A production method of an optical waveguide includes: preparing a laminated body that includes a first clad layer and at least a core layer laminated on the first clad layer; forming a light propagating optical waveguide core by cutting the core layer by use of a dicing saw from a side where the core layer is laminated while intruding an edge of a blade portion of the dicing saw into the first clad layer so as to partially cut the first clad layer; and embedding at least a cut portion of the laminated body with a second clad layer.
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1. A production method of an optical waveguide, comprising:
preparing a laminated body that comprises a first clad layer having a thickness of 30 μm to 150 μm and at least a core layer laminated on the first clad layer;
forming a light propagating optical waveguide core by cutting through the core layer by use of a dicing saw from a side where the core layer is laminated while intruding an edge of a blade portion of the dicing saw into the first clad layer so as to partially cut the first clad layer, an incising amount of the blade portion of the dicing saw into the first clad layer being 10 μm or more, a cutting residue amount of the first clad layer being 10 μm or more, and a deformation portion of a cross-sectional shape of a cut groove due to wear of the edge of the blade portion of the dicing saw being formed in the first clad layer; and
embedding at least a cut portion of the laminated body with a material of a second clad layer,
wherein the edge of the blade portion of the dicing saw is non-flat,
wherein a cross-sectional shape of the edge of the blade portion of the dicing saw is non-flat when viewed along a main cutting direction of the blade portion,
wherein the blade portion is configured such that the resulting cut portion has a cross-sectional shape when viewed along the main cutting direction of the blade portion,
wherein the cross-sectional shape of the cut portion comprises:
an upper side portion and a lower side portion both of which are defined by a peripheral side surface of the cut portion; and
a bottommost portion defined by a bottommost surface of the cut portion,
wherein the upper side portion defines a first approximate line,
wherein the bottommost portion defines a second approximate line,
wherein the lower side portion starts deviating from the first approximate line starting at a deviating point, and
wherein a length r, measured in a depth direction of the cut portion, between said deviating point and said second approximate line is 10 μm or more.
5. A production method of an optical waveguide, comprising:
preparing a laminated body that comprises a first clad layer having a thickness of 30 μm to 150 μm and, on the first clad layer, at least a core layer and a third clad layer laminated in this order;
forming a light propagating optical waveguide core by cutting through the core layer and the third clad layer by use of a dicing saw from a side where the core layer and the third clad layer are laminated while intruding an edge of a blade portion of the dicing saw into the first clad layer so as to partially cut the first clad layer, an incising amount of the blade portion of the dicing saw into the first clad layer being 10 μm or more, a cutting residue amount of the first clad layer being 10 μm or more, and a deformation portion of a cross-sectional shape of a cut groove due to wear of the edge of the blade portion of the dicing saw being formed in the first clad layer; and
embedding at least a cut portion of the laminated body with a material of a second clad layer,
wherein the edge of the blade portion of the dicing saw is non-flat,
wherein a cross-sectional shape of the edge of the blade portion of the dicing saw is non-flat when viewed along a main cutting direction of the blade portion,
wherein the blade portion is configured such that the resulting cut portion has a cross-sectional shape when viewed along the main cutting direction of the blade portion,
wherein the cross-sectional shape of the cut portion comprises:
an upper side portion and a lower side portion both of which are defined by a peripheral side surface of the cut portion; and
a bottommost portion defined by a bottommost surface of the cut portion,
wherein the upper side portion defines a first approximate line,
wherein the bottommost portion defines a second approximate line,
wherein the lower side portion starts deviating from the first approximate line starting at a deviating point, and
wherein a length r, measured in a depth direction of the cut portion, between said deviating point and said second approximate line is 10 μm or more.
2. The production method of an optical waveguide according to
3. The production method of an optical waveguide according to
4. The production method of an optical waveguide according to
6. The production method of an optical waveguide according to
7. The production method of an optical waveguide according to
8. The production method of an optical waveguide according to
9. The production method of an optical waveguide according to
10. The production method of an optical waveguide according to
11. The production method of an optical waveguide according to
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This application is based on and claims priority under 35 USC 119 from Japanese Patent Application No. 2007-139244 filed May 25, 2007.
1. Technical Field
The present invention relates to a production method of an optical waveguide.
2. Related Art
As an example of a mode when a polymer optical waveguide is applied to intra-device and inter-device optical interconnections, there is a multimode optical waveguide having a simple structure where linear cores are arranged at a desired pitch.
According to an aspect of the invention, there is provided a production method of an optical waveguide, including: preparing a laminated body that includes a first clad layer and at least a core layer laminated on the first clad layer; forming a light propagating optical waveguide core by cutting the core layer by use of a dicing saw from a side where the core layer is laminated while intruding an edge of a blade portion of the dicing saw into the first clad layer so as to partially cut the first clad layer; and embedding at least a cut portion of the laminated body with a material of a second clad layer.
Exemplary embodiments of the present invention will be described in detail based on the following figures, wherein:
In what follows, the present invention will be detailed with reference to the drawings. Members having substantially same function and action are provided with same reference numerals in all drawings and, in some cases, duplicated descriptions may be omitted.
In a production method of an optical waveguide film according to a first exemplary embodiment, in the beginning, as shown in
In a polymer film 10A, a lower clad layer 14 (first clad layer) and a core layer 12 are laminated in this order. The polymer film 10A may be prepared by laminating sheets corresponding to the respective layers by a method such as a lamination method. The preparation thereof, since there is no need to align the respective sheets, is convenient and low in cost.
The polymer film 10A, as far as it is made of materials that may provide refractive index difference between the clad layer and the core layer, is not particularly restricted. For instance, an alicyclic olefin film, an acrylic film, an epoxy film or a polyimide film may be used.
In the next place, as shown in
A region of the core layer 12, which is formed by cutting and is sandwiched between cut grooves 22, becomes an optical waveguide core 12A. Accordingly, owing to the cutting, a plurality of optical waveguide cores 12A are formed so as to be arranged in parallel on the same plane of a lower clad layer 14 so that propagating lights may proceed in parallel with each other in a width direction of the polymer film 10A.
When the dicing saw 20 is used to cut the core layer 12 to form the optical waveguide cores, that is, when the dicing saw 20 is used to form cut grooves 22 in the core layer 12, a edge of a blade portion of the dicing saw 20 is allowed to reach a lower clad layer 14 and to intrude therein by a predetermined depth to partially cut the clad layer 14. In other words, cutting is performed so that an edge of a blade portion of the dicing saw 20 incises the lower clad layer 14 to form cut grooves 22.
In the next place, as shown in
Here, a curable resin for forming the embedded clad layer 18 and upper clad layer 16 is a liquid material and, for instance, a radiation-curable, electron beam-curable or thermosetting resin may be used. Specifically, as the curable resin, a UV-curable resin and thermosetting resin may be used, and, more specifically, a UV-curable resin may be selected. As the UV-curable resin or thermosetting resin, UV-curable or thermosetting monomer, oligomer or a mixture of monomer and oligomer may be used. As the UV-curable resin, an epoxy, polyimide or acrylic UV-curable resin may be used.
The lower clad layer 14, upper clad layer 16 and embedded clad layer 18 are constituted of materials lower in refractive index than the core 12A. In particular, in order to secure the refractive index difference from the optical waveguide core 12A, the relative refractive index difference may be 0.5% or more, and specifically, may be 1% or more. Furthermore, the refractive index difference between the respective clad layers, in view of confinement of light, may be small such as 0.05 or less, specifically 0.001 or less and more specifically zero.
Thus, the optical waveguide film 10 is prepared. The obtained optical waveguide film 10 may have a thickness of 50 μm to 500 μm and specifically 100 μm to 200 μm. On the other hand, the optical waveguide film 10 may have a width of 0.5 mm to 10 mm and specifically 1 mm to 5 mm. When the thickness and width of the optical waveguide film 10 are set in the above-mentioned ranges, flexibility may be secured and strength may be readily obtained.
In the optical waveguide film 10 according to the above-described exemplary embodiment, since the core layer 12 and a part of the lower clad layer 14 are simultaneously cut and removed by use of the dicing saw 20 so as to intrude an edge of a blade portion of the dicing saw 20 into the lower clad layer 14, optical waveguide cores 12A having an excellent cross-sectional shape may be formed. Accordingly, deformation and fluctuation of the cross-sectional shapes of the formed optical waveguide cores 12A may be suppressed to provide a production method excellent in mass productivity.
So far, when the cut grooves 22 are formed in the core layer 12 by use of the dicing saw 20, a cross-sectional shape of the cut groove 22 has been presumed to be always substantially a rectangle. However, a cross-sectional shape of the cut groove 22, as the edge of a blade portion of the dicing saw 20 is worn, is rounded; as a result, the planarity of a bottom surface of the cut groove 22 is deteriorated.
Specifically, as shown in, for instance,
On the other hand, in
Then, as shown in
Accordingly, when an edge of a blade portion of a dicing saw 20 is allowed to incise a lower clad layer 14, that is, when an edge of a blade portion of the dicing saw 20 is allowed to incise a lower clad layer 14 by a predetermined depth to partially cut the layer, a deformation portion of a cross-sectional shape of a cut groove 22 (portion where the planarity of a bottom surface is deteriorated) due to the wear of the edge of the blade portion of the dicing saw 20 is formed in the lower clad layer 14 and, thereby, a cross-sectional shape of the cut groove 22 in the core layer 12 is inhibited from deforming or fluctuating. As a result, a cross-sectional shape of the formed optical waveguide core 12A is inhibited from deforming or fluctuating; accordingly, a production method excellent in mass productivity is obtained.
On the other hand, a position where a shape of a side surface lower portion of the cut groove 22 (brim of a bottom portion) starts deviating from an approximate line of a side surface of the cut groove 22 (a length R in a groove depth direction between a position where a shape of a side surface lower portion of the cut groove 22 starts deviating from an approximate line of a side surface of the cut groove 22 and the lowest portion of a bottom surface of the cut groove 22) is about 5 μm in a brand-new blade. Accordingly, an incising amount of the edge of the blade portion of the dicing saw 20 into the lower clad layer 14 may be set at 5 μm or more (specifically 10 μm or more). Thereby, an optical waveguide core 12A having an excellent cross-sectional shape may be obtained.
Furthermore, in the case where a distance (cutting residue amount) between a bottom surface of a cut groove 22 and a surface of a lower clad layer 14 (surface on a side opposite to a cutting side) is small, in some cases, there occurs a production trouble where, owing to external force applied to a polymer film 10A at the time of cutting, the lower clad layer 14 is completely cut through. Accordingly, the cutting residue amount may be set at 5 μm or more (specifically 10 μm or more). Thereby, a polymer film 10A is inhibited from being damaged when an optical waveguide core 12A is formed.
Furthermore, when a prepared optical waveguide film 10 is imparted with flexibility, in order to obtain an optical waveguide film 10 thin in a total thickness, a lower clad layer 14 and an upper clad layer 16 are necessarily made thinner. However, in considering restrictions on the incising amount and the cutting residue amount and the cutting accuracy in a film thickness direction of the dicing saw, the lower clad layer 14 may be set at a thickness of 20 μm or more (specifically 30 μm to 150 μm). Accordingly, for decreasing the total thickness of the optical waveguide film 10, it is effective to vary the thicknesses of the lower clad layer 14 and the upper clad layer 16 covering the optical waveguide core 12A on a side opposite in a thickness direction to the lower clad layer 14 so that the thickness of the lower clad layer 14 is 20 μm or more and the thickness of the upper clad layer 16 is thinner than that of the lower clad layer 14.
In a production method of an optical waveguide film 10 according to the second exemplary embodiment, in the beginning, as shown in
In a polymer film 10A, a lower clad layer 14, a core layer 12 and an upper clad layer 16 are laminated in this order.
