Patent
   D630535
Priority
Mar 25 2009
Filed
Aug 11 2009
Issued
Jan 11 2011
Expiry
Jan 11 2025
Assg.orig
Entity
unknown
7
4
n/a
The ornamental design for a spectrophotometer, as shown and described.

FIG. 1 is a perspective view of a spectrophotometer showing the new design.

FIG. 2 is another perspective view thereof.

FIG. 3 is a front view thereof.

FIG. 4 is a rear view thereof.

FIG. 5 is a left side view thereof.

FIG. 6 is a right side view thereof.

FIG. 7 is a top view thereof.

FIG. 8 is a bottom view thereof.

FIG. 9 is an enlarged perspective view of a test region thereof; and,

FIG. 10 is another enlarged perspective view of a test region thereof.

Hoshino, Shogo

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Patent Priority Assignee Title
6617095, Apr 07 2000 Tokyo Electron Limited Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern
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D373315, Jul 27 1995 Hitachi, Ltd. Spectro photometer
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May 25 2009HOSHINO, SHOGOShimadzu CorporationASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0230810546 pdf
Aug 11 2009Shimadzu Corporation(assignment on the face of the patent)
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