An led light module and an led chip are provided. led wafers (1) are provided on one side of a heat spreading plate (3) made of copper, aluminum or copper-aluminum composite material with a thickness of more than 0.4 mm and with an area of 5 times of the sum area of the led wafers larger to reduce the heat-flux density. A high-voltage insulation plate (2) made of a ceramic wafer with a thickness of more than 0.15 mm is provided on the other side of the heat spreading plate (3). The heat spreading plate (3) is separated and insulated by an outer layer insulator (4) with the high-voltage insulation plate (2). This kind design can effectively reduce the internal conduction thermal resistance and raise the insulation strength, and the manufacturing cost can be reduced effectively also.
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5. A led chip including a plurality of LEO wafers, an outer insulator and a high-voltage insulation plate consisting essentially of a ceramic wafer with a thickness of more than 0.15 mm, a heat dispreading plate consisting essentially of copper, or aluminum, or copper-aluminum composite material and having face A and face b for said high-voltage insulation plate to be attached to,
said heat dispreading plate is a plate that,
the area of said heat dispreading plate is five times larger than the sum area of said led wafers on said heat dispreading plate, and
said led wafers are set directly on face A of said heat dispreading plate, or
face A of said heat dispreading plate is provided with a low-voltage insulation layer, the thickness of said low-voltage insulation layer is not larger than 50 μm, said led wafers are set directly on said low-voltage insulation layer,
said high-voltage insulation plate is a wafer that is attached directly on face b of said heat dispreading plate,
said outer insulator is a part that, by which the whole peripheral sidewall of said heat dispreading plate is surrounded, and is in company with said high-voltage insulation plate to make the whole outer circumferential edge and face b of said heat dispreading plate to be insulated and separated from said thermal conductive core,
characterized in that:
wherein the thickness of said heat dispreading plate is larger than 0.4 mm.
11. A led chip including a plurality of led wafers, an outer insulator and a high-voltage insulation plate consisting essentially of a ceramic wafer with a thickness of more than 0.15 mm, a heat dispreading plate consisting essentially of copper, or aluminum, or copper-aluminum composite material and having face A and face b for said high-voltage insulation plate to be attached to,
said heat dispreading plate is a plate that,
the area of said heat dispreading plate is five times larger than the sum area of said led wafers on said heat dispreading plate, and
said led wafers are set directly on face A of said heat dispreading plate, or
face A of said heat dispreading plate is provided with a low-voltage insulation layer, the thickness of said low-voltage insulation layer is not larger than 50 μm, said led wafers are set directly on said low-voltage insulation layer,
said high-voltage insulation plate is a wafer that is attached directly on face b of said heat dispreading plate,
said outer insulator is a part that, by which the whole peripheral sidewall of said heat dispreading plate is surrounded, and is in company with said high-voltage insulation plate to make the whole outer circumferential edge and face b of said heat dispreading plate to be insulated and separated from said thermal conductive core,
characterized in that:
wherein the whole peripheral edge of said high-voltage insulation plate has any kind of the three, insulation strength enhancing structures, listed below:
the size of the peripheral edge of said high voltage insulation plate is larger than the size of the peripheral edge of said heat dispreading plate,
the peripheral edge of face b of said heat dispreading plate adopts a chamfering structure,
face b of said heat dispreading plate adopts a protruding portion, wherein the size of the peripheral edge of the protruding portion is smaller than the size of the peripheral edge of said high-voltage insulation plate.
