Patent
   D440582
Priority
Mar 16 1998
Filed
Jul 13 1998
Issued
Apr 17 2001
Expiry
Apr 17 2015
Assg.orig
Entity
unknown
1
55
n/a
The ornamental design for sputtering chamber coil, as shown and described.

FIG. 1 is a front elevational view;

FIG. 2 is a top view;

FIG. 3 is a right side elevational view;

FIG. 4 is a bottom view; and,

FIG. 5 is a rear elevational view of our sputtering chamber coil.

The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.

Ding, Peijun, Forster, John C., Gopalraja, Praburam, Xu, Zheng, Rosenstein, Michael

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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jul 13 1998Applied Materials, Inc.(assignment on the face of the patent)
Jul 21 1998GOPALRAJA, PRABURAMApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096530075 pdf
Jul 21 1998ROSENSTEIN, MICHAELApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096530075 pdf
Jul 21 1998DING, PEIJUNApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096530075 pdf
Jul 22 1998XU, ZHENGApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096530075 pdf
Jul 23 1998FORSTER, JOHN C Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096530075 pdf
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