The present invention relates to an analyzer (1) including a photometry mechanism (6) for photometrically analyzing a reagent pad of an analytical tool to which a sample is applied, and a table (4) including a placing portion (41) at which the analytical tool is to be placed. The light emitting surface (68) or the light incident surface (68) of the light from the light emitting elements (66) of the photometry mechanism (6) is cleaned, with a cleaning tool (22) placed at the table (4). The present invention further provides a cleaning tool (22) for cleaning the photometry mechanism (6) of the analyzer (1).
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1. An analyzer in combination with a cleaning tool, the analyzer comprising:
a photometry mechanism including a light emitting surface or a light incident surface for photometrically analyzing a reagent pad of an analytical tool with a sample applied to the reagent pad; and
a table including an analyzing position at which the analytical tool is placed for analysis;
wherein the cleaning tool is configured to be placed at the analyzing position in exchange for the analyzing tool and includes a press portion that is pressed against the light emitting surface or the light incident surface for cleaning when the photometry mechanism is located at a position corresponding to the analyzing position; and
wherein the analyzing position is provided by a slot formed on the table for exchangeable fitting the analyzing tool or the cleaning tool.
2. The analyzer according to
3. The analyzer according to
4. The analyzer according to
wherein the photometry mechanism includes a contact portion for corning into contact with the guide,
wherein the contact portion is received in the recess when the photometry mechanism is located at the analyzing position.
5. The analyzer according to
6. The analyzer according to
7. The analyzer according to
8. The analyzer according to
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The present invention relates to a technique for cleaning a photometry mechanism in an analyzer for analyzing a sample by an optical method using the photometry mechanism.
As shown in
The light emitted from the light emitting elements 95 and the light reflected at a reagent pad 99 of the test piece 92 are supposed to pass through the transparent plate 98. However, when the surface 98a of the transparent plate 98 is dirty, the light is absorbed or reflected at the transparent plate 98. In light of this, it is desirable to frequently clean the surface 98a of the transparent plate 98.
In the analyzer 9, to prevent the light receiving elements 96 from receiving external light, the distance between the upper surface 90a of the table 90 and the surface 98a of the transparent plate 98 of the photometry mechanism 93 is set to be small, and the photometry mechanism 93 is located at a back portion of the analyzer. In such an arrangement, the cleaning of the transparent plate 98 is performed, with the clearance between the photometry mechanism 93 and the table 93 being lit with a flashlight, by inserting a cotton swab wet with a cleaning liquid into the clearance and rubbing the transparent plate 98 with the swab. As readily seen, the cleaning of the transparent plate 98 is not easy. Accordingly, the user may neglect the cleaning of the transparent plate 98, thinking of the difficulty of the operation. As a result, the reliability of the analysis deteriorates. Further, since the transparent plate 98 is not within easy access and the cleaning is performed manually, it depends on users how well the cleaning is finished. Unfavorably this dependency results in the difference in the analysis accuracy.
An object of the present invention is to reduce the burden on the user in cleaning the photometry mechanism of an analyzer and to enhance the analysis accuracy.
According to a first aspect of the present invention, there is provided an analyzer comprising: a photometry mechanism for photometrically analyzing a reagent pad of an analytical tool with a sample applied to the reagent pad; and a table including a placing portion at which the analytical tool is to be placed. The table supports a cleaning tool including a press portion. The photometry mechanism includes a light emitting surface or a light incident surface that is cleaned with the press portion being pressed against the light emitting surface or the light incident surface.
Preferably, the press portion of the cleaning tool is configured to rub the light emitting surface or the light incident surface of the photometry mechanism.
The photometry mechanism may be movable up and down relative to the table. The up and down movement of the photometry mechanism relative to the table may be achieved by making only the photometry mechanism movable up and down, making only the table movable up and down, or making both of the photometry mechanism and the table movable up and down.
Preferably, in the analyzer of the present invention, the light emitting surface or the light incident surface is cleaned with the cleaning tool placed at the placing portion. Preferably, in this case, when the cleaning tool is placed at the placing portion and the photometry mechanism is located at a position corresponding to the placing portion, the press portion of the cleaning tool is pressed against the light emitting surface or the light incident surface.
The table may include a guide extending in the movement direction of the table and including a recess. In this case, the photometry mechanism includes a contact portion for coming into contact with the guide, and the contact portion is received in the recess when the placing portion is located at a position where the photometrical analysis of the reagent pad is performed.
Preferably, in the analyzer of the present invention, the light emitting surface or the light incident surface of the photometry mechanism is heated when the press portion of the cleaning tool is impregnated with a cleaning liquid and pressed against the light emitting surface or the light incident surface.
In the analyzer of the present invention, the degree of dirtiness of the light emitting surface or the light incident surface of the photometry mechanism may be checked by utilizing a reference plate having a predetermined reflectance. Preferably, in this case, the checking of the degree of dirtiness of the light emitting surface or the light incident surface may be performed when the power source is turned on or immediately after the light emitting surface or the light incident surface is cleaned. As the reference plate, use may be made of one which is to be irradiated with light from a light source in checking the output of the power source of the photometry mechanism.
According to a second aspect of the present invention, there is provided a method for cleaning the light emitting surface or the light incident surface of the photometry mechanism in the analyzer according to the first aspect of the present invention. The cleaning method includes a first step of rubbing the light emitting surface or the light incident surface with a press portion of the cleaning tool, with the press portion impregnated with a cleaning liquid. The method further includes at least one of the second and the third steps below.
The second step, which is performed before the first step, comprises heating the light emitting surface or the light incident surface of the photometry mechanism, with the press portion impregnated with cleaning liquid and pressed against the light emitting surface or the light incident surface. The third step, which is performed after the first step, comprises checking the degree of dirtiness of the light emitting surface or the light incident surface utilizing a reference plate having a predetermined reflectance.
According to a third aspect of the present invention, there is provided a cleaning tool for an analyzer comprising a photometry mechanism and a table, wherein the photometry mechanism is configured to photometrically analyze a reagent pad of an analytical tool with a sample applied to the reagent pad, and the table includes a placing portion at which the analytical tool is placed. The cleaning tool is used for cleaning a light emitting surface or a light incident surface of the photometry mechanism. The cleaning tool comprises a base plate, and at least one press portion supported by the base plate.
The base plate may have a shape substantially similar to that of a substrate of the analytical tool that supports the reagent pad. The press portion is provided at least at a location corresponding to the reagent pad of the analytical tool. Preferably, the press portion has a shape similar to that of the reagent pad in plan view and is provided at a location corresponding to the reagent pad.
Preferably, the press portion is thicker than the reagent pad of the analytical tool. For instance, the thickness of the press portion may be 2 to 30 times the thickness of the reagent pad, and preferably, 3 to 20 times the thickness of the reagent pad.
Preferably, the press portion has at least either of elasticity and water absorbency. To make the press portion elastic, part or the entirety of the press portion may be made of non-porous material such as rubber. To make the press portion water-absorbent, part or the entirety of the press portion may be made of a cloth made of a highly water-absorbent material such as cotton yarn or a cloth made of ultrafine fiber such as dividing thread. To make the press portion elastic and water-absorbent, the press portion may be made of a combination of an elastic material and a water-absorbent material or entirely made of a porous material such as expanded resin (sponge).
The press portion may comprise an elastic layer and a water-absorbent layer laminated on the elastic layer. In this case, the elastic layer may be made of silicone rubber or silicone sponge, whereas the water-absorbent layer may be made of cloth made of dividing thread (ultrafine fiber) of nylon and polyester, non-woven fabric made of resin such as polyester, nylon or rayon, or non-woven fabric obtained by bonding a web made of the exemplified resin with a resin such as acrylic-based resin.
The press portion may not be in the form of a pad. For instance, the press portion may be in the form of a brush made of a plurality of linear strips or may be in the form of a strip extending wider than the reagent pad.
The analyzer 1 shown in
The housing 3 defines the outer shape of the analyzer 1, accommodates various elements, and is formed with openings 30 and 31:
The opening 30 allows the test piece table 4 to partially project from the housing 3 and is provided at a front surface 33 of the housing 3. The opening 30 is selectively opened or closed by a lid 34. When the opening 30 is in the open state, the inside and outside of the housing 3 communicate with each other, whereby it is possible to select one from the two states, i.e. a state in which the test piece table 4 is accommodated in the housing 3 and another state in which most part of the test piece table 4 projects from the housing 3. When the test piece table 4 projects from the housing 3, the first slit 41 and the second slits 42 of the test piece table 4, which will be described later, are exposed.
The other opening 31 is utilized for taking a rack 35 out of the housing 3 and back into it. The opening 31 is provided at a side surface 36 of the housing 3 and is selectively opened or closed by the rack 35. The rack 35 is utilized for holding tips 52 and containers (not shown) containing a sample or a cleaning liquid. The rack is also utilized for storing used tips 52.
The housing 3 is further provided with an operation panel 37 and a display 38. The operation panel 37 includes various operation buttons 37A for setting measurement conditions or controlling the operation of the analyzer 1. The display 38 displays e.g. the measurements, the results of operation of the control buttons 37A or information such as error message.
As shown in
The first slit 41 holds a test piece 20 for multi-component measurement shown in
As shown in
The cleaning tool 22 shown in
The cleaning pads 22 are elastic and water-absorbent. The cleaning pad 22 may be comprise a single layer which is elastic and water-absorbent or have a two-layer structure comprising an elastic layer 22Ba and a water-absorbent layer 22Bb laminated on the elastic layer. The elastic layer 22Ba may also have water absorbency in addition to the elasticity.
To make the cleaning pad 22B of a single-layer structure, use may be made of cotton, expanded resin (sponge) or knitted fabric for the material. To make the cleaning pad 22B of a double-layer structure, use may be made of elastomer such as silicone rubber or expanded resin such as silicone sponge for the material of the elastic layer 22Ba, and filter paper, woven fabric or non-woven fabric for the material of the water-absorbent layer 22Bb. Specifically, the water-absorbent layer 22Bb may be made of cloth using ultrafine fiber which is a dividing thread of polyester and nylon, non-woven fabric made of resin such as polyester, nylon or rayon, or non-woven fabric obtained by bonding a web made of the exemplified resin with a resin such as acrylic-based resin. The cleaning pad 22B may carry a surface-active agent such as Triton X-100 (polyoxyethylene p-t-octylphenyl ether).
Each of the second slits 42 shown in
As shown in
As shown in
The black and the white reference plates 45A and 45B shown in
The dispenser 5 shown in
The dispenser 5 includes a nozzle 50 and a pump unit 51. The pump unit 51 applies suction force or discharging force to the nozzle 50.
The nozzle 50 shown in
The pump unit 51 is designed to move up and down a direct-acting shaft 54 by a pulse motor 53. The direct-acting shaft 54 is connected to a piston 56, and the piston 56 moves up and down relative to a syringe 55 in accordance with the up-down movement of the direct-acting shaft 54. In this way, by controlling the pulse motor 53, the pump unit 51 moves up and down the piston 56 to suck liquid into the tip 52 attached to the nozzle 50 or discharge liquid from the tip 52.
The photometry mechanism 6 shown in
The case 60 is entirely elongated in the directions D3, D4 and includes an upper wall 63, a pair of inclined walls 64A, 64B and a lower opening 65.
The upper wall 63 extends horizontally in the directions D3, D4 and supports a plurality of light emitting elements 66 (six in the figure) aligned in the directions D3, D4. The light emitting elements 66 are arranged correspondingly to the arrangement of the reagent pads 20B of the test piece 20. Each of the light emitting elements 66 is so supported as to emit light vertically downward to vertically illuminate the reagent pads 20B, 21B of the test pieces 20, 21 or the reference plates 45A, 45B (see
Each of the inclined walls 64A and 64B is inclined 45 degrees with respect to the upper wall 63 and extends in the directions D3, D4. The inclined wall 64A supports a plurality of light receiving elements 67 (six in the figure). The light receiving elements 67 are so supported that, of the light rays reflected at the reagent pads 20B, 21B of the test pieces 20, 21 or the reference plates 45A, 45B, the light rays reflected at 45 degrees are received by the light receiving elements (see
The lower opening 65 allows the light emitted from the light emitting elements 66 to exit the case 60 and allows the light reflected at the reagent pads 20B, 21B of the test pieces 20, 21 to enter the case 60. The transparent plate 68 is fixed to the lower opening 65. The transparent plate 68 may be made of a transparent resin or glass.
The holder 61 makes it possible for the photometry mechanism 6 including the case 60 to move up and down. The holder includes a through-hole 61A for holding the case 60. The holder 61 further includes openings 61B, 61C and grooves 61D at opposite ends in the directions D3, D4. The openings 61B allow the rotation of the rollers 62. As shown in
As shown in
The height of the rails 43A is so set that, when the rollers 62 are located on the rails 43A, the surface of the transparent plate 68 of the photometry mechanism 6 is positioned higher than the upper surface of the cleaning pads 22B of the cleaning tool 22 placed at the first slit 41 (see
The operation of the analyzer 1 will be described below with reference to flowcharts.
