According to one embodiment, a slit mechanism apparatus includes, two slit plates configured to adjust a thickness of x-rays, two slit link bars which are pivotally supported on two ends of each of the two slit plates to interlock the two slit plates, two shafts on which the two slit link bars are respectively mounted to rotate the two slit link bars, two shutter plates configured to block/pass the x-rays, and two shutter link bars which are pivotally supported on two ends of each of the two shutter plates to interlock the two shutter plates and are mounted on the two shafts together with the two slit link bars.
|
1. A slit mechanism apparatus comprising:
two slit plates configured to adjust a thickness of x-rays;
two slit link bars which are pivotally supported on two ends of each of the two slit plates to interlock the two slit plates;
two shafts on which the two slit link bars are respectively mounted to rotate the two slit link bars;
two shutter plates configured to block/pass the x-rays; and
two shutter link bars which are pivotally supported on two ends of each of the two shutter plates to interlock the two shutter plates and are mounted on the two shafts together with the two slit link bars.
13. A x-rays beam adjusting/blocking apparatus which includes x-rays beam adjustment means comprising an adjustment plate, x-rays blocking means comprising a blocking plate, and switching means and adjusts and blocks a x-rays beam,
wherein when the switching means is in a state to block a x-rays beam, the x-rays blocking means blocks x-rays, and when the switching means is in a state to adjust a x-rays beam, a slit which makes a blocking plate of the x-rays blocking means pass a x-rays beam is always larger than a slit which makes an adjustment plate of the x-rays beam adjustment means pass a x-rays beam.
19. A ct apparatus including x-ray emission means for emitting x-rays, optical adjustment means for filtering x-rays, a bed on which a patient is placed, and detection means for detecting and x-rays and performing signal processing, further comprising
a x-rays beam adjusting/blocking apparatus which includes x-rays beam adjustment means comprising an adjustment plate, x-rays blocking means comprising a blocking plate, and switching means and adjusts and blocks a x-rays beam, the x-rays blocking means blocking x-rays when the switching means is in a state to block a x-rays beam, and a slit which makes a blocking plate of the x-rays blocking means pass a x-rays beam being always larger than a slit which makes an adjustment plate of the x-rays beam adjustment means pass a x-rays beam when the switching means is in a state to adjust a x-rays beam.
7. An x-ray computed tomography apparatus comprising an x-ray tube which generates x-rays, an x-ray detector which detects x-rays transmitted through an object, a rotating mechanism which rotates the x-ray tube together with the x-ray detector around the object, and a slit mechanism apparatus which is provided between the x-ray tube and the object to adjust a width of the x-rays,
the slit mechanism apparatus comprising
two slit plates configured to adjust a width of x-rays,
two slit link bars which are pivotally supported on two ends of each of the two slit plates to interlock the two slit plates,
two shafts on which the two slit link bars are respectively mounted to rotate the two slit link bars;
two shutter plates configured to block/pass the x-rays, and
two shutter link bars which are pivotally supported on two ends of each of the two shutter plates to interlock the two shutter plates and are mounted on the two shafts together with the two slit link bars.
2. The apparatus according to
3. The apparatus according to
4. The apparatus according to
5. The apparatus according to
6. The apparatus according to
8. The apparatus according to
9. The apparatus according to
10. The apparatus according to
11. The apparatus according to
12. The apparatus according to
14. The apparatus according to
the x-rays beam adjustment means comprises two adjustment plates and adjusts an intensity of a x-rays beam by adjusting a slit between the two adjustment plates, and
the x-rays blocking means comprises two blocking plates and blocks passage of x-rays by reducing a slit between the two blocking plates to 0.
15. The apparatus according to
the x-rays blocking means is placed above the x-rays beam adjustment means,
the switching means includes two blocking/switching plates and two adjusting/switching plates, and forms two crossbars by installing the two blocking/switching plates and the two adjusting/switching plates so as to make the two blocking/switching plates respectively intersect the two adjusting/switching plates, and
two ends of each of the two blocking/switching plates are connected to two ends of a corresponding one of the two blocking plates to form a parallelogram, and two ends of each of the two adjusting/switching plates are connected to two ends of a corresponding one of the two adjustment plates to form another parallelogram.
