Copolycondensate molding materials are obtainable by polycondensation of
from 2 to 98 mol % of 2,2-di-(4'-hydroxyphenyl)-propane (A),
from 2 to 98 mole % of 4,4'-dihydroxydiphenyl sulfone (B) and
from 0 to 96 mole % of (C) ##STR1## where R1 and R2 are each H, C1 -C6 -alkyl or C1 -C6 -alkoxy, X is a chemical bond, --S--, --O--, --CO--, CR3 R4 (where R3 and R4 are different when n and p are each 0), or SO2 -- only when n or p is not 0), R3 and R4 are each H, C1 -C6 -alkyl, C1 -C6 -alkoxy, aryl or halogen-substituted alkyl of 1 to 4 carbon atoms, m is 0 or 1, and n and p are each 0, 1, 2, 3, or 4,
with from 1 to 100 mole % of (D) ##STR2## where R5 and R6 have the same meaning as R1 and R2, and v and w are each 0, 1, 2, 3 or 4, and from 0 to 99 mol % of (E) ##STR3## where R7 -R10 are each Cl or F or have the same meanings as R1 and R2, q is 0 or 1, r, s, t and n are each 0, 1, 2, 3 or 4, Z1 is --SO2 -- or --CO-- and Z2 is --O--, --S--, --SO2 --, --CO-- or a chemical bond,
with the proviso that one or more of the components C and E are present and the molar ratio of B to the sum of A and C is not greater than 1.
|
1. A heat-stable copolycondensate molding material which contains polyarylene sulfone and polyarylene ether sulfone units in random distribution and is obtainable by polycondensation of a mixture of
(A) from 2 to 98 mol %, based on the sum of (A)-(C), of ##STR37## (B) from 2 to 98 mol %, based on the sum of (A)-(C), ##STR38## and (C) from 0 to 96 mol %, based on the sum of (A)-(C), of ##STR39## where X is a chemical bond or ##STR40## ##STR41## (only when n or p is not 0), R1 and R2 are each alkyl or alkoxy, each of 1 to 6 carbon atoms, R3 and R4 are each hydrogen, alkyl of 1 to 6 carbons atoms, aryl or halogen-substituted alkyl of 1 to 4 carbon atoms, m is 0 or 1 and n and p are 0, 1, 2, 3 or 4, with (D) from 1 to 100 mol %, based on the sum of (D) and (E), of ##STR42## where R5 and R6 are each hydrogen or have the same meanings as R1 and R2, Y is Cl or F, and v and w are each 0, 1, 2, 3 or 4, and (E) from 0 to 99 mol %, based on the sum of (D) and (E), of ##STR43## or a chemical bond, R7, R8, R9 and R10 are each hydrogen, Cl or F or may have the same meanings as R1 and R2, q and p are each 0 or 1 and r, s, t and u may each be an integer from 0 to 4, with the proviso that one or more of the components C and E are present and the molar ratio of B to the sum of A+C is not greater than 1.
2. A heat-stable copolycondensate molding material as claimed in
from 25 to 70 mol % of A, from 25 to 70 mol % of B and from 5 to 60 mol % of C,
the percentages in each case being based on the sum of A to C, with from 1 to 100 mol % of D and from 0 to 99 mol % of E, the percentages in each case being based on the sum of D and E. 3. A heat-stable copolycondensation molding material as claimed in
from 20 to 80 mol % of A from 20 to 80 mol % of B and from 0 to 60 mol % of C,
the percentages in each case being based on the sum of A to C, with from 50 to 95 mol % of D and from 5 to 50 mol % of E, the percentages in each case being based on the sum of D and E. 4. A heat-stable copolycondensate molding material as claimed in
from 25 to 70 mol % of A from 25 to 70 mol % of B and from 5 to 60 mol % of C,
the percentages in each case being based on the sum of A to C, with from 50 to 95 mol % of D and from 5 to 50 mol % of E, the percentages in each case being based on the sum of D and E. 5. A molding which is obtainable from a heat-stable copolycondensate molding material as claimed in
6. A printed circuit board consisting of a heat-stable copolycondensate molding material as claimed in
7. An electrical plug connection consisting of a heat-stable copolycondensate molding material as claimed in
|
The present invention relates to heat-stable copolycondensate molding materials which contain polyarylene sulfone and polyarylene ether sulfone units in random distribution and are obtainable by polycondensation of a mixture of
(A) from 2 to 98 mole %, based on the sum of (A)-(C), of ##STR4##
(B) from 2 to 98 mole %, based on the sum of (A)-(C), of ##STR5## and
(C) from 0 to 96 mol %, based on the sum of (A)-(C), of ##STR6## where X is a chemical bond or ##STR7## (only when n or p is not 0), R1 and R2 are each alkyl or alkoxy, each of 1 to 6 carbon atoms, R3 and R4 are each hydrogen, alkyl or alkoxy of 1 to 6 carbon atoms, aryl or halogen-substituted alkyl of 1 to 4 carbon atoms, m is 0 or 1, preferably 1, and n and p are each 0, 1, 2, 3, or 4.
