|
The design for sputtering chamber coil, as shown and described. |
FIG. 1 is a front elevational view;
FIG. 2 is a top view;
FIG. 3 is a right side elevational view;
FIG. 4 is a bottom view; and,
FIG. 5 is a rear elevational view of our sputtering chamber coil.
The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.
Forster, John C., Gopalraja, Praburam, Xu, Zheng, Rosenstein, Michael
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Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Jul 13 1998 | Applied Materials, Inc. | (assignment on the face of the patent) | / | |||
Jul 21 1998 | GOPALRAJA, PRABURAM | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 009616 | /0662 | |
Jul 21 1998 | ROSENSTEIN, MICHAEL | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 009616 | /0662 | |
Jul 22 1998 | XU, ZHENG | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 009616 | /0662 | |
Jul 23 1998 | FORSTER, JOHN C | Applied Materials, Inc | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 009616 | /0662 |
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