Liquid feed nozzle, wet treatment apparatus and wet treatment method

Abstract

The wet treatment liquid feed nozzle of the invention comprises an introducing path having an introducing port, a discharging path having a discharging port, a crossing section formed by causing the introducing path and the discharging path to cross at the other ends thereof, a nozzle assembly having an opening section opening to an object to be treated, provided at the crossing section, and pressure control means, for controlling the difference between the pressure of the wet treatment liquid in contact with the object to be treated and the atmospheric pressure provided at least on the discharging path side so that the wet treatment liquid having been in contact with the object to be treated via the opening section does not flow to outside the discharging path.

Description

by some vase or other in some way or another, and the open air pressure becomes higher, air flows into the crossing section and entangled mixes into the wet treatment liquid.

By providing a sensor 131 as shown in FIG. 38 described later, it is possible to know the status of balance in pressure.

When there is a risk of breakage of pressure balance, the balance in pressure ca can be maintained by ejecting the wet treatment liquid into the crossing section.

FIG. 28 shows a case in which the auxiliary paths 240a and 240b are added to the basic configuration comprising the two discharging paths 112a and 112b with the introducing path 110 in between. It is however needless to mention that the auxiliary paths may be added to a basic configuration having a single introducing path and a single discharging path, shown in FIG. 19.

FIG. 29 illustrates a fifteenth embodiment of the wet treatment liquid feed nozzle of the invention.

FIG. 29A is sectional side view, and FIG. 29B is a plan view.

The wet treatment liquid feed nozzle of the fifteenth embodiment comprises introducing paths 110a and 110b each having an introducing port for introducing a wet treatment liquid at an end thereof, a discharging path 112 having a discharging port 115aa for discharging the wet treatment liquid after a wet treatment to outside the wet treatment system, a crossing section 114 formed by causing the introducing paths 110a and 110b and the discharging path 112 to cross at the other ends thereof. An opening section 106 opening to an object to be wet-treated provided at the crossing section, and a parallel flow section 260 through which the wet treatment liquid flows in parallel with the treated surface of the object to be wet-treated 101.

When the wet treatment liquid is introduced through the parallel flow section 260, replacement of the wet treatment liquid after treatment and the newly introduced wet treatment liquid is efficiently accomplished, so that the object to be wet-treated can always be wet-treated with fresh wet treatment liquid.

The length Lx the parallel flow section 260 should preferably be within a range of from 1 mm to 10 mm. With a length of under 1 mm, it is difficult to control the flow direction. With a length of over 10 mm, the nozzle becomes excessively larger in size.

The wet treatment liquid flowing through the parallel flow section 260 may come into contact with the object to be wet-treated 101, or may flow without coming into contact with the object to be wet-treated 101.

In the case shown in FIG. 29, the upper length Lx of the parallel flow section 260 is substantially equal to the lower length Ly thereof. When the lengths Ly=Lx for the parallel flow section 260, therefore, the wet treatment liquid does not come into contact with the object to be wet-treated in the parallel flow section, and is introduced into the crossing section 114. In this case, the wet treatment liquid is controlled so as to be in parallel with the object to be wet-treated, enters the crossing section, comes into contact with the object to be wet-treated at the opening section and flows into the discharging path, thereby improving washing efficiency.

On the other hand, Ly=0 in the case shown in FIG. 30 giving a variant of the foregoing fifteenth embodiment. That is, the wet treatment liquid flows through the parallel flow section while being in contact with the object to be wet-treated.

In this variant of the fifteenth embodiment, the mesh is a little deeper than the opening section 106. In other words, a mesh plate 265 having a mesh-shaped opening is provided near the beginning of the discharging path 112. By adopting this configuration, it is possible to avoid exhaustion of the treatment liquid upon closing a valve provided in the discharging path from the proximity to the ultrasonic element 116 even in stoppage of the wet treatment liquid.