16. The apparatus according to
17. The apparatus according to
18. The apparatus according to
20. The apparatus according to
the x-rays beam adjustment means comprises two adjustment plates and adjusts an intensity of a x-rays beam by adjusting a slit between the two adjustment plates, and
the x-rays blocking means comprises two blocking plates and blocks passage of x-rays by reducing a slit between the two blocking plates to 0.
21. The apparatus according to
the x-rays blocking means is placed above the x-rays beam adjustment means,
the switching means includes two blocking/switching plates and two adjusting/switching plates, and forms two crossbars by installing the two blocking/switching plates and the two adjusting/switching plates so as to make the two blocking/switching plates respectively intersect the two adjusting/switching plates, and
two ends of each of the two blocking/switching plates are connected to two ends of a corresponding one of the two blocking plates to form a parallelogram, and two ends of each of the two adjusting/switching plates are connected to two ends of a corresponding one of the two adjustment plates to form another parallelogram.
22. The apparatus according to
23. The apparatus according to
|
This application is based upon and claims the benefit of priority from Chinese Patent Application No. 200910165898.7, filed Aug. 12, 2009; and Japanese Patent Application No. 2010-040550, filed Feb. 25, 2010, the entire contents of both of which are incorporated herein by reference.
Embodiments described herein relate generally to a slit mechanism apparatus for an X-ray computed tomography apparatus (CT apparatus).
A CT apparatus is a medical diagnosis apparatus to diagnose a patient with X-rays. As shown in
In general, before diagnosis using a CT apparatus, it is necessary to preheat the X-ray tube 10 to emit X-rays. During a preheat period, it is necessary to block unnecessary X-rays by using a shutter plate (X-ray blocking mechanism).
A shutter plate 11c is mounted in the optical system unit 11. The shutter mechanism 11c has a shutter plate, e.g., a lead plate, with an X-ray blocking function placed in the path of X-rays so as to implement X-ray blocking operation.
In addition, when the X-ray tube normally emits X-rays, no X-rays are blocked. At this time, the shutter plate to block X-rays moves away from the path of X-rays.
As shown in
The conventional shutter mechanism is integrated with a wedge mechanism, and uses the driving mechanism to drive the shutter plate so as to move it to the path of X-rays along a linear rail. That is, the shutter mechanism has a complicated structure. As shown in
In general, according to one embodiment, an a slit mechanism apparatus comprising:
two slit plates configured to adjust a thickness of X-rays;
two slit link bars which are pivotally supported on two ends of each of the two slit plates to interlock the two slit plates;
two shafts on which the two slit link bars are respectively mounted to rotate the two slit link bars;
two shutter plates configured to block/pass the X-rays; and
two shutter link bars which are pivotally supported on two ends of each of the two shutter plates to interlock the two shutter plates and are mounted on the two shafts together with the two slit link bars.
It is not necessary to provide it by a integral structure with shutter link bar S1 and slit link bar S2. It may be provided by a separate structure with shutter link bar S1 and slit link bar S2. It may be similarly provided by a integral structure with shutter link bar S3 and slit link bar S4.
Two shutter plates L1 and L2 are coupled to each other at their two ends through two link bars S1 and S3 having the same length. The link bars S1 and S3 are mounted on the two shafts (common shafts) R1 and R2 on which the link bars S2 and S4 of the slit plates L3 and L4 are mounted, together with the link bars S2 and S4. The link bars S1 and S3 are mounted on the shafts R1 and R2 at a predetermined distance from the link bars S2 and S4 so as to prevent the slit plates L3 and L4 from interfering with the shutter plates L1 and L2. Rotating the two shafts R1 and R2 will open/close the slit between the shutter plates L1 and L2 while maintaining their parallel state. This blocks/passes X-rays.
