An atomic force microscope includes a tip mounted on a micromachined cantilever. As the tip scans a surface to be investigated, interatomic forces between the tip and the surface induce displacement of the tip. A laser beam is transmitted to and reflected from the cantilever for measuring the cantilever orientation. In a preferred embodiment the laser beam has an elliptical shape. The reflected laser beam is detected with a position-sensitive detector, preferably a bicell. The output of the bicell is provided to a computer for processing of the data for providing a topographical image of the surface with atomic resolution.
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44. A method for generating an image of a surface of a workpiece comprising the steps of:
positioning a tip fixed to one end of a front side of a micromachined cantilever beam in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam; transmitting a laser beam onto a back of the cantilever beam; detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein said reflected light beam produces an elongated shaped light spot when striking said position-sensitive detection means; scanning the tip relative to the surface, and; processing the output signal for providing an image of the surface of the workpiece.
1. A method for generating a topographical image of a surface of a workpiece comprising the steps of:
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever; transmitting a laser beam onto a back of the cantilever beam; detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam; scanning the tip relative to the surface, and processing the output signal for providing a topographical image of the workpiece surface.
36. A force microscope for generating an image of a surface of a workpiece, comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where forces between atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein the reflected laser beam has an elongated shaped light spot when incident upon the detection means; means for causing the tip and the surface to undergo relative scanning motion; and computing means, coupled to said detection means, for generating the image of the surface.
15. An atomic force microscope for generating a topographical image of a surface of a workpiece wherein the improvement comprises:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam; means for causing the tip and surface to undergo relative scanning motion, and computing means coupled to said detection means for generating a topographical image of the surface.
30. An atomic force microscope for generating a topographical image of a surface of a workpiece, comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where forces between atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, wherein the reflected laser beam has an elongated shaped light spot when incident upon the detection means; means for causing the tip and the surface to undergo relative scanning motion; and computing means, coupled to said detection means, for generating the topographical image of the surface.
29. An atomic force microscope for generating a topographical image of a surface of a workpiece comprising:
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam; means for causing the tip and surface to undergo relative scanning motion; and computing means coupled to said detection means for generating the topographical image of the surface, wherein said laser means operates in the visible light spectrum, wherein said laser means comprises a single-mode diode laser, and wherein said reflected beam has a shape other than circular.
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9. The method as set forth in
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever; transmitting a laser beam onto a back of the cantilever beam; detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam; scanning the tip relative to the surface, and processing the output signal for providing the topographical image of the workpiece surface, wherein the position sensitive detector is remotely positioned from the cantilevered beam, and wherein an inertial mover remotely positions the detector.
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14. The method as set forth in
moving a tip which is fixed to one end of a front side of a micromachined cantilever beam toward a surface of a workpiece to be inspected at a distance where the forces occurring between the atoms at the tip and on the workpiece surface deflect the cantilever; transmitting a laser beam onto a back of the cantilever beam; detecting the laser beam reflected from the cantilever beam with position-sensitive detection means for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam which change is inversely proportional to the length of the cantilever beam; scanning the tip relative to the surface, and processing the output signal for providing the topographical image of the workpiece surface, wherein said transmitted reflected laser beam has an elliptical beam shape at said detection means.
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24. An atomic force microscope as set forth in
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam, said position-sensitive detection means being remotely positionable from the cantilever beam, and wherein said position-sensitive detection means comprises an inertial mover; means for causing the tip and surface to undergo relative scanning motion; and computing means coupled to said detection means for generating the topographical image of the surface.
25. An atomic force microscope as set forth in
26. An atomic force microscope as set forth in
27. An atomic force microscope as set forth in
a tip fixed to one end of a front side of a micromachined cantilever beam adapted for being positioned in proximity to the surface of the workpiece where the forces between the atoms of said tip and the surface deflect the cantilever beam; laser means for transmitting a laser beam to a back of the cantilever beam; position-sensitive detection means for receiving said laser beam after being reflected from the cantilever beam and for converting the reflected beam into an output signal indicative of an angular change of the cantilever beam, which change is inversely proportional to the length of the cantilever beam; means for causing the tip and surface to undergo relative scanning motion, and computing means coupled to said detection means for generating the topographical image of the surface, wherein said laser means transmits a laser beam having an elliptical shape to the back of the cantilever beam and wherein said reflected laser beam has an elliptical shape at said detection means.
28. An atomic force microscope as set forth in
31. The atomic force microscope of
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45. The method of
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Moreover, the size of the reflected laser beam 46 received at the bicell 40 is 5 to 7 times larger in the direction perpendicular to the deflection direction as shown in FIG. 5, thereby enabling the use of higher laser power, without exceeding the saturation limit of the bicell, and correspondingly achieving higher measurement sensitivity. Alternatively, the distance between the cantilever beam and bicell can be decreased, thus resulting in an even more compact microscope.
While there have been described and illustrated an atomic force microscope and several modifications and variations thereof, it will be apparent to those skilled in the art that further modifications and variations are possible without deviating from the broad spirit of the present invention which shall be limited solely by the scope of the claims appended hereto.
Amer, Nabil Mahmoud, Meyer, Gerhard
Patent | Priority | Assignee | Title |
10466271, | Sep 01 2015 | HITACHI HIGH-TECH SCIENCE CORPORATION | Scanning probe microscope and optical axis adjustment method for scanning probe microscope |
6437343, | Mar 13 1998 | Olympus Optical Co., Ltd. | Scanner system and piezoelectric micro-inching mechansim used in scanning probe microscope |
6940789, | Dec 27 1999 | Sony Corporation | Optical pickup device that corrects the spot shape of reflected light beams |
7041963, | Nov 26 2003 | Massachusetts Institute of Technology | Height calibration of scanning probe microscope actuators |
7205237, | Jul 05 2005 | GLOBALFOUNDRIES Inc | Apparatus and method for selected site backside unlayering of si, GaAs, GaxAlyAszof SOI technologies for scanning probe microscopy and atomic force probing characterization |
7534999, | Apr 21 2004 | Japan Science and Technology Agency | Quantum beam aided atomic force microscopy and quantum beam aided atomic force microscope |
8726410, | Jul 30 2010 | GOVERNMENT OF THE UNITED STATES, AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE | Atomic force microscopy system and method for nanoscale measurement |
Patent | Priority | Assignee | Title |
1976337, | |||
2048154, | |||
2171433, | |||
2205517, | |||
2686101, | |||
3251135, | |||
3335367, | |||
3571579, | |||
3617131, | |||
3782205, | |||
3798449, | |||
4102577, | Jan 04 1977 | Fuji Photo Optical Co., Ltd. | Method of forming moire contour lines |
4267732, | Nov 29 1978 | Stanford University Board of Trustees | Acoustic microscope and method |
4596925, | Oct 27 1982 | The Foxboro Company | Fiber optic displacement sensor with built-in reference |
4659219, | Oct 27 1983 | Societe Anonyme de Telecommunications | System for detecting the angular position of a mechanical device |
4711578, | Jun 14 1984 | British Technology Group Limited | Optical displacement sensors |
4724318, | Nov 26 1985 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
4739161, | Jun 13 1985 | Hitachi, Ltd. | Fine displacement transducer employing plural optical fibers |
4745270, | Apr 26 1985 | Olympus Optical Co., Ltd. | Photoelectric microscope using position sensitive device |
4762996, | Apr 20 1987 | International Business Machines Corporation | Coarse approach positioning device |
4770533, | Sep 11 1984 | Nippon Kogaku K. K. | Apparatus for detecting position of an object such as a semiconductor wafer |
4782239, | Apr 05 1985 | U S BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT | Optical position measuring apparatus |
4800274, | Feb 02 1987 | The Regents of the University of California | High resolution atomic force microscope |
4806755, | Oct 03 1986 | INTERNATIONAL BUSINESS MACHINES CORPORATION, A CORP OF NEW YORK | Micromechanical atomic force sensor head |
4823004, | Nov 24 1987 | California Institute of Technology; CALIFORNIA INSTITUTE OF TECHNOLOGY, 1201 E CALIFORNIA BLVD , PASADENA, CA 91125 A CA CORP | Tunnel and field effect carrier ballistics |
4827091, | Sep 23 1988 | Automotive Systems Laboratory, Inc. | Magnetically-damped, testable accelerometer |
4837435, | Jun 25 1987 | SII NANOTECHNOLOGY INC | Tunneling scanning microscope having light source |
4851671, | Dec 05 1987 | International Business Machines Corporation | Oscillating quartz atomic force microscope |
4861990, | Feb 09 1988 | California Institute of Technology | Tunneling susceptometry |
4873401, | Sep 19 1988 | Siemens-Bendix Automotive Electronics Limited | Electromagnetic damped inertia sensor |
4878114, | May 10 1988 | UNIVERSITY OF WINDSOR, 360 SUNSET AVENUE, WINDSOR, ONTARIO, CANADA, N9B 3P4 | Method and apparatus for assessing surface roughness |
4883959, | Jun 05 1987 | Hitachi, Ltd. | Scanning surface microscope using a micro-balance device for holding a probe-tip |
4889988, | Jul 06 1988 | VEECO METROLOGY INC | Feedback control for scanning tunnel microscopes |
4894537, | Jul 21 1988 | Dalhousie University | High stability bimorph scanning tunneling microscope |
4896044, | Feb 17 1989 | Purdue Research Foundation | Scanning tunneling microscope nanoetching method |
4935634, | Mar 13 1989 | The Regents of the University of California | Atomic force microscope with optional replaceable fluid cell |
4992728, | Dec 21 1989 | International Business Machines Corporation | Electrical probe incorporating scanning proximity microscope |
5003815, | Oct 20 1989 | International Business Machines Corporation | Atomic photo-absorption force microscope |
5015850, | Jun 20 1989 | BOARD OF TRUSTEES OF THE LELAND STANFORD JUNIOR UNIVERSITY, THE, A CORP OF CA | Microfabricated microscope assembly |
5051379, | Aug 16 1989 | INTERNATIONAL BUSINESS MACHINES CORPORATION, A CORP OF NY | Method of producing micromechanical sensors for the AFM/STM profilometry and micromechanical AFM/STM sensor head |
5053588, | Feb 20 1990 | TRW Technar Inc. | Calibratable crash sensor |
EP320326, | |||
JP304103, | |||
RE33387, | Nov 26 1985 | International Business Machines Corporation | Atomic force microscope and method for imaging surfaces with atomic resolution |
WO4753, | |||
WO7256, |
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