The cross-sectional area of the discharging path 112 is larger on the crossing section 114 side, and smaller on the discharge port 115 side. This is for arranging the ultrasonic element 116 at a position where an ultrasonic wave can be efficiently imparted, and for discharging the wet treatment liquid after wet treatment promptly on the discharge port 115 side.

FIG. 31 illustrates a sixteenth embodiment of the wet treatment liquid feed nozzle of the invention.

The wet treatment liquid feed nozzle of the sixteenth embodiment comprises introducing paths 110a and 110b having respective introducing ports 107a and 107b for introducing a wet treatment liquid at ends on one side thereof, a discharging path 112 having a discharging port 115 for discharging the wet treatment liquid after a wet treatment to outside the wet treatment system, a crossing section 114 formed by causing the introducing paths 110a and 110b and the discharging path 112 to cross at the other ends thereof, an opening section 106 opening to an object to be wt-treated 101, and an inner extension 270 provided on the peripheral edge of the opening section 106, from the peripheral edge toward inside, of which the outer surface is in parallel with the treated surface of the object to be wet-treated 101.

When such an inner extension 270 is provided, it is possible to prevent air from the open air side from being entangled into the wet treatment liquid, since the wet treatment liquid in contact with the object to be wet-treated 101 communicates with the open air only through a very small gap between the object to be wet-treated 101 and the inner extension. It is also possible to prevent leakage of the wet treatment liquid to the open air side.

FIG. 32 illustrates a variant of the aforesaid sixteenth embodiment, in which the inner extension 270 comprises a material different from the material for the introducing paths 110a and 110b. Suitable materials for the introducing path include stainless steel such as SUS316L (particularly, stainless steel having an oxide passive film of chromium oxide alone formed on the surface) and aluminum (aluminum having a fluoride passive film formed on the inner surface). The inner extension should preferably be formed of a water repellent material such as PTFE, PVDF{(CFH—CH2)n—} or PFA.

FIG. 33 illustrates a seventeenth embodiment of the wet treatment liquid feed nozzle of the invention.

The wet treatment liquid feed nozzle of the seventeenth embodiment comprises introducing paths 110a and 110b having respective introducing ports 107a and 107b for introducing a wet treatment liquid at ends on one side thereof, a discharging path 112 having a discharging port 115 for discharging the wet treatment liquid after a wet treatment to outside the wet treatment system, a crossing section 114 formed by causing the introducing paths 110a and 110b and the discharging path 112 to cross at the other ends thereof, an opening section 106 opening to an object to be wet-treated 101 provided at the crossing section 114, and a sealing member 280 provided on the peripheral edge of the opening section 106 for sealing the crossing section 114 from outside while being in contact with a support stand 281 of the object to be wet-treated 101.

An object of this embodiment is to cut off the wet treatment liquid from outside by completely sealing the crossing section 114 with a sealing member 280, thereby discharging the wet treatment liquid after the wet treatment completely into the discharging path 112.

According to this embodiment, the sealing member permits achievement of perfect prevention of liquid leakage.

Or, as shown in FIG. 33B, the sealing member should preferably be in contact with a portion allowing contact such as the outer periphery of the object to be wet-treated 101.

In this embodiment, it is not necessary to arrange the wet treatment liquid feed nozzle movably in parallel with the object to be wet-treated 101, but it suffices to provide the nozzle vertically or diagonally movably relative to the object to be wet-treated 101.

FIG. 34 illustrates an eighteenth embodiment of the wet treatment liquid feed nozzle of the invention.

The wet treatment liquid feed nozzle of the eighteenth embodiment comprises an introducing path 110 having an introducing port 107 for introducing a wet treatment liquid at an end thereof, discharging paths 112a and 112b having respective discharging ports 115a and 115b for discharging the wet treatment liquid after a wet treatment to outside the wet treatment system, a crossing section 114 formed by causing the introducing path 110 and the discharging paths 112a and 112b to cross at the other end thereof, a opening section 106 opening to an object to be wet-treated 101 at the crossing section 114, and an auxiliary introducing path 290 communicating with the discharging path 115b. In FIG. 34, 270 is an inner extension provided on the peripheral edge of the opening section 106, from the peripheral edge toward inside, of which the outer surface is in parallel with the treated surface of the object to be wet-treated 101.

The wet treatment liquid is constantly fed from the introducing path 110 to the crossing section 114. However, the crossing section 114 may sometimes become empty at the trailing or beading end of the object to be wet-treated. A problem is that, upon introduction of the wet treatment liquid from the introducing path 110 when the next object to be wet-treated arrives, and upon filling the entire crossing section with the treatment liquid, the discharging path side contains air, and the treatment liquid cannot be discharged by the use of a water discharge pump. Therefore, by feeding the wet treatment liquid from the auxiliary introducing path 290, it is possible to fill the discharging path 112 as well with the wet treatment liquid, thereby ensuring a state permitting smooth flow of the treatment liquid. A reduced-pressure pump can eliminate the problem without the necessity of an auxiliary introducing path 290.

In this embodiment, a shutter 295 is provided for opening and closing the opening section 106. When treatment of an object to be wet-treated has been completed and the process is in standby for the treatment of the next object to be wet-treated, continuing feeding the wet treatment liquid with a valve V₂ kept open would lead to exhaustion of the wet treatment liquid. When introduction of the wet treatment liquid is discontinued by closing the valve V₂ air enters the entire wet treatment liquid feed nozzle including the crossing section 114, and at the start of the next run of wet treatment, the wet treatment liquid entrapping the air would be fed to the object to be wet-treated.

Air is prevented from entering the wet treatment liquid by filling the entire wet treatment liquid feed nozzle including the crossing section 114 with the wet treatment liquid by closing the shutter 295, and closing valves V₁, V₂ and V₃ in this state. When using the wet treatment liquid feed nozzle for the next run, it suffices to open the shutter 295, with the valves V₁, V₂ and V₃ opened, to feed the wet treatment liquid to the object to be wet-treated.

FIG. 35 illustrates a variant of the foregoing sixteenth embodiment.

This variant of embodiment has the same basic structure as that shown in FIG. 24: discharging paths 112a and 112b are provided with two opposed introducing paths 110a and 110b in between. The only difference of this case lies in that the distance between the exits of the introducing paths 110a and 110b, on the one hand, and the entries of the discharging paths 112a and 112b is shorter than that shown in FIG. 24. The wet treatment liquid introduced from the introducing paths 110a and 110b is discharged more efficiently into the discharging paths 112a and 112b.

While the discharging paths are arranged with the introducing paths in between in FIG. 35, the introducing paths may be arranged with the discharging paths in between.

In this variant of embodiment, liquid leakage is prevented by providing a film 230.

FIG. 36 illustrates a nineteenth embodiment of the wet treatment liquid feed nozzle of the invention.

In this embodiment, the crossing section is divided by partitions 350a and 350b into three compartments 114a, 114b and 114c.

By dividing the crossing section into a plurality of compartments, and further providing introducing paths 110a, 110b and 110c and discharging paths 112a, 112b and 112c for the compartments 114a, 114b and 114c, respectively, and providing a valve (not shown), it is possible to feed the wet treatment liquid only to limited portions requiring the wet treatment, thereby further reducing the consumption of the wet treatment liquid.

Independent ultrasonic elements 116a, 116b and 116c may be provided in the compartments, respectively, and by appropriately selecting a frequency and a power for each compartment, it is possible to carry out a treatment suitable for each surface portion of the object to be wet-treated.

FIG. 37 illustrates first embodiment of the wet treatment liquid feed nozzle apparatus of the invention.

The wet treatment liquid feed nozzle apparatus of this embodiment comprises the wet treatment liquid feed nozzle of the invention provided with a pressure controller 113.

