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Patent
D631858
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Priority
Nov 17 2008
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Filed
Nov 17 2008
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Issued
Feb 01 2011
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Expiry
Feb 01 2025
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Assg.orig
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Entity
unknown
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3
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15
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n/a
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The ornamental design for a shadow frame, as shown and described.
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FIG. 1 is an isometric view of a shadow frame showing my new design;
FIG. 2 is a bottom plan view thereof;
FIG. 3 is a side elevation view thereof; the opposite side being identical thereto;
FIG. 4 is a top plan view thereof;
FIG. 5 is a another side elevation view thereof; the opposite side being identical thereto;
FIG. 6 is an enlarged detailed view of FIG. 2.
FIG. 7 is another enlarged detailed view of FIG. 2; and,
FIG. 8 is a cross section of FIG. 7 taken in the direction of line 8—8.
The broken line portion of FIG. 7 is included to show an unclaimed element and forms no part of the claimed design.
Kim, Kyung-Tae
Patent |
Priority |
Assignee |
Title |
5352294, |
Jan 28 1993 |
Applied Materials, Inc |
Alignment of a shadow frame and large flat substrates on a support |
6106631, |
Oct 16 1997 |
Sharp Kabushiki Kaisha |
Plasma processing apparatus |
6355108, |
Jun 22 1999 |
APPLIED KOMATSU TECHNOLOGY, INC |
Film deposition using a finger type shadow frame |
6744562, |
Jul 30 2001 |
Asahi Glass Company, Limited |
Pellicle |
6746198, |
May 20 1998 |
Applied Materials, Inc. |
Substrate transfer shuttle |
6773562, |
Feb 20 1998 |
APPLIED KOMATSU TECHNOLOGY, INC |
Shadow frame for substrate processing |
20040123799, |
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20060011137, |
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20060103289, |
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20060148368, |
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20080213679, |
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20090283036, |
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D568839, |
May 17 2004 |
Hoya Corporation |
Photomask blank |
D608742, |
Nov 14 2008 |
Applied Materials, Inc |
Shadow frame |
D608743, |
Nov 18 2008 |
Applied Materials, Inc |
Shadow frame |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a