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Patent
D943734
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Priority
Apr 03 2020
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Filed
Apr 03 2020
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Issued
Feb 15 2022
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Expiry
Feb 15 2037
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Assg.orig
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Entity
unknown
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4
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13
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n/a
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The ornamental design for a mask, as shown and described.
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FIG. 1 is a front elevation view of a mask showing my new design;
FIG. 2 is a back elevation view thereof;
FIG. 3 is a left side elevation view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a top plan view thereof;
FIG. 6 is a bottom plan view thereof;
FIG. 7 is a front perspective view thereof; and,
FIG. 8 is a rear perspective view thereof.
Fan, Guang
Patent |
Priority |
Assignee |
Title |
20110159758, |
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20110296584, |
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20190358473, |
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CN305952084, |
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CN305959607, |
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CN306014846, |
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CN306055886, |
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CN306088015, |
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CN306109356, |
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D831192, |
Dec 18 2015 |
Vertex Korea Co., Ltd. |
Dust mask |
D894394, |
May 12 2020 |
SHENZHEN AIDIANSHENG TECHNOLOGY CO., LTD. |
Breathing filter |
EM77907040001, |
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EM78098430001, |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a