Patent
   D956005
Priority
Sep 19 2019
Filed
Sep 19 2019
Issued
Jun 28 2022
Expiry
Jun 28 2037
Assg.orig
Entity
unknown
1
93
n/a
The ornamental design for a shaped electrode, as shown and described.

FIG. 1 is an isometric view of our new design;

FIG. 2 is a first side view of the design of FIG. 1;

FIG. 3 is a second side view of the design of FIG. 1;

FIG. 4 is a first end view of the design of FIG. 1;

FIG. 5 is a second end view of the design of FIG. 1;

FIG. 6 is a top view of the design of FIG. 1; and,

FIG. 7 is a bottom view of the design of FIG. 1.

The broken lines shown represent portions of the shaped electrode that form no part of the claimed design.

Sinclair, Frank, Lindberg, Robert C., LeBlanc, Wayne, Radovanov, Svetlana, Likhanskii, Alexandre

Patent Priority Assignee Title
D983151, Sep 09 2020 KOKUSAI ELECTRIC CORPORATION Exhaust liner for reaction tube
Patent Priority Assignee Title
10068758, Jan 27 2017 Varian Semiconductor Equipment Associates, Inc Ion mass separation using RF extraction
10088694, May 08 2014 Rolled elastomeric tubular casings for eyewear
10204796, Dec 18 2015 Applied Materials, Inc. Methods for selective etching of a silicon material using HF gas without nitrogen etchants
10249507, Nov 11 2015 Applied Materials, Inc. Methods for selective etching of a silicon material
10410844, Dec 09 2016 Varian Semiconductor Equipment Associates, Inc RF clean system for electrostatic elements
10468224, Dec 21 2017 Varian Semiconductor Equipment Associates, Inc Apparatus and method for controlling ion beam properties using energy filter
10497578, Jul 22 2016 Applied Materials, Inc Methods for high temperature etching a material layer using protection coating
10522330, Jun 12 2015 Varian Semiconductor Equipment Associates, Inc In-situ plasma cleaning of process chamber components
10665415, Nov 06 2018 Applied Materials, Inc Apparatus and method for controlling ion beam properties using electrostatic filter
3025834,
4107830, May 02 1977 Rolling pin construction
4544464, Dec 23 1983 ELGARD CORPORATION A CORP OF DELAWARE Ground anode prepacked with backfill in a flexible structure for cathode protection with impressed currents
5196171, Mar 11 1991 BRANDAROMA HOLDINGS LIMITED Electrostatic vapor/aerosol/air ion generator
6130436, Jun 02 1998 Varian Semiconductor Equipment Associates, Inc Acceleration and analysis architecture for ion implanter
6326631, Sep 24 1998 U S PHILIPS CORPORATION Ion implantation device arranged to select neutral ions from the ion beam
6441382, May 21 1999 Axcelis Technologies, Inc Deceleration electrode configuration for ultra-low energy ion implanter
6489622, Mar 01 2000 ADVANCED ION BEAM TECHNOLOGY, INC Apparatus for decelerating ion beams with minimal energy contamination
6573517, Jul 30 1999 Sumitomo Eaton Nova Corporation Ion implantation apparatus
6710358, Feb 25 2000 ADVANCED ION BEAM TECHNOLOGY, INC Apparatus and method for reducing energy contamination of low energy ion beams
6777696, Feb 21 2003 Axcelis Technologies, Inc. Deflecting acceleration/deceleration gap
6946667, Mar 01 2000 ADVANCED ION BEAM TECHNOLOGY, INC Apparatus to decelerate and control ion beams to improve the total quality of ion implantation
6998625, Jun 23 1999 Varian Semiconductor Equipment Associates, Inc Ion implanter having two-stage deceleration beamline
7022984, Jan 31 2005 Axcelis Technologies, Inc. Biased electrostatic deflector
7098614, Feb 06 2002 NISSIN ION EQUIPMENT CO , LTD Electrostatic accelerator and ion implanting apparatus with the same
7223973, Dec 01 2000 Ebara Corporation Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former
7521675, Feb 04 2005 Hitachi High-Technologies Corporation Charged particle beam apparatus
7579602, Dec 22 2006 Varian Semiconductor Equipment Associates, Inc. Ion implantation with a collimator magnet and a neutral filter magnet
7579605, Sep 29 2006 Varian Semiconductor Equipment Associates, Inc. Multi-purpose electrostatic lens for an ion implanter system
7888653, Jan 02 2009 Varian Semiconductor Equipment Associates, Inc.; Varian Semiconductor Equipment Associates, Inc Techniques for independently controlling deflection, deceleration and focus of an ion beam
8129695, Dec 28 2009 Varian Semiconductor Equipment Associates, Inc. System and method for controlling deflection of a charged particle beam within a graded electrostatic lens
