A hardcoat composition comprises (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photoacid generator.
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1. A hardcoat composition comprising:
(a) one or more epoxy silane compounds,
(b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, having the following general structure:
(Mep)a(Mh)b(MHFPO)cG wherein:
Mep is a radical from acrylate or methacrylate monomer with a curable epoxy group;
MHFPO is a radical from perfluoropolyether-containing acrylate or methacrylate monomer;
Mh is a radical from one or more hydrocarbon acrylate monomers;
G is a radical from a chain transfer agent;
a is at least 1; b is 0 to 20; and c is at least 1, and
(c) photo-acid generator.
16. A hardcoat composition comprising the reaction product of:
(a) one or more epoxy silane compounds,
(b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, having the following general structure:
(Mep)a(Mh)b(MHFPO)cG wherein:
Mep is a radical from acrylate or methacrylate monomer with a curable epoxy group;
MHFPO is a radical from perfluoropolyether-containing acrylate or methacrylate monomer;
Mh is a radical from one or more hydrocarbon acrylate monomers;
G is a radical from chain transfer agent;
a is at least 1; b is 0 to 20; and c is at least 1, and (c) photo-acid generator.
24. A phototool comprising an optically clear substrate having a designed pattern, and a cured protective layer comprising a hardcoat composition in cured form on the substrate;
wherein the hardcoat composition comprises an epoxy-functionalized perfluoropolyether acrylate oligomer and a photo-acid generator, wherein the epoxy-functionalized perfluoropolyether acrylate oligomer comprises a reaction product of components comprising:
(i) one or more acrylate or methacrylate monomers with a curable epoxy group;
(ii) one or more perfluoropolyether-containing acrylate or methacrylate monomers; and
(iii) a chain transfer agent;
wherein the epoxy-functionalized perfluoropolyether acrylate oligomer comprises no units derived from alkyl(meth)acrylate monomers.
2. The hardcoat composition of
3. The hardcoat composition of
4. The hardcoat composition of
5. The hardcoat composition of
6. The hardcoat composition of
8. The hardcoat composition of
(R)qSi(R1)p-q wherein
R is selected from the group consisting of alkyl, aryl, arylalkylenyl, and alkylarylenyl;
Rl is a hydrolysable group selected from the group consisting of halide, hydroxyl, alkoxy, aryloxy, acyloxy, and polyalkyleneoxy;
p is 3 or 4; and
q is 0,1,or 2.
11. The hardcoat composition of
12. The hardcoat composition of
##STR00024##
wherein
HFPO is perfluoropolyether made from the oligomerization of hexafluoropropene oxide having an average molecular weight of 1,000 or higher;
X and Y are independently divalent linkage groups;
n is at least 1, and m is at least 1.
13. The hardcoat composition of
14. The hardcoat composition of
15. The hardcoat composition of
17. A coated article comprising a substrate and a cured protective layer comprising the hardcoat composition of
18. A phototool comprising an optically clear substrate having a designed pattern, and a cured protective layer comprising the hardcoat composition of
20. The phototool of
21. A method of making a printed circuit comprising placing the phototool of
23. The method of
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This application is a national stage filing under 35 U.S.C. 371 of PCT/US2009/036733, filed Mar. 11, 2009, which claims priority to Provisional Application No. 61/035,578, filed Mar. 11, 2008, the disclosure of which is incorporated by reference in its/their entirety herein.
This invention relates to hardcoat compositions that are useful, for example, as a protective layer for a phototool.
In the printed circuit industry, photographic masks or stencils bearing a circuit pattern are known as phototools. Such a stencil, through which a photoresist can be exposed, provides an intricate complex image representing an electrical circuit. The image often consists of many fine lines and junctions spaced closely together. During its use to make printed circuit boards, the phototool is placed face down on a photoresist layer and a contact print is made by exposing the photoresist to high intensity light through the phototool. In this way, a single phototool can be used to make multiple contact prints.
After processing, a phototool must be carefully inspected through a microscope to ensure that there are no breaks in the fine lines of the image. The continued use of the phototool can cause tiny scratches and abrasions on the phototool surface. The photoresists on which the phototool is placed are usually laminated on sheet copper and small burrs or rough edges of the copper sheet can cause scratches as the phototool is transferred from one photoresist to the next. The phototool is also frequently wiped with a soft cloth to make sure it is dust and lint free. Small particles of dirt can cause scratching as they are wiped across the phototool surface. Because of this general wear and tear on the phototool surfaced during normal use, the phototool must be frequently inspected to ensure line continuity. Depending upon the size and the intricacy of the phototool, such microscopic inspections can take 2 to 3 hours.
Due to the fact that phototools are vulnerable to scratching and that abrasion is a serious problem during the normal use of a phototool, protective films and overcoats are often employed to protect the phototool. For example, polyester films coated with various kinds of pressure sensitive adhesives have been laminated to image-bearing surfaces to protect the image. Because of their thickness, however, laminating films can cause optical distortion and hence loss of resolution. Thinner protective coatings can be obtained by coating the surfaces of phototools with liquid compositions. After application, the thin liquid coating is hardened to yield the desired protective coat. Epoxy silanes and acrylate esters (for example, polyurethane acrylates) are useful in such coatings because of their resistance to abrasion. Many protective overcoats have limited release properties, however, and can therefore stick to the surface of the photoresist, particularly when relatively sticky materials such as high viscosity solder mask inks are present.
In view of the foregoing, we recognize that there is a need for hardcoat compositions that can be used to protect surfaces and objects from scratching and abrasion. We also recognize that for phototool applications, it would be advantageous if protective layers comprising the hardcoat compositions release easily from relatively sticky materials such as solder mask inks.
Briefly, in one aspect, the present invention provides a hardcoat composition comprising (a) one or more epoxy silane compounds, (b) one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and (c) photo-acid generator. The epoxy-functionalized perfluoropolyether acrylate oligomer has the following general structure:
(Mep)a(Mh)b(MHFPO)cG
wherein:
Mep is a radical from acrylate or methacrylate monomer with a curable epoxy group;
MHFPO is a radical from perfluoropolyether-containing acrylate or methacrylate monomer;
Mh is a radical from one or more hydrocarbon acrylate monomers with or without functional groups;
G is a radical from chain transfer agent with or without functional groups;
a is at least 1; b is 0 to 20; and c is at least 1.
In another aspect, the present invention provides a hardcoat composition comprising the reaction product of components (a), (b), and (c).
The hardcoat compositions of the invention can provide abrasion-resistance, hardness, clarity, low surface energy with low adhesion, release properties, anti-reflection, resistance to staining and soiling, and repellency to stains, soils, solvents, oil, and water. Protective layers comprising the cured hardcoat compositions can be used to protect various hard substrates. They are particularly well-suited for protecting phototools from scratching and abrasion. Protective layers comprising the cured hardcoat compositions of the invention have good release properties and therefore do not stick to photoresist surfaces even when sticky materials such as high viscosity solder masks are present. Phototools with protective layers comprising the cured hardcoat compositions of the invention can advantageously be used to make multiple contact prints (for example, 5 times or more (preferably, 10 times or more; more preferably, 20 times or more)).
Cured protective layers formed from the hardcoat compositions of the invention have low surface energy with receding water contact angles greater than about 60° (preferably, greater than about 80°; more preferably, greater than about 90°) and receding hexadecane contact angles greater than about 50° (preferably, greater than about 55°; more preferably, greater than about 60°). The protective layer also exhibits good release properties/low peel force.
In yet another aspect the present invention provides novel epoxy-functionalized perfluoropolyether acrylate oligomers comprising the reaction product of (i) one or more acrylate or methacrylate monomers with a curable epoxy group and (ii) one or more perfluoropolyether-containing acrylate or methacrylate monomers; wherein the epoxy-functionalized perfluoropolyether acrylate oligomer comprises no units derived from alkyl(meth)acrylate monomers that are not reactive with epoxide groups.
Hardcoat Compositions
The hardcoat compositions of the invention comprise one or more epoxy silane compounds, one or more epoxy-functionalized perfluoropolyether acrylate oligomers, and photo-acid generator. The compositions may also comprise solvent.
Epoxy Silanes
The hardcoat compositions of the invention comprise curable epoxy silane compounds. Curable epoxy silanes are compounds or materials having at least one polymerizable epoxy group and at least one polymerizable silane group, the bridging of these groups being through a non-hydrolyzable aliphatic, aromatic, or aliphatic and aromatic divalent hydrocarbon linkage which may have N, O, and/or S atoms in the linkage chain. The O atoms for example would be within the chain only as ether or ester linkages. These linkage chains may be generally substituted as is well known in the art, as these substituents on the chain do not greatly affect the functional ability of the epoxy-terminated silanes to under the essential reactions necessary to polymerization through the siloxane or epoxy terminal groups. Examples of substituents which may be present on the linkage or bridging moieties are groups such as NO2, CH3(CH2)nCH2, methoxy, ester, amide, urethane, ether and thioether, sulfone, halogen, and the like. In general structural formulae appearing within this description of the invention, such substitution of the bridging moieties is implied unless specifically excluded by language such as “unsubstituted divalent hydrocarbon radical”.
The epoxy silane compounds may be monomeric, oligomeric, or polymeric. They may be, for example, acrylates, urethanes, ester-based, or the like.
The epoxy silane compounds can be of the general formula:
##STR00001##
wherein:
Preferably the curable epoxy silane compounds are epoxy-terminated silane compounds having terminal polymerizable epoxy groups and terminal polymerizable silane groups, the bridging of these groups being as described above.
Useful epoxy-terminated silane compounds include epoxy-terminated alkoxy silanes of the following structure:
G-L1-Si(R2)m(OR3)3-m
wherein:
Many epoxy-functional alkoxysilanes are suitable, including glycidoxymethyl-trimethoxysilane, glycidoxymethyltriethoxysilane, glycidoxymethyl-tripropoxysilane, glycidoxymethyl-tributoxysilane, β-glycidoxyethyltrimethoxysilane, β-glycidoxyethyltriethoxysilane, β-glycidoxyethyl-tripropoxysilane, β-glycidoxyethyl-tributoxysilane, β-glycidoxyethyltrimethoxysilane, α-glycidoxyethyl-triethoxysilane, α-glycidoxyethyl-tripropoxysilane, α-glycidoxyethyltributoxysilane, γ-glycidoxypropyl-trimethoxysilane, γ-glycidoxypropyl-triethoxysilane, γ-glycidoxypropyl-tripropoxysilane, γ-glycidoxypropyltributoxysilane, β-glycidoxypropyl-trimethoxysilane, O-glycidoxypropyl-triethoxysilane, β-glycidoxypropyl-tripropoxysilane, β-glycidoxypropyltributoxysilane, α-glycidoxypropyl-trimethoxysilane, α-glycidoxypropyl-triethoxysilane, α-glycidoxypropyl-tripropoxysilane, α-glycidoxypropyltributoxysilane, γ-glycidoxybutyl-trimethoxysilane, α-glycidoxybutyl-triethoxysilane, α-glycidoxybutyl-tripropoxysilane, α-glycidoxybutyl-tributoxysilane, α-glycidoxybutyl-trimethoxysilane, γ-glycidoxybutyl-triethoxysilane, γ-glycidoxybutyl-tripropoxysilane, γ-propoxybutyl-tributoxysilane, α-glycidoxybutyl-trimethoxysilane, α-glycidoxybutyl-triethoxysilane, 8-glycidoxybutyl-tripropoxysilane, α-glycidoxybutyl-trimethoxysilane, α-glycidoxybutyl-triethoxysilane, α-glycidoxybutyl-tripropoxysilane, α-glycidoxybutyl-tributoxysilane, (3,4-epoxycyclohexyl)-methyl-trimethoxysilane, (3,4-epoxycyclohexyl)methyl-triethoxysilane, (3,4-epoxycyclohexyl)methyl-tripropoxysilane, (3,4-epoxycyclohexyl)-methyl-tributoxysilane, (3,4-epoxycyclohexyl)ethyl-trimethoxysilane, (3,4-epoxycyclohexyl)ethyl-triethoxysilane, (3,4-epoxycyclohexyl)ethyl-tripropoxysilane, (3,4-epoxycyclohexyl)-ethyl-tributoxysilane, (3,4-epoxycyclohexyl)propyl-trimethoxysilane, (3,4-epoxycyclohexyl)propyl-triethoxysilane, (3,4-epoxycyclohexyl)propyl-tripropoxysilane, (3,4-epoxycyclohexyl)propyl-tributoxysilane, (3,4-epoxycyclohexyl)butyl-trimethoxysilane, (3,4-epoxycyclohexyl) butyl-triethoxysilane, (3,4-epoxycyclohexyl)-butyl-tripropoxysilane, and (3,4-epoxycyclohexyl)butyl-tributoxysilane.
Particularly preferred epoxyalkylalkoxysilanes are γ-glycidoxypropyl trimethoxy silane, γ-glycidoxypropylmethyldiethoxysilane and beta-(3,4-epoxycyclohexyl) ethyl-trimethoxysilane.