1. A led light module including a plurality of led wafers, an outer insulator, a high-voltage insulation plate consisting essentially of a ceramic wafer with a thickness of more than 0.15 mm, a thermal conductive core, a heat dispreading plate consisting essentially of copper, or aluminum, or copper-aluminum composite material and having face A and face b for said high-voltage insulation plate to be attached to,
said heat dispreading plate is a plate that,
the area of said heat dispreading plate is five times larger than the sum area of said led wafers on said heat dispreading plate, and
said led wafers are set directly on face A of said heat dispreading plate, or
face A of said heat dispreading plate is provided with a low-voltage insulation layer, the thickness of said low-voltage insulation layer is not larger than 50 μm, said led wafers are set directly on said low-voltage insulation layer,
said high-voltage insulation plate is a wafer that is attached directly on face b of said heat dispreading plate, and is set between said heat dispreading plate and said thermal conductive core, and is attached directly on the heat absorption face of said thermal conductive core,
said outer insulator is a part that, by which the whole peripheral sidewall of said heat dispreading plate is surrounded, and is in company with said high-voltage insulation plate to make the whole outer circumferential edge and face b of said heat dispreading plate to be insulated and separated from said thermal conductive core,
characterized in that:
wherein the whole peripheral edge of said high-voltage insulation plate has any kind of the four insulation strength enhancing structures listed below:
the heat adsorption face of said thermal conductive core is provided with a protruding portion, wherein the size of the peripheral edge of said protruding portion is smaller than the size of the peripheral edge of said high-voltage insulation plate,
the size of the peripheral edge of said high-voltage insulation plate is larger than the size of the peripheral edge of said heat dispreading plate,
the peripheral edge of face b of said heat dispreading plate adopts a chamfering structure,
face b of said heat dispreading plate adopts a protruding portion, wherein the size of the peripheral edge of the protruding portion is smaller than the size of the peripheral edge of said high-voltage insulation plate.
2. The led light module, as recited in
3. The led light module, as recited in
4. The led light module, as recited in
6. The led chip, as recited in
7. The led chip, as recited in
8. The led chip, as recited in
wherein said retention plate, which is made from an insulation plate, is provided with an electric circuit and a lead wire soldering pad, there is an electrical connection between said lead wire soldering pad and the electrode soldering pad on said led wafer.
9. The led chip, as recited in
10. The led chip, as recited in
12. The led chip, as recited in
13. The led chip, as recited in
14. The led chip, as recited in
15. The led chip, as recited in
16. The led chip, as recited in
17. The led chip, as recited in
18. The led chip, as recited in
wherein said retention plate, which is made from an insulation plate, is provided with an electric circuit and a lead wire soldering pad, there is an electrical connection between said lead wire soldering pad and the electrode soldering pad on said led wafer.
19. The led chip, as recited in
20. The led chip, as recited in
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1. Field of Invention
The present invention relates to the LED technical field, and more particularly to an LED package structure for reducing the internal heat conduction resistance of an LED light module or an LED chip as well as raising the insulation strength thereof.
2. Description of Related Arts
One of the most important applications of LED technology is the light illumination. The LED light illumination is considered to be the green illumination technology for the next generation of human beings. However, the manufacturing costs of LED illumination products are still high, so that the widely application thereof is hindered. The heat dissipation should be responsible for the high manufacturing costs of LED illumination products. The LED heat dissipating process comprises an internal heat conduction process, and an external heat transfer process of air convection (and/or radiation). The present invention only relates to the internal heat conduction process.
The internal heat conduction thermal resistance of a current LED chip accounts for a relatively large portion of the total heat transfer process thermal resistance. A current product has a thermal resistance of at least 6° C./W. The amount will be at least 10° C./W considering the thermal resistance of the insulation layer on the aluminum base plate. The aim for addressing the electrical insulation problem within the chip should be responsible for the high internal conduction thermal resistance. Even the internal conduction thermal resistance is as high as the amount mentioned above, the electrical insulation strength thereof is less than 2,000V. The thermal resistance must be higher for obtaining higher and safer electrical insulation strength. There is suggestion which is to adopt a high heat conduction ceramic (such as AIN ceramic) as the heat sink of the LED chip for solving the contradiction between the insulation and heat conduction issue. However, the manufacturing costs of AIN like high heat conduction ceramics are high.
The modularization and standardization of light source is the inevitable development orientation of LED light illumination. A Chinese patent (patent No. ZL2009201340352, an LED lamp core and LED illumination lamp thereof) adopts a conical or tapered spiral column structure to solve the problem of contact heat transfer between the LED light module and the lamp (radiator). But the contradiction between the electrical insulation and heat conduction issue from the LED wafer to the heat conductive core (lamp) remains to be solved.
The main object of the present invention is to solve the problem of the internal heat conduction as well as the electrical insulation (especially high voltage insulation) of the LED light module and LED chip, a novel configuration which is based on the principle theory of heat transfer is provided, so as to obtain high voltage insulation and meet higher electro-security regulations while reduce the internal heat conduction thermal resistance in order to significantly reduce the total manufacturing costs without the need for adopting expensive AIN like high heat conduction ceramics.
Additional advantages and features of the invention will become apparent from the description which follows, and may be realized by means of the instrumentalities and combinations particularly point out in the appended claims.
According to the present invention, the foregoing and other objects and advantages are attained by an LED light module comprising: a plurality of LED wafers, a heat dispreading plate, an outer insulator, a high-voltage insulation plate, and a thermal conductive core, wherein a contact heat transfer surface of the thermal conductive core for transferring the heat to outside adopts a conical or a tapered spiral column structure. The LED light module of the present invention has the following character features: The LED wafers are set on one face of the heat spreading plate which is defined as Face A of the heat dispreading plate, wherein the heat dispreading plate adopts copper or aluminum material or copper-aluminum composite material, wherein the area of the heat dispreading plate is five times larger than the sum area of the LED wafers on the heat dispreading plate, wherein the thickness of the heat dispreading plate is larger than 0.4 mm. The high-voltage insulation plate is set between the other face which is defined as Face B of the heat dispreading plate and an end face (i.e. heat leading-in face of the thermal conductive core, so called heat absorption face) of the thermal conductive core. The high-voltage insulation plate adopts a ceramic wafer which is sintered into ceramics, with a thickness of more than 0.15 mm. The outer insulator is arranged around the peripheral sidewall of the heat dispreading plate and is connected with the high-voltage insulation plate, the whole outer circumferential edge and Face B of said heat dispreading plate are surrounded by said outer insulator and said high-voltage insulation plate so as to be insulated and separated.
The thermal conductive cores adopts a conical or a tapered spiral column structure, so as to effectively solve the problem of contact heat transfer between the module and the radiator, as disclosed in the Chinese patent (patent No. ZL2009201340352, an LED lamp core and LED illumination lamp thereof).
Since the area of the LED wafers is small, and a high heat flux density is produced, so that a high heat conduction temperature difference is formed between the LED wafer and the thermal conductive core (heat dissipation plate). The heat conduction temperature difference (i.e. thermal resistance) is directly proportional to the heat flux density and the heat conduction distance, but inversely proportional to the thermal conductivity of the material. The insulation materials have a relatively low thermal conductivity (except AIN like high thermal conduction ceramics) which is a plurality ten times smaller than copper and aluminum. When adopting a wafer with a size of 1×1 mm and a thermal power of 1 W, the heat flux density will be 106 W/m2. When using the structure of the current products, an alumina ceramic plate (thermal conductivity of 20 W/m·k) with a thickness of 0.15 mm are used as the insulation plate, the wafers are directly set on the ceramic plate, the insulation strength can be 1500V while the heat conduction temperature difference will be 7.5° C.
According to the present invention, the wafers are set on the heat dispreading plate which is made of copper or aluminum. The high-voltage insulation plate which is responsible for providing a high voltage insulation performance is set between the heat dispreading plate and thermal conductive core. When adopting a wafer with a size of 1×1 mm and a thermal power of 1 W, and an alumina ceramic wafer (thermal conductivity of 20 W/m·k) with a thickness of 0.15 mm are used as the high-voltage insulation plate, i.e. maintaining the same insulation strength, but the heat flux density will reduce after passing through the heat dispreading plate. When the heat flux density is reduced five times, the heat conduction temperature difference on the high-voltage insulation plate will be reduced to 1.5° C., and thus the thermal resistance is significantly reduced. The design concept of the prevent invention is that not consider the electrical insulation (high-voltage insulation) between the LED wafers and the heat dispreading plate first, but to reduce the heat flux density first, and then apply the high-voltage insulation, so as the internal conduction thermal resistance can be reduced significantly. The heat dispreading plate which is made of metal electric conductive material has no insulation or low insulation strength with the wafers, so that the high-voltage insulation of the heat dispreading plate becomes the main issue.