8395070, Apr 01 2010 American Torch Tip Electrical contact point device for use in a plasma arc cutting torch
8502160, Mar 21 2007 ADVANCED ION BEAM TECHNOLOGY, INC Beam control assembly for ribbon beam of ions for ion implantation
8519353, Dec 29 2010 Varian Semiconductor Equipment Associates, Inc.; Varian Semiconductor Equipment Associates, Inc Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
8604418, Apr 06 2010 Axcelis Technologies, Inc.; Axcelis Technologies, Inc In-vacuum beam defining aperture cleaning for particle reduction
9281162, Jun 27 2014 Advanced Ion Beam Technology, Inc. Single bend energy filter for controlling deflection of charged particle beam
9287386, Jun 19 2014 Applied Materials, Inc Method for fabricating vertically stacked nanowires for semiconductor applications
9293295, Mar 27 2014 SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO , LTD Ion implantation apparatus, final energy filter, and ion implantation method
9419107, Jun 19 2014 Applied Materials, Inc Method for fabricating vertically stacked nanowires for semiconductor applications
9508831, Jun 19 2014 Applied Materials, Inc Method for fabricating vertically stacked nanowires for semiconductor applications
9515166, Apr 10 2014 Applied Materials, Inc Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
9595451, Oct 19 2015 Applied Materials, Inc Highly selective etching methods for etching dielectric materials
9640385, Feb 16 2015 Applied Materials, Inc. Gate electrode material residual removal process
9653310, Nov 11 2015 Applied Materials, Inc Methods for selective etching of a silicon material
9679739, Dec 26 2014 Axcelis Technologies, Inc. Combined electrostatic lens system for ion implantation
9721750, Jul 28 2015 Varian Semiconductor Equipment Associates, Inc Controlling contamination particle trajectory from a beam-line electrostatic element
9831097, Dec 18 2015 Applied Materials, Inc Methods for selective etching of a silicon material using HF gas without nitrogen etchants
9911594, Apr 10 2014 Applied Materials, Inc. Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications
9978556, Dec 11 2015 Varian Semiconductor Equipment Associates, Inc Parallelizing electrostatic acceleration/deceleration optical element
20070045557,
20070164229,
20070295901,
20080135777,
20100171042,
20110114851,
20120168637,
20140034843,
20150144810,
20150155129,
20150340197,
20150340202,
20150380206,
20170032924,
20200020508,
20200161077,
20200161078,
20210090845,
CN206098343,
227514,
D254912, May 16 1978 Pilot Man-Nen Hitsu Kabushiki Kaisha Fountain pen
D282753, Dec 27 1983 PARKER PEN BENELUX B V ; Bankers Trust Company Writing instrument with a striped body
D335347, Apr 26 1991 Hu-Friedy Mfg. Co., Inc. Dental instrument handle
D407157, Jun 24 1997 Encore Medical Corporation; Encore Medical Asset Corporation Vaginal electrode
D412531, Nov 13 1997 Scratcher pen
D439337, Feb 06 1998 Surgical needle holder
D446213, Jan 04 2001 Intel Corporation Stylus
D497388, Feb 25 2004 Premium Collection Industries Limited Four-in-one pen
D564462, Dec 27 2005 Tokyo Electron Limited RF electrode for a process tube of semiconductor manufacturing apparatus
D572673, Jul 13 2006 Ebara Corporation Anode shaft
D576647, Oct 06 2006 NuFlare Technology, Inc. Nozzle for vapor-phase epitaxial equipment
D653760, Aug 31 2010 FRESHRAIN, LLC Vapor ion plasma generator
D702654, May 29 2012 ASM IP Holding B.V. Plasma power transfer rod for a semiconductor deposition apparatus
D715235, Mar 05 2014 ElliQuence, LLC Fixed position RF electrode
D901998, May 18 2018 Robert Bosch GmbH Hot-melt pencil
JP1508043,
JP1996088074,
JP1998270198,
JP2014058724,
KR1020170101884,
TW173861,
TW179921,
TW189296,
TW195250,
TW195583,
//////
Executed onAssignorAssigneeConveyanceFrameReelDoc
Sep 19 2019Applied Materials, Inc.(assignment on the face of the patent)
Sep 23 2019LINDBERG, ROBERT C Applied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509470618 pdf
Sep 23 2019LIKHANSKII, ALEXANDREApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509470618 pdf
Sep 24 2019LEBLANC, WAYNEApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509470618 pdf
Nov 07 2019SINCLAIR, FRANKApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509470618 pdf
Nov 07 2019RADOVANOV, SVETLANAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0509470618 pdf
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule