Electronics Corporation Capacitive memory having a PN junction writing and tunneling through an insulator of a charge holding electrode
5388068, May 02 1990 Microelectronics & Computer Technology Corp. Superconductor-semiconductor hybrid memory circuits with superconducting three-terminal switching devices
5397726, Feb 04 1992 National Semiconductor Corporation Segment-erasable flash EPROM
5432730, Dec 20 1993 STMicroelectronics, Inc Electrically programmable read only memory array
5446299, Apr 29 1994 International Business Machines Corporation Semiconductor random access memory cell on silicon-on-insulator with dual control gates
5448513, Dec 02 1993 Regents of the University of California Capacitorless DRAM device on silicon-on-insulator substrate
5466625, Jun 17 1992 International Business Machines Corporation Method of making a high-density DRAM structure on SOI
5489792, Apr 07 1994 Regents of the University of California, The Silicon-on-insulator transistors having improved current characteristics and reduced electrostatic discharge susceptibility
5506436, Dec 10 1992 Sony Corporation Semiconductor memory cell
5515383, May 28 1991 The Boeing Company; Boeing Company, the Built-in self-test system and method for self test of an integrated circuit
5526307, Jan 22 1992 Macronix International Co., Ltd. Flash EPROM integrated circuit architecture
5528062, Jun 17 1992 International Business Machines Corporation High-density DRAM structure on soi
5568356, Apr 18 1995 Hughes Electronics Corporation Stacked module assembly including electrically interconnected switching module and plural electronic modules
5583808, Sep 16 1994 National Semiconductor Corporation EPROM array segmented for high performance and method for controlling same
5593912, Oct 06 1994 International Business Machines Corporation; IBM Corporation SOI trench DRAM cell for 256 MB DRAM and beyond
5606188, Apr 26 1995 International Business Machines Corporation Fabrication process and structure for a contacted-body silicon-on-insulator dynamic random access memory
5608250, Nov 29 1993 SGS-THOMSON MICROELECTRONICS S A Volatile memory cell with interface charge traps
5627092, Sep 26 1994 Siemens Aktiengesellschaft Deep trench dram process on SOI for low leakage DRAM cell
5631186, Dec 30 1992 Samsung Electronics Co., Ltd. Method for making a dynamic random access memory using silicon-on-insulator techniques
5677867, Feb 12 1991 Memory with isolatable expandable bit lines
5696718, Nov 10 1994 Commissariat a l'Energie Atomique Device having an electrically erasable non-volatile memory and process for producing such a device
5740099, Feb 07 1995 Renesas Electronics Corporation Semiconductor memory device having peripheral circuit and interface circuit fabricated on bulk region out of silicon-on-insulator region for memory cells
5754469, Jun 14 1996 Macronix International Co., Ltd. Page mode floating gate memory device storing multiple bits per cell
5774411, Sep 12 1996 International Business Machines Corporation Methods to enhance SOI SRAM cell stability
5778243, Jul 03 1996 International Business Machines Corporation Multi-threaded cell for a memory
5780906, Jun 21 1995 Micron Technology, Inc. Static memory cell and method of manufacturing a static memory cell
5784311, Jun 13 1997 International Business Machines Corporation Two-device memory cell on SOI for merged logic and memory applications
5798968, Sep 24 1996 SanDisk Technologies LLC Plane decode/virtual sector architecture
5811283, Oct 22 1996 AISAWA TECHNOLOGIES, LLC Silicon on insulator (SOI) dram cell structure and process
5847411, Apr 11 1996 Matsushita Electric Industrial Co., Ltd. Semiconductor device having a channel region including a vacancy-introduced polysilicon layer
5877978, Mar 04 1996 Renesas Electronics Corporation Semiconductor memory device
5886376, Jul 01 1996 International Business Machines Corporation; IBM Corporation EEPROM having coplanar on-insulator FET and control gate
5886385, Aug 22 1996 Kabushiki Kaisha Toshiba Semiconductor device and manufacturing method thereof
5897351, Feb 21 1997 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Method for forming merged transistor structure for gain memory cell
5929479, Oct 21 1996 NEC Electronics Corporation Floating gate type non-volatile semiconductor memory for storing multi-value information
5930648, Dec 30 1996 Hyundai Electronics Industries Co., Ltd. Semiconductor memory device having different substrate thickness between memory cell area and peripheral area and manufacturing method thereof