The pressure controller 113 is provided at least on the discharging path 112 side so as to take balance between the pressure of the wet treatment liquid in contact with to open air at the opening section 106 (including the surface tension of the wet treatment liquid and the surface tension of the treated surface of the object to be wet-treated)and the atmospheric pressure so that the wet treatment liquid in contact with the object to be wet-treated 101 after a wet treatment flows into the discharging path 112.

In this embodiment, the pressure controller 113 comprises a reduced-pressure pump provided on the discharging port 115 side. More specifically, by controlling the sucking pressure of the reduced-pressure pump, the pressure controller 113 controls the pressure of the wet treatment liquid, and hence the difference between the atmospheric pressure and the pressure of the wet treatment liquid in contact with the object to be wet-treated 101. It is desirable to carry out control, taking account of the flow rate of-the introduced wet treatment liquid and the flow rate of the discharged wet treatment liquid which have an effect on the pressure of the wet treatment liquid. More particularly, it suffices to experimentally determine these values in advance by the use of an actual wet treatment liquid feed nozzle and an actual wet treatment liquid.

That is, a reduced-pressure pump is used for the pressure controller 113 on the discharging path 112 side. Balance is taken between the pressure of the wet treatment liquid in contact with the open air at the opening section 106 (including the surface tension of the wet treatment liquid and the surface tension of the treated surface of the object to be wet-treated) and the atmospheric pressure, by controlling the force of the crossing section 114 sucking the wet treatment liquid by means of the reduced-pressure pump. In other words, by assuming Pw≈Pa to represent the relationship between the pressure Pw of the wet treatment liquid in contact with the open air at the opening section 106 (including the surface tension of the wet treatment liquid and the surface tension of the treated surface of the object to be wet-treated) and the atmospheric pressure Pa, it is fed to the substrate 101 via the opening section 106, and the wet treatment liquid in contact with the substrate 101 almost never leaks to outside the wet treatment liquid feed nozzle, and is discharged into the discharging path 112.

It is desirable to select a shape of the ceiling of the crossing section 114, a shape of the boundary between the introducing path 110 and the crossing section 114 and a shape of the boundary between the crossing section 114 and the discharging path 112 such that a Coanda effect is available to facilitate taking balance of pressure.

By adopting the configuration as described above, it is possible to remove the wet treatment liquid 105 fed from the wet treatment liquid feed nozzle to the object to be wet-treated (substrate) 101, without coming into contact with portions other than the potion to which the wet treatment liquid has been fed (opening section 106), from the object to be set-treated (substrate) 101.

FIG. 38 illustrates a second embodiment of the wet treatment liquid feed nozzle apparatus of the invention.

In this embodiment, means for controlling the difference between the pressure of the wet treatment liquid and the atmospheric pressure comprises a reduced-pressure pump (water discharge pump in this embodiment) 117 provided in the downstream of the discharging path 112, a feed pump 133 provided in the upstream of the introducing path 110, a pressure sensor 131 for detecting the pressure of the wet treatment liquid in contact with the object to be wet-treated 101, and a controller 132 for controlling driving of the reduced-pressure pump 117 and the feed pump 133 by a signal from the pressure sensor 131.

While the embodiment shown in FIG. 37 is effective when the pressure of the wet treatment liquid on the introducing port 107 side is constant, in this embodiment, a more accurate pressure control is achieved and an excellent cleanliness is available because the pressure of the wet treatment liquid is detected on the introducing side as well.

Now, another embodiment of the wet treatment apparatus of the invention will be described.

When composing a wet treatment apparatus by the use of the wet treatment liquid feed nozzle 102 shown in FIGS. 19 and 20, the opening section 106 of the wet treatment liquid feed nozzle 102 is directed toward the substrate 101 as shown in FIG. 11, and means for relatively moving the wet treatment liquid feed nozzle 102 and the substrate 101, such as a roller conveyor-(not shown) of the substrate 101 should preferably be provided.