Examples of more epoxy-terminated silanes useful in the present invention are described, for example, in U.S. Pat. Nos. 4,049,861 and 4,293,606, and include compounds of the general formulae:
##STR00002##
where R=a non-hydrolyzable divalent hydrocarbon radical (aliphatic, aromatic, or aliphatic and aromatic containing) of less than 20 carbon atoms or a divalent radical of less than 20 carbon atoms composed of C, H, N, S, and O atoms (these atoms are the only atoms which may appear in the backbone of the divalent radicals), the last being in the form of either linkages. No two heteroatoms may be adjacent within the backbone of the divalent hydrocarbon radical. This description defines divalent hydrocarbon radicals for epoxy terminated siloxanes in the practice of this invention. The value of n is from 0 to 1, R1 is an aliphatic hydrocarbon radical of less than 10 carbon atoms, an acyl radical of less than 10 carbon atoms, or a radical of formula (CH2CH2O)k Z in which k is an integer of at least 1 and Z is an aliphatic hydrocarbon radical of less than 10 carbon atoms or hydrogen, m has values of 1 to 3.
The epoxy silanes used in this invention can be an epoxy silane of the above formula in which R is any divalent hydrocarbon radical such as methylene, ethylene, decalene, phenylene, cyclohexylene, cyclopentylene, methylcyclohexylene, 2-ethylbutylene, and allene or an ether radical such as —CH2—CH2—O—CH2—CH2—, (CH2—CH2O)2—CH2—CH2—,
##STR00003##
and —CH2O—(CH2)3—, R1 can be any aliphatic hydrocarbon radical of less than 10 carbon atoms such as methyl, ethyl, isopropyl, butyl, vinyl, alkyl, or any acyl radical of less than 10 carbon atoms such as formyl, acetyl, propionyl, or any radical of the formula (CH2CH2O)k Z in which k is an integer of at least 1, for example 2, 5, and 8, and Z is hydrogen or any aliphatic hydrocarbon radical of less than 10 carbon atoms such as methyl, ethyl, isopropyl, butyl, vinyl and allyl.
The following compounds are illustrative of some of the epoxy-terminated silanes that are useful in the present invention:
##STR00004##
##STR00005##
The preparation of most of the above epoxy-terminated silane compounds has been described in U.S. Pat. No. 3,131,161.
Other useful epoxy-terminated silanes are those of the formula:
##STR00006##
wherein
m is 1 to 6 (preferably 1 to 4),
n is 0 or 1 (preferably 1),
p is 1 to 6 (preferably 1 to 4), and
R1 is H or alkyl of 1 to 10 carbon atoms (preferably alkyl of 1 to 4 carbon atoms).
In addition to any of the above epoxy silanes, partially hydrolyzed or condensated epoxy silane, which are further curable under photo-irradiation in the presence of photo-acid generator are useful in the present invention, alone or blended with non-hydrolyzed epoxy silane. These partial hydrolyzates can be formed by the partial hydrolysis of the silane OR1 groups. Thus the term precondensate includes siloxanes in which some or all of the silicon atoms are bonded through oxygen atoms. Prepolymers are formed by the polymerization of groups other than the silanes as in U.S. Pat. Nos. 4,100,134 and 7,037,585.
Epoxy silanes typically comprise at least about 90% by weight of the hardcoat composition. Preferably, they comprise from about 90% by weight to about 98% by weight of the composition.
Epoxy-Functionalized Perfluoropolyether Acrylate Oligomers
The hardcoat compositions of the invention also comprise an epoxy-functionalized perfluoropolyether acrylate oligomer. The epoxy silanes described above and the epoxy-functionalized perfluoropolyether acrylate oligomer crosslink with themselves and with each other in the presence of acid generated, for example, by cationic photoinitiator, giving the composition durability. In addition, the fluorochemical imparts release properties.
Useful epoxy-functionalized perfluoropolyether acrylate oligomers have the following general structure:
(Mep)a(Mh)b(MHFPO)cG
wherein:
Mep is a radical from acrylate or methacrylate monomer with a curable epoxy group; MHFPO is the radical from perfluoropolyether-containing acrylate or methacrylate monomer; specifically, the perfluoropolyether is made from the oligomerization of hexafluoropropylene oxide (HFPO), (HFPO)x-L-OC(O)CH═CH2 or (HFPO)x-L -OC(O)CCH3═CH2 wherein L is a divalent linking group (for example, C(O)NHCH2CH2—, —CH2CH2OCH2CH2—, or —CH2OCH2CH2OCH2CH2—) and x is 3 or greater (preferably, 5 or greater);
Mh is a radical from one or more hydrocarbon acrylate monomers with or without functional groups;
G is a radical from chain transfer agent with or without functional groups; a is at least 1; b is 0 to 20; and c is at least 1.
Preferably, the perfluoropolyether is made from the oligomerization of hexyluoropropene oxide (HFPO), (HFPO)xLOC(O)CH═CH2 or (HFPO)xLOC(O)CMe=CH2.
For good solubility in non-fluorinated organic solvent and compatibility with epoxy-silanes, a or a+b is preferred having 50% or more by weight. For better water/oil repellency and release performance, c is preferred having 10% or more by weight.
Useful ethylenic epoxide compounds include epoxy-acrylates such as glycidyl methacrylate, glycidyl acrylate, 2-oxiranylmethoxy-ethyl acrylate, 2-oxiranylmethoxy-ethyl methacrylate, and aposcopolamine
##STR00007##
Preferred ethylenic epoxides are glycidyl methacrylate and glycidyl acrylate.
Acrylate or methacrylate from the following epoxy-alcohols are also useful:
2-methyl-2,3-epoxy-1-propanol
##STR00008##
Glycerol digylycidyl ether
##STR00009##
1,3-digylcidyl glyceryl ether
##STR00010##
Trimethylolpropane-diglycidyl ether
##STR00011##
(3-hex-5-enyl-oxiranyl)-methanol
##STR00012##
1-(3-tert-butyl-oxiranyl)-propan-1-ol
##STR00013##
(3-tert-butyl-oxiranyl)-cyclolhexyl-methanol
##STR00014##
3-[2-tert-butyl-dimethyl-silanyloxy)-ethyl]-oxiranyl-methanol
##STR00015##
2-[1-oxiran-2-ylmethyl)piperidin-2-yl]ethanol
##STR00016##
3-phenylglycidol
##STR00017##
Other useful ethylenic epoxides include allyl glycidyl ether, butadiene monoxide, 1,2-epoxy-7-octene, 1,2-epoxy-5-hexene, 4-vinyl-1-cyclohexene 1,2-epoxide, allyl-11,12-epoxy stearate, 1,2-epoxy-9-decene, limonene oxide, isoprene monoxide, and 1-ethynyl-3-(oxiran-2-ylmethoxy)-benzene
##STR00018##
In some embodiments, G corresponds to the Formula:
—SQ1T2C(O)NHQ5Si(Y1)(Y2)(Y3)—
wherein
MHFPO is the residue of acrylate monomer with perfluoropolyether segment with the following general structure:
RfQX—C(O)CR═CH2
Rf can be monovalent or divalent. In some compounds where Rf is monovalent, the terminal groups can be (CpF2p+1)—, (CpF2p+1O)—, (X′CpF2pO)—, or (X′CpF2p+1)— where X′ is hydrogen, chlorine, or bromine and p is an integer of 1 to 10. In some embodiments of monovalent Rf groups, the terminal group is perfluorinated and p is an integer of 1 to 10, 1 to 8, 1 to 6, 1 to 4, or 1 to 3. Exemplary monovalent Rf groups include CF3O(C2F4O) CF2—, and C3F7O(CF(CF3)CF2O)—CF(CF3)— wherein n has an average value of 0 to 50, 1 to 50, 3 to 30, 3 to 15, or 3 to 10.
Suitable structures for divalent Rf groups include, but are not limited to, —CF2O(CF2O)q(C2F4O)—CF2—, —(CF2)3O(C4F8O)n(CF2)3—, —CF2O(C2F4O)nCF2—, and CF(CF3)(OCF2CF(CF3))sOCtF2tO(CF(CF3)CF2O)—CF(CF3)—, wherein q has an average value of 0 to 50, 1 to 50, 3 to 30, 3 to 15, or 3 to 10; n has an average value of 0 to 50, 3 to 30, 3 to 15, or 3 to 10; s has an average value of 0 to 50, 1 to 50, 3 to 30, 3 to 15, or 3 to 10; the sum (n+s) has an average value of 0 to 50 or 4 to 40; the sum (q+n) is greater than 0; and t is an integer of 2 to 6.
As synthesized, compounds typically include a mixture of Rf groups. The average structure is the structure averaged over the mixture components. The values of q, n, and s in these average structures can vary, as long as the compound has a number average molecular weight of at least about 400. Useful compounds often have a molecular weight (number average) of 400 to 5000, 800 to 4000, or 1000 to 5000.
Examples of suitable fluorochemical monomers for MHFPO include C3F7O(CF(CF3)CF2O)uCF(CF3)CH2OC(O)CH═CH2, C3F7O(CF(CF3)CF2O)uCF(CF3)CH2OC(O)C(CH.3)═CH2, C3F7O(CF(CF3)CF2O)uCF(CF3)CH2OCH2CH2C(O)CH═CH2, C3F7O(CF(CF3)CF2O)uCF(CF3)CH2OCH2CH2OC(O)C(CH.3)═CH2, C3F7O(CF(CF3)CF2O)uCF(CF3)C(O)NHCH2CH2OC(O)CH═CH2, C3F7O(CF(CF3)CF2O)uCF(CF3)C(O)NHCH2CH2OC(O)C(CH.3)═CH2, CH2═CHC(O)OCH2CF2(OCF2)u(OCF2CF2)vOCF2CH2OC(O)CH═CH2, and CH2═C(CH3)C(O)OCH2CF2(OCF2)u(OCF2CF2)vOCF2CH2OC(O)C(CH3)═CH2, wherein u and v are independently 1 to 50.
Mh is the radical polymerizable ethylenic monomers excluding epoxide-reactive functional substitutes. The preferred ethylenic monomer is acrylates and methacrylate, including, for example, methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, octyl acrylate, octyl methacrylate, methoxyethyl acrylate, methoxyethyl methacrylate, methoxypropyl acrylate, octadecyl acrylate, octadecyl methacrylate and CH2═CMeC(O)O(CH2)3Si(OMe)3.
Preferably, Mh is a radical from methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, butyl acrylate, butyl methacrylate, octyl acrylate, octyl methacrylate, octadecyl acrylate, or octadecyl methacrylate.
The oligomer can be prepared through a free radical polymerization of a fluorinated monomer, optionally with a non-fluorinated monomer and a monomer that includes the epoxy group, in the presence of a chain transfer agent. A free radical initiator can be used to initiate the polymerization or oligomerization reaction. Suitable free-radical initiators include, for example, azo compounds, such as azobisisobutyronitrile (AIBN) and azo-2-cyanovaleric acid, hydroperoxides (for example, cumene, t-butyl and t-amyl hydroperoxide, dialkyl peroxides such as di-t-butyl and dicumylperoxide), peroxyesters such as t-butylperbenzoate and di-t-butylperoxy phthalate, diacylperoxides such as benzoyl peroxide and lauroyl peroxide.
The oligomerization reaction can be carried out in any solvent suitable for organic free-radical reactions. The reactants can be present in the solvent at any suitable concentration including, for example, from about 5% by weight to about 90% by weight based on the total weight of the reaction mixture. Suitable solvents include, for example, aliphatic and alicyclic hydrocarbons (for example, hexane, heptane, cyclohexane), aromatic solvents (for example, benzene, toluene, xylene), ethers (for example, diethylether, glyme, diglyme, diisopropyl ether), esters (for example, ethyl acetate, butyl acetate), alcohols (for example, ethanol, isopropyl alcohol), ketones (for example, acetone, methylethyl ketone, methyl isobutyl ketone), sulfoxides (for example, dimethyl sulfoxide), amides (for example, N,N-dimethylformamide, N,N-dimethylacetamide), halogenated solvents such as methylchloroform, FREON 113, trichloroethylene, alpha,alpha,alpha-trifluorotoluene, and mixtures thereof.
The oligomerization reaction can be carried out at any temperature suitable for conducting an organic free-radical reaction. Particular temperature and solvents for use can be easily selected based on considerations such as the solubility of reagents, the temperature required for the use of a particular initiator, and desired molecular weight. While it is not practical to enumerate a particular temperature suitable for all initiators and all solvents, generally suitable temperatures are from about 30° C. and about 200° C. The fluorochemical oligomer is prepared in the presence of chain transfer agent.
Suitable chain transfer agents include, for example, a hydroxy-, amino-, mercapto and halogen groups. The chain transfer agent can include at least two of such hydroxy, amino-, mercapto and halogen groups. Illustrative examples of chain transfer agents useful in the preparation of the fluorochemical oligomer include tetrabromomethane, 2-mercaptoethane, 3-mercaptobutane, 3-mercapto-2-butanol, 3-mercapto-2-propanol, 3-mercapto-1-propanol, 3-mercapto-1,2-propanediol, 2-mercapto-ethylamine, di(2-mercaptoethyl)sulfide, octylmercaptan, and dodecylmercaptan.
In one useful embodiment, a chain transfer agent that includes a silyl group having at least one hydrolyzable groups is used in the oligomerization to produce the fluorochemical oligomer. Useful chain transfer agent that include such a silyl group include chain transfer agents of Formula:
HS-L-Si(Y1)(Y2)(Y3)
wherein
A single chain transfer agent or a mixture of different chain transfer agents can be used. Useful chain transfer agents are CBr4, 2-mercaptoethane, octylmercaptane and 3-mercaptopropyltrimethoxysilane. A chain transfer agent is preferably present in an amount sufficient to control the number of polymerized monomer units in the oligomer and to obtain the desired molecular weight of the oligomeric fluorochemical silane. The chain transfer agent is generally used in an amount of about 0.05 equivalents to about 0.5 equivalents, preferably about 0.25 equivalents, per equivalent of monomer including fluorinated and non-fluorinated monomers. One example of a useful commercially available chain transfer agent is CBr4 available from Sigma-Aldrich Chemical Company (Milwaukee, Wis.). Other examples of useful commercially available chain transfer agents are HS(CH2)3Si(OCH3)3 and C12H25SH available from Sigma-Aldrich Chemical Company (Milwaukee, Wis.).
One of preferred-functionalized perfluoropolyether acrylate oligomers has the general Formula:
##STR00019##
wherein
The epoxy-functionalized perfluoropolyether acrylate oligomer typically comprises from about 0.1% by weight to about 10% by weight of the composition (preferably, from about 0.5% by weight to about 5% by weight of the composition).
Photoacid Generator
Photoacid generators are cationic photoinitiators. The hardcoat compositions used in the present invention comprise a photoacid generator to cationically polymerize the composition using ultraviolet (UV) light. Useful cationic photoiniators include diaryliodonium salts, triarylsulfonium salts benzylsulfonium salts, phenacylsulfonium salts, N-benzylpyridinium salts, N-benzylpyrazinium salts, N-benzylammonium salts, phosphonium salts, hydrazinium salts, and ammonium borate salts.
Useful cationic initiators for the purposes of this invention also include the aromatic onium salts, including salts of Group Va elements, such as phosphonium salts, for example, triphenyl phenacylphosphonium hexafluorophosphate, salts of Group VIa elements, such as sulfonium salts, for example, triphenylsulfonium tetrafluoroborate, triphenylsulfonium hexafluorophosphate and triphenylsulfonium hexafluoroantimonate, and salts of Group VIIa elements, such as iodonium salts such as diphenyliodonium chloride and diaryl iodonium hexafluoroantimonate, the latter being preferred. The aromatic onium salts and their use as cationic initiators in the polymerization of epoxy compounds are described in detail in U.S. Pat. No. 4,058,401, “Photocurable Compositions Containing Group VIA Aromatic Onium Salts,” by J. V. Crivello issued Nov. 15, 1977; U.S. Pat. No. 4,069,055, “Photocurable Epoxy Compositions Containing Group VA Onium Salts,” by J. V. Crivello issued Jan. 17, 1978, U.S. Pat. No. 4,101,513, “Catalyst For Condensation Of Hydrolyzable Silanes And Storage Stable Compositions Thereof,” by F. J. Fox et al. issued Jul. 18, 1978; and U.S. Pat. No. 4,161,478, “Photoinitiators,” by J. V. Crivello issued Jul. 17, 1979, the disclosures of which are incorporated herein by reference.
Other cationic initiators can also be used in addition to those referred to above; for example, the phenyldiazonium hexafluorophosphates containing alkoxy or benzyloxy radicals as substituents on the phenyl radical as described in U.S. Pat. No. 4,000,115, “Photopolymerization Of Epoxides,” by Sanford S. Jacobs issued Dec. 28, 1976, the disclosure of which is incorporated herein by reference. Preferred cationic initiators for use in the compositions of this invention are the salts of Group VIa elements and especially the sulfonium salts, and also the Group VIIa elements, particularly the diaryl iodonium hexafluororantimonates. Particular cationic catalysts include diphenyl iodonium salts of tetrafluoro borate, hexafluoro phosphate, hexafluoro arsenate, and hexafluoro antimonate; and triphenyl sulfonium salts of tetrafluoroborate, hexafluoro phosphate, hexafluoro arsenate, and hexafluoro antimonate.
Cyracure™ UVI-6976 (a mixture of triarylsulfonium hexafluoroantimonate salts in propylene carbonate) and UVI-6992 are examples of cationic photoinitiators available from Dow Chemical. Darocur™ 1173 cationic photoinitator can be obtained from Ciba Geigy Co.
Cationic initiator is typically present in the compositions of the invention in a range from about 1% to about 5% by weight.
Optional Components
The hardcoat compositions can further comprise one or more diepoxide compounds. Diepoxide compounds can, for example, accelerate polymerization of the composition. They can also be used to adjust the softness or to reduce brittleness of the cured composition.
Suitable diepoxide comonomers include those disclosed in U.S. Pat. No. 4,293,606 (Zollinger et al.) of the formula:
##STR00020##
wherein n=1 to 6, X and Y independently represent (1) —OCH2)m—, wherein m=1 or 2 and the terminal carbon atom of this group is directly connected to the carbon of the epoxy group, or (2)
##STR00021##
with the bond from the carbonyl carbon atom directly connected to the bridging group CH2n, p+q=1 or 2 and p and q are independently 0 or 1, A and B, and A′ and B′ are independently H or, when fused together as A and B or A′ and B′, the atoms necessary to form a 5- or 6-membered cycloaliphatic ring, and
##STR00022##
wherein A and B and A′ and B′ are as defined above r and u are independently integers of 1 to 6, and s is an integer of 1 to 6.
Preferably, the diepoxide comonomer is a cycloaliphatic diepoxide compound. A preferred diepoxide compound is 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate.
If used, diepoxide comonomers are typically present in the compositions of the invention in amounts of less than about 40% by weight.
The hardcoat compositions of the invention may also comprise other optional components such as, for example, curable mono- and/or di-silanes (for example, to adjust hardness), surfactant, matting agents, inorganic particles, and the like.
In another aspect, the protective coating compositions may also comprise a fluorinated compound disclosed herein and a crosslinkable compound (for example, for coating hardness adjustment) represented by formula:
(R)qM(R1)p-q
wherein
Representative compounds of this formula include tetramethoxysilane, tetraethoxysilane, methyltriethoxysilane, dimethyldiethoxysilane, octadecyltriethoxysilane, methyltrichlorosilane, tetramethyl orthotitanate, tetraethyl orthotitanate, tetraisopropyl orthotitanate, tetraethylzirconate, tetraisopropylzirconate, and tetrapropylzirconate.
If used, the crosslinkable silanes are typically present in the compositions of the invention in amounts of less than about 40% by weight.
The protective coating compositions may comprise a fluorinated additive disclosed herein and one or more crosslinkable multi-epoxides as well as one or more crosslinkable silanes.