As shown in
As shown in
Then, in the analyzer 1, whether or not the reflectance of the black reference plate 45A is not higher than a predetermined value is determined (S22). When the reflectance is equal to or below the predetermined value (S22: YES), it is determined whether or not the reflectance of the white reference plate 45B is not lower than a predetermined value (S23). When the reflectance of the white reference plate 45B is equal to or above the predetermined value in S23, the analyzer 1 determines that there is no dirt on the transparent plate 68 (S24). When the reflectance of the black reference plate 45A is higher than the predetermined value in S22 (S22: NO) or the reflectance of the white reference plate 45B is lower than the predetermined value in S23 (S23: NO), the transparent plate 68 is determined to be dirty (S25).
The thresholds for the reflectance of the black and the white reference plates 45A and 45B, which is utilized as the basis for determining whether the transparent plate 68 is dirty or not, may be set in light of the wavelength of the irradiating light and the reflectance of the black and white reference plates 45A, 45B when they are clean (and further the composition of the reference plates 45A and 45B, etc.).
As shown in
When it is determined that there is no dirt on the transparent plate 68 (S3: NO) or when notice is given that the transparent plate 68 is dirty (S4), the analyzer 1 determines whether or not the cleaning mode is selected by the user (S5). The selection of the cleaning mode may be performed by operating the operation buttons 37A by the user.
When it is determined that the cleaning mode is selected (S5: YES), the analyzer 1 performs the cleaning (S6).
As shown in
When it is determined in S60 that the cleaning tool 22 is placed (S60: YES), a cleaning liquid (e.g. water, solution of a surface-active agent or solvent) is applied to the cleaning pads 22B of the cleaning tool 22 (S62). The application of the cleaning liquid to the cleaning pads 22B is performed by sucking the cleaning liquid into the tip 52 attached to the nozzle 50 of the dispenser 5 and then discharging the cleaning liquid onto the cleaning pads 22 (see
After the application of the cleaning liquid to the cleaning pads 22B (S62) is completed, the test piece table 4 is moved to bring the cleaning pads 22B into close contact with the transparent plate 68 of the photometry mechanism 6 (S63).
In this process, as shown in
Then, in the analyzer 1, the transparent plate 68 is heated, as shown in
Then, in the analyzer 1, the dirt is wiped off the transparent plate 68 by the cleaning pads 22B (S64). As shown in
After the wiping of the dirt (S64) is completed, checking of the transparent plate 68 for dirt is performed (S65). The dirt checking (S65) is performed similarly to the above-described step S2 (see
When the transparent plate 68 is determined to be dirty in S66 (S66: YES), the wiping of dirt in S64 and the dirt checking in S65 are repeated until it is determined in S66 that the transparent plate 68 is not dirty (S66: NO) or it is determined that the wiping is performed a predetermined number of times (S67: YES).
Since the dirt checking is performed (S65) after the wiping of the dirt (S64), even when dirt cannot be removed sufficiently by the single wiping, dirt is reliably removed from the transparent plate 68 by the wiping (S64) performed thereafter. Further, when the dirt cannot be removed sufficiently, the analyzer notifies the user that the accurate measurement may not be possible.
When it is determined in S66 that the transparent plate 68 is not dirty (S66: NO) or it is determined that the wiping of the dirt (S64) is performed a predetermined number of times (S67: YES), the analyzer gives a notice to that effect (S68). Specifically, when it is determined in S66 that the transparent plate 68 is not dirty (S66: NO), the analyzer gives a notice in S68 that the dirt is properly removed from the transparent plate 68. When it is determined in S67 that the wiping (S64) is performed a predetermined number of times (S67: YES), the analyzer gives a notice in S68 that the dirt is not sufficiently removed from the transparent plate 68. Such notices can be given by displaying a code or a sentence representing the notice at the display 38.
Then, in the analyzer 1, whether or not the cleaning tool 22 is removed from the first slit 41 of the test piece table 4 is determined (S69). When it is determined that the cleaning tool 22 is not removed (S69: NO), the determination of S69 and S70 is repeated until a predetermined time elapses from the notice in S68 (S70: YES) or until it is determined that the cleaning tool 22 is removed (S69: YES).
