To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.
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18. A catadioptric optical system for forming a reduced image of a first object onto a second object, comprising:
a catadioptric optical sub-system having a first reduction magnification; a dioptric optical sub-system, arranged in an optical path between said catadioptric optical sub-system and said second object, having a second reduction magnification; wherein an intermediate image of said first object is formed on an optical path between said catadioptric optical sub-system and said dioptric optical sub-system; and wherein said dioptric optical sub-system forms an image of said intermediate image on the second object.
29. A catadioptric optical system for forming a reduced image of a first object onto a second object, comprising:
a catadioptric optical sub-system having a first reduction magnification; a dioptric optical sub-system, arranged in an optical path between said catadioptric optical sub-system and said second object, having an aperture stop and a second reduction magnification; wherein an intermediate image of said first object is formed on an optical path between said catadioptric optical sub-system and said dioptric optical sub-system; wherein a secondary image of said first object is formed on the second object; and wherein said aperture stop is capable of controlling a coherence factor.
0. 39. A catadioptric imaging optical system used in a projection optical system that transfers a pattern on a mask onto a substrate, comprising:
from the mask to an intermediate image, a catadioptric imaging optical sub-system arranged in an optical path between the mask and the substrate; and from the intermediate image to a second image, a dioptric imaging optical sub-system arranged between the catadioptric imaging optical sub-system and the substrate, the dioptric imaging optical sub-system comprising a dioptric optical axis along a straight line, wherein the dioptric imaging optical sub-system further comprises an aperture stop, wherein the aperture stop controls a coherence factor of the dioptric imaging optical sub-system.
0. 32. A catadioptric imaging optical system used in a projection optical system that transfers a pattern on a mask onto a substrate, comprising:
from the mask to an intermediate image, a catadioptric imaging optical sub-system arranged in an optical path between the mask and the substrate; from the intermediate image to a second image, a dioptric imaging optical sub-system arranged in an optical path between the catadioptric imaging optical sub-system and the substrate, the dioptric imaging optical sub-system comprising a dioptric axis along a straight line and a plurality of lenses; and an aperture stop arranged in the optical path between the mask and the substrate to control a coherence factor of the catadioptric imaging optical system.
0. 43. A method of imaging a pattern on a mask onto a substrate using a catadioptric imaging optical system, the method comprising:
guiding a light from the mask to a catadioptric imaging optical sub-system to form an intermediate image; guiding the light from the intermediate image after the catadioptric imaging optical sub-system to a dioptric imaging optical sub-system that comprises a dioptric optical axis along a straight line and a plurality of lenses; forming a final image of the mask on the substrate using the light from the dioptric imaging optical sub-system, the dioptric imaging optical sub-system being from the intermediate image to the final image; and controlling a coherence factor of the catadioptric imaging optical system.
1. A catadioptric optical system, for forming an image of a first object onto a second object, comprising:
a first image-forming optical system having a first group with positive refractive power and a second group including a concave mirror; a second image-forming optical system, arranged on an optical path between a mirror and the second object, having at least a refractive lens element, wherein said second image-forming optical system is a dioptric optical system; and the mirror arranged in one of spaces respectively by a virtual plane, said virtual plane including one of an optical axis of said first image-forming optical system and an optical axis of said second image-forming optical system, said spaces positioned between said first group and said second group.
0. 53. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system has a first group of lenses, a second group of lenses, and a third group of lenses, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the projection optical system is both side telecentric. 0. 52. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system has at least one negative-positive doublet with a negative power lens and a positive power lens in the sequence from the first object side, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the projection optical system is both side telecentric. 0. 51. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system, in the order from the intermediate side, has a positive lens group, a negative lens group, a positive lens group, a negative lens group, and a positive lens group, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the projection optical system is both side telecentric. 0. 66. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path, the lenses in the catadioptric sub-system include at least one lens arranged between the optical path changing mirror and the concave mirror, for each of the lenses in the catadioptric sub-system including the at least one lens disposed between the optical path changing mirror and the concave mirror, a distance from each lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and the catadioptric sub-system has no more than five lenses. 0. 73. A projection optical system for forming an image of a first object onto a second object, comprising:
from the first object to an intermediate image, a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and from the intermediate image to the second object, a dioptric imaging sub-system arranged in an optical path between said catadioptric sub-system and the second object, wherein: the intermediate image of the first object is formed in the optical path, lenses in said catadioptric sub-system including at least one lens arranged between the optical path changing mirror and the concave mirror, a distance from each lens of the lenses of said catadioptric sub-system including said at least one lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and the projection optical system is both side telecentric. 0. 50. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the catadioptric sub-system has at least one positive lens disposed in an optical path between the first object and the optical path changing mirror, not more than one positive and not more than three negative lenses are arranged between the optical path changing mirror and the concave mirror, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the projection optical system is both side telecentric. 10. A catadioptric optical system, for forming an image of a first object onto a second object, comprising:
a first image-forming optical system having a first group including at least a lens element and a second group including a concave mirror; a second image-forming optical system, arranged on an optical path between a mirror and the second object, having at least a refractive lens element; said mirror arranged in one side of multiple spaces separated by a virtual plane, said virtual plane including one of an optical axis of said first image-forming optical system and an optical axis of said second image-forming optical system, and arranged between said lens element of the first group and said second group; and wherein an intermediate image of the first object is formed in the space in which said mirror is arranged and on an optical path between said first image-forming optical system and said second image-forming optical system, and wherein said second image-forming optical system is a dioptric optical system.
0. 58. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system has a first group of lenses, a second group of lenses, and a third group of lenses, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the dioptric imaging sub-system comprises a pair of meniscus lenses including an intermediate-side meniscus lens and an image-side meniscus lens, wherein a convex surface of the intermediate-side meniscus lens faces the intermediate image, and a convex surface of the image-side meniscus lens faces the image. 0. 49. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the lenses in the catadioptric sub-system include at least one lens arranged in an optical path between the optical path changing mirror and the concave mirror, for each of the lenses in the catadioptric sub-system including the at least one lens disposed between the optical path changing mirror and the concave mirror, a distance from each lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image. 0. 54. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric sub-system arranged in an optical path between said catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path, lenses in said catadioptric sub-system including at least one lens arranged between the optical path changing mirror and the concave mirror, a distance from each lens of the lenses in said catadioptric sub-system including said at least one lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and said dioptric sub-system comprises a pair of meniscus lenses including an intermediate-side meniscus lens and an image-side meniscus lens, wherein a convex surface of the intermediate-side meniscus lens faces the intermediate image, and a convex surface of the image-side meniscus lens faces the image. 0. 57. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system has at least one negative-positive doublet with a negative power lens and a positive power lens in the sequence from the first object side, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the dioptric sub-system comprises a pair of meniscus lenses including an intermediate-side meniscus lens and an image-side meniscus lens, wherein a convex surface of the intermediate-side meniscus lens faces the intermediate image, and a convex surface of the image-side meniscus lens faces the second image. 0. 56. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the dioptric imaging sub-system, in the order from the intermediate side, has a positive lens group, a negative lens group, a positive lens group, a negative lens group, and a positive lens group, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the dioptric imaging sub-system comprises a pair of meniscus lenses including an intermediate-side meniscus lens and an image-side meniscus lens, wherein a convex surface of the intermediate-side meniscus lens faces the intermediate image, and a convex surface of the image-side meniscus lens faces the second image. 0. 55. A projection optical system for forming an image of a first object onto a second object, comprising:
a catadioptric sub-system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and a dioptric imaging sub-system arranged in an optical path between the catadioptric sub-system and the second object, wherein: an intermediate image of the first object is formed in the optical path between the catadioptric sub-system and the dioptric imaging sub-system, the catadioptric sub-system has at least one positive lens disposed between the first object and the optical path changing mirror, not more than one positive lens and not more than three negative lenses are arranged between the optical path changing mirror and the concave mirror, the system is both sides telecentric, the dioptric imaging sub-system forms a second image and is from the intermediate image to the second image, and the dioptric imaging sub-system comprises a pair of meniscus lenses including an intermediate-side meniscus lens and an image-side meniscus lens, wherein a convex surface of the intermediate-side meniscus lens faces the intermediate image, and a convex surface of the image-side meniscus lens faces the second image. 2. A system according to
3. A system according to
4. A system according to
5. A system according to
6. A system according to
7. An exposure apparatus comprising:
an illuminating optical system having a light source; a catadioptric optical system according to a stage, arranged on an optical path between said illuminating optical system and said catadioptric optical system, for supporting a mask as a first object;
8. An apparatus according to
9. A fabricating method comprising:
preparing a mask with a predetermined pattern; illuminating the mask with exposure light having a predetermined wavelength; and projecting a secondary image of said pattern onto a photosensitive substrate through a catadioptric optical system according to
11. A system according to
12. A system according to
13. A system according to
14. A system according to
and
wherein β12 is a magnification of from the first object to the intermediate image, β3 is a magnification of from the intermediate image to the image on the second object, and β is a magnification of from the first object to the second object.
15. An exposure apparatus comprising:
an illuminating optical system having a light source; a catadioptric optical system according to a stage, arranged on an optical path between said illuminating optical system and said catadioptric optical system, for supporting a mask as the first object.
16. An apparatus according to
17. A fabricating method comprising:
preparing a mask with a predetermined pattern; illuminating the mask with exposure light having a predetermined wavelength; and projecting a secondary image of the pattern onto a photosensitive substrate through a catadioptric optical system according to
19. A catadioptric optical system according to
20. A catadioptric optical system according to
21. A catadioptric optical system according to
22. A catadioptric optical system according to
23. A catadioptric optical system according to
24. A catadioptric optical system according to
25. An exposure method comprising:
preparing a mask with a predetermined pattern at a first surface; illuminating the mask with exposure light having a predetermined wavelength; and projecting a secondary image of the pattern of the mask onto a photosensitive substrate, arranged at a second surface, through the catadioptric optical system of
26. An exposure method according to
27. An exposure method according to
28. An exposure apparatus, comprising:
an illumination optical system having a light source; a first stage, capable of holding a mask, adjacent said illumination optical system; a catadioptric optical system of a second stage, arranged adjacent said catadioptric optical system opposite said first stage, and capable of holding a photosensitive substrate.
30. An exposure method comprising:
preparing a mask with a predetermined pattern at a first surface; illuminating the mask with exposure light having a predetermined wavelength; projecting a secondary image of the pattern of the mask onto a photosensitive substrate, arranged at a second surface, through the catadioptric optical system of
31. An exposure apparatus, for exposing a pattern of a mask onto a photosensitive substrate, comprising:
an illumination optical system having a light source; a first stage, capable of holding the mask, adjacent said illumination optical system; a catadioptric optical system of a second stage, arranged adjacent said catadioptric optical system opposite the first stage, and capable of holding the photosensitive substrate.
0. 33. A catadioptric imaging optical system according to
a concave mirror, and a group optical axis, wherein the group optical axis intersects the dioptric optical axis.
0. 34. A catadioptric imaging optical system according to
0. 35. A catadioptric imaging optical system according to
0. 36. A catadioptric imaging optical system according to
0. 37. A catadioptric imaging optical system according to
0. 38. A catadioptric imaging optical system according to
0. 40. A catadioptric imaging optical system according to
0. 41. A projection exposure apparatus that transfers a pattern off a mask onto a substrate, comprising:
a catadioptric imaging optical system according to wherein said catadioptric imaging optical system forms an exposure area at a position off of the dioptric optical axis of the dioptric imaging object sub-system.
0. 42. A projection exposure apparatus according to
0. 44. A method according to
0. 45. A method according to
0. 46. A method according to
0. 47. A method according to
0. 48. A method according to
0. 59. A projection optical system according to
0. 60. A projection optical system according to
0. 61. A projection optical system according to
0. 62. A projection optical system according to
0. 63. A projection optical system according to
0. 64. A projection optical system according to
0. 65. A projection optical system according to
0. 67. A projection optical system according to
0. 68. A projection optical system according to
0. 69. A projection optical system according to
0. 70. A projection optical system according to
0. 71. A projection optical system according to
0. 72. A projection optical system according to
0. 74. A projection optical system according to
0. 75. A projection exposure apparatus comprising:
a laser light source; an illumination system; a mask holding system; a projection optical system according to a wafer holding system.
0. 76. A projection exposure apparatus comprising:
a laser light source; an illumination system; a mask holding system; a projection optical system according to a wafer holding system.
0. 77. A projection exposure apparatus comprising:
a laser light source; an illumination system; a mask holding system; a projection optical system according to a wafer holding system.
0. 78. A projection exposure apparatus comprising:
a laser light source; an illumination system; a mask holding system; a projection optical system according to a wafer holding system.
0. 79. A projection exposure apparatus comprising:
a laser light source; an illumination system; a mask holding system; a projection optical system according to a wafer holding system.
0. 80. A method of producing a device by projection exposure making use of a projection exposure apparatus according to
0. 81. A method of producing a device by projection exposure making use of a projection exposure apparatus according to
0. 82. A method of producing a device by projection exposure making use of a projection exposure apparatus according to
0. 83. A method of producing a device by projection exposure making use of a projection exposure apparatus according to
0. 84. A method of producing a device by projection exposure making use of a projection exposure apparatus according to
0. 85. A method according to
0. 86. A method according to
0. 87. A method according to
0. 88. A method according to
0. 89. A method according to
0. 90. The catadioptric imaging optical system of
a first group with positive refractive power, a second group including a concave mirror, and a mirror between the first and second group.
0. 91. The method of
a first group with positive refractive power, a second group including a concave mirror, and a mirror between the first and second groups.
0. 92. The projection optical system of
0. 93. The projection optical system of
0. 94. The projection optical system of
0. 95. The projection optical system of
0. 96. The projection optical system of
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This is a continuation of application Ser. No. 08/429,970 filed Apr. 27, 1995, now U.S. Pat. No. 5,808,805.
1. Field of the Invention
The present invention relates to a catadioptric projection optical system suitable for applications to projection optical systems for 1:1 or demagnifying projection in projection exposure apparatus such as steppers used in fabricating, for example, semiconductor devices or liquid crystal display devices, etc., by photolithography process. More particularly, the invention relates to a catadiontric projection optical system of a magnification of ¼ to ⅕ with a resolution of submicron order in the ultraviolet wavelength region, using a reflecting system as an element in the optical system.
2. Related Background Art
In fabricating semiconductor devices or liquid crystal display devices, etc. by photolithography process, the projection exposure apparatus is used for demagnifying through a projection optical system a pattern image on a reticle (or photomask, etc.) for example at a ratio of about ¼ to ⅕ to effect exposure of the image on a wafer (or glass plate, etc.) coated with a photoresist or the like.
The projection exposure apparatus with a catadioptric projection optical system is disclosed, for example, in Japanese Laid-open Patent Application No. 2-66510, Japanese Laid-open Patent Application No. 3-282527, U.S. Pat. No. 5,089,913, Japanese Laid-open Patent Application No. 5-72478, or U.S. Pat. Nos. 5,052,763, 4,779,966, 4,65,77, 4,701,035.
An object of the present invention is to provide an exposure apparatus having a catadioptric projection optical system which can use a beam splitting optical system smaller than the conventional polarizing beam splitter and which is excellent in image-forming performance, permitting a sufficiently long optical path of from the concave, reflective mirror to the image plane. Therefore, the catadioptric projection optical system has a space permitting an aperture stop to be set therein, based on a size reduction of the beam splitting optical system such as a polarizing beam splitter. The catadioptric projection optical system can be applied to the projection exposure apparatus of the scanning exposure method, based on use of a compact beam splitting optical system. Besides the projection exposure apparatus of the one-shot exposure method, the catadioptric projection optical system can be also applier to recent apparatus employing a scanning exposure method such as the slit scan method or the step-and-scan method, etc. for effecting exposure while relatively scanning the reticle and the wafer to the projection optical system.
To achieve the above object, as shown in
In particular, as shown in
Various embodiments of the catadioptric projection optical system according to the present invention will be described with reference to the drawings. In the examples, the present invention is applied to the projection optical system in the projection exposure apparatus for projecting an image of patterns of reticle onto a wafer coated with a photoresist.
The techniques relating to an exposure apparatus of the present invention are described, for example, in U.S. patent applications Ser. No. 255,927 (which issued as U.S. Pat. No. 5,534,970), 260,398 (which issued as U.S. Pat. No. 5,591,958), 299,305 (which issued as U.S. Pat. No. 5,506,684), U.S. Pat. Nos. 4,497,015, 4,666,273, 5,194,893, 5,253,110, 5,333,035, 5,365,051, 5,379,091, or the like. The reference of U.S. patent application Ser. No. 255,927 (which issued as U.S. Pat. No. 5,534,970) teaches an illumination optical system (using a laser source) applied to a scan type exposure apparatus. The reference of U.S. patent application Ser. No. 260,398 (which issued as U.S. Pat. No. 5,591,958) teaches an illumination optical system (using a lamp source) applied to a scan type exposure apparatus. The reference of U.S. patent application Ser. No. 299,305 (which issued as U.S. Pat. No. 5,506,684) teaches an alignment optical system applied to a scan type exposure apparatus. The reference of U.S. Pat. No. 4,497,015 teaches an illumination optical system (using a lamp source) applied to a scan type exposure apparatus. The reference of U.S. Pat. No. 4,666,273 reaches a step-and repeat type exposure apparatus capable of using the catadioptric projection optical system of the present invention.
The reference of U.S. Pat. No. 5,194,893 teaches an illumination optical system, an illumination region, mask-side and reticle-side interferometers, a focusing optical system, alignment optical system, or the like. The reference of U.S. Pat. No. 5,253,110 teaches an illumination optical system (using a laser source) applied to a step-and-repeat type exposure apparatus. The '110 reference can be applied to a scan type exposure apparatus. The reference of U.S. Pat. No. 5,333,035 teaches an application of an illumination optical system applied to an exposure apparatus. The reference of U.S. Pat. No. 5,365,051 teaches a auto-focusing system applied to an exposure apparatus. The reference of U.S. Pat. No. 5,379,091 teaches an illumination optical system (using a laser source) applied to a scan type exposure apparatus.
In each embodiment as described below, a lens arrangement is illustrated as an optical path development, for example as shown in FIG. 4. In each optical path development, a reflective surface is shown as a transmissive surface, and optical elements are arranged in the order in which light from reticle R passes. Also, a virtual plane of flat surface (for example r15) is used at a reflective surface of a concave, reflective mirror (for example r14). In order to indicate a shape and separation of lens, for example as shown in
silica glass: 1.56100
The first embodiment is a projection optical system with a magnification of ¼×, suitably applicable to the projection exposure apparatus of the one-shot exposure method (steppers etc.). This first embodiment is an embodiment corresponding to the optical system of
Then, light from the intermediate image, that is, a light beam having passed through the polarizing beam splitter 10A, then passes through a third converging group G3 consisting of fourteen refractive lenses to form a second intermediate image of the patterns on the surface of wafer W. In this case, an aperture stop 6 is placed on a Fourier transform plane in the third converging group G3, i.e., between a positive meniscus lens L36 and a concave lens L37.
Also, as shown in
A magnification of the total system is ¼×(demagnification), a numerical aperture NA on the wafer W side (image side) is 0.4, and the object height is 30 mm.
The refractive lenses all are made of a kind of optical glass of fused quartz, which are corrected For axial and lateral chromatic aberrations for a wavelength band of 1 nm at the wavelength of 193 nm of the ultraviolet excimer laser light. Also, the optical system has excellent image-forming performance, as well corrected for spherical aberration, coma, astigmatism, and distortion up to a nearly zero aberration slate, and the good image-forming performance can be retained even if the optical system of
Next Table 1 shows radii of curvature ri, surface separations di, and glass materials in the first embodiment of FIG. 4. In the following table, the fifteenth surface is a virtual plane for indicating the concave, reflective mirror in the optical path development.
TABLE 1 | ||||
Glass | ||||
i | ri | di | Material | |
0 | -- | 2.2 | ||
1 | 45.87 | 15.0 | SiO2 | |
2 | 321.75 | 7.5 | ||
3 | 4161.48 | 6.0 | SiO2 | |
4 | 56.56 | 11.7 | ||
5 | 243.98 | 10.0 | SiO2 | |
6 | -89.98 | 7.3 | ||
7 | -50.58 | 6.0 | SiO2 | |
8 | 46.80 | 5.0 | ||
9 | ∞ | 30.0 | SiO2 | |
10 | ∞ | 52.6 | ||
11 | ∞ | 27.0 | ||
12 | -76.04 | 6.9 | SiO2 | |
13 | -140.44 | 4.1 | ||
14 | -89.27 | 0.0 | ||
15 | ∞ | 4.1 | ||
16 | 140.44 | 6.9 | SiO2 | |
17 | 76.04 | 79.6 | ||
18 | ∞ | 30.0 | SiO2 | |
19 | ∞ | 5.0 | ||
20 | -41.51 | 6.0 | SiO2 | |
21 | -39.50 | 1.0 | ||
22 | 244.39 | 10.0 | SiO2 | |
23 | -64.38 | 1.0 | ||
24 | -140.60 | 6.0 | SiO2 | |
25 | -82.20 | 1.0 | ||
26 | 146.49 | 9.4 | SiO2 | |
27 | -114.12 | 32.9 | ||
28 | 84.53 | 6.0 | SiO2 | |
29 | -182.36 | 1.0 | ||
30 | 48.17 | 6.0 | SiO2 | |
31 | 194.47 | 4.0 | ||
32 | -48.51 | 5.6 | SiO2 | |
33 | 58.04 | 4.3 | ||
34 | 207.40 | 8.2 | SiO2 | |
35 | -118.99 | 0.3 | ||
36 | 103.13 | 8.2 | SiO2 | |
37 | -61.92 | 3.7 | ||
38 | -38.44 | 6.7 | SiO2 | |
39 | -42.44 | 1.0 | ||
40 | 308.23 | 8.0 | SiO2 | |
41 | -71.28 | 1.0 | ||
42 | 19.58 | 5.7 | SiO2 | |
43 | 16.97 | 2.5 | ||
44 | 19.43 | 8.0 | SiO2 | |
45 | 51.61 | 0.5 | ||
46 | 108.17 | 3.7 | SiO2 | |
47 | 39.10 | 0.7 | ||
Also,
The second embodiment is a projection optical system with a magnification of ¼×, suitably applicable to the projection exposure apparatus of the scanning exposure method. This second embodiment is an embodiment as a modification of the optical system of
The reflected light reaches a second converging group G2 consisting of a negative meniscus lens L20 and a concave, reflective mirror M2, and light reflected by the second converging group G2 forms an intermediate image of the patterns in the illumination area P10, near the reflective film 10Ba in the partially-reflective beam splitter 10B. Then light from the intermediate image is reflected by the reflective film 10Ba, then passes through a third converging group G3 consisting of fourteen refractive lenses, and forms a second intermediate image of the patterns on the surface of wafer W. Letting β be a projection magnification of from reticle R to wafer W, the reticle area R is scanned upward at a predetermined velocity VR and in synchronization therewith the wafer W is scanned upward at a velocity β·VR, thus carrying out exposure in the scanning exposure method.
Also, as shown in
A magnification of the total system is ¼×(demagnification), a numerical aperture NA on the wafer W side (image side) is 0.5, and the object height is 22 mm. The optical system may be used in the one-shot exposure method.
The refractive lenses all are made of a kind of optical glass of fused quartz, which are corrected for axial and lateral chromatic aberrations for a wavelength band of 1 nm at the wavelength of 193 nm of the ultraviolet excimer laser light. Also, the optical system has excellent image-forming performance, as well corrected for spherical aberration, coma, astigmatism, and distortion up to a nearly zero aberration state.
Next Table 2 shows radii of curvature ri, surface separations di and glass materials in the second embodiment of FIG. 10. In the following table, the fourteenth surface is a virtual plane for indicating the concave, reflective mirror in the optical path development.
