Patent
   D354297
Priority
Sep 15 1992
Filed
Mar 15 1993
Issued
Jan 10 1995
Expiry
Jan 10 2009
Assg.orig
Entity
unknown
3
4
n/a
The ornamental design for a wet and dry processor, as shown and described.

FIG. 1 is a perspective view of a wet and dry processor showing my new design;

FIG. 2 is a rear view thereof;

FIG. 3 is a front view thereof;

FIG. 4 is a view of one side thereof;

FIG. 5 is a view of the other side thereof;

FIG. 6 is a bottom view thereof; and,

FIG. 7 is a top view thereof.

Pokorny, Wolfgang

Patent Priority Assignee Title
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Patent Priority Assignee Title
5290361, Jan 24 1991 Wako Pure Chemical Industries, Ltd.; Purex Co., Ltd. Surface treating cleaning method
5301700, Mar 05 1992 Tokyo Electron Limited Washing system
5311893, May 08 1991 Tokyo Electron Limited Cleaning apparatus
5320706, Oct 15 1991 Texas Instruments Incorporated Removing slurry residue from semiconductor wafer planarization
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Mar 15 1993Pokorny GmbH(assignment on the face of the patent)
Apr 07 1993POKORNY, WOLFGANGPokorny GmbHASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0065390330 pdf
May 06 1994Pokorny GmbHSteag MicroTech GmbH DonaueschingenCHANGE OF NAME SEE DOCUMENT FOR DETAILS 0070770578 pdf
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