Provided is a spin head for supporting and rotating a substrate. The spin head includes a body, chuck pins disposed at the body and movable between supporting positions and rest positions, and a chuck pin moving unit configured to move the chuck pins straight. The chuck pins supports a substrate at the supporting positions and provides a substrate loading/unloading space at the rest position. The chuck pin moving unit includes movable rods fixed to the chuck pins, a rotatable cam including protrusions on an outer surface thereof so as to move the chuck pins from the supporting positions to the rest positions, and chuck pin return units respectively applying forces to the movable rods so as to move the chuck pins individually from the rest positions to the supporting positions. The chuck pin moving unit further includes contact maintaining members.
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30. A spin head for receiving a substrate, comprising:
a body;
chuck pins disposed at the body and protruding upward from the body; and
a chuck pin moving unit configured to move the chuck pins straight in radial directions of the body,
wherein the chuck pin moving unit comprises chuck pin return units enabling the chuck pins to be individually moved toward a center of the body by restoring forces.
20. A spin head for receiving a substrate, comprising:
a rotatable body;
chuck pins disposed at the body and protruding upward from the body; and
a chuck pin moving unit configured to move the chuck pins,
wherein the chuck pin moving unit comprises:
movable rods fixed to the chuck pins;
a linear mover configured to move the movable rods straight in radial directions of the body; and
contact maintaining members pushing the movable rods toward a center of the body while the body is rotated.
27. A spin head for receiving a substrate, comprising:
a body;
chuck pins disposed at the body and protruding upward from the body; and
a chuck pin moving unit configured to move the chuck pins,
wherein the body comprises:
an upper plate;
a lower plate at which the chuck pin moving unit is installed; and
a pressing part configured to couple the upper plate and the lower plate,
wherein the lower plate comprises a slit groove, and the pressing part comprises an insertion portion and a head portion, the insertion portion being inserted in the slit groove and fixed to the upper plate, the head portion extending from the insertion portion and pressing the lower plate toward the upper plate.
1. A spin head for receiving a substrate, comprising:
a body;
chuck pins disposed at the body and protruding upward from the body; and
a chuck pin moving unit configured to move the chuck pins between supporting positions and rest positions for supporting an edge of a substrate placed at the spin head by moving the chuck pins to the supporting positions and allowing a substrate to be placed at the body by moving the chuck pins to the rest positions that are more distant from a center of the body than the supporting positions;
wherein the chuck pin moving unit comprises:
movable rods fixed to the chuck pins;
a rotatable cam comprising protrusions on an outer surface thereof so as to move the chuck pins from the supporting positions to the rest positions; and
chuck pin return units applying forces to the movable rods, respectively, so as to move the chuck pins individually from the rest positions to the supporting positions.
2. The spin head of
3. The spin head of
a second hook is disposed at a position of the body closer to a center of the body than the first hook and the other end of the elastic member is fixed to the second hook; and
when the chuck pin is in the rest position, the elastic member is extended.
4. The spin head of
5. The spin head of
6. The spin head of
7. The spin head of
a fixed pin fixed to the movable rod and protruding from the movable rod; and
a maintaining bar comprising a center portion rotatably coupled to the body, a pressing portion extending from the center portion toward the movable rod for pushing the fixed pin, and a guide portion extending from the center portion toward an outer side of the body in a direction away from the movable rod.
9. The spin head of
10. The spin head of
11. The spin head of
wherein the distance adjustor comprises:
an adjustment block comprising a slit shaped penetration hole formed through a center portion of the adjustment block in a top-to-bottom direction; and
a fixing member coupled to the body through the hole of the adjustment block for fixing the adjustment block to the body,
wherein a stopper is disposed at the movable rod, the stopper making contact with the adjustment block so as to restrict movement of the movable rod.
12. The spin head of
a cam driving unit rotating the cam in a first rotation direction; and
a cam return unit applying a restoring force to the cam for rotating the cam in a second rotation direction opposite to the first rotation direction,
wherein the chuck pin is moved from the supporting position to the rest position by rotating the cam using the cam driving unit, and the chuck pin is moved from the rest position to the supporting position by rotating the cam using the cam return unit.
13. The spin head of
14. The spin head of
15. The spin head of
16. The spin head of
an upper plate;
a lower plate at which the chuck pin moving unit is installed; and
a pressing part configured to couple the upper plate and the lower plate,
wherein the lower plate comprises a slit groove, and the pressing part comprises an insertion portion and a head portion, the insertion portion being inserted in the slit groove and coupled to the upper plate using a screw, the head portion extending from the insertion portion and pressing the lower plate toward the upper plate as the insertion portion is coupled to the upper plate.
17. The spin head of
the lower plate is formed of a material that is less deformed by heat than the upper plate.
18. The spin head of
19. The spin head of
21. The spin head of
22. The spin head of
a fixed pin disposed at the movable rod; and
a maintaining bar comprising a center portion rotatably coupled to the body, a pressing portion extending from the center portion toward the movable rod for pushing the fixed pin, and a guide portion extending from the center portion toward an outer side of the body in a direction away from the movable rod.
24. The spin head of
25. The spin head of
a cam comprising protrusions on an outer surface thereof so as to move the chuck pins away from the center of the body while being rotated; and
chuck pin return units applying forces to the movable rods, respectively, so as to move the chuck pins individually toward the center of the body.
26. The spin head of
28. The spin head of
29. The spin head of
31. The spin head of
32. The spin head of
33. The spin head of
34. The spin head of
wherein each of the contact maintaining members comprises:
a fixed pin disposed at the movable rod; and
a maintaining bar comprising a center portion rotatably coupled to the body, a pressing portion extending from the center portion toward the movable rod for pushing the fixed pin, and a guide portion extending from the center portion toward an outer side of the body in a direction away from the movable rod.
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This U.S. non-provisional patent application claims priority under 35 U.S.C. §119 of Korean Patent Application No. 10-2007-0100188, filed on Oct. 5, 2007, the entire contents of which are hereby incorporated by reference.
The present invention disclosed herein relates to an apparatus and method for treating a substrate, and more particularly, to a rotatable spin head configured to support a substrate, for example, in a semiconductor process, and an apparatus for treating a substrate using the spin head.
Semiconductor processes include a process of etching or cleaning thin layers, foreign substances, and particles. Such an etching or cleaning process may be performed by placing a substrate such as a wafer on a spin head with a patterned side of the wafer facing upward or downward and supplying a treating liquid to the wafer while rotating the spin head at high speed. The spin head includes chuck pins to support the edge of the wafer for preventing the wafer from being detached from the spin head in a radial direction. The chuck pins can be moved between rest positions and supporting positions. When the chuck pins are in the rest positions, a space for loading and unloading a substrate on the spin head is formed. When a substrate loaded on the spin head is treated while rotating the spin head, the chuck pins are in supporting positions where the chuck pins make contact with the edge of the substrate and support the substrate. A space defined among the chuck pins in the rest positions is larger than a space defined among the chuck pins in the supporting positions.
In general, the chuck pins are moved together from the rest positions to the supporting positions by a single driving mechanism. However, the chuck pins may be non-uniform in size since machining tolerances are allowed in a manufacturing process. In this case, although all the chuck pins are moved together to the supporting positions, some of the chuck pins may not make contact with the edge of a substrate placed on the spin head. Thus, the substrate can be unstably supported, and the other chuck pins making contact with the edge of the substrate can be easily damaged due to concentration of stress.
In addition, if the spin head is rotated at high speed, since a strong centrifugal force is applied to the chuck pins in a direction from the supporting positions to the rest positions, a substrate loaded on the spin head may be unstably supported by the chuck pins.
Generally, the spin head includes an upper plate and a lower plate that are joint together using screws, and the chuck pins are installed on the lower plate with upper portions of the chuck pins being protruded upward through the upper plate. Since chemicals are used as treating liquids in a substrate treating process, the upper plate is generally formed of a corrosion resistant material such as polyvinylchloride. However, if chemicals are used at high temperatures, the upper plate formed of polyvinylchloride may be readily deformed by heat. When the upper plate expands due to thermal deformation, the lower plate coupled to the upper plate using screws may also expand. This alters positions of the chuck pins installed on the lower plate.
The present invention provides a spin head having a structure for stably supporting a substrate.
The present invention also provides a spin head having a structure for stably keeping all chuck pins in contact with a substrate.
The present invention also provides a spin head having a structure for stably keeping all chuck pins in contact with an edge portion of a substrate at high speed.
The present invention also provides a spin head having a structure for preventing chuck pins from deviating from set positions due to thermal deformation of the spin head caused by a hot process chemical.
Objects of the present invention are not limited to those mentioned above, and other objects of the present invention will be apparently understood by those skilled in the art through the following description.
Embodiments of the present invention provide spin heads for receiving a substrate. The spin heads include: a body; chuck pins disposed at the body and protruding upward from the body; and a chuck pin moving unit configured to move the chuck pins between supporting positions and rest positions for supporting an edge of a substrate placed at the spin head by moving the chuck pins to the supporting positions and allowing a substrate to be placed at the body by moving the chuck pins to the rest positions that are more distant from a center of the body than the supporting positions. The chuck pin moving unit includes: movable rods fixed to the chuck pins; a rotatable cam including protrusions on an outer surface thereof so as to move the chuck pins from the supporting positions to the rest positions; and chuck pin return units applying forces to the movable rods, respectively, so as to move the chuck pins individually from the rest positions to the supporting positions.
In some embodiments, each of the chuck pin return units may include an elastic member, and the elastic member may include an end fixed to the movable rod and the other end fixed to the body for applying an elastic force to the movable rod. Alternatively, each of the chuck pin return units may include a magnetic member for applying a magnetic force to the movable rod. The magnetic member may include a first magnet fixed to the movable rod and a second magnet fixed to the body.
In other embodiments, the chuck pin may include contact maintaining members that are configured to push the movable rods toward the center of the body when the chuck pins are in the supporting positions and move to predetermined positions so as not to impede movements of the movable rods when the chuck pins are moved from the supporting positions to the rest positions. The contact maintaining members may be configured to push the movable rods in a direction opposite to a direction of a centrifugal force when the spin head rotates. For example, each of the contact maintaining members may include: a fixed pin fixed to the movable rod and protruding from the movable rod; and a maintaining bar including a center portion rotatably coupled to the body, a pressing portion extending from the center portion toward the movable rod for pushing the fixed pin, and a guide portion extending from the center portion toward an outer side of the body in a direction away from the movable rod. The guide portion may be heavier than the pressing portion. The guide portion and the pressing portion may make an obtuse angle with each other.
In still other embodiments, the spin head may further include a distance adjustor for adjusting the supporting position. The distance adjustor may include: an adjustment block including a slit shaped penetration hole formed through a center portion of the adjustment block in a top-to-bottom direction; and a fixing member coupled to the body through the hole of the adjustment block for fixing the adjustment block to the body, wherein a stopper is disposed at the movable rod, the stopper making contact with the adjustment block so as to restrict movement of the movable rod.
In even other embodiments, the chuck pin moving unit may further include: a cam driving unit rotating the cam in a first rotation direction; and a cam return unit applying a restoring force to the cam for rotating the cam in a second rotation direction opposite to the first rotation direction. The chuck pin may be moved from the supporting position to the rest position by rotating the cam using the cam driving unit, and the chuck pin may be moved from the rest position to the supporting position by rotating the cam using the cam return unit.
In yet other embodiments, the body may include: an upper plate; a lower plate at which the chuck pin moving unit is installed; and a pressing part configured to couple the upper plate and the lower plate, wherein the lower plate includes a slit groove, and the pressing part includes an insertion portion and a head portion, the insertion portion being inserted in the slit groove and coupled to the upper plate using a screw, the head portion extending from the insertion portion and pressing the lower plate toward the upper plate as the insertion portion is coupled to the upper plate. The upper plate may be formed of a material that is more corrosion resistive than the lower plate, and the lower plate may be formed of a material that is less deformed by heat than the upper plate.
In other embodiments of the present invention, spin heads for receiving a substrate are provided. The spin heads include: a rotatable body; chuck pins disposed at the body and protruding upward from the body; and a chuck pin moving unit configured to move the chuck pins, wherein the chuck pin moving unit includes: movable rods fixed to the chuck pins; a linear mover configured to move the movable rods straight in radial directions of the body; and contact maintaining members pushing the movable rods toward a center of the body while the body is rotated.
In still other embodiments of the present invention, spin heads for receiving a substrate are provided. The spin heads include: a body; chuck pins disposed at the body and protruding upward from the body; and a chuck pin moving unit configured to move the chuck pins, wherein the body includes: an upper plate; a lower plate at which the chuck pin moving unit is installed; and a pressing part configured to couple the upper plate and the lower plate, wherein the lower plate includes a slit groove, and the pressing part includes an insertion portion and a head portion, the insertion portion being inserted in the slit groove and fixed to the upper plate, the head portion extending from the insertion portion and pressing the lower plate toward the upper plate.
In even other embodiments of the present invention, spin heads for receiving a substrate are provided. The spin heads include: a body; chuck pins disposed at the body and protruding upward from the body; and a chuck pin moving unit configured to move the chuck pins straight in radial directions of the body, wherein the chuck pin moving unit includes chuck pin return units enabling the chuck pins to be individually moved toward a center of the body by restoring forces.
The accompanying figures are included to provide a further understanding of the present invention, and are incorporated in and constitute a part of this specification. The drawings illustrate exemplary embodiments of the present invention and, together with the description, serve to explain principles of the present invention. In the figures:
Preferred embodiments of the present invention will be described below in more detail with reference to
In the following descriptions of embodiments, an apparatus for cleaning a substrate (W) using a chemical, a rinsing liquid, and a dry gas is described as an example. That is, the spirit and scope of the present invention is not limited to the exemplary substrate cleaning apparatus. The present invention can be applied to various apparatuses such as an etching apparatus that processes a substrate while rotating the substrate.
The fluid supply unit 10 includes an upper nozzle member 100a and a lower nozzle member 100b (refer to
The upper nozzle member 100a includes a chemical supply nozzle 120a, a rinsing liquid supply nozzle 140a, and a dry gas supply nozzle 160a. The chemical supply nozzle 120a supplies a plurality of chemicals to the substrate (W). The chemical supply nozzle 120a includes a plurality of injectors 121, a support bar 122, and a bar mover 125. The injectors 121 are disposed at a side of the container 20. The injectors 121 are respectively connected to chemical tanks (not shown) for receiving chemicals from the chemical tanks. The chemical tanks connected to the injectors 121 store different chemicals. The injectors 121 are arranged in a predetermined direction in parallel with each other. The injectors 121 include upward protrusions 121a, respectively. Grooves (not shown) may be formed in side portions of the protrusions 121a, respectively. The chemical may be sulfuric acid, nitric acid, ammonia, hydrofluoric acid, or a mixture of deionized water and one or more of the listed chemicals. A discharge hole is formed in an end of each of the injectors 121.
The support bar 122 is coupled to one of the injectors 121 for moving the injectors 121 above the substrate (W) placed on the spin head 40. The support bar 122 is shaped like a long rod and is disposed in a manner such that the length of the support bar 122 is perpendicular to the arranged direction of the injectors 121. A holder (not shown) is attached to a bottom surface of the support bar 122 for coupling the support bar 122 and the injectors 121. The holder includes arms (not shown), and the arms are insertable into the grooves formed in the protrusions 121a of the injectors 121. The arms may be rotatable or movable into the grooves.
The bar mover 125 moves the support bar 122 along a linear path between a position above the support bar 122 and a position above the substrate (W) placed on the spin head 40. The bar mover 125 includes a bracket 123, a guide rail 124, and a driving unit (not shown). The guide rail 124 extends straight along the injectors 121 and the container 20 from the outside of the injectors 121 to the outside of the container 20. The bracket 123 is coupled to the guide rail 124 and is movable on the guide rail 124. The support bar 122 is fixed to the bracket 123. The driving unit provides a driving force for moving the bracket 123 linearly. The bracket 123 may be linearly moved using a motor and a screw. Alternatively, the bracket 123 may be linearly moved using a belt, a pulley, and a motor. Alternatively, the bracket 123 may be linearly moved using a linear motor.
The rinsing liquid supply nozzle 140a is disposed at another side of the container 20, and the dry gas supply nozzle 160a is disposed at another side of the container 20. The rinsing liquid supply nozzle 140a includes an injector 141, a support bar 142, and a driving unit 144. The injector 141 is fixed to an end of the support bar 142. A rotation shaft (not shown) is fixed to the other end of the support bar 142, and the driving unit 144 rotates the rotation shaft. The injector 141 receives a rinsing liquid from a rinsing liquid tank (not shown). The dry gas supply nozzle 160a has a structure similar to that of the rinsing liquid supply nozzle 140a. The dry gas supply nozzle 160a is used to supply isopropyl alcohol and nitrogen gas. The nitrogen gas may be supplied through the dry gas supply nozzle 160a at a high temperature.
The lower nozzle member 100b includes an injection head 180b (refer to
A chemical, a rinsing liquid, and a dry gas supplied through the upper nozzle member 100a and the lower nozzle member 100b are spread from a center region to an edge region of the top or bottom surface of the substrate (W) by rotation of the spin head 40 so that the substrate (W) can be cleaned.
The inner collecting vessel 220 is shaped like a ring for enclosing the spin head 40. The middle collecting vessel 240 is shaped like a ring for enclosing the inner collecting vessel 220. The outer collecting vessel 260 is shaped like a ring for enclosing the middle collecting vessel 240. The collecting vessels 220, 240, and 260 include inlets 227, 247, and 267, respectively. The inlets 227, 247, and 267 communicate with the space 32 of the container 20. Each of the inlets 227, 247, and 267 is shaped like a ring enclosing the spin head 40. Chemicals injected to the substrate (W) are directed to the inlets 227, 247, and 267 by a centrifugal force generated by rotation of the substrate (W) and then are collected to the collecting vessels 220, 240, and 260. The inlet 267 of the outer collecting vessel 260 is located above the inlet 247 of the middle collecting vessel 240, and the inlet 247 of the middle collecting vessel 240 is located just above the inlet 227 of the inner collecting vessel 220. That is, the inlets 227, 247, and 267 of the inner, middle, and outer collecting vessels 220, 240, and 260 are disposed at different heights.