Although the heat dispreading plate of the present invention has a similar heat conduction process similar to the heat sink of the current products, the present invention firstly introduce and emphasize the important effect: heat spreading effect, so that it is defined as heat dispreading plate. The current LED industry is not clear about the concept and the importance of heat dispreading and heat-flux density decreasing. Since the thermal conductivity of copper and aluminum is high but the price is lower, so that the heat dispreading plate is preferred to be made of copper or aluminum, or copper-aluminum composite material.
The heat dispreading plate which is used for heat dispreading not only needs to adopt a material with a high thermal conductivity, but also the area and thickness thereof should be large enough. The area of the heat dispreading plate should be five times larger than the sum area of the LED wafers on the heat dispreading plate so that the heat-flux density can be reduced five times, preferably ten times in practical applications, the thickness of the heat dispreading plate should be larger than 0.4 mm by means of calculation and analysis by synthesis. The aim and effect of a thick heat dispreading plate is to effectively spread the heat in the heat dispreading plate so as to reduce the heat flux density.
LED wafers are preferably directly soldered on the heat dispreading plate. Since the connection between the LED wafers and the heat dispreading plate has a high heat flux density, the thermal conductivity of the material at the connection should be high enough. The thermal conductivity of the metal material is high, for example, the thermal conductivity of tin is 60 W/m·k which is several times larger than the thermal conductivity of the heat conduction adhering glue (e.g. fulmargin).
The ceramic wafer which is sintered into ceramics is compact in substance and has high insulation strength and enough high thermal conductivity, so that the present invention adopts the ceramic wafer which is sintered into ceramics as the high-voltage insulation plate. The alumina ceramic wafer has low manufacturing costs and enough high thermal conductivity, the thermal conductivity of 96 alumina ceramics can be 20 W/m·k, so that it is a first choice of the material for the high-voltage insulation plate.
The thickness of the ceramic wafer of the high-voltage insulation plate of the present invention is not less than 0.15 mm. From one aspect considering the difficulty of the manufacturing process, the ceramic wafer which is too thin is not easy for producing and is easy to break. From another aspect considering the insulation strength, the insulation strength of the high-voltage insulation plate is defined to be more than 1500V. High insulation strength is beneficial for reducing the power driver circuit, for example, when the insulation strength is high enough to meet the electrical security requirements, a non isolated power driver circuit can be used, the manufacturing costs can be reduced.
The high-voltage insulation plate can be designed to be integrated with the thermal conductive core via soldering (or adhering), or can be integrated with the heat dispreading plate via soldering (or adhering). According to the second design, the present invention provided an LED chip comprising: a plurality of LED wafers, a heat dispreading plate, an outer insulator, and a high-voltage insulation plate. The LED chip of the present invention has the following character features: the LED wafers are set on Face A of the heat dispreading plate, wherein the heat dispreading plate adopts copper or aluminum material or copper-aluminum composite material, wherein the area of the heat dispreading plate is five times larger than the sum area of the LED wafers on the heat dispreading plate, wherein the thickness of the heat dispreading plate is larger than 0.4 mm. The high-voltage insulation plate is set on Face B of the heat dispreading plate. The high-voltage insulation plate adopts a ceramic wafer which is sintered into ceramics, with a thickness of more than 0.15 mm. The outer insulator is arranged around the peripheral sidewall of the heat dispreading plate and is connected with the high-voltage insulation plate, the whole outer circumferential edge and Face B of said heat dispreading plate are surrounded by said outer insulator and said high-voltage insulation plate so as to be insulated and separated.
Still further objects and advantages will become apparent from a consideration of the ensuing description and drawings.
These and other objectives, features, and advantages of the present invention will become apparent from the following detailed description, the accompanying drawings, and the appended claims.
In the drawings:
1 LED wafer; 2 high-voltage insulation plate; 3 heat spreading plate; 301 Face A: 302 Face B; 4 outer insulator; 5 thermal conductive core; 6 lamp housing cover; 7 insulation glue (filling); 8 retention plate; 9 electrical wire; 10 solder or electrical conductive glue; 11 low-voltage insulation layer, 12 electric power input wire; 13 insulation bushing; 14 constant voltage diode; 15 controllable silicon.
As shown in
The high-voltage insulation plate and the outer insulator are two components with two materials respectively. The high-voltage insulation plate has a small thickness (not larger than 0.5 mm). As shown in
In the LED light module shown in
The LED chip in
The LED chip shown in
In order to enhance the insulation strength at the peripheral edge of the high-voltage insulation plate, the LED chip of the present invention shown in
There are two types of LED wafers: one type of the LED wafer includes a substrate which is an electric conductor and has a pn electrode of L-contact (Laterial-contact) which is known as L-type electrode, for example, the substrate of this type of LED wafer is carborundum; the other type of LED wafer includes a substrate which is an insulator and has a pn electrode of V-contact (Vertical-contact) which is known as V-type electrode, for example, the substrate this type of LED wafer is sapphire. If the LED wafers adopt a serial connection structure, and the LED wafers are directly contacting the metal (copper or aluminum) on the heat spreading plate, there is only one choice which is to use LED wafers with an insulation substrate and having a formal structure, as the structures shown in
Ceramic membranes which are produced through vapor deposition process such as diamond, SiC, AiN, BN, BeO, Al2O3 are compact in substance and have good electrical insulation and heat conduction performances, especially, diamond, SiC, AiN, BN, and BeO which are high heat conduction ceramics, can be used as the low-voltage insulation layer on Face A of the heat spreading plate. The vapor deposition process can be physical vapor deposition process or chemical vapor deposition process, both of them are suitable for preparing the low-voltage insulation layer of the present invention.
Although the ceramic membranes produced through vapor deposition process are compact in substance and have good insulation and heat conduction performances, the thickness of the ceramic membranes are small (several micro), the manufacturing costs are relatively high. The manufacturing costs of ceramic membrane which can endure hundreds of voltages (the thickness of the membrane should be thinker than 10 μm) are even higher. When adopting the anodic oxidation process for directly growing alumina membrane on the metal aluminum on the surface of the heat dispreading plate so as to produce the low-voltage insulation layer. Although the heat conduction performance of the alumina membrane is not high as the membrane produced by vapor deposition process, the manufacturing costs are low and it is easy to obtain a thicker membrane, the insulation strength thereof can be more than 100V. When in design, the thickness of the alumina membrane serving as the low-voltage insulation layer should be smaller than 50 μm so as to control the heat conduction resistance thereof.
Although copper is more expensive than aluminum and harder for processing into a desired shape, the amount of materials required for the heat dispreading plate is relatively few and the outer appearance is simple (plate shaped) and the manufacturing process is easy. More importantly, the thermal flux density of the LED wafers is relatively high, the material of the high heat conduction is more important, so that the heat dispreading plate should adopt copper first. In order to create an alumina insulation layer with anodic oxidation process on the surface of the copper heat dispreading plate, a copper and aluminum composite material should be introduced. In other words, the copper plate is coated with an aluminum layer on the surface thereof. The aluminum layer on Face A of the heat dispreading plate should have a small thickness as long as the thickness is capable for providing aluminum which is required for the anodic oxidation process.
In the LED chip shown in
As also shown in
When a flip chip structure is used, if a retention plate is employed and the lead wire soldering pads are located on the surface of the retention plate, an electrode soldering pad on the LED wafer should be provided on the sidewall of the LED wafer, solder soldering or electrical conductive glue adhering can be employed for providing the electrical connection between the lead wire soldering pads on the retention plate and the electrode soldering pads on the LED wafers. As shown in
The LED light module or LED chip of the present invention comprises a plurality of LED wafers which can be serially connected. When one of the LED wafers ceases to be in effect or a break in the circuit is produced, the operation of the module or chip is influenced. Therefore, it is preferred to provide a circuit break safety element which is in parallel connection with each of or a plurality of the LED wafers.
The circuit break safety element can be provided on the surface of the retention plate. Also, the installation of circuit break safety element may adopt the embedding structure similar to the LED wafers in the retention plate shown in
It will thus be seen that the objects of the present invention have been fully and effectively accomplished. It embodiments have been shown and described for the purposes of illustrating the functional and structural principles of the present invention and is subject to change without departure from such principles. Therefore, this invention includes all modifications encompassed within the spirit and scope of the following claims.
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Oct 06 2016 | QIN, BIAO | SHENZHEN QIN BO CORE TECHNOLOGY DEVELOPMENT CO , LTD | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 040044 | /0371 |
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