TABLE 2 | ||||
Glass | ||||
i | ri | di | Material | |
0 | -- | 2.2 | ||
1 | 45.63 | 10.0 | SiO2 | |
2 | -183.72 | 12.0 | ||
3 | -91.37 | 6.0 | SiO2 | |
4 | 47.38 | 11.7 | ||
5 | -221.10 | 10.0 | SiO2 | |
6 | -98.95 | 7.3 | ||
7 | -110.83 | 6.0 | SiO2 | |
8 | 66.11 | 3.0 | ||
9 | ∞ | 40.0 | SiO2 | |
10 | ∞ | 77.7 | ||
11 | -78.96 | 7.2 | SiO2 | |
12 | -145.84 | 4.3 | ||
13 | -92.70 | 0.0 | ||
14 | ∞ | 4.3 | ||
15 | 145.84 | 7.2 | SiO2 | |
16 | 78.96 | 77.7 | ||
17 | ∞ | 40.0 | SiO2 | |
18 | ∞ | 4.0 | ||
19 | -40.58 | 6.0 | SiO2 | |
20 | -36.69 | 1.0 | ||
21 | 212.61 | 10.0 | SiO2 | |
22 | -65.47 | 1.0 | ||
23 | -134.41 | 6.0 | SiO2 | |
24 | -75.11 | 1.0 | ||
25 | 319.62 | 9.4 | SiO2 | |
26 | -119.09 | 32.9 | ||
27 | 56.25 | 6.0 | SiO2 | |
28 | -120.67 | 1.0 | ||
29 | 49.04 | 6.0 | SiO2 | |
30 | 99.71 | 4.0 | ||
31 | -48.50 | 5.6 | SiO2 | |
32 | 54.15 | 4.3 | ||
33 | -361.48 | 8.2 | SiO2 | |
34 | -76.92 | 0.3 | ||
35 | 145.52 | 8.2 | SiO2 | |
36 | -71.54 | 3.7 | ||
37 | -37.19 | 6.7 | SiO2 | |
38 | -41.33 | 1.0 | ||
39 | 194.05 | 8.0 | SiO2 | |
40 | -62.51 | 1.0 | ||
41 | 17.77 | 5.7 | SiO2 | |
42 | 13.88 | 2.5 | ||
43 | 17.52 | 8.0 | SiO2 | |
44 | 93.95 | 0.5 | ||
45 | 98.19 | 3.7 | SiO2 | |
46 | 31.30 | 7.0 | ||
Also,
The third embodiment is a projection optical system with a magnification of ¼×, suitably applicable to the projection exposure apparatus of the scanning exposure method. This third embodiment is an embodiment of the optical system using a partial mirror as well. As shown in
This passing light reaches a second converging group G2 consisting of a negative meniscus lens L20 and a concave, reflective mirror M2, and light reflected by the second converging group G2 forms an intermediate image 11 of the patterns in the illumination area P10, near the partial mirror 12 (see FIG. 17). Then light from the intermediate image 11 is reflected by a second reflective surface 12b of the partial mirror 12 and thereafter passes through a third converging group G3 consisting of fourteen refractive lenses to form a second intermediate image of the patterns on the surface of wafer W. Also, an aperture stop 6 is placed on a Fourier transform plane in the third converging group G3, i.e., between a convex lens L34 and a convex lens L35 near a last one of the beam waists. In this case, letting β be a projection magnification of from reticle R to wafer W, the reticle area R is scanned upward at a predetermined velocity VR and in synchronization therewith the wafer 11 is scanned upward at a velocity β·VR, thus performing exposure in the scanning exposure method.
Also, as shown in
A magnification of the total system is ¼×(demagnification), a numerical aperture NA on the wafer 11 side (image side) is 0.4, and the object height is 26 mm. The optical system may be used in the one-shot exposure method.
The refractive lenses all are made of a kind of optical glass of fused quartz, which are corrected for axial and lateral chromatic aberrations for a wavelength band of 1 nm at the wavelength of 193 nm of the ultraviolet excimer laser light. Also, the optical system has excellent image-forming performance, as well corrected for spherical aberration, coma, astigmatism, and distortion up to a nearly zero aberration state, and the good image-forming performance can be retained even if the optical system is proportionally enlarged two to three times.
Next Table 3 shows radii of curvature ri, surface separations di and glass materials in the third embodiment of
TABLE 3 | ||||
Glass | ||||
i | ri | di | Material | |
0 | 0 | 2.2 | ||
1 | 38.17 | 10.0 | SiO2 | |
2 | 76.72 | 12.0 | ||
3 | 142.94 | 6.0 | SiO2 | |
4 | 32.99 | 11.7 | ||
5 | 36.73 | 10.0 | SiO2 | |
6 | -337.52 | 6.5 | ||
7 | -51.05 | 6.0 | SiO2 | |
8 | 46.99 | 34.6 | ||
9 | ∞ | 30.3 | ||
10 | ∞ | 69.6 | ||
11 | -87.27 | 8.0 | SiO2 | |
12 | -177.44 | 4.8 | ||
13 | -101.17 | 0.0 | ||
14 | ∞ | 4.8 | ||
15 | 177.44 | 8.0 | SiO2 | |
16 | 87.27 | 100.0 | ||
17 | ∞ | 14.6 | ||
18 | -36.36 | 8.0 | SiO2 | |
19 | -40.19 | 1.0 | ||
20 | -579.38 | 6.0 | SiO2 | |
21 | -39.93 | 1.0 | ||
22 | -280.59 | 8.0 | SiO2 | |
23 | -108.42 | 1.0 | ||
24 | 140.91 | 9.4 | SiO2 | |
25 | -191.84 | 32.9 | ||
26 | 92.51 | 8.0 | SiO2 | |
27 | -154.05 | 1.0 | ||
28 | 58.31 | 7.0 | SiO2 | |
29 | 427.83 | 4.0 | ||
30 | -43.79 | 4.0 | SiO2 | |
31 | 1615.36 | 3.0 | ||
32 | -48.72 | 8.2 | SiO2 | |
33 | -43.49 | 0.3 | ||
34 | 165.95 | 8.2 | SiO2 | |
35 | -82.87 | 3.7 | ||
36 | -43.10 | 6.7 | SiO2 | |
37 | -50.06 | 1.0 | ||
38 | 75.15 | 7.0 | SiO2 | |
39 | -168.78 | 1.0 | ||
40 | 21.81 | 7.0 | SiO2 | |
41 | 17.17 | 3.0 | ||
42 | 21.02 | 8.0 | SiO2 | |
43 | 97.85 | 1.0 | ||
44 | 17.80 | 3.7 | SiO2 | |
45 | 13.10 | 6.9 | ||
Also,
The fourth embodiment is a projection optical system with a magnification of ¼×, suitably applicable to the projection exposure apparatus of the one-shot exposure method (steppers etc.). This fourth embodiment is an embodiment as a modification of the optical system of
A light beam having passed through the beam splitter surface 10Ca passes through a quarter wave plate 9 (not shown in
Then a light beam from the intermediate image 11 passes through a third converging group G3 consisting of fourteen refractive lenses to form a second intermediate image of the patterns on the surface of wafer W. In this case, an aperture stop 6 is placed on a Fourier transform plane in the third converging group G3 that is, between a positive meniscus lens L38 and a convex lens L39.