R1 and R2 are each preferably alkyl of 1 to 4 carbon atoms, eg. methyl, ethyl, isopropyl, n-propyl or n-, iso- or tert-butyl or corresponding alkoxy groups. Methyl and ethyl are particularly preferred.
Preferred substituents R3 and R4 are C1 -C4 -alkyl groups, as described for R1 and R2, aryl or halogen-substituted alkyl, such as CF3 and CCl3, to mention but two examples.
m is 0 or 1, and is preferably 1 particularly when p is 0, ie. no substituents R2 are present.
n and p may each be 0, 1, 2, 3, or 4, preferably 0, 1, 2 or 3.
A few examples of preferred dihydroxy compounds are listed below.
__________________________________________________________________________ |
##STR13## Di-(4-hydroxyphenyl)-methane |
##STR14## 2,2-Di-(4-hydroxyphenyl)-ethane |
##STR15## 1-Phenyl-1,1-di-(4-hydroxyphenyl)-metha |
ne |
##STR16## Diphenyl-di-(4-hydroxyphenyl)-methane |
##STR17## Tetramethylbisphenol A |
##STR18## 4,4'-Dihydroxydiphenyl ether |
##STR19## 4,4'-Dihydroxydiphenyl sulfide |
##STR20## Dihydroxybenzophenone |
##STR21## 1,4-Di-(4'-hydroxyphenylcarbonyl)-benze |
ne |
##STR22## Tetramethylbisphenol S |
##STR23## Hydroquinone |
##STR24## 2,3,6-Trimethylhydroquinone |
##STR25## 4,4'-Dihydroxydiphenyl |
##STR26## 3,3',5,5'-tetramethyl-4,4'-dihydroxydip |
henyl |
##STR27## Dihydroxybenzophenone |
__________________________________________________________________________ |
ether |
The mixture of the dihydroxy compounds A, B and, where relevant, C contains from 2 to 98 mole % of A, from 2 to 98 mol % of B and from 0 to 96 mol % of C, the percentages in each case being based on the sum of A-C.
Preferred mixtures are those which contain from 20 to 80, in particular from 25 to 70, mol % of A, from 20 to 80, in particular from 25 to 70, mol % of B and from 0 to 60, in particular from 5 to 60, mol % of C.
Component C is present in the mixture whenever component E is not used. In this case, as a rule from 5 to 60, preferably from 10 to 40, mol %, based on the sum of compounds A to C, of dihydroxy compound C are used.
The molar ratio of dihydroxy compound B to the sum of A and C is not more than 1. If this ratio is greater than 1, the water absorption is adversely affected and becomes too high. Products of this type are less suitable for the production of components in the electrical industry and electronics.
Compounds D and E, which are reacted with the mixture of compounds, A, B and, if required, C to give the novel heat-stable copolycondensate molding materials, are aromatic dihalogen compounds. Compound D is 4,4'-dichloro- or 4,4'-difluorodiphenyl sulfone or their C1 -C6 -alkyl-substituted or halogen-substituted derivatives, such as 3,3,5,5'-tetramethyl-4,4'-dichlorodiphenyl sulfone or the corresponding fluorine compound. The two halogen substituents may be identical or different. v and w can be 0, 1, 2, 3 or 4, and are preferably 0, 1 or 2.