Preferably, the coating compositions of the invention are solvent-free. In some embodiments, however, the coating compositions comprise solvent such as, for example, ketones (for example, acetone or methyl isobutyl ketone (MIBK)), esters (for example, ethyl acetate), or ethers (for example, methyl tert-butyl ether (MTBE) or tetrahydrofuran (THF)), or combinations.
Method and Articles
The hardcoat compositions of the invention can be used to provide durability, clarity, stain- and soil-resistance, water- and soil-repellency, easy-cleaning, and/or release properties to a hard substrate such as, for example, a substrate comprising natural stone, man-made stone, ceramic, vinyl, wood, masonry, cork, glass, or the like. The hardcoat composition can be applied using coating techniques known in the art, and then cured (that is, cationically polymerized) using ultraviolet light. Typically, when the protective coating is used on a hard substrate, the protective layer will be between about 0.1 mils and about 2 mils thick, but suitable thicknesses will depend upon the application.
The hardcoat compositions described above are particularly useful for forming a protective layer on phototools to provide scratch- and abrasion-resistance, as well as release properties. Phototools are typically made using a computer-aided design (CAD) system to prepare data for an exposure apparatus (for example, a photo-plotter) based on a target blueprint or data. Then, this data is used to perform direct writing of a designed pattern (for example, a circuit pattern) onto an emulsion photographic dry plate, which has been prepared by forming a film surface of a photosensitive emulsion layer on an optically clear substrate (for example, a glass substrate, fused silica or polyethylene terephthalate (PET), polycarbonate, or poly(methyl)methacrylate substrate). Optically clear substrates typically have low haze (for example, less than about 5% or even less than about 2%) and are substantially transparent (that is, they typically allow the passage of 95% or more (preferably 98% or more) of visible and ultraviolet light. The photographic dry plate with the pattern thereon is then developed, fixed, washed in water, and dried. It may then be examined for defects and, if necessary, retouched.
The photosensitive emulsion layer typically comprises a silver halide emulsion or a diazo emulsion. Thus, the film surface is relatively soft and easily scratched or marked. Chrome metal absorbing film may also be used.
The hardcoat compositions of the invention can be coated on the substrate of the phototool by any useful coating technique known in the art. The hardcoat composition can then be cured on the phototool using UV light to form the protective layer. Typically, the protective layer comprising the cured hardcoat composition will be from about 0.5 microns to about 40 microns thick; preferably, from about 2 microns to about 15 microns thick; more preferably, from about 2 microns to about 10 microns thick.
Objects and advantages of this invention are further illustrated by the following examples, but the particular materials and amounts thereof recited in these examples, as well as other conditions and details, should not be construed to unduly limit this invention.
Contact Angle Measurement
The coatings were rinsed for 1 minute by hand agitation in IPA before being subjected to measurement of water and hexadecane contact angles. Measurements were made using as-received reagent-grade hexadecane (Aldrich) and deionized water filtered through a filtration system obtained from Millipore Corporation (Billerica, Mass.), on a video contact angle analyzer available as product number VCA-2500XE from AST Products (Billerica, Mass.). Reported values are the averages of measurements on at least three drops measured on the right and the left sides of the drops. Drop volumes were 5 μL for static measurements and 1-3 μL for advancing and receding. For hexadecane, only advancing and receding contact angles are reported because static and advancing values were found to be nearly equal.
Marker Repellent Test
KING SIZE Permanent Marker, Sharpie Permanent Marker and Vis-à-vis Permanent Overhead Project Pen (all from SANFORD) were used for marker test and rated from 5 (completely bead-up) to 1 (no bead-up) in the order.
Solvent Resistant Test
On the coated and cured film, a big drop of MEK or other organic solvent was dropped in ˜0.5 inch diameter. The appearance and change was visually rated and recorded after the solvent was allowed to evaporate at room temperature as, H for Hazy and C for Clear (no change of the coating). Then, a Sharpie permanent marker test was conducted over the dried MEK spot and rated as above (1 to 5). Reported values are the averages of three time ratings.
Steel Wool Durability Test
The abrasion resistance of the cured films was tested cross-web to the coating direction by use of a mechanical device capable of oscillating steel wool fastened to a stylus (by means of a rubber gasket) across the film's surface. The stylus oscillated over a 10 cm wide sweep width at a rate of 3.5 wipes/second wherein a “wipe” is defined as a single travel of 10 cm. The stylus had a flat, cylindrical geometry with a diameter of 3.8 mm having a 400 g load. The device was equipped with a platform on which weights were placed to increase the force exerted by the stylus normal to the film's surface. The steel wool was obtained from Rhodes-American a division of Homax Products, Bellingham, Wash. under the trade designation “#0000-Super-Fine” and was used as received. A single sample was tested for each sample, with the weight in grams applied to the stylus and the number of 50 wipes employed during testing reported in the tables. After scratch, Sharpie repellent was tested and contact angles were measured to determine the durability.
Cleaning Tissue Durability Test
Sight Savers pre-moisture lens cleaning tissue made from Bausch&Lomb were used for durability test, which contains IPA. After cleaning the surface of hardcoat for 20 times, Sharpie marker is re-tested and rated from 1 to 5 as before.
Materials:
ES-1, A-187/ER-4299/PI at the ratio of 89/2/9 by weight;
ES-2, A-186/GPTE/PI at the ratio of 86/5/9 by weight;
ES-3, 3M Scotchgard Film Protector II
Epoxy Functionalized Perfluoropolyether Acrylate Oligomers as Additive in Epoxy-Silane Hardcoat
1. Preparation of Epoxy Functionalized Perfluoropolyether Acrylate Oligomers:
Preparation of HFPO-MAr/GMAr in the presence of CBr4 chain transfer agent
FA-1, HFPO-MAr/GMAr/CBr4 in 10/90/0.26 ratio by weight:
FA-2, HFPO-MAr/GMAr/CBr4 in 20/80/0.25 ratio by weight:
FA-3, HFPO-MAr/GMAr/CBr4 in 30/70/0.27 ratio by weight:
FA-4, HFPO-MAr/A-174/CBr4 in 40/60/0.35 ratio by weight:
HFPO-MAr/GMAr/CBr4
Product solution
50/50/0.5
Two Separated phases
70/30/0.5
Two Separated phases
It was that, the polymerization of 50% or more HFPO-MAr with GMAr gives homogenous polymer solution in the presence of fluorinated solvent or fluorinated co-solvent.
