Patent
   D400511
Priority
Mar 21 1996
Filed
Mar 21 1996
Issued
Nov 03 1998
Expiry
Nov 03 2012
Assg.orig
Entity
unknown
1
21
n/a
The ornamental design for a magnet structure for a conical target, as shown .

FIG. 1 is a perspective view showing substantially the bottom of a magnet structure of the present invention;

FIG. 2 is a perspective view showing substantially one side of a magnet structure of the present invention;

FIG. 3 is a perspective view showing substantially another side of a magnet structure of the present invention;

FIG. 4 is a perspective view showing substantially another side of a magnet structure of the present invention;

FIG. 5 is a perspective view showing substantially the bottom of a magnet structure of the present invention;

FIG. 6 is a bottom perspective view of a magnet structure of the present invention; and,

FIG. 7 is a top perspective view of a magnet structure of the present invention.

Tepman, Avi

Patent Priority Assignee Title
D502450, Apr 23 2002 BIOCONTROL SYSTEMS, INC Transfer device for magnetic particles
Patent Priority Assignee Title
3654110,
3663850,
3988232, Jun 25 1974 Matsushita Electric Industrial Co., Ltd. Method of making crystal films
4394236, Feb 16 1982 BOC GROUP PLC, THE, CHERTSEY ROAD, WINDLESHAM SURREY, ENGLAND GU20 6HJ, A CORP OF GREAT BRITAIN Magnetron cathode sputtering apparatus
4457825, May 16 1980 Varian Semiconductor Equipment Associates, Inc Sputter target for use in a sputter coating source
4547279, Oct 22 1982 Hitachi, Ltd. Sputtering apparatus
4673480, May 16 1980 Novellus Systems, Inc Magnetically enhanced sputter source
4721553, Aug 31 1984 Hitachi, Ltd. Method and apparatus for microwave assisting sputtering
4747926, Feb 08 1985 Hitachi, Ltd. Conical-frustum sputtering target and magnetron sputtering apparatus
4756810, Dec 04 1986 SOLITEC WAFER PROCESSING INC Deposition and planarizing methods and apparatus
4957605, Apr 17 1989 Tokyo Electron Limited Method and apparatus for sputter coating stepped wafers
5063934, Oct 07 1987 QUALION LTD Permanent magnet arrangement
5194131, Aug 16 1991 Varian Associates, Inc.; Varian Associates, Inc Apparatus and method for multiple ring sputtering from a single target
5252194, Jan 26 1990 Novellus Systems, Inc Rotating sputtering apparatus for selected erosion
D337148, Jan 11 1991 SAVECO, INC Magnet holder for treatment of liquids
DE150482,
EP273550,
JP5148633,
JP62017175,
JP63243272,
JP7166346,
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Mar 20 1996TEPMAN, AVIAPLLIED MATERIAL, INC ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0079660111 pdf
Mar 21 1996Applied Materials, Inc.(assignment on the face of the patent)
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