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Patent
D750783
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Priority
Feb 19 2014
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Filed
Jul 16 2014
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Issued
Mar 01 2016
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Expiry
Mar 01 2030
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Assg.orig
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Entity
unknown
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2
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8
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n/a
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The ornamental design for a X-ray residual stress measuring instrument, as shown and described.
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FIG. 1 is a front elevational view of a X-ray residual stress measuring instrument showing our new design;
FIG. 2 is a top plan view thereof;
FIG. 3 is a bottom plan view therefore;
FIG. 4 is a rear elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a right side elevational view thereof;
FIG. 7 is a cross-sectional view thereof, taken along the line 7-7 of FIG. 1;
FIG. 8 is a cross-sectional view thereof, taken along the line 8-8 of FIG. 2;
FIG. 9 is a perspective view thereof; and,
FIG. 10 is a perspective view thereof.
Sasaki, Suguru, Yasukawa, Shoichi
Patent |
Priority |
Assignee |
Title |
4694480, |
Jul 30 1985 |
KEVEX X-RAY INC , A CORP OF CA |
Hand held precision X-ray source |
7515684, |
Dec 04 2002 |
X-Ray Optical Systems, Inc. |
Detection apparatus for x-ray analysis, including semiconductor detectors having uncooled active areas |
9146203, |
Jul 30 2010 |
Rigaku Corporation |
X-ray stress measuring apparatus |
D371197, |
Jul 05 1994 |
|
X-ray machine |
D554754, |
Sep 01 2004 |
Hamamatsu Photonics K.K. |
X-ray device |
D628296, |
Sep 28 2009 |
Shimadzu Corporation |
X-ray collimator |
D676554, |
Aug 10 2011 |
Samsung Electronics Co., Ltd. |
Medical X-ray collimator |
D724214, |
Aug 27 2013 |
Shimadzu Corporation |
Analyzing machine having X-ray |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a