The shutter link bars S1 and S3 intersect the slit link bars S2 and S4 at the angle selected from the range of 50°-140°, for instance, 90° respectively. This forms two crossbars (switching means). When the slit plates L3 and L4 separate from each other as the two shafts R1 and R2 rotate clockwise, the shutter plates L1 and L2 approach each other and completely close the slit in the end. When the shutter plates L1 and L2 separate from each other as the two shafts R1 and R2 rotate counterclockwise, the slit plates L3 and L4 approach each other.
The two ends of each of the two shutter link bars S1 and S3 are pivotally connected to the two ends of a corresponding one of the two shutter plates L1 and L2 with, for example, screws to form a parallelogram. The two ends of each of the two slit link bars S2 and S4 are pivotally connected to the two ends of a corresponding one of the two slit plates L3 and L4 with, for example, screws to form another parallelogram.
The shutter link bar S1 intersects the slit link bar S2 at a predetermined angle to form one “crossbar”. The shutter link bar S3 intersects the slit link bar S4 at a predetermined angle to form the other “crossbar”. Fixing intersecting points by the shafts R1 and R2 allows the shutter link bar S1, the slit link bar S2, the shutter link bar S3, and the slit link bar S4 to rotate about the common shafts R1 and R2 at the intersecting points. When the shutter link bar S1, the slit link bar S2, the shutter link bar S3, and the slit link bar S4 rotate about the shafts R1 and R2 at the intersecting points, the long sides of the two parallelograms move in the opposite directions.
By determining in advance the length relationship between the shutter link bar S1 and the slit link bar S2, the length relationship between the shutter link bar S3 and the slit link bar S4, and the angle relationship between the intersections of the crossbars, it is possible to link the slit mechanism with the shutter mechanism so as not to interfere with each other. In this case, the length of the shutter link bar S1 is equal to that of the shutter link bar S3. The length of the slit link bar S2 is equal to that of the slit link bar S4.
The length relationship between the shutter link bar S1 and the slit link bar S2 and the length relationship between the shutter link bar S3 and the slit link bar S4 have been embodied, but this embodiment is not limited to the above relationships.
In this embodiment, for example, the length of the shutter link bars S1 and S3 is set to 39 mm, the length of the slit link bars S2 and S4 is set to 35 mm, and the intersection angle of the crossbars is set to 90°.
As shown in
L(AB) and L(CD) intersect each other at a point O and are fixed to form a “crossbar”, and the angle defined by the two sides is represented by β. L(A′B′) and L(C′D′) intersect each other at a point O′ and are fixed to form a “crossbar”, and the angle defined by the two sides is represented by β.
A parallelogram ABB′A′ can rotate about O and O′, with two long sides being denoted by reference symbols AA′ and BB′. A parallelogram CDD′C′ can rotate about O and O′, with two long sides being denoted by reference symbols CC′ and DD′.
When the two “crossbars” rotate about O and O′ clockwise, the distance between AA′ and BB′ decreases, as shown in (b) of
The amount of change ΔL(AB) in the distance between AA′ and BB′ is opposite in direction to the amount of change ΔL(CD) in the distance between CC′ and DD′, and these distances change according to a predetermined relationship.
Actual situations can be summed up with the following restriction ranges in actual applications (however, the present invention is not limited to the following ranges):
1) L(AB)>L(CD). That is, a short side of the parallelogram of the shutter mechanism is longer than that of the parallelogram of the slit mechanism.
In this arrangement, the short side L(AB) of the parallelogram of the shutter mechanism selects from the range of 20 mm to 150 mm.
The short side L(CD) of the parallelogram of the slit mechanism selects from the range of 20 mm to 140 mm.
2) The short sides of the parallelogram of the shutter mechanism and those of the parallelogram of the slit mechanism are fixed in the form of “crossbars”. The range of the distances from the fixing points to the centers of the respective short sides is 0 mm to 50 mm.
3) The angle β defined by each short side of the parallelogram of the shutter mechanism and a corresponding short side of the parallelogram of the slit mechanism is an arbitrary fixed value from 50° to 140°.
