Patent
   D713024
Priority
Nov 19 2012
Filed
Nov 19 2012
Issued
Sep 09 2014
Expiry
Sep 09 2028
Assg.orig
Entity
unknown
2
13
n/a
What is claimed is the chemical vapor deposition fixture, as shown and described.

FIG. 1 shows a perspective view of the chemical vapor deposition fixture.

FIG. 2 shows a front view thereof;

FIG. 3 shows a rear view thereof;

FIG. 4 shows a first side view thereof;

FIG. 5 shows a second side view thereof; and,

FIG. 6 shows the bottom view thereof.

The broken line showing of parts of the drawings is included for the purpose of illustrating use and environment and forms no part of the claimed design.

Grove, William David, Deskevich, Nicholas Peter

Patent Priority Assignee Title
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Patent Priority Assignee Title
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7252716, Nov 15 2002 Samsung Electronics Co., Ltd. Gas injection apparatus for semiconductor processing system
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D645487, Mar 20 2009 Foseco International Limited Holder for molten metal filters
D689107, Nov 19 2012 Silcotek Corp. Weldment fixture
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Nov 14 2012GROVE, WILLIAM DAVIDSILCOTEK CORPASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0293180737 pdf
Nov 14 2012DESKEVICH, NICHOLAS PETERSILCOTEK CORPASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0293180737 pdf
Nov 19 2012Silcotek Corp.(assignment on the face of the patent)
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