The inner collecting vessel 220 includes an outer wall 222, a bottom wall 224, an inner wall 226, and a guide wall 228. Each of the outer wall 222, the bottom wall 224, the inner wall 226, and the guide wall 228 is shaped like a ring. The outer wall 222 includes an oblique wall 222a and a vertical wall 222b. The oblique wall 222a is sloped down in a direction away from the spin head 40. The vertical wall 222b extends downward from the oblique wall 222a. The bottom wall 224 extends horizontally from a lower edge of the vertical wall 222b toward the spin head 40. An end of the bottom wall 224 is aligned with a top end of the oblique wall 222a. The inner wall 226 extends vertically upwardly from the end of the bottom wall 224. A top end of the inner wall 226 is spaced a predetermined distance from the top end of the oblique wall 222a. A gap between the vertically space inner wall 226 and the oblique wall 222a functions as the inlet 227.
A plurality of holes 223 are formed in the inner wall 226 in a circular fashion. Each of the holes 223 is shaped like a slit. The holes 223 functions as exhaust holes. That is, gases introduced into the inner collecting vessel 220 are discharged to the outside of the container 20 through the exhaust holes 223 and a space under the spin head 40. A discharge pipe 225 is coupled to the bottom wall 224. A used process liquid collected into the inner collecting vessel 220 is discharged to an outer recycle system through the discharge pipe 225.
The guide wall 228 includes an oblique wall 228a and a vertical wall 228b. The oblique wall 228a is sloped down from a top end portion of the inner wall 226 in a direction away from the spin head 40. The vertical wall 228b extends vertically downwardly from a lower end portion of the oblique wall 228a. A lower end of the vertical wall 228b is spaced a predetermined distance from the bottom wall 224. A process liquid introduced through the inlet 227 is smoothly guided by the guide wall 228 toward a space 229 enclosed by the outer wall 222, the bottom wall 224, and the inner wall 226.
The middle collecting vessel 240 includes an outer wall 242, a bottom wall 244, an inner wall 246, and a protruded wall 248. The outer wall 242, the bottom wall 244, and the inner wall 246 of the middle collecting vessel 240 have structures similar to those of the outer wall 222, the bottom wall 224, and the inner wall 226 of the inner collecting vessel 220. However, since the middle collecting vessel 240 encloses the inner collecting vessel 220, the outer wall 242, the bottom wall 244, and the inner wall 246 of the middle collecting vessel 240 are larger than the outer wall 222, the bottom wall 224, and the inner wall 226 of the inner collecting vessel 220. The outer wall 242 of the middle collecting vessel 240 includes an oblique wall 242a. A top end of the oblique wall 242a is vertically spaced a predetermined distance from the top end of the oblique wall 222a of the outer wall 222 of the inner collecting vessel 220 so as to form the inlet 247 of the middle collecting vessel 240. The protruded wall 248 extends vertically downwardly from a lower edge of the bottom wall 244. A top end of the inner wall 246 of the middle collecting vessel 240 extends on to a lower edge of the bottom wall 224 of the inner collecting vessel 220. Slit-shaped exhaust holes 243 are formed in the inner wall 246 of the middle collecting vessel 240 in a ring fashion for discharging gas. A discharge pipe 245 is coupled to the bottom wall 244. A used process liquid collected into the middle collecting vessel 240 is discharged to an outer recycle system through the discharge pipe 245.
The outer collecting vessel 260 includes an outer wall 262 and a bottom wall 264. The outer wall 262 of the outer collecting vessel 260 has a structure similar to that of the outer wall 242 of the middle collecting vessel 240. However, since the outer collecting vessel 260 encloses the middle collecting vessel 240, the outer wall 262 of the outer collecting vessel 260 are larger than the outer wall 242 of the middle collecting vessel 240. The outer wall 262 of the outer collecting vessel 260 includes an oblique wall 262a. A top end of the oblique wall 262a is vertically spaced a predetermined distance from the top end of the oblique wall 242a of the outer wall 242 of the middle collecting vessel 240 so as to form the inlet 267 of the outer collecting vessel 260. The bottom wall 264 is shaped like a circular disk and includes an opening for receiving the rotation shaft 42. A discharge pipe 265 is coupled to the bottom wall 264. A used process liquid collected into the outer collecting vessel 260 is discharged to an outer recycle system through the discharge pipe 265. The outer collecting vessel 260 forms the exterior of the container 20. An exhaust pipe 263 is coupled to the bottom wall 264 of the outer collecting vessel 260. Gas introduced into the outer collecting vessel 260 is discharged through the exhaust pipe 263. In addition, gases discharged through the exhaust holes 223 and 243 of the inner walls 226 and 246 of the inner and middle collecting vessels 220 and 240 is discharged to the outside of the container 20 through the exhaust pipe 263 connected to the outer collecting vessel 260. The exhaust pipe 263 protrudes upward from the bottom wall 264 by a predetermined length.
The lifting unit 30 moves the container 20 straight and vertically. As the container 20 moves vertically, the height of the container 20 varies relative to the height of the spin head 40. The lifting unit 30 includes a bracket 31, a movable shaft 34, and a driving unit 36. The bracket 31 is fixed to an outer wall of the container 20, and the movable shaft 34 is fixed to the bracket 31. The driving unit 36 moves the movable shaft 34 vertically. When a substrate (W) is placed on the spin head 40 or lifted from the spin head 40, the container 20 is moved down so as to expose the spin head 40 through the top of the container 20. During a process, the height of the container 20 is adjusted so that process liquids used to process the substrate (W) can be separately collected to the collecting vessels 220, 240, and 260. Alternatively, the lifting unit 30 may move the spin head 40 vertically.
An exemplary structure of the spin head 40 will now be described with reference to
The support pins 400 support the backside edge portion of a substrate (W) so that the substrate (W) is spaced a predetermined distance from a top surface of the body 300. The support pins 400 have the same shape and size. Each of the support pins 400 includes an upper portion 420 (refer to
The chuck pins 500 are installed on an edge portion of the body 300 in a manner such that the chuck pins 500 protrude upward from the top surface of the body 300. The number of chuck pins 500 may be about six. The chuck pins 500 support the edge of a substrate (W) placed at the spin head 40 so that the substrate (W) can be kept in place without being detached from the spin head 40 when the spin head 40 is rotated. The chuck pins 500 have the same shape and size. Each of the chuck pins 500 includes a support portion 520, a center portion 540, a coupling portion 560, and a stopper portion 580. The support portion 520 has a flat top surface. The diameter of the support portion 520 gradually decreases from the flat top surface and then gradually increases in a downward direction. Thus, when viewed from the front, the support portion 520 is concaved. That is, the support portion 520 has a concave portion 522. When a substrate (W) is placed on the support pins 400, the concave portion 522 is in contact with the edge of the substrate (W). The center portion 540 extends downward from a lower end of the support portion 520. The center portion 540 has the same diameter as that of the lower end of the support portion 520. The coupling portion 560 extends downward from the center portion 540. A threaded hole is formed in the coupling portion 560 for fixing the coupling portion 560 to the chuck pin moving unit 600. The stopper portion 580 extends outward from the center portion 540 and is shaped like a ring. The stopper portions 580 of the chuck pins 500 are in contact with the top surface of the body 300 so that the chuck pins 500 can protrude from the top surface of the body 300 to the same height.
The body 300 includes an upper plate 320, a lower plate 340, and pressing parts 360 (refer to
The pressing parts 360 are coupled to the upper plate 320 through the slit grooves 342 in a direction from the lower plate 340 to the upper plate 320. Each of the pressing parts 360 includes a pressing plate 362 and a screw 364. A hole 362c is formed vertically through a center portion of the pressing plate 362. The screw 364 is inserted through the hole 362c of the pressing plate 362, the slit groove 342 of the lower plate 340, and the threaded groove 328 of the upper plate 320 in a direction from the lower plate 340 to the upper plate 320 so as to couple the upper plate 320 and the lower plate 340. The pressing plate 362 includes insertion portion 362b and a head portion 362a. The insertion portion 362b is inserted in the slit groove 342 of the lower plate 340, and the head portion 362a extends downward from the insertion portion 362b for pressing the lower plate 340. The insertion portion 362b of the pressing plate 362 has a diameter approximately equal to the width of the slit groove 342 of the lower plate 340, the head portion 362a of the pressing plate 362 has a diameter greater than the width of the slit groove 342.
The chuck pin moving unit 600 moves the chuck pins 500 between supporting positions and rest positions. In the supporting positions, the chuck pins 500 are in contact with the edge of a substrate (W) placed at the spin head 40. In the rest positions, the chuck pins 500 are located outward from the supporting positions so as to allow a substrate (W) to be placed at the spin head 40. That is, the supporting positions are closer to a center portion of the body 300 than the rest positions.
The number of the movable rods 620 is equal to the number of the chuck pins 500. The moveable rods 620 are coupled to the chuck pins 500, respectively. The movable rods 620 are disposed in the lower plate 340 in the radial directions of the body 300. The upper plate 320 includes a lateral portion protruded downward from its edge, and holes 329 (refer to
The guide members 640 are disposed on moving paths of the movable rods 620, respectively. The guide members 640 guide linear movements of the movable rods 620 in the radial directions of the body 300. The guide members 640 may be sliding bearings fixed to the body 300.
The linear mover 700 moves the movable rods 620 straight in the radial directions of the body 300 between the rest positions and the supporting positions. The linear mover 700 includes a cam 720, a cam driving unit 730, cam return units 760, and chuck pin return units 780. The cam 720 is shaped like a circular ring. The cam 720 includes protrusions 740. The protrusions extend outward from the periphery of the cam 720. The number of the protrusions 740 is equal to the number of the movable rods 620, and the protrusions 740 are formed at positions corresponding to the movable rods 620. Each of the protrusions 740 includes a gradually inclined front surface 742 and a steeply inclined rear surface 744. The cam driving unit 730 rotates the cam 720 in a first rotation direction 82, and the cam return units 760 rotate the cam 720 in a second rotation direction 84 opposite to the first rotation direction 82. A rotary cylinder may be used as the cam driving unit 730 for rotating the cam 720 a predetermined angle. The rotary cylinder may rotate a rotation shaft (not shown) fixed to the cam 720. Cam stoppers 750 are fixed to the body 300 beside the protrusions 740 for restricting rotation of the cam 720. The cam return units 760 may include springs 762 providing elastic forces for returning the cam 720. Ends of the spring 762 are fixed to first hooks 764 of the cam 720, and the other ends of the springs 762 are fixed to second hooks 766 of the lower plate 340. The first hooks 764 are closer to the protrusions 740 than the second hooks 766.
In an embodiment, the cam driving unit 730 may rotate the cam 720 so that the rolling ball 622 can rotate upward on the front surface 742 of the protrusion 740. As the cam 720 is rotated in the first rotation direction 82, the chuck pin 500 is moved from the supporting position to the rest position, and the spring 762 of the cam return unit 760 extends. If a driving force of the cam driving unit 730 is interrupted, the cam 720 is rotated in the second rotation direction 84 by a resilient force of the spring 762, and the rolling ball 622 is moved away from the front surface 742 of the protrusion 740. In the current embodiment, when the chuck pin 500 is in the supporting position, the spring 762 is in equilibrium. Therefore, although the cam driving unit 730 malfunctions, a substrate (W) can be stably supported by the chuck pin 500.
In another embodiment, the cam 720 can be returned to its original position using a magnetic force. For this, as shown in
In another embodiment, the cam driving unit 730 may rotate the cam 720 to move the chuck pin 500 from the rest position to the supporting position, and the cam return units 760 may rotate the cam 720 to move the chuck pin 500 from the supporting position to the rest position.
In another embodiment, the chuck pin 500 may be moved by the cam driving unit 730 in both directions from the rest position to the supporting position and from the supporting position to the rest position.
As explained above, when the cam 720 is rotated in the first rotation direction 82, the rolling ball 622 rotates along the front surface 742 of the protrusion 740 away from the cam 720. When the cam 720 is rotated in the second rotation direction 84, the chuck pin return units 780 moves the chuck pin 500 from the rest position to the supporting position using a resilient force. In the embodiment shown in
In another embodiment shown in
In another embodiment shown in
If the movable rods 620 are moved toward the center of the body 300 by a single force, the chuck pins 500 may not be individually moved. In this case, although the chuck pins 500 are moved to the supporting positions, some of the chuck pins 500 may not be in contact with the edge of a substrate (W) placed at the spin head 40 due to machining errors of components such as the chuck pins 500, the movable rods 620, and the cam 720. Therefore, when the spin head 40 is rotated, stresses may be concentrated on some of the chuck pins 500 that make contact with the edge of the substrate (W). Thus, the chuck pins 500 can be easily damaged and broken. However, in the present invention, since the chuck pin return units 780 are respectively disposed at the movable rods 620, the movable rods 620 can be moved toward the center of the body 300 by returning forces individually applied to the movable rod 620. Therefore, although components such as the chuck pins 500, the movable rods 620, and the cam 720 are not uniform in size due to machining errors, all the chuck pins 500 can be in contact with the edge of a substrate (W) when the chuck pins 500 are moved to the supporting positions.
