A multicolor infrared detection device comprising a number of doped antum well structural units. Each unit consists of a thick well and a thin well separated by a thin barrier. This arrangement produces strong coupling. Infrared radiation radiation incident on the device gives rise to intersubband absorption. For each transition a photosignal results which allows the detection of a plurality of incident frequencies.

Patent
   RE34649
Priority
May 18 1992
Filed
May 18 1992
Issued
Jun 28 1994
Expiry
May 18 2012
Assg.orig
Entity
Large
1
9
all paid
1. An infrared-radiation A radiation detection device comprising a semiconductor superlattice consisting of a plurality of quantum well units, each unit composed of a thick barrier, a thick quantum well having two confined states E1 and E2, a thin barrier, and a thin quantum well having one confined state E1 E1 ', adjusted to be very close to E2 when the wells are considered in isolation, such that the thick quantum well and the thin quantum well are brought close enough together that the wells become coupled and the level structure becomes common to both wells, and contact means for electrically biasing said superlattice and for sensing an electrical signal in response to radiation incident on said superlattice.
2. An infrared-radiation A radiation detection device as defined in claim 1 in which a forward bias moves said energy levels E2 and E3 closer to level E1.
3. An infrared-radiation A radiation detection device as defined in claim 1 in which a reverse bias moves said energy levels E2 and E3 further away from E1.

The invention described herein may be manufactured, used, and licensed by or for the Government for governmental purposes without the payment to me of any royalties thereon.

The present invention relates in general to radiation detector in accordance with the present invention in an arrangement which further includes a voltage source and a current measuring device.

FIG. 2 is the energy band diagram of the present invention.

FIG. 3 is an energy band diagram illustrating the energy levels of the preferred embodiment when the wells are isolated from one another.

FIG. 4 is an energy band diagram illustrating the energy levels of the preferred embodiment when the wells are closed enough together to become coupled.

FIG. 5 is an energy band diagram illustrating the quantum well structure of the preferred embodiment when the wells are isolated and are also subject to a forward bias.

FIG. 6 is an energy band diagram illustrating the quantum well structure of the preferred embodiment when the wells are close enough together to become coupled and are also subject to a forward bias.

FIG. 7 is an energy band diagram illustrating the quantum well structure of the preferred embodiment when the wells are isolated, and are also subject to a reverse bias.

FIG. 8 is an energy band diagram illustrating the quantum well structure of the preferred embodiment when the wells are close enough together to become coupled and are also subject to a reverse bias.

FIG. 9 is an energy band diagram illustrating the dark current transport mechanism for the condition of a small applied bias.

FIG. 10 is an energy band diagram illustrating the dark current transport mechanism for the condition of a large applied bias.

FIG. 11 shows the dark current-voltage characteristics in both forward and reverse bias at a temperature equal to 4.2° K.

FIG. 12 shows the light absorption curve as a function of wavenumber at zero bias and the photocurrent detected at both forward and reverse bias.

FIG. 13 shows the photoresponse of the detector described in FIG. 11.

FIG. 1 shows a semi-insulating substrate (1), contact layer (2), semiconductor superlattice (3), contact layer (4), voltage source (5), a series resistor (6), and a voltmeter (7) which complete an electric circuit for light sensing operation. In operation, the detector is cooled to a desired temperature, and the polished face of the substrate is exposed to the infrared radiation. The device is biased by a voltage source through the two contact layers, and the photocurrent can, for example, be sensed by either a current meter or by a series resistor as shown.

Illumination of the superlattice is shown at an angle via a polished face of the substrate which has been cut at an angle. This was found to be convenient for experimental device evaluation. The angle shown in FIG. 1 is a 45° angle. A superlattice is a periodic arrangement of layers of two different materials such as ABABAB . . . where A represents one layer and B represents another layer. Infrared radiation Radiation is made incident on these superlattice layers. In order to initiate excitation, the electric field vector associated with the radiation has to be perpendicular to the material layers. That is, the light has to travel parallel to the layers. One convenient way to do this is to have the infrared radiation incident on the superlattice at the 45° angle shown. With this arrangement, the radiation with the electric vector component perpendicular to the superlattice layers will be absorbed. More generally, illumination may be in any direction having an electric field component perpendicular to the superlattice layers.

A quantum well is created when a smaller band gap material is placed between two wider band gap materials. A quantum well acts like a "trap" to an electron. Inside a quantum well, there are discrete energy levels due to size quantization. The present invention comprises an array of doped quantum well units. A typical embodiment of the present invention might consist of fifty units. FIG. 2 shows four units. Each unit consists of a thick barrier (B1), a thick well (W1), a thin barrier (B2), and a thin well (W2). These units are sandwiched between contact layers C1 and C2.

In the preferred embodiment of the present invention, the thicker quantum well, when it is isolated, is chosen to contain two bound states denoted by E1 and E2 respectively. The width of the thin well is adjusted such that an isolated thin well has an energy level denoted by E1, very close to E2. This situation is shown in FIG. 3. The energy level structure within each well in FIG. 3 is at zero bias.

However, when barrier (B2) is thin enough, a new situation arises. The electrons located in each well penetrate into each other and change the level structure of each well. Such wells are said to be "coupled." The level structure becomes common to both of the wells. The new levels are indicated in FIG. 4 and are denoted by new E1, E2, and E3. The coupled quantum wells shown in FIG. 4 are also at zero bias. The coupled structure exhibits different characteristics compared with the isolated wells. The most important difference is that in a simple single well unit as utilized in the Levine et al's designs, the electron wavefunction associated with each energy level has a definite parity, either even or odd. Since the intersubband optical absorption is an optical dipole transition, the electrons in the ground state, which is even in parity, can only be excited by radiation to the odd parity states, i.e. the second level, the fourth level, . . . , etc. Hence, not all the levels can be used to detect radiation. However, for the present invention of coupled wells, each level is of mixed parity due to the breaking of the parity symmetry by the unequal well thickness. In this case, all transitions from the ground state to any excited state are allowed, leading to multicolor detection capability. Corresponding to each optical transition, the radiation of a particular wavenumber ν will be detected where ν=(En -E1)/hc and where En is the nth energy level, h is the plank constant and c is the speed of light.

Another important feature of the coupled quantum well structure is the voltage tunability of the detector, which is not shared by the Levine et al's design. For a simple single well design, the separations between the excited states and the ground state is extremely insensitive to the applied voltage. However, for the coupled quantum well structure, the separation between the levels is strongly affected by the applied voltage. This is because an applied voltage shifts the relative level positions of each well. At each applied voltage, the frequencies of detection are different. Detectors of different frequencies can therefore be obtained by changing the applied voltage. The fact that the detection wavenumber can be tuned by the applied voltage is illustrated in FIGS. 5, 6, 7, and 8.

In FIG. 5 a quantum well unit according to the present invention is shown assuming that the wells are isolated. Energy levels E1, E2, and E1, E1 ', are denoted. The structure is subject to a forward bias. Under bias the energy level E1, E1 ', moves closer to E1.

In FIG. 6 the wells are made close enough to become coupled. New energy levels E1, E2, and E3 form which are common to both wells. The structure is subject to a forward bias. The motion of E1 ' toward E1 under the condition of a forward bias makes combined levels E2 and E3 move closer to E1. Thus, the transition energy and the detection wavenumber are both reduced.

In the reverse bias shown in FIGS. 7 and 8, the level E1, E1 ', moves away from E1 which leads to a larger separation in energy and increased detection wavenumbers.

FIG. 9 shows the dark current transport mechanism for the condition of a small applied bias. The electrons tunnel from the ground level of one well into the ground level of the next well.

FIG. 10 shows the condition for large applied bias. The electrons tunnel from the ground level of one well into the upper levels of the adjacent well and then relax to the ground level before tunneling into the next well. This process creates high field domains in the device.

FIG. 11 shows the dark current-voltage characteristics in both forward and reverse bias at a temperature equal to 4.2° K. The formation of high field domains can be observed as oscillations in the dark current.

When the device is exposed to infrared radiation, the electrons in the high field domain are excited from the ground state to one of the excited states. The electrons then tunnel out of the well forming hot electrons. Since the hot electrons can move more freely across the device then the tunneling electrons, the detector will register an increase in current flow. From this increase, the radiation is detected.

FIGS. 12 and 13 show absorption characteristics of two samples of the preferred embodiment. The first sample is grown on a semi-insulating GaAs substrate. It consists of 50 periods of a unit composed of 65 Å GaAs doped with n=1.0×1018 cm-3, 40 Å undoped Al0.25 Ga0.75 As, 14 Å undoped GaAs, and 150Å undoped Al0.25 Ga0.75 As. The quantum wells are sandwiched between the top (0.5μm) and the bottom (1μm) GaAS contact layers in which n=1×1018 cm-3. FIG. 12 shows the light absorption curve as a function of wavenumber at zero bias and the photocurrent detected at both forward and reverse bias. At zero bias, two absorption peaks are observed at wavenumbers equal to ν° ν2o and ν3o, the superscript denotes the biasing condition and the subscript denotes the final level of the transition. Under forward bias, two photocurrent peaks are observed at ν 3f and ν4f whereas under reverse bias, three photocurrent peaks are observed at ν2r, ν3r, and ν4r. Note that ν3f is smaller than ν3o, whereas ν3r is larger than ν3o. The photocurrent peak at ν2f is not observed because the electrons are still deep inside the well due to the small E2 in forward bias so that the excited electrons cannot escape out of the well. The arrows in the figure are the expected location of the photocurrent peaks based on the structure of the quantum wells.

FIG. 13 shows a similar experimental result for another detector. This detector has a similar structural design as the previous detector except that the barrier height of the present device is higher. The device consists of 50 periods of 72 ° Å GaAs doped at n=1×1018 cm-3, 39 Å Al0.31 Ga0.69 As, 20 Å undoped GaAs, and 154 Å undoped Al0.31 Ga0.69 As. The contact layers and the substrate are the same as in the previous sample.

The data for both samples are taken at Vp =109mV for forward biasing (dashed curves) and Vp =123 mV for reverse biasing (solid curves). The detectivity of the two detectors is around 1010 cm.sqroot.Hz/W.

Other and different approximations to the multiple quantum well multicolor infrared photodetector may occur to those skilled in the art. Accordingly, having shown and described what is at present considered to be a preferred embodiment of the inventor, it should be understood that the same has been shown by way of illustration and not limitation. And, all modifications, alterations, and changes coming within the spirit and scope of the invention are herein meant to be included.

Choi, Kwong-Kit

Patent Priority Assignee Title
6979825, Apr 11 2003 ARMY, UNITED STATES OF AMERICA, THE, AS REPRESENTED BY THE SECRETARY Quantum-grid infrared photodetector (QGIP) spectrometers and related methods
Patent Priority Assignee Title
4796067, Feb 19 1985 Canon Kabushiki Kaisha Semiconductor device having a superlattice structure
4822992, Dec 31 1987 Bell Telephone Laboratories, Incorporated; American Telephone and Telegraph Company Wavelength conversion using self electrooptic effect devices
4894526, Jan 15 1987 BELL TELEPHONE LABORATORIES INCORPORATED, 600 MOUNTAN AVENUE, MURRAY HILL, NEW JERSEY 07974-2070, A CORP OF NY; AMERICAN TELEPHONE AND TELEGRAPH COMPANY, 550 MADISON AVENUE, NEW YORK, NEW YORK 10022-3201, A CORP OF NY Infrared-radiation detector device
4903101, Mar 28 1988 California Institute of Technology Tunable quantum well infrared detector
5010517, Nov 18 1987 Hitachi, Ltd. Semiconductor optical apparatus
5036371, Sep 27 1989 The United States of America as represented by the Secretary of the Navy Multiple quantum well device
5121181, Jan 31 1989 International Business Machines Corporation Resonant tunneling photodetector for long wavelength applications
5185647, Dec 12 1988 The United States of America as represented by the Administrator of the Long wavelength infrared detector
RE32893, Oct 06 1987 American Telephone and Telegraph Company, AT&T Bell Laboratories Nonlinear and bistable optical device
/
Executed onAssignorAssigneeConveyanceFrameReelDoc
May 18 1992The United States of America as represented by the Secretary of the Army(assignment on the face of the patent)
Date Maintenance Fee Events
Mar 23 1995M183: Payment of Maintenance Fee, 4th Year, Large Entity.
Mar 23 1995M186: Surcharge for Late Payment, Large Entity.
Apr 26 1995ASPN: Payor Number Assigned.
Jul 10 1998M184: Payment of Maintenance Fee, 8th Year, Large Entity.
Mar 28 2003M1553: Payment of Maintenance Fee, 12th Year, Large Entity.
Mar 28 2003M1556: 11.5 yr surcharge- late pmt w/in 6 mo, Large Entity.


Date Maintenance Schedule
Jun 28 19974 years fee payment window open
Dec 28 19976 months grace period start (w surcharge)
Jun 28 1998patent expiry (for year 4)
Jun 28 20002 years to revive unintentionally abandoned end. (for year 4)
Jun 28 20018 years fee payment window open
Dec 28 20016 months grace period start (w surcharge)
Jun 28 2002patent expiry (for year 8)
Jun 28 20042 years to revive unintentionally abandoned end. (for year 8)
Jun 28 200512 years fee payment window open
Dec 28 20056 months grace period start (w surcharge)
Jun 28 2006patent expiry (for year 12)
Jun 28 20082 years to revive unintentionally abandoned end. (for year 12)