Preparation of HFPO-MAr/GMAr in the Presence of RSH Chain Transfer Agent
FA-5, HFPO-MAr/GMAr/C12H25SH in 30/70/3 ratio by weight:
FA-6, HFPO-MAr/GMAr/A-160 in 30/70/3 ratio by weight:
All formulations were coated on primed PET with No#6 wire rod, and cured with different UV sources as identified below for 2 minutes unless specifically noted. Generally, all formulations were clear solution (unless noted)
A series of epoxy functionalized perfluoropolyether acrylate oligomers were blended with epoxy-silane (ES) formulations at different levels (0.5˜5% by weight), with or without extra solvent, and cured under different UV source in the air. The representative examples of coating quality, marker repellent and contact angle have been summarized in Table 1.
TABLE 1
Coating
Marker
H2O
HD
Exp. No#
Formulation
Quality
Repellent**
Adv/Rec/Static
Adv/Rec/Static
C-1
ES-1/F-additive
Excellent
1/1/1
87
38
85
21
12
19
100/0
85
38
83
21
11
19
UV-2
85
38
82
Average
86
38
83
21
12
19
C-2
ES-2/F-additive
Good
1/1/1
77
44
68
12
4
10
100/0
78
45
67
12
5
11
Average
UV-2
78
45
68
12
5
11
C-3
ES-3/F-additive
Good
4/3/3
91
55
91
32
26
32
100/0
91
55
91
32
27
34
Average
UV-2
91
55
91
32
27
33
C-4**
Release Liner
N/A
2/3/3
95
62
93
34
19
34
92
59
90
34
18
33
Average
94
61
92
34
19
34
1
ES-1/FA-1
Excellent
5/5/5
96
56
96
60
43
57
99.5/0.5
99
53
95
59
42
56
UV-2
97
56
96
Average
97
55
96
60
43
57
2
ES-1/FA-1
Excellent
5/3/5
103
59
102
56
46
60
99/1
104
57
102
58
44
60
Average
UV-2
104
58
102
57
45
60
3
ES-1/FA-1
Excellent
2/2/2
112
69
109
71
61
69
98/2
112
68
110
72
61
70
Average
UV-2
112
69
110
72
61
70
4
ES-1/FA-1
Excellent
5/5/5
107
66
105
70
54
69
95/5
110
68
107
68
54
67
UV-2
110
66
106
Average
109
67
106
69
54
68
5
ES-2/FA-1
Fair
5/5/5
113
73
109
70
60
68
95/5
114
73
110
70
61
69
Average
UV-2
114
73
110
70
61
69
6
ES-1/FA-2
Excellent
5/5/5
107
72
106
71
60
70
99.5/0.5
107
74
107
69
58
68
Average
UV-2
107
73
107
70
59
69
7
ES-1/FA-2
Good
2/2/3
113
77
110
70
63
68
98/2, 50% in MEK
111
76
107
71
63
69
UV-2
112
77
109
Average
112
77
109
71
63
69
8
ES-2/FA-2
Excellent
5/5/5
101
61
100
67
52
64
99.5/0.5
102
62
100
66
51
63
Average
UV-2
102
62
100
67
52
64
9
ES-2/FA-2
Excellent
5/5/5
108
67
106
72
61
67
98/2
109
68
107
72
61
68
Average
UV-2
109
68
107
72
61
68
10
ES-1/FA-3
Excellent
2/2/5
113
74
109
72
65
70
98/2, 50% in MEK
114
76
110
71
63
69
Average
UV-2
114
75
110
72
64
70
11
ES-2/FA-3
Excellent
5/5/5
116
75
110
71
61
68
98/2
112
75
110
72
63
69
UV-2
115
75
110
Average
114
75
110
72
62
69
12
ES-1/FA-4
Excellent
5/5/5
105
70
103
67
52
65
99.5/0.5
105
69
103
66
51
65
Average
UV-2
105
70
103
67
52
65
13
ES-1/FA-4
Excellent
3/2/5
116
70
111
73
68
71
98/2, 50% in MEK
118
71
111
72
67
70
Average
UV-2
117
71
111
73
68
71
14
ES-1/FA-5
Excellent
5/5/5
117
75
112
70
59
69
99/1
115
74
113
69
57
69
Average
UV-2
116
75
113
70
58
69
15
ES-2/FA-5
Good
5/5/4
105
65
104
67
53
66
99/1
104
66
102
67
53
65
Average
UV-2
105
66
103
67
53
66
16
ES-1/FA-6
Excellent
5/5/5
116
74
108
70
63
69
98/2
115
75
110
71
62
68
Average
UV-3
114
78
109
71
61
68
17
ES-1/FA-6
Excellent
5/5/5
113
79
109
70
63
68
95/5
113
78
109
70
62
69
Average
UV-3
113
79
109
70
63
69
18
ES-3/FA-6
Good
5/5/5
115
70
111
72
67
70
98/2
116
71
111
71
66
70
Average
116
71
111
72
67
70
19
ES-3/FA-6
Good
5/5/5
115
64
109
72
66
70
95/5
116
62
109
73
67
71
116
63
109
73
67
71
*The order of markers tested: King/Sharpie/Vis-à-vis;
**Used for laminating on ES-3 hardcoat for release performance made by Sekisui Chemical from Japan.
2. Epoxy Functionalized Perfluoropolyether Acrylate Oligomers Containing Epoxy-Silane Hardcoat with Extra Crosslinkers:
Table 2 summarizes examples of epoxy-silane hardcoat with extra crosslinkers in addition to epoxy functionalized perfluoropolyether acrylate oligomers.
TABLE 2
H2O
HD
Marker
Coating
Exp. No#
Formulation
Adv/Rec/Static
Adv/Rec/Static
Repellent*
Quality
20
ES-1/FA-4/DiEpoxide
114
62
110
72
67
70
4/4/5
Good
93/2/5
114
64
109
73
68
71
Average
50% MEK, UV-2
114
63
110
73
68
71
21
ES-1/FA-3/DiEpoxide
115
65
111
71
63
68
4/4/5
Good
93/2/5
114
66
109
72
63
69
Average
50% MEK, UV-2
115
66
110
72
63
69
22
ES-1/FA-4/TEOS
114
72
110
72
65
69
5/4/5
Good
93/2/5
114
70
109
71
65
69
Average
50% MEK, UV-2
114
71
110
72
65
69
23
ES-1/FA-3/TEOS
114
69
109
71
64
69
3/4/5
Excellent
93/2/5
114
68
110
72
64
70
5/5/5**
Average
50% MEK, UV-2
114
69
110
72
64
70
24
ES-2/FA-3/DiEpoxide
115
78
111
71
63
68
5/5/5
Good
93/2/5
113
80
111
72
62
69
Average
UV-2
114
79
111
72
63
69
25
ES-2/FA-4/TEOS
112
76
110
72
65
70
5/5/5
Good
93/2/5
114
74
110
72
65
69
Average
UV-2
113
75
110
72
65
70
*Marker order: King/Sharpie/VisaVis;
**Remeasured marker repellent after 12 hours.
3. Solvent Resistant Test Results
Solvent resistant test from coating films were studied, and the results to Sharpie are summarized in Table 3.
TABLE 3
Exp.
Tissue Test (20
Solvent
No#
times Scratch)
EtOAc
IPA
Acetone
Toluene
MEK
DMF
1
C/5
C/5
C/5
C/5
C/5
C/5
C/5
2
C/5
C/5
C/5
C/5
C/5
C/5
C/5
3
C/5
C/5
C/5
C/5
C/5
C/5
C/5
4
C/5
C/5
C/5
C/5
C/5
C/5
C/5
5
C/5
C/5
C/5
C/5
C/5
C/5
C/5
6
C/5
C/5
C/5
C/5
C/5
C/5
C/5
7
C/5
C/5
C/5
C/5
C/5
C/5
C/5
11
C/5
C/5
C/5
C/5
C/5
C/5
C/5
12
C/5
C/5
C/5
C/5
C/5
C/5
C/5
13
C/5
C/5
C/5
C/5
C/5
C/5
C/5
14
C/5
C/5
C/5
C/5
C/5
C/5
C/5
15
C/5
C/5
C/5
C/5
C/5
C/5
C/5
16
C/5
C/5
C/5
C/5
C/5
C/5
C/5
The results from Table 3 indicate excellent solvent resistance.
4. Steel Wood Durability Test Results (50 times rubs at 400 g weight):
Steel wood durability test on coated films was studied and the results after 50 time rubs with 400 g weight are summarized in Table 4.
TABLE 4
Visible
Marker
H2O
HD
Exp. NO#
Scratches
Respellent**
Adv/Rec/Static
Adv/Rec/Static
2
No
5/5/5
114
78
109
70
63
69
111
76
108
71
64
69
113
79
110
Average
113
78
109
71
64
69
3
No
5/5/5
114
64
108
65
50
63
112
63
107
66
50
64
Average
113
64
108
66
50
64
8
No
5/5/5
111
68
106
66
52
64
110
67
105
67
51
66
Average
111
68
106
67
52
65
9
No
5/5/5
115
82
109
73
63
69
115
80
109
71
60
67
70
59
66
Average
115
81
109
71
61
67
C-4**
Scratched
Not Tested
Not measured
Not measured
*King/Sharpie/Vis-à-vis;
**Release Liner for laminating on ES-3 hardcoat; Tested only 4 time rubs at 200 g weight.
5. Peel Release Testing and Ink Release Testing:
TABLE 5
Formulation
Tested Tape
Average Peel Force
Exp. No#
ES-1/FA-6
Type
(g/in)
C-1
100/0
845
2340
29
99.5/0.5
845
500
30
98/2
845
425
31
95/5
845
402
C-1
100/0
610
1460
32
99.5/0.5
610
950
33
98/2
610
510
34
95/5
610
540
Release Test Results from Ink:
Below in Table 6 are the results of a single solder mask ink transfer test. The ink is available from Taiyo Ink Mfg. Co., Ltd., Japan (PSR-4000 AUS303/CA-40 AUS303). Scale went from 0 to 5 where 0 is no ink transfer, 5 is 100% ink transfer to the hardcoat and 2.5 would be approximately a 50% transfer. Examples are summarized in Table 6.
TABLE 6
Ink Transfer
Ink Transfer
Exp. No#
ES-1/FA-6
Before UV Curing
After UV Curing
C-1
100/0
5
5
C-1
100/0
5
5
35
99.5/0.5
1
0
36
98/2
0
0
37
95/5
0
0
Protective Coating from Pure HFPO-Polyacrylate-Epoxide:
Pure HFPO-polyacrylate-epoxide as coating in the presence of photoacid generator was studied. Table 7 summarizes the examples of HFPO-polyacrylate-epoxide hardcoat on PET Film without epoxysilane.
TABLE 7
H2O
HD
Marker
Coating
Example
Formulation*
Adv/Rec/Static
Adv/Rec/Static
Repellent**
Quality
38
FA-4/PI
118
69
113
74
63
71
5/5/5
Fair
92/8 50% MEK
121
73
115
74
62
71
UV-2
121
75
114
Average
120
72
114
74
63
71
39
FA-3/PI
118
79
112
72
67
70
5/5/5
Good
92/8, UV-2
117
78
112
72
66
69
Average
118
79
112
72
67
70
40
FA-2/PI
115
72
110
71
64
69
5/5/5
Good
92/8, UV-2
116
74
111
71
63
69
Average
116
73
111
71
64
69
40
FA-1/PI
110
66
107
70
58
68
5/5/5
Good
92/8, UV-2
110
64
107
69
58
67
Average
110
65
107
70
58
68
42
FA-5/PI
119
81
111
70
58
68
4/4/5
Good
92/8, UV-2
120
81
110
71
59
68
Average
120
81
111
71
59
68
*PI, UVI-6974; 42A, HFPO-MAr/Epoxy-MAr/CBr4 (40/60/0.30);
**King/Sharpie/VisaVis, 5 = best, 1 = worst performance
Additional Examples on Different Substrates
HFPO-polyacrylate-epoxide coating on different substrates was also studied and results are summarized in Table 8.
TABLE 8
H2O
HD
Marker
Coating
NB #
Formulation*
Adv/Rec/Static
Adv/Rec/Static
Repellent**
Quality
Substrate
43
A187/FA-3/DiEpoxide
107
65
102
71
60
69
5/5/5
Good
Aluminum
93/2/5
107
64
102
71
61
70
Average
UV-2; 50% MEK
107
65
102
71
61
70
44
A187/FA-3/DiEpoxide
81
60
60
63
55
58
5/5/5
Good
Copper
93/2/5
80
61
70
62
55
59
UV-2
80
60
71
Average
50% MEK
80
60
67
63
55
59
45
A187/FA-3/TEOS
112
77
108
72
64
69
5/5/5
Good
PMMA
93/2/5
112
79
109
72
64
70
Average
UV-2, 50% MEK
112
78
109
72
64
70
46
A187/FA-4/TEOS
117
75
109
72
67
70
4/4/5
Good
Ceramic
93/2/5
115
76
110
72
67
70
Average
UV-2, 50% MEK
116
76
110
72
67
70
##STR00023##
The complete disclosures of the publications cited herein are incorporated by reference in their entirety as if each were individually incorporated. Various modifications and alterations to this invention will become apparent to those skilled in the art without departing from the scope and spirit of this invention. It should be understood that this invention is not intended to be unduly limited by the illustrative embodiments and examples set forth herein and that such examples and embodiments are presented by way of example only with the scope of the invention intended to be limited only by the claims set forth herein as follows.
Qiu, Zai-Ming, Hulteen, John C., Fall, Douglas C.
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