Patent
   D275032
Priority
Jan 06 1982
Filed
Jan 06 1982
Issued
Aug 07 1984
Expiry
Aug 07 1998
Assg.orig
Entity
unknown
6
5
n/a
The ornamental design for a plasma cassette etcher, substantially as shown and described.

FIG. 1 is a front perspective view of a plasma cassette etcher showing our new design;

FIG. 2 is a front elevational view of the plasma cassette etcher shown in FIG. 1;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a rear elevational view thereof;

FIG. 6 is a left side elevational view thereof, looking toward the left side thereof as it is shown in FIGS. 1 and 2; and

FIG. 7 is a right side elevational view thereof, looking toward the right side thereof as it is shown in FIGS. 1 and 2.

Zafiropoulo, Arthur W., Maher, Jr., Joseph A.

Patent Priority Assignee Title
5308431, Apr 18 1986 Applied Materials, Inc System providing multiple processing of substrates
5344542, Apr 18 1986 Applied Materials, Inc Multiple-processing and contamination-free plasma etching system
6103055, Apr 18 1986 Applied Materials, Inc System for processing substrates
6773683, Jan 08 2001 UVTECH SYSTEMS, INC Photocatalytic reactor system for treating flue effluents
7270724, Dec 13 2000 Novellus Systems, Inc Scanning plasma reactor
D706948, Dec 28 2012 Comfort media station
Patent Priority Assignee Title
4264393, Oct 31 1977 MOTOROLA, INC , A DE CORP Reactor apparatus for plasma etching or deposition
4341582, Dec 22 1980 Lam Research Corporation Load-lock vacuum chamber
4397708, Sep 25 1980 Koltron Corporation Etching and etchant removal apparatus
228455,
228755,
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jan 05 1982ZAFIROPOULO, ARTHUR W DRYTEX, INC ASSIGNMENT OF ASSIGNORS INTEREST 0042240111 pdf
Jan 06 1982Drytek, Inc.(assignment on the face of the patent)
Jan 06 1982MAHER, JOSEPH A JR DRYTEX, INC ASSIGNMENT OF ASSIGNORS INTEREST 0042240111 pdf
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