5936265, Mar 25 1996 Kabushiki Kaisha Toshiba Semiconductor device including a tunnel effect element
5939745, Dec 30 1992 Samsung Electronics Co., Ltd. Dynamic access memory using silicon-on-insulator
5943258, Dec 24 1997 Texas Instruments Incorporated Memory with storage cells having SOI drive and access transistors with tied floating body connections
5943581, Nov 05 1997 TAIWAN SEMICONDUCTOR MANUFACTURING CO , LTD Method of fabricating a buried reservoir capacitor structure for high-density dynamic random access memory (DRAM) circuits
5960265, Jul 01 1996 International Business Machines Corporation Method of making EEPROM having coplanar on-insulator FET and control gate
5968840, Dec 30 1992 Samsung Electronics Co., Ltd. Dynamic random access memory using silicon-on-insulator techniques
5977578, Dec 06 1995 Round Rock Research, LLC Method of forming dynamic random access memory circuitry and dynamic random access memory
5982003, Apr 07 1994 The Regents of the University of California Silicon-on-insulator transistors having improved current characteristics and reduced electrostatic discharge susceptibility
5986914, Mar 31 1993 STMicroelectronics, Inc Active hierarchical bitline memory architecture
6018172, Sep 26 1994 TESSERA ADVANCED TECHNOLOGIES, INC Semiconductor memory device including memory cell transistors formed on SOI substrate and having fixed body regions
6048756, Jul 31 1997 Electronics and Telecommunications Research Institute Method for making a silicon-on-insulator MOS transistor using a selective SiGe epitaxy
6081443, Mar 04 1996 Renesas Electronics Corporation Semiconductor memory device
6096598, Oct 29 1998 International Business Machines Corporation Method for forming pillar memory cells and device formed thereby
6097056, Apr 28 1998 GLOBALFOUNDRIES Inc Field effect transistor having a floating gate
6097624, Sep 17 1997 Samsung Electronics Co., Ltd. Methods of operating ferroelectric memory devices having reconfigurable bit lines
6111778, May 10 1999 International Business Machines Corporation Body contacted dynamic memory
6121077, Apr 07 1994 The Regents of the University of California Silicon-on-insulator transistors having improved current characteristics and reduced electrostatic discharge susceptibility
6133597, Jul 25 1997 Promos Technologies Inc Biasing an integrated circuit well with a transistor electrode
6157216, Apr 22 1999 International Business Machines Corporation Circuit driver on SOI for merged logic and memory circuits
6171923, Nov 20 1997 TAIWAN SEMICONDUCTOR MANUFACTURING CO , LTD Method for fabricating a DRAM cell structure on an SOI wafer incorporating a two dimensional trench capacitor
6177300, Dec 24 1997 Texas Instruments Incorporated Memory with storage cells having SOI drive and access transistors with tied floating body connections
6177698, Feb 01 1999 Qimonda AG Formation of controlled trench top isolation layers for vertical transistors
6177708, Aug 07 1998 GLOBALFOUNDRIES Inc SOI FET body contact structure
6214694, Nov 17 1998 GLOBALFOUNDRIES Inc Process of making densely patterned silicon-on-insulator (SOI) region on a wafer
6222217, Nov 27 1997 Renesas Electronics Corporation Semiconductor device and manufacturing method thereof
6225158, May 28 1998 GLOBALFOUNDRIES Inc Trench storage dynamic random access memory cell with vertical transfer device
6245613, Apr 28 1998 GLOBALFOUNDRIES Inc Field effect transistor having a floating gate
6252281, Mar 27 1995 Kabushiki Kaisha Toshiba Semiconductor device having an SOI substrate
6262935, Jun 17 2000 Sony Corporation Shift redundancy scheme for wordlines in memory circuits
6292424, Jan 20 1995 Kabushiki Kaisha Toshiba DRAM having a power supply voltage lowering circuit
6297090, Aug 14 1998 SAMSUNG ELECTRONICS CO , LTD Method for fabricating a high-density semiconductor memory device
6300649, Apr 07 1994 The Regents of the University of California Silicon-on-insulator transistors having improved current characteristics and reduced electrostatic discharge susceptibility
6320227, Dec 26 1998 Hyundai Electronics Industries Co., Ltd. Semiconductor memory device and method for fabricating the same
6333532, Jul 16 1999 GLOBALFOUNDRIES Inc Patterned SOI regions in semiconductor chips
6333866, Sep 28 1998 Texas Instruments Incorporated Semiconductor device array having dense memory cell array and heirarchical bit line scheme
6350653, Oct 12 2000 GLOBALFOUNDRIES U S INC Embedded DRAM on silicon-on-insulator substrate