Also, as shown in
A magnification of the total system is ¼×(demagnification), a numerical aperture NA on the wafer 11 side (image side) is 0.6, and the object height is 20 mm.
The refractive lenses all are made of a kind of optical glass of fused quartz, which are corrected for axial and lateral chromatic aberrations for a wavelength band of 1 nm at the wavelength of 193 nm of the ultraviolet excimer laser light. Also, the optical system has excellent image-forming performance, as well corrected for spherical aberration, coma, astigmatism, and distortion up to a nearly zero aberration state, and the good image-forming performance can be retained even if the optical system of
Next Table 4 shows radii of curvature ri, surface separations di and glass materials in the fourth embodiment of FIG. 25. In the following table, the fourteenth surface is a virtual plane for indicating the concave, reflective mirror in the optical path development.
TABLE 4 | ||||
Glass | ||||
i | ri | di | Material | |
0 | 0 | 2.2 | ||
1 | 43.62 | 8.0 | SiO2 | |
2 | -319.17 | 12.6 | ||
3 | -250.41 | 6.0 | SiO2 | |
4 | 42.75 | 11.7 | ||
5 | 1371.37 | 10.0 | SiO2 | |
6 | -83.00 | 7.3 | ||
7 | 46.47 | 6.0 | SiO2 | |
8 | 73.09 | 5.0 | ||
9 | ∞ | 40.0 | SiO2 | |
10 | ∞ | 60.7 | ||
11 | -78.96 | 7.2 | SiO2 | |
12 | -145.84 | 4.3 | ||
13 | -92.70 | 0.0 | ||
14 | ∞ | 4.3 | ||
15 | 145.84 | 7.2 | SiO2 | |
16 | 78.96 | 60.7 | ||
17 | ∞ | 40.0 | SiO2 | |
18 | ∞ | 40.0 | ||
19 | -48.19 | 6.0 | SiO2 | |
20 | -39.43 | 1.0 | ||
21 | 99.65 | 10.0 | SiO2 | |
22 | 69.37 | 1.0 | ||
23 | -82.13 | 6.0 | SiO2 | |
24 | -95.92 | 1.0 | ||
25 | 426.51 | 8.4 | SiO2 | |
26 | -155.92 | 32.9 | ||
27 | 65.87 | 7.0 | SiO2 | |
28 | -861.00 | 1.0 | ||
29 | 45.43 | 6.0 | SiO2 | |
30 | 144.51 | 6.0 | ||
31 | -47.72 | 3.6 | SiO2 | |
32 | 9.88 | 4.3 | ||
33 | -139.82 | 6.2 | SiO2 | |
34 | -63.75 | 3.3 | ||
35 | 164.20 | 7.2 | SiO2 | |
36 | -61.66 | 3.7 | ||
37 | -35.40 | 6.7 | SiO2 | |
38 | -42.77 | 1.0 | ||
39 | 194.25 | 8.0 | SiO2 | |
40 | -64.00 | 1.0 | ||
41 | 21.24 | 5.7 | SiO2 | |
42 | 16.45 | 1.5 | ||
43 | 17.66 | 9.0 | SiO2 | |
44 | 103.14 | 0.5 | ||
45 | 60.80 | 3.7 | SiO2 | |
46 | 40.36 | 7.0 | ||
Also,
It is preferred that the conditions of equations (1) to (6) be satisfied in the present invention, and thus, correspondence is next described between each embodiment as described above and the conditions of equations. First, Table 5 to Table 8 each show the radius of curvature r of the concave, reflective mirror M2, focal lengths fi of the i-th converging groups Gi (i=1 to 3), Petzval sums pi, apparent refractive indices ni, image magnifications βi, a magnification β12 of a combinational system of the first converging group G1 with the second converging group G2, an image magnification β3 of the third converging group G3, a Petzval sum p of the total system, and a magnification β of the total system in each embodiment as described above. Here, the total system is represented by GT, and blocks for Petzval sum pi and image magnification βi corresponding to the total system GT indicate the Petzval sum and image magnification of the total system, respectively.