The compounds E are of the general formula ##STR28## or a chemical bond, R7, R8, R9 and R10 are each hydrogen, Cl or F or may have the same meanings as R1 and R2, q and p are each 0 or 1 and r, s, t and u may each be an integer from 0 to 4.
Z2 is preferably a chemical bond, or --SO2 --, and R7, R8, R9 and R10 are each preferably hydrogen, methyl, ethyl or Cl or F, r, s, t and u may each be 0, 1, 2, 3 or 4, preferably 0, 1 or 2.
Some preferred dihalogen compounds D and E are listed below merely as typical examples.
__________________________________________________________________________ |
Name of chlorine compound |
__________________________________________________________________________ |
##STR29## 4,4'-Dichlorobenzophenone |
##STR30## 1,4-Di-(4'-chlorophenylcarbonyl)-benz |
ene |
##STR31## 1,10-Di-(4'-chlorophenylsulfonyl)-dip |
henyl |
##STR32## 4,4'-Dichlorodiphenyl sulfone |
##STR33## 3,3',5,5'-Tetramethyl-4,4'-dichlorodi |
phenyl sulfone |
##STR34## 3-Chloro-4,4'-dichlorodiphenyl |
sulfone |
##STR35## 3,3'-4,4'-Tetrachlorodiphenyl |
sulfone |
##STR36## 1,3-Dimethyl-4,6-di-(4-chlorophenylsu |
lfonyl)benzene |
__________________________________________________________________________ |
The amount of dihalogen compound D is from 1 to 100, preferably from 20 to 100, particularly preferably from 50 to 100, mol %, based on the sum of D and E.
The dihalogen compounds E are present when no dihydroxy compound C is used. In this case, the amount of the dihalogen compound E is preferably from 5 to 50, particularly preferably from 10 to 40, mol %, based on the sum of D and E.
The novel copolycondensate molding materials can be mixed with other thermoplastics, for example polyesters, nylons, polyurethanes, polyolefins, polyvinyl chloride and polyoxymethylenes, in amounts of from 5 to 50, preferably from 20 to 50, % by weight, based on the molding materials.
They may furthermore be modified with reinforcing fillers and, if required, transparent pigments and other assitants and additives.
Examples of reinforcing fillers are asbestos, carbon and preferably glass fibers, the latter being used in the form of, for example, glass fabrics, mats, surface mats and/or preferably glass rovings or cut glass filaments of low-alkali E glasses having a diameter of from 5 to 200 μm, preferably from 8 to 15 μm, which, after being incorporated, have a mean length of from 0.05 to 1 mm, preferably from 0.1 to 0.5 mm. The molding materials reinforced with glass rovings or cut glass filaments contain from 10 to 60, preferably from 20 to 50, % by weight, based on the total weight, of the reinforcing material, while the impregnated-glass fabrics, mats and/or surface mats contain from 10 to 80, preferably from 30 to 60, % by weight, based on the total weight, of copolycondensates. Examples of suitable pigments are titanium dioxide, cadmium sulfide, zinc sulfide, barium sulfate and carbon black. Examples of other suitable additives and assistants are dyes, lubricants, eg. graphite or molybdenum disulfide, abrasives, eg. carborundum, light stabilizers and stabilizers against hydrolysis. The pigments, additives and assistants are usually used in amounts of from 0.01 to 3% by weight, based on the weight of polycondensates.
Wollastonite, calcium carbonate, glass spheres, quartz powder, silicon nitride and boron nitride or mixtures of these fillers may also be used.
The polycondensation of the dihydroxy compounds A, B and, where relevant, C with the dihalogen compounds D and, where relevant, E can be carried out in principle by the processes which are known for the preparation of polysulfones or polyethersulfones and are described in the literature. A preferred process for the preparation of the novel copolycondensates is described below as a typical example.
The mixture of the aromatic dihydroxy compounds A, B and, if required, C can be reacted with aromatic dihalogen compounds in a molar ratio of from 0.8:1 to 1.2:1, preferably from 0.9:1 to 1.1:1, in particular from 0.98:1 to 1.02:1, and particularly preferably with an equimolar amount of aromatic dihalogen compounds in the presence of from 1.0 to 2.0, preferably from 1.05 to 1.5, moles of an anhydrous alkali metal carbonate, in particular K2 CO3, in an aprotic, polar solvent.
Preferred aprotic polar solvents are N-substituted acid amides and lactams, N,N-dimethylformamide, N,N-dimethylacetamide and N-methylpyrrolidone may be mentioned merely by way of example.
If desired, an azeotrope former may be added to the solvent in order to remove the water of reaction. Compounds of this type are described in the literature. However, an azeotrope former may also advantageously be omitted.
The amount of monomers is in general from 20 to 80, preferably from 30 to 70, in particular from 40 to 60% by weight, based on the total amount of the solvent.
The major part of the water of reaction formed can be removed at from 100° to 200°C, preferably from 130° to 180° C. This can be effected, for example, by heating alone, by adding an azeotrope former or, preferably, by reducing the pressure.
The condensation can then be continued at from 180° to 220° C. until the desired molecular weight or the desired degree of condensation is reached.
The total reaction time is, as a rule, from 5 to 20, preferably from 7 to 15, hours and is of course dependent on the reaction conditions (temperature and pressure) and on the desired molecular weight of the product.
After the polycondensation, the product can be reacted with an arylating or alkylating agent, eg. methyl chloride, in order to stabilize free terminal phenolate groups. This reaction is preferably carried out at from 50° to 200°C, preferably from 50° to 150°C
The suspended alkali metal halide obtained in the polycondensation can be separated off by means of a suitable separating apparatus, for example a clarifying filter or a centrifuge.
The copolycondensate can be isolated from the solution by evaporation of the solvent or precipitation in a suitable nonsolvent.
The novel copolycondensation, particularly products prepared by the process described above, generally have a reduced viscosity of from 0.35 to 2.0, preferably from 0.45 to 1.0, in particular from 0.45 to 0.85, measured as a 1% by weight solution in 1:1 phenol/o-dichlorobenzene at 25°C
The novel copolycondensate molding materials are distinguished by their balanced properties. They possess high heat distortion resistance and good stress cracking resistance coupled with low water absorption and very good processability.
The molding materials according to the invention can be used for the production of moldings, film and fibers. Because of their good properties, they are particularly useful for the production of circuit boards and electrical plug connections.
86 kg of N-methylpyrrolidone, 11.41 kg (50 moles) of bisphenol A, 12.51 kg (50 moles) of 4,4'-dihydroxydiphenyl sulfone and 28.72 kg of 4,4'-dichlorodiphenyl sulfone were dissolved under a nitrogen atmosphere in a 300 l vessel provided with a stirrer and a N2 connection, and 15.2 kg (150 moles) of anhydrous potassium carbonate were added.
The reaction mixture was first heated for one hour at 180°C under 300 mbar (30 kPa) with constant removal of the water of reaction and N-methylpyrrolidone by distillation, and was kept at this temperature for 3 hours. The reaction was then continued for 6 hours at 190°C
The polycondensation was terminated by adding methyl chloride at 150°C and carrying out the reaction for 2 hours under pressure (0.5 bar).
After the addition of 125 kg of N-methylpyrrolidone, the inorganic components were filtered off and the polymer was isolated as a solid by precipitation in methanol. After drying at 100°C under reduced pressure, the polymer was converted to granules.
The procedure described in Example 1 was followed, except that 25 mol % of bisphenol A and 75 mole % of 4,4'-dihydroxydiphenyl sulfone were used.
The procedure described in Example 1 was followed, except that a mixture of 75 mol % of bisphenol A and 25 mol % of 4,4'-dihydroxydiphenyl sulfone (DHDPS) was used.
A 50:50 (mol %) mixture of a polysulfone and a polyethersulfone was used.
The procedure described in Example 1 was followed, except that the dihydroxy compounds and dihalogen compounds stated in the Table were used.
The following abbreviations are used in the Table:
TABLE |
______________________________________ |
Bis A Bisphenol A |
T-Bis A Tetramethylbisphenol A |
DHDPS 4,4'-dihydroxyphenyl sulfone |
DHDP 4,4'-dihydroxydiphenyl |
T-DHDP 3,3',5,5'-tetramethyl-4,4'-dihydroxydi- |
phenyl |
TMH 2,3-trimethylhydroquinone |
DCDPS 4,4'-dichlorodiphenyl sulfone |
DDP 1,10-di-(4'-chlorophenylsulfonyl)-diphenyl |
DDB 1,3-dimethyl-4,6-di-(4'-chlorophenyl- |
sulfonyl)-benzene. |
______________________________________ |
Table 1 also shows the heat distortion resistance (Tg) and the water absorption after storage under standard conditions of temperature and humidity (23°C, 50% relative humidity) and after storage in H2 O at 23°C, for 180 days in each case.
TABLE |
__________________________________________________________________________ |
Water absorption |
Component A |
Component B |
Component C |
Component D |
Component E Standard |
Example |
(mol) (mol) (mol) (mol) (mol) Tg °C. |
conditions |
H2 O |
__________________________________________________________________________ |
1V+ Bis A DHDPS -- DCDPS -- 210 0.14 1.05 |
(0.05) (0.05) (0.1) |
2V+ Bis A DHDPS -- DCDPS -- 215 0.21 1.37 |
(0.025) |
(0.075) (0.1) |
3V+ Bis A DHDPS -- DCDPS -- 197 0.11 0.78 |
(0.075) |
(0.025) (0.1) |
4V*+ -- -- -- -- -- 189/224 |
0.18 1.15 |
5 Bis A DHDPS T-Bis A |
DCDPS -- 252 0.12 0.89 |
(0.025) |
(0.05) (0.025) |
(0.1) |
6 Bis A DHDPS DHDP DCDPS -- 225 0.12 0.92 |
(0.025) |
(0.05) (0.025) |
(0.1) |
7 Bis A DHDPS T-DHDP DCDPS -- 241 0.10 0.88 |
(0.025) |
(0.05) (0.025) |
(0.025) |
8 Bis A DHDPS -- DCDPS DDP 225 0.16 1.09 |
(0.05) (0.05) (0.05) (0.05) |
9 Bis A DHDPS -- DCDPS DDP 245 0.17 1.11 |
(0.05) (0.05) (0.075) (0.025) |
10 Bis A DHDPS -- DCDPS DDB 225 0.13 0.99 |
(0.05) (0.05) (0.05) (0.05) |
11 Bis A DHDPS TMH DCDPS -- 215 0.15 1.10 |
(0.0375) |
(0.05) (0.0125) |
(0.1) |
12 Bis A DHDPS DHDP DCDPS 221 0.13 1.03 |
(0.025) |
(0.075) |
(0.05) (0.1) |
13 Bis A DHDPS T-DHDP DCDPS 226 0.10 0.90 |
(0.055) |
(0.02) (0.025) |
(0.1) |
__________________________________________________________________________ |
*50:50 mixture of polysulfone and polyethersulfone |
+Examples 1 to 4 are Comparative Examples |
Patent | Priority | Assignee | Title |
5569681, | May 19 1994 | JSP Corporation | Flame-retardant foamed particles of polyolefin resin |
Patent | Priority | Assignee | Title |
4489181, | Nov 07 1983 | General Electric Company | Thermoplastic polycarbonate-polysulfone carbonate molding compositions |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
May 15 1992 | BASF Aktiengesellschaft | (assignment on the face of the patent) | / |
Date | Maintenance Fee Events |
Nov 03 1997 | M184: Payment of Maintenance Fee, 8th Year, Large Entity. |
Date | Maintenance Schedule |
Mar 15 1997 | 4 years fee payment window open |
Sep 15 1997 | 6 months grace period start (w surcharge) |
Mar 15 1998 | patent expiry (for year 4) |
Mar 15 2000 | 2 years to revive unintentionally abandoned end. (for year 4) |
Mar 15 2001 | 8 years fee payment window open |
Sep 15 2001 | 6 months grace period start (w surcharge) |
Mar 15 2002 | patent expiry (for year 8) |
Mar 15 2004 | 2 years to revive unintentionally abandoned end. (for year 8) |
Mar 15 2005 | 12 years fee payment window open |
Sep 15 2005 | 6 months grace period start (w surcharge) |
Mar 15 2006 | patent expiry (for year 12) |
Mar 15 2008 | 2 years to revive unintentionally abandoned end. (for year 12) |