Patent
   D934991
Priority
Apr 25 2019
Filed
Oct 23 2019
Issued
Nov 02 2021
Expiry
Nov 02 2036
Assg.orig
Entity
unknown
5
12
n/a
The ornamental design for a component of a liquid discharge nozzle for semiconductor substrate processing apparatus, as shown and described herein.

FIG. 1 is a front, bottom and left-side perspective view of a component of a liquid discharge nozzle for semiconductor substrate processing apparatus;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a rear elevational view thereof;

FIG. 4 is a left-side elevational view thereof;

FIG. 5 is a right-side elevational view thereof;

FIG. 6 is a top plan view thereof; and,

FIG. 7 is a bottom plan view thereof.

The broken lines shown represent portions of a component of a liquid discharge nozzle for semiconductor substrate processing apparatus and form no part of the claimed design.

Amano, Yoshifumi, Aiura, Kazuhiro

Patent Priority Assignee Title
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Oct 23 2019Tokyo Electron Limited(assignment on the face of the patent)
Oct 29 2019AMANO, YOSHIFUMITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0513620927 pdf
Oct 29 2019AIURA, KAZUHIROTokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0513620927 pdf
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