Patent
   D836212
Priority
Aug 14 2015
Filed
Feb 02 2016
Issued
Dec 18 2018
Expiry
Dec 18 2033
Assg.orig
Entity
unknown
1
10
n/a
The ornamental design for a vacuum device, as shown and described.

FIG. 1 is a perspective view of a vacuum device embodying my new design;

FIG. 2 is a front elevation view thereof;

FIG. 3 is a rear elevation view thereof;

FIG. 4 is a left side elevation view thereof.

FIG. 5 is a right side elevation view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines illustrate portions of the vacuum device that form no part of the claimed design.

Diener, Christof-Herbert

Patent Priority Assignee Title
D881405, Oct 23 2018 TALIS BIOMEDICAL CORPORATION Analysis instrument
Patent Priority Assignee Title
5289641, Nov 23 1992 WELCH VACUUM TECHNOLOGY INC Chemical vapor trap and vacuum drying system including same
5671546, Dec 14 1995 Vacuum remediation system
5948704, Jun 05 1996 Lam Research Corporation High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support
6405423, Sep 10 1998 Applied Materials, Inc. Method for producing vacuum processing chambers
6461287, Jul 22 1999 THERMO SAVANT INC Centrifugal vacuum concentrator and modular structured rotor assembly for use therein
20090288773,
20110031214,
20170122663,
202466,
D645975, Mar 29 2007 BARKEY GMBH & CO KG Plasma warming device
Executed onAssignorAssigneeConveyanceFrameReelDoc
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule