Patent
   D450070
Priority
Jul 13 1998
Filed
Jul 13 1998
Issued
Nov 06 2001
Expiry
Nov 06 2015
Assg.orig
Entity
unknown
2
27
n/a
The design for sputtering chamber coil, as shown and described.

FIG. 1 is a front elevational view;

FIG. 2 is a top view;

FIG. 3 is a right side elevational view;

FIG. 4 is a bottom view; and,

FIG. 5 is a rear elevational view of our sputtering chamber coil.

The left side elevation view (not shown) is the same as the right side elevational view (FIG. 3) because of coil symmetry.

Forster, John C., Gopalraja, Praburam, Xu, Zheng, Rosenstein, Michael

Patent Priority Assignee Title
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jul 13 1998Applied Materials, Inc.(assignment on the face of the patent)
Jul 21 1998GOPALRAJA, PRABURAMApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096160662 pdf
Jul 21 1998ROSENSTEIN, MICHAELApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096160662 pdf
Jul 22 1998XU, ZHENGApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096160662 pdf
Jul 23 1998FORSTER, JOHN C Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0096160662 pdf
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