6351426, Jan 20 1995 Kabushiki Kaisha Toshiba DRAM having a power supply voltage lowering circuit
6359802, Mar 28 2000 Intel Corporation One-transistor and one-capacitor DRAM cell for logic process technology
6384445, Sep 26 1994 TESSERA ADVANCED TECHNOLOGIES, INC Semiconductor memory device including memory cell transistors formed on SOI substrate and having fixed body regions
6391658, Oct 26 1999 International Business Machines Corporation Formation of arrays of microelectronic elements
6403435, Jul 21 2000 Hyundai Electronics Industries Co., Ltd. Method for fabricating a semiconductor device having recessed SOI structure
6421269, Oct 17 2000 Intel Corporation Low-leakage MOS planar capacitors for use within DRAM storage cells
6424011, Apr 14 1997 GLOBALFOUNDRIES Inc Mixed memory integration with NVRAM, dram and sram cell structures on same substrate
6424016, May 24 1996 Autoliv Development AB SOI DRAM having P-doped polysilicon gate for a memory pass transistor
6429477, Oct 31 2000 International Business Machines Corporation Shared body and diffusion contact structure and method for fabricating same
6432769, Oct 27 1995 LONGITUDE SEMICONDUCTOR S A R L Semiconductor integrated circuit device and process for manufacture the same
6440872, Nov 03 2000 Infineon Technologies AG Method for hybrid DRAM cell utilizing confined strap isolation
6441435, Jan 31 2001 Advanced Micro Devices, Inc. SOI device with wrap-around contact to underside of body, and method of making
6441436, Nov 29 2000 United Microelectronics Corp. SOI device and method of fabrication
6466511, Jun 30 2000 TOSHIBA MEMORY CORPORATION Semiconductor memory having double data rate transfer technique
6479862, Jun 22 2000 Synopsys, Inc Charge trapping device and method for implementing a transistor having a negative differential resistance mode
6480407, Aug 25 1995 CONVERSANT INTELLECTUAL PROPERTY MANAGEMENT INC Reduced area sense amplifier isolation layout in a dynamic RAM architecture
6492211, Sep 07 2000 International Business Machines Corporation Method for novel SOI DRAM BICMOS NPN
6518105, Dec 10 2001 Taiwan Semiconductor Manufacturing Company High performance PD SOI tunneling-biased MOSFET
6531754, Dec 28 2001 Kabushiki Kaisha Toshiba Manufacturing method of partial SOI wafer, semiconductor device using the partial SOI wafer and manufacturing method thereof
6537871, Oct 06 1997 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Circuit and method for an open bit line memory cell with a vertical transistor and trench plate trench capacitor
6538916, Feb 15 2001 TOSHIBA MEMORY CORPORATION Semiconductor memory device
6544837, Mar 17 2000 International Business Machines Corporation SOI stacked DRAM logic
6548848, Mar 15 2001 Kabushiki Kaisha Toshiba Semiconductor memory device
6549450, Nov 08 2000 GLOBALFOUNDRIES U S INC Method and system for improving the performance on SOI memory arrays in an SRAM architecture system
6552398, Jan 16 2001 VITO, ROBERT; VITO, LISA T-Ram array having a planar cell structure and method for fabricating the same
6552932, Sep 21 2001 SanDisk Technologies LLC Segmented metal bitlines
6556477, May 21 2001 GLOBALFOUNDRIES U S INC Integrated chip having SRAM, DRAM and flash memory and method for fabricating the same
6560142, Mar 22 2002 RPX Corporation Capacitorless DRAM gain cell
6563733, May 24 2001 Winbond Electronics Corporation Memory array architectures based on a triple-polysilicon source-side injection non-volatile memory cell
6566177, Oct 25 1999 GOOGLE LLC Silicon-on-insulator vertical array device trench capacitor DRAM
6567330, Aug 17 2001 Kabushiki Kaisha Toshiba Semiconductor memory device
6573566, Jul 09 2001 United Microelectronics Corp. Low-voltage-triggered SOI-SCR device and associated ESD protection circuit
6574135, Apr 19 2002 Texas Instruments Incorporated Shared sense amplifier for ferro-electric memory cell
6590258, Mar 17 2000 International Business Machines Corporation SIO stacked DRAM logic
6590259, Oct 12 2000 GLOBALFOUNDRIES U S INC Semiconductor device of an embedded DRAM on SOI substrate
6617651, Jul 19 2001 TOSHIBA MEMORY CORPORATION Semiconductor memory device
6621725, Aug 17 2000 TOSHIBA MEMORY CORPORATION Semiconductor memory device with floating storage bulk region and method of manufacturing the same
6632723, Apr 26 2001 Kabushiki Kaisha Toshiba Semiconductor device
6650565, Sep 11 2002 Kabushiki Kaisha Toshiba Semiconductor memory device