In the next place, as shown in
A region of the core layer 12 interposed between the cut grooves 22 formed by the cutting becomes an optical waveguide core 12A. Accordingly, due to the cutting, a plurality of optical waveguide cores 12A are formed so as to be arranged in parallel on the same plane of a lower clad layer 14 so that propagating lights may proceed in parallel with each other in a width direction of the polymer film 10A.
When the dicing saw 20 is used to cut the core layer 12 to form the optical waveguide cores, namely, when the dicing saw 20 is used to form the cut grooves 22 in the core layer 12, the edge of the blade portion of the dicing saw 20 is allowed to reach the lower clad layer 14 and to intrude therein by a predetermined depth to partially cut the lower clad layer 14. In other words, cutting is performed so that the edge of the blade portion of the dicing saw 20 incises the lower clad layer 14 to form the cut grooves 22.
Then, as shown in
Thus, the optical waveguide film 10 is prepared. Others than the above are same as the first exemplary embodiment; accordingly, descriptions thereof will be omitted.
In the production method of the optical waveguide film according to the above-described exemplary embodiment, since the dicing saw 20 is used to simultaneously cut the core layer 12 and upper clad layer 16 and a part of the lower clad layer 14 so as to intrude the edge of the blade portion of the dicing saw 20 into the lower clad layer 14, an optical waveguide core 12A having an excellent cross-sectional shape is formed. As a result, a production method where the cross-sectional shapes of the formed optical waveguide cores 12A are inhibited from deforming and fluctuating and the mass productivity is excellent is obtained.
Furthermore, since a three-layered polymer film 10A where top and bottom surfaces of the core layer 12 are protected by a lower clad layer 14 and an upper clad layer 16 is used, the optical waveguide core 12A is inhibited from being damaged in the steps of dicing and forming an embedded clad; accordingly, the light guiding properties of products may be inhibited from fluctuating, whereby defect rate may be decreased.
Thus, the method in which the polymer film 10A where the lower clad layer 14, the core layer 12, and the upper clad layer 16 are sequentially laminated is cut as described above is also a production method where the cross-sectional shapes of the formed optical waveguide cores 12A are inhibited from deforming and fluctuating and the mass productivity is excellent. In the exemplary embodiment, a mode where two layers of the core layer 12 and upper clad layer 16 are laminated on the lower clad layer 14 is described. However, without restricting thereto, a mode where a polymer film obtained by alternately laminating pluralities of core layers and clad layers on the lower clad layer 14 is cut may be adopted.
In what follows, the present invention will be specifically described with reference to examples. However, the examples do not restrict the invention.
According to a production method of an optical waveguide film according to the first exemplary embodiment, an optical waveguide film is produced as follows.
A two-layered polymer film where, on ARTON FILM (trade name, manufactured by JSR Corporation, refractive index: 1.51) having a length of 145 mm, a width of 30 mm and a thickness of 100 μm, an acrylic resin layer (refractive index: 1.57) having a thickness of 45 μm is formed is prepared.
In the next place, a dicing saw equipped with a blade having a thickness of 120 μm is used to cut the acrylic resin layer so that the cutting depth position is 80 μm from the lowermost surface of the two-layered polymer film and optical waveguide cores having a width of 45 μm is arranged at a pitch of 250 μm in a width direction of the polymer film to form cut grooves. At this time, a blade portion of the dicing saw intrudes in the ARTON FILM to cut the ARTON FILM at the maximum cut groove depth (incising depth) of 20 μm. Thus, optical waveguide cores are formed.
Then, an acrylic UV-curable resin (refractive index: 1.51) is coated at a thickness of 50 μm so as to fill the cut grooves formed in the acrylic resin layer and to cover the acrylic resin layer, that is, to cover the optical waveguide cores, and is cured by UV-ray exposure.
Subsequently, a dicing saw is used to form an external shape to prepare a four-channel optical waveguide film having a length of 140 mm and a width of 0.9 mm.