When it is determined in S69 that the cleaning tool 22 is removed (S69: YES), the cleaning process is finished. Further, when it is determined in S61 that the cleaning tool 22 is not placed even after the lapse of a predetermined time from the selection of the cleaning mode (S61: YES) or when it is determined that the cleaning tool 22 is not removed after the lapse of a predetermined time from the notice in S68 (S70: YES), the analyzer gives a notice to that effect (S71) and then finishes the cleaning process. Specifically, when it is determined in S61 that the cleaning tool 22 is not placed even after the lapse of a predetermined time (S61: YES), the analyzer gives a notice in S71 that the cleaning is not performed properly because the cleaning tool 22 is not placed. When it is determined in S61 that the cleaning tool 22 is not removed even after the lapse of a predetermined time (S70: YES), the analyzer gives a notice in S71 that the cleaning tool 22 is not removed.
As shown in
When it is determined that the analysis mode is not selected (S7: NO), the analyzer 1 determines whether or not the cleaning mode is selected (S5) or whether or not the analysis mode is selected (S7).
When it is determined that the analysis mode is selected (S7: YES), the analyzer 1 performs the analysis (S8).
As shown in
When it is determined in S80 that the test pieces 20, 21 are placed at the first and the second slits 41, 42 (S80: YES), sample is applied to the reagent pads 20B, 21B of the test pieces 20, 21 (S81). The application of the sample to the reagent pads 20B, 21B is performed by sucking the sample into the tip 52 attached to the nozzle 50 of the dispenser 5 and then discharging the sample onto the reagent pads 20B, 21B (see
After the application of the sample (S81) is finished, the test piece table 4 is moved in the direction D1 as shown in
The concentration computed in this way is displayed at the display 38 or printed on non-illustrated recording paper. Further, in the cleaning step (S6), when it is determined that the dirt is not sufficiently removed from the transparent plate 68 (S66: NO) or when the cleaning is finished without wiping off the dirt (S61: YES) or when the analysis mode is selected (S7: YES) without selecting the cleaning mode (S5: NO) although the transparent plate 68 is determined to be dirty (S3: YES) the notice that the analysis result may not be accurate may be added.
In the above-described analyzer 1, the transparent plate 68 of the photometry mechanism 6 is checked for dirt when the power source is turned on, and when the transparent plate 68 is dirty, a notice that the cleaning of the transparent plate 68 is necessary is given. Thus, the analyzer 1 informs the user of the fact that the cleaning is necessary (the fact that accurate analysis may not be possible). Therefore, the possibility that the user performs sample analysis in the state in which the transparent plate 68 is dirty is reduced, so that the accuracy of sample analysis is increased.
Further, the cleaning of the transparent plate 68 is performed automatically in the analyzer 1 just by selecting the cleaning mode by e.g. operating the operation buttons 37A and placing the cleaning tool 22 on the test piece table 4. Therefore, the burden on the user in cleaning the transparent plate 68 is reduced, so that the possibility that the user neglects the cleaning reduces. Further, since the cleaning is performed automatically by the apparatus, the degree of cleaning does not differ from user to user. Therefore, in the analyzer 1, as compared with the case where the user manually cleans the transparent plate 68, the accuracy of analysis improves.
The present invention is not limited to the structure employed in the foregoing embodiment. For instance, the structure for moving the photometry mechanism 6 up and down relative to the test piece table 4 is not limited to the example described as the analyzer 1, and other structures may be employed. It is only necessary that the photometry mechanism 6 is movable up and down relative to the test piece table 4. Therefore, the test piece table 4 may be movable up and down or both of the photometry mechanism 6 and the test piece table 4 may be movable up and down.
Further, use may be made of a cleaning tool in which the portions to which the cleaning liquid is to be applied (wet pads) and the portions to which the cleaning liquid is not to be applied (dry pads) are aligned in the width direction of the substrate. Moreover, the cleaning tool does not necessarily need to have a porous structure having water absorbency. Further, the portion to be pressed against the transparent plate of the photometry mechanism (press portion) does not necessarily need to be in the form of a pad. For instance, the press portion may be in the form of a non-porous pad made of e.g. rubber, may be in the form of a brush made of a plurality of linear strips or may have a shape extending in the longitudinal direction of the substrate.
Tanji, Hideki, Fujiwara, Toshinori, Usagawa, Naoyuki
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Oct 12 2007 | USAGAWA, NAOYUKI | ARKRAY, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 020046 | /0983 |
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