6653175, Mar 22 2001 T-RAM ASSIGNMENT FOR THE BENEFIT OF CREDITORS , LLC Stability in thyristor-based memory device
6686624, Mar 11 2002 MOSYS, INC Vertical one-transistor floating-body DRAM cell in bulk CMOS process with electrically isolated charge storage region
6703673, May 24 1996 Texas Instruments Incorporated SOI DRAM having P-doped poly gate for a memory pass transistor
6707118, Mar 31 2000 BEIJING XIAOMI MOBILE SOFTWARE CO , LTD Semiconductor-on-insulator resistor-capacitor circuit
6714436, Mar 20 2003 SHENZHEN XINGUODU TECHNOLOGY CO , LTD Write operation for capacitorless RAM
6721222, Oct 17 2000 Intel Corporation Noise suppression for open bit line DRAM architectures
6825524, Aug 29 2003 Kabushiki Kaisha Toshiba Semiconductor integrated circuit device
6861689, Nov 08 2002 SHENZHEN XINGUODU TECHNOLOGY CO , LTD One transistor DRAM cell structure and method for forming
6870225, Nov 02 2001 International Business Machines Corporation Transistor structure with thick recessed source/drain structures and fabrication process of same
6882566, May 16 2002 OVONYX MEMORY TECHNOLOGY, LLC Stacked 1T-nMTJ MRAM structure
6888770, May 09 2003 Kabushiki Kaisha Toshiba Semiconductor memory device
6894913, Dec 17 2001 SAMSUNG ELECTRONICS CO , LTD Non-volatile semiconductor memory and method of operating the same
6897098, Jul 28 2003 TAHOE RESEARCH, LTD Method of fabricating an ultra-narrow channel semiconductor device
6903984, Dec 31 2003 Intel Corporation Floating-body DRAM using write word line for increased retention time
6909151, Jun 27 2003 Intel Corporation Nonplanar device with stress incorporation layer and method of fabrication
6912150, May 13 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Reference current generator, and method of programming, adjusting and/or operating same
6913964, Mar 11 2002 MOSYS, INC Method of fabricating a one transistor floating-body DRAM cell in bulk CMOS process with electrically isolated charge storage region
6936508, Sep 12 2003 Texas Instruments Incorporated Metal gate MOS transistors and methods for making the same
6969662, Jun 18 2001 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Semiconductor device
6975536, Jan 31 2002 MORGAN STANLEY SENIOR FUNDING Mass storage array and methods for operation thereof
6982902, Oct 03 2003 Qimonda AG MRAM array having a segmented bit line
6987041, Oct 02 1998 Fujitsu Semiconductor Limited Semiconductor device having both memory and logic circuit and its manufacture
7030436, Dec 04 2002 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Embedded DRAM gain memory cell having MOS transistor body provided with a bi-polar transistor charge injecting means
7037790, Sep 29 2004 Intel Corporation Independently accessed double-gate and tri-gate transistors in same process flow
7041538, Apr 05 2002 GLOBALFOUNDRIES Inc Method of manufacturing a disposable reversed spacer process for high performance recessed channel CMOS
7042765, Aug 06 2004 SHENZHEN XINGUODU TECHNOLOGY CO , LTD Memory bit line segment isolation
7061806, Sep 30 2004 TAHOE RESEARCH, LTD Floating-body memory cell write
7085153, May 13 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Semiconductor memory cell, array, architecture and device, and method of operating same
7085156, May 13 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Semiconductor memory device and method of operating same
7170807, Apr 18 2002 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Data storage device and refreshing method for use with such device
7177175, Sep 24 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Low power programming technique for a floating body memory transistor, memory cell, and memory array
7187581, May 13 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Semiconductor memory device and method of operating same
7230846, Jun 14 2005 Intel Corporation Purge-based floating body memory
7233024, Mar 31 2003 WODEN TECHNOLOGIES INC Three-dimensional memory device incorporating segmented bit line memory array
7256459, Sep 09 2004 Kabushiki Kaisha Toshiba Floating body-type DRAM cell with increased capacitance
7301803, Dec 22 2004 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Bipolar reading technique for a memory cell having an electrically floating body transistor
7301838, Dec 13 2004 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Sense amplifier circuitry and architecture to write data into and/or read from memory cells
7317641, Jun 20 2005 SanDisk Technologies LLC Volatile memory cell two-pass writing method