The above embodiment is an example to facilitate the understanding of the present invention, and does not limited to the invention. The components and parts disclosed in the above embodiment can therefore be replaced by other parts having the same functions, newly designed, or improved within the spirit and scope of the invention. In addition, any possible combinations of these components and parts are included in the spirit and scope of the invention as long as they have merits similar to those of the embodiment of the invention.
While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the inventions. Indeed, the novel methods and systems described herein may be embodied in a variety of other forms; furthermore, various omissions, substitutions and changes in the form of the methods and systems described herein may be made without departing from the spirit of the inventions. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the inventions.
He, Wei, Junjie, Sun, Jingjing, Zhang
Patent | Priority | Assignee | Title |
10123756, | Feb 10 2014 | SIEMENS HEALTHINEERS AG | Single source dual energy having two filters for X-ray spectrum differentiation in the case of radiator screens having slotted plates |
10687779, | Feb 03 2016 | Globus Medical, Inc | Portable medical imaging system with beam scanning collimator |
10714227, | Jun 06 2016 | LORAM TECHNOLOGIES, INC | Rotating radiation shutter collimator |
10937560, | Mar 30 2016 | CEFLA SOCIETÁ COOPERATIVA | Beam-limiting device for radiographic apparatuses |
11862357, | Oct 21 2020 | Illinois Tool Works Inc. | Adjustable collimators and x-ray imaging systems including adjustable collimators |
9261611, | Sep 21 2012 | General Electric Company | Systems and methods for scanning with radiation detectors |
Patent | Priority | Assignee | Title |
6445764, | Dec 27 1999 | GE MEDICAL SYSTEMS GLOBAL TECHNOLOGY COMPANY, LLC, A DELWARE LIMITED LIABILITY COMPANY | Multi-slice X-ray CT apparatus and method of controlling the same |
6707876, | May 22 2001 | GE Medical Systems Global Technology Company, LLC | X-ray CT apparatus and method |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Apr 19 2010 | Kabushiki Kaisha Toshiba | (assignment on the face of the patent) | / | |||
Apr 19 2010 | Toshiba Medical Systems Corporation | (assignment on the face of the patent) | / | |||
Apr 21 2010 | JUNJIE, SUN | Kabushiki Kaisha Toshiba | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Apr 21 2010 | JINGJING, ZHANG | Kabushiki Kaisha Toshiba | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Apr 21 2010 | HE, WEI | Kabushiki Kaisha Toshiba | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Apr 21 2010 | JUNJIE, SUN | Toshiba Medical Systems Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Apr 21 2010 | JINGJING, ZHANG | Toshiba Medical Systems Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Apr 21 2010 | HE, WEI | Toshiba Medical Systems Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 024516 | /0908 | |
Mar 16 2016 | Kabushiki Kaisha Toshiba | Toshiba Medical Systems Corporation | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 038891 | /0693 |
Date | Maintenance Fee Events |
Nov 05 2013 | ASPN: Payor Number Assigned. |
Nov 25 2015 | M1551: Payment of Maintenance Fee, 4th Year, Large Entity. |
Dec 02 2019 | M1552: Payment of Maintenance Fee, 8th Year, Large Entity. |
Jan 29 2024 | REM: Maintenance Fee Reminder Mailed. |
Jul 15 2024 | EXP: Patent Expired for Failure to Pay Maintenance Fees. |
Date | Maintenance Schedule |
Jun 12 2015 | 4 years fee payment window open |
Dec 12 2015 | 6 months grace period start (w surcharge) |
Jun 12 2016 | patent expiry (for year 4) |
Jun 12 2018 | 2 years to revive unintentionally abandoned end. (for year 4) |
Jun 12 2019 | 8 years fee payment window open |
Dec 12 2019 | 6 months grace period start (w surcharge) |
Jun 12 2020 | patent expiry (for year 8) |
Jun 12 2022 | 2 years to revive unintentionally abandoned end. (for year 8) |
Jun 12 2023 | 12 years fee payment window open |
Dec 12 2023 | 6 months grace period start (w surcharge) |
Jun 12 2024 | patent expiry (for year 12) |
Jun 12 2026 | 2 years to revive unintentionally abandoned end. (for year 12) |