TABLE 5 | ||||||
Specifications of first embodiment | ||||||
r | fi | pi | ni | βi | βij | |
G1 | -- | -197.278 | -0.00887 | 0.60199 | 0.47913 | -0.32802 |
G2 | -89.277 | 56.4187 | 0.02674 | -0.66285 | -0.68461 | |
G3 | -- | -303.1767 | 0.03546 | -0.09302 | -0.76215 | -0.76215 |
GT | -- | -- | -0.00015 | -- | 0.25004 | 0.25004 |
TABLE 6 | ||||||
Specifications of second embodiment | ||||||
r | fi | pi | ni | βi | βij | |
G1 | -- | -236.848 | -0.00836 | 0.505038 | 0.4993 | -0.33286 |
G2 | -92.707 | 58.5864 | -0.02575 | 0.662866 | -0.66665 | |
G3 | -- | -206.081 | 0.03442 | -0.140978 | -0.750195 | -0.750195 |
GT | -- | -- | 0.00032 | -- | 0.20 | 0.24971 |
TABLE 7 | ||||||
Specifications of third embodiment | ||||||
r | fi | pi | ni | βi | βij | |
G1 | -- | -313.155 | -0.00749 | 0.426342 | 0.53714 | -0.33331 |
G2 | -101.175 | 66.2825 | -0.02395 | -0.629935 | -0.620527 | |
G3 | -- | -696.956 | 0.03173 | -0.045219 | -0.75104 | -0.75104 |
GT | -- | -- | 0.00029 | -- | 0.25033 | 0.25033 |
TABLE 8 | ||||||
Specifications of fourth embodiment | ||||||
r | fi | pi | ni | βi | βij | |
G1 | -- | -105.504 | -0.01079 | 0.87843 | 0.46888 | -0.39211 |
G2 | -92.7068 | 58.586 | 0.02575 | -0.66287 | -0.83627 | |
G3 | -- | -107.983 | 0.03733 | -0.24808 | -0.63959 | -0.63959 |
GT | -- | -- | 0.00079 | -- | 0.25079 | 0.25079 |
Further, based on Table 5 to Table 8, values are calculated for (p1+p3), p2, |p1+p2+p3|, |β12|, |β3|, and |β| in each embodiment, and the following Table 9 shows the calculated values.
TABLE 9 | ||||
Table of correspondence conditions | ||||
Conditions\ | ||||
Embodiment | 1 | 2 | 3 | 4 |
(1) p1 + p3 > 0 | 0.02659 | 0.02606 | 0.02424 | 0.02654 |
(2) p2 < 0 | -0.02674 | -0.02575 | -0.02395 | -0.02575 |
(3) |p1 + p2 + p3 | < 0.1 | 0.00015 | 0.00031 | 0.00029 | 0.00079 |
(4) 0.1 ≦ |β12| ≦ 0.5 | 0.32802 | 0.33286 | 0.33331 | 0.39211 |
(5) 0.25 ≦ |β3| ≦ 2 | 0.76215 | 0.7502195 | 0.75104 | 0.63959 |
(6) 0.1 ≦ |β| ≦ 0.5 | 0.25004 | 0.24971 | 0.25033 | 0.25079 |
From this table, it is seen that either one of the above-described embodiments satisfies the conditions of equations (1) to (6).
The embodiments as described above employed quartz as a glass material for forming the refractive optical system, but another optical glass such as fluorite may be used.
Next, an embodiment of a common exposure apparatus using the catadioptric projection optical system 5 of the present invention. In this embodiment, as shown in
Thus, the present invention is by no means limited to the above-described embodiments, but may employ a variety of constitutions within a range not departing from the essence of the present invention.
Since the catadioptric projection optical system of
Also, different from the ring field optical system for projecting only an annular part using an off-axis light beam, the optical system of the invention includes an advantage that it can employ the one-shot exposure method under a high numerical aperture.
Since an aperture stop can be placed in the second image-forming optical system, the optical system of the invention can enjoy an advantage that the σ value being a coherence factor can be freely controlled.
In the case of the conventional catadioptric systems, adjustment was difficult because of eccentricity of optical axis, and thus, image-forming performance as designed was rarely able to be achieved. In contrast, the catadioptric projection optical system according to the present invention permits independent adjustment of the first image-forming optical system and the second image-forming optical system, and after the adjustment the two image-forming optical systems may be set with the optical axis approximately vertical, which facilitates adjustment of eccentricity etc.
Since the image magnification by the first image-forming optical system can be freely selected, an excellent optical performance state can be realized.
In this case, an advantage of a further size reduction of the beam splitter can be attained by forming the intermediate image inside the prism type beam splitter.
Next, because the second catadioptric projection optical system of
Further, when the partial mirror is used, the best image region is, for example, arcuate or slit as eccentric from the optical axis. Such an image region is suitable for the projection exposure apparatus of the scanning exposure method.
Next, when the conditions of equations (1) to (3) are satisfied, the Petzval sum of the total optical system readily becomes nearly 0, so that the projection image surface becomes approximately flat. Further, when the conditions of equations (4) and (5) are satisfied, a magnification balance becomes reasonable, and the optical system can be easily constructed.
From the invention thus described, it will be obvious that the invention may be varied in many ways. Such variations are not to be regarded as a departure from the spirit and scope of the invention, and all such modifications as would be obvious to one skilled in the art are intended to be included within the scope of the following claims. The basic Japanese application No. 6-90837 filed on Apr. 28, 1994 is hereby incorporated by reference.
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