7324387, Apr 18 2006 Maxim Integrated Products, Inc. Low power high density random access memory flash cells and arrays
7335934, Jul 22 2003 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Integrated circuit device, and method of fabricating same
7341904, Feb 06 2002 Polaris Innovations Limited Capacitorless 1-transistor DRAM cell and fabrication method
7416943, Sep 01 2005 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Peripheral gate stacks and recessed array gates
7456439, Mar 22 2001 T-RAM ASSIGNMENT FOR THE BENEFIT OF CREDITORS , LLC Vertical thyristor-based memory with trench isolation and its method of fabrication
7477540, Dec 22 2004 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Bipolar reading technique for a memory cell having an electrically floating body transistor
7492632, Apr 07 2006 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Memory array having a programmable word length, and method of operating same
7517744, Jun 08 2005 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Capacitorless DRAM on bulk silicon
7539041, Oct 30 2006 Samsung Electronics Co., Ltd. Floating body semiconductor memory device and method of operating the same
7542340, Jul 11 2006 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Integrated circuit including memory array having a segmented bit line architecture and method of controlling and/or operating same
7542345, Feb 16 2006 U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT Multi-bit memory cell having electrically floating body transistor, and method of programming and reading same
7545694, Aug 16 2006 LONGITUDE FLASH MEMORY SOLUTIONS LTD Sense amplifier with leakage testing and read debug capability
7606066, Sep 07 2005 OVONYX MEMORY TECHNOLOGY, LLC Memory cell and memory cell array having an electrically floating body transistor, and methods of operating same
7696032, Nov 18 2005 Samsung Electronics Co., Ltd. Semiconductor device including a crystal semiconductor layer, its fabrication and its operation
20010055859,
20020030214,
20020034855,
20020036322,
20020051378,
20020064913,
20020070411,
20020072155,
20020076880,
20020086463,
20020089038,
20020098643,
20020110018,
20020114191,
20020130341,
20020160581,
20020180069,
20030003608,
20030015757,
20030035324,
20030042516,
20030047784,
20030057487,
20030057490,
20030102497,
20030112659,
20030123279,
20030146474,
20030146488,
20030151112,
20030231521,
20040021137,
20040021179,
20040029335,
20040075143,
20040108532,
20040188714,
20040217420,
20050001257,
20050001269,
20050017240,
20050047240,
20050062088,
20050063224,
20050064659,
20050105342,
20050111255,
20050121710,
20050135169,
20050141262,
20050141290,
20050145886,
20050145935,
20050167751,
20050189576,
20050208716,
20050226070,
20050232043,
20050242396,
20050265107,
20060043484,
20060084247,
20060091462,
20060098481,
20060126374,
20060131650,
20060223302,
20070008811,
20070023833,
20070045709,
20070058427,
20070064489,
20070085140,
20070097751,
20070114599,
20070133330,
20070138524,
20070138530,
20070187751,
20070187775,
20070200176,
20070252205,
20070263466,
20070278578,
20080049486,
20080062793,
20080083949,
20080099808,
20080130379,
20080133849,
20080165577,
20080253179,
20080258206,
20090086535,
20090121269,
20090127592,
20090201723,
20100085813,
20100091586,
20100110816,
CA272437,
EP30856,
EP175378,
EP202515,
EP207619,
EP245515,
EP253631,
EP300157,
EP333426,
EP350057,
EP354348,
EP359551,
EP362961,
EP366882,
EP465961,
EP510607,
EP513923,
EP537677,
EP564204,
EP579566,
EP599388,
EP599506,
EP601590,
EP606758,
EP642173,
EP682370,
EP689252,
EP694977,
EP725402,
EP726601,
EP727820,
EP727822,
EP731972,
EP739097,
EP744772,
EP788165,
EP801427,
EP836194,
EP844671,
EP858109,
EP860878,
EP869511,
EP878804,
EP920059,
EP924766,
EP933820,
EP951072,
EP971360,
EP980101,
EP993037,
EP1073121,
EP1162663,
EP1162744,
EP1179850,
EP1180799,
EP1191596,
EP1204146,
EP1204147,
EP1209747,
EP1233454,
EP1237193,
EP1241708,
EP1253634,
EP1280205,
EP1288955,
FR2197494,
GB1414228,
JP10242470,
JP11087649,
JP12274221,
JP12389106,
JP13180633,
JP2000247735,
JP2002009081,
JP2002083945,
JP2002094027,
JP2002176154,
JP2002246571,
JP2002329795,
JP2002343886,
JP2002353080,
JP2003031693,
JP2003086712,
JP2003100641,
JP2003100900,
JP2003132682,
JP2003203967,
JP2003243528,
JP200368877,
JP2004335553,
JP2294076,
JP3171768,
JP4176163,
JP5347419,
JP62007149,
JP62272561,
JP8213624,
JP8274277,
JP8316337,
JP9046688,
JP9082912,
WO124268,
WO2005008778,
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