If the spin head 40 is rotated at high speed, the chuck pins 500 can be moved outward in radial directions of the body 300 by a centrifugal force. In this case, a substrate (W) placed at the spin head 40 may be unstably supported by the chuck pins 500. To prevent this situation, the contact maintaining member 680 holds the chuck pin 500 at the supporting position to maintain contact between the chuck pin 500 and the edge of the substrate (W) when the spin head 40 is rotated. The contact maintaining member 680 includes a fixed pin 680a and a maintaining bar 680b. The fixed pin 680a is fixed to the movable rod 620 and is protruded from the movable rod 620. When the spin head 40 is rotated, the maintaining bar 680b pushes the fixed pin 680a toward the center of the body 300.
For example, the maintaining bar 680b may be configured to push the fixed pin 680a using a centrifugal force when the spin head 40 is rotated. Referring to
When the spin head 40 rotates, the guide portion 686 receives a centrifugal force greater than a centrifugal force acting on the pressing portion 684. The guide portion 686 is heavier than the pressing portion 684. When viewed from the top, the guide portion 686 may be wider than the pressing portion 684. A free end of the guide portion 686 may be wider than the pressing portion 684.
The contact maintaining member 680 is oriented such that the pressing portion 684 is directed to the movable rod 620 and the guide portion 686 is disposed away from the movable rod 620. The pressing portion 684 is disposed opposite to the cam 720 with respect to the fixed pin 680a. The distance between the guide portion 686 and the movable rod 620 increases in a direction away from the center of the body 300.
Since the fixed pin 680a of the contact maintaining member 680 is pushed toward the center of the body 300 using a centrifugal force when the spin head 40 is rotated, an additional driving unit is unnecessary for driving the contact maintaining member 680, and thus the contact maintaining member 680 can have a simple structure. Alternatively, an additional driving unit can be used to rotate the contact maintaining member 680 so as to push the movable rod 620 toward the center of the body 300 when the spin head 40 is rotated.
The diameter of a substrate (W) can be varied due to the previous process. For example, if the substrate (W) is heat treated in the previous process, the diameter of the substrate (W) may be varied due to thermal expansion. For this, the distance adjustor 660 can be used to adjust the supporting position of the chuck pin 500. The distance adjustor 660 includes an adjustment block 662 and fixing members 664. The adjustment block 662 includes a slit shaped penetration hole. The length of the penetration hole is parallel with the moving direction of the movable rod 620. The fixing members 664 are used to fix the adjustment block 662 to the body 300. Each of the fixing members 664 includes a head portion 664aand an insertion portion 664b extending from the head portion 664a. The head portion 664a is greater than the width of the penetration hole. The insertion portion 664b is inserted through the penetration hole and is coupled to a screw groove (not shown) formed in the body 300. The head portion 664a can be pressed against the adjustment block 662 by inserting the insertion portion 664b into the body 300. In this way, the adjustment block 662 can be fixed to the body 300. The number of the fixing members 664 may be two. A stopper 666 is disposed at the movable rod 620. The adjustment block 662 is disposed between the stopper 666 and the cam 720. When the movable rod 620 is moved toward the center of the body 300 by a resilient force of the chuck pin return unit 780, the stopper 666 makes contact with an end of the adjustment block 662 so that the movement of the movable rod 620 can be restricted.
The supporting position of the chuck pin 500 can be adjusted as follows. First, the fixing member 664 is unfastened to remove a pressing force applied to the adjustment block 662 by the head portion 664a of the fixing member 664. Next, the adjustment block 662 is moved to a desired position. If the adjustment block 662 is moved away from the center of the body 300 in a radial direction of the body 300, the supporting position of the chuck pin 500 is also moved away from the center of the body 300. On the other hand, if the adjustment block 662 is moved toward the center of the body 300 in the radial direction of the body 300, the supporting position of the chuck pin 500 is also moved toward the center of the body 300. Then, the fixing member 664 is fastened to fix the adjustment block 662 to the body 300.
According to the present invention, when a substrate is supported by the chuck pins, all the chuck pins can stably make contact with the edge of the substrate. Therefore, the substrate can be stably supported, and stress concentration on some of the chuck pins can be prevented.
Furthermore, according to the present invention, even when a substrate is rotated at high speed, the chuck pins can be stably held in the supporting positions and make contact with the edge of the substrate.
In addition, according to the present invention, although the upper plate of the spin head expands due to thermal deformation, the lower plate coupled with the chuck pins may not expand.
The above-disclosed subject matter is to be considered illustrative, and not restrictive, and the appended claims are intended to cover all such modifications, enhancements, and other embodiments, which fall within the true spirit and scope of the present invention. Thus, to the maximum extent allowed by law, the scope of the present invention is to be determined by the broadest permissible interpretation of the following claims and their equivalents, and shall not be restricted or limited by the foregoing detailed description.
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