A cross-sectional shape of the optical waveguide core of the prepared optical waveguide film is a rectangle that has a height of 45 μm and a width of 45±2 μm.
Then, at one end of the optical waveguide film, a graded-index type multimode optical fiber (GI-MMF) having a core diameter of 50 μm is connected, followed by inputting LED (light-emitting diode) light having a wavelength of 850 nm. To the other end of the optical waveguide film, a hard polymer clad optical fiber (HPCF) having a core diameter of 200 μm is connected, and an incident position of the GI-MMF is adjusted so that light intensity guided from the HPCF to a photometer may be the maximum. Then, the HPCF is changed to a GI-MMF having a core diameter of 50 μm to compare the light intensity with that in the case of the HPCF, and thereby, the connection loss when light is input from the optical waveguide film to the GI-MMF having a core diameter of 50 μm is determined. An average value of the connection loss of four optical waveguide cores is 2.5 dB.
According to a production method of an optical waveguide film according to the second exemplary embodiment, an optical waveguide film is prepared as follows.
A three-layered polymer film having a length of 125 mm and a width of 30 mm, in which both surfaces of an epoxy resin layer (core layer: refractive index, 1.60) having a thickness of 50 μm are covered with epoxy resin (clad layers: refractive index, 1.55) having thicknesses of 10 μm and 25 μm, is prepared.
In the next place, with the epoxy resin layer having a thickness of 25 μm as a disposition surface (lower surface), the polymer film is mounted on a dicing saw, and, by use of a dicing saw equipped with a blade having a thickness of 120 μm, the epoxy resin layer having a thickness of 50 μm is cut from a side of an epoxy resin layer having a thickness of 10 μm so that a position at 10 μm from the lowermost surface (disposition surface) of the polymer film may be a cutting depth and optical waveguide cores having a width of 50 μm may be arranged at a pitch of 500 μm in a width direction of the polymer film to form cut grooves. At this time, a blade portion of the dicing saw intrudes into the epoxy resin layer having a thickness of 25 μm so that a cut groove depth (incising amount) in the epoxy resin layer may be 15 μm at the maximum. Thus, optical waveguide cores are formed.
Then, an epoxy UV-curable resin (refractive index: 1.55) is coated so as to be embedded in the cut grooves formed in the epoxy resin layer, namely, so as to cover the optical waveguide cores, followed by exposing UV-ray for curing.
Subsequently, a dicing saw is used to form an external shape to prepare a two-channel optical waveguide film having a length of 120 mm and a width of 0.9 mm.
Cross-sectional shapes of the optical waveguide cores of the prepared optical waveguide film are rectangles that have a height of 50 μm and a width of 50±2 μm. Similarly to example 1, the connection loss when light is input from the optical waveguide film to the GI-MMF having a core diameter of 50 μm is determined and an average value of two optical waveguide cores is 5.1 dB.
Except that a dicing saw equipped with a blade having a thickness of 120 μm is used to form cut grooves, namely, optical waveguide cores, so that a position located at 25 μm from the lowermost surface (disposition surface) of a polymer film may be a cutting depth, similarly to example 2, a two-channel optical waveguide film having a length of 120 mm and a width of 0.9 mm is prepared. When the dicing saw is used for cutting, the epoxy resin layer having a thickness of 25 μm is not cut.
While a cross-sectional shape of the optical waveguide cores of the prepared optical waveguide film is a rectangle that has a height of 50 μm and a width of 50 μm, in proximity to the epoxy resin layer (lower clad layer) having a thickness of 25 μm, both side surfaces extend outside and the sectional area is 30% larger than that of example 2. Furthermore, when, similarly to example 1, the connection loss when light is input from the optical waveguide to the GI-MMF having a core diameter of 50 μm is determined, an average value of two waveguide cores is 8.5 dB, which is an inferior result.
Akutsu, Eiichi, Suzuki, Toshihiko, Fujii, Akira, Ohtsu, Shigemi, Shimizu, Keishi, Yatsuda, Kazutoshi
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