The apparatus has a wet treatment liquid source and means for feeding the wet treatment liquid from the wet treatment liquid source to the introducing port of the wet treatment liquid feed nozzle. For cases requiring treatment of the object to be wet-treated at a temperature of 70 to 80° C. such as in a stripping process of resist, it is desirable to provide a heating unit, a temperature adjusting unit and a temperature holding unit at appropriate positions.

In FIG. 11, wet treatment liquid feed nozzles 102aF and 102aB make a pair with the object to be wet-treated 101 in between to simultaneously wet-treat the surface and the back of the object to be wet-treated.

In addition, three rows comprising wet treatment liquid feed nozzles (102aF and 102aB) for electrolytic ion washing (and embodiment of wet treatment), wet treatment liquid feed nozzles (102bF and 102bB) for extra-pure water rinsing (wet treatment), and, for example, wet treatment liquid feed nozzles (102cF and 102cB) for IPA (isopropyl alcohol) drying are arranged sequentially in the travelling direction of the object to be wet-treated 101. Illustration of the opening section, details of the surrounding portions thereof and the pressure controller are omitted here.

The both ends of the pair of wet treatment liquid feed nozzles 102aF and 102aB are brought into contact with each other to form a tunnel-shaped space, through which the object to be wet-treated 101 travels. Even when the wet treatment liquid flows from the end face side (a plane perpendicular to the sheet in the drawing) of the object to be wet-treated 101, therefore, the flowing wet treatment liquid can be received in the lower wet treatment liquid feed nozzle 102aB.

Because the washing efficiency is high on the back (lower surface), ultrasonic elements (16a and 16b) are provided only on the surface (upper surface). When a single kind of wet treatment liquid is used for all cases, pressure control may be conducted with a single pressure controller.

FIG. 12 illustrates an embodiment in which the object to be wet-treated is move up and down: FIG. 12A is a sectional side view, and FIG. 12B is a plan view.

FIGS. 13A, 13B and 13C are sectional view as viewed from above, in which the object to be wet-treated 101 is place upright. The wed treatment liquid feed nozzle 102 is arranged in the longitudinal direction at right angles to the travelling direction of the object to be wet-treated 101 in the longitudinal direction of the wet treatment liquid feed nozzle 102, and the object to be wet-treated 101 is horizontally transferred. In this case the object to be wet-treated has no up-down relationship. Since the washing efficiency is the same for both the surface and the back, the ultrasonic element 16 may be provided on the back (FIG. 13C), on the surface (FIG. 13B), or on the back and the surface (FIG. 13A).

FIG. 14 is sectional side view, in which the object to be wet-treated is place upright, and vertically transferred upward.

As in the case shown in FIG. 13, in the embodiment shown in FIG. 14, the object to be wet-treated has no up-down relationship and the washing efficiency is the same for both the surface and the back. The ultrasonic element 16 may therefore be provided on the back (FIG. 14C), on the surface (FIG. 14B) or on the back and the surface (FIG. 14A).

FIG. 15 is a sectional side view as viewed from a side: the back is the lower surface and the surface is the upper surface. FIG. 15 represents a case where the object to be wet-treated 101 is horizontally placed and transferred in the horizontal direction. As to the ultrasonic element 16, FIG. 15B is generally employed since washing of the back can be accomplished at a high washing efficiency.

For the washing step, the wet treatment liquid may be extra-pure water, electrolytic ion water, ozone water, hydrogen water or other washing liquid, and for the other wet treatment steps, an etching solution, a developing solution or a stripping liquid is suitably applicable.

EXAMPLE 3

A 500 mm×400 mm rectangular glass substrate was provided.

The substrate surface was stained b immersing the glass substrate into pure water containing Al₂O₃ particles. The number of particles on the entire surface of the substrate after staining was measured, giving a result of 41,500 particles. Only particles having a size of at least 0.5 μm were measured.

After the aforesaid staining, washing was carried out by the transverse displacement method as shown in FIG. 11, by the use of the wet treatment liquid feed nozzle shown in FIG. 19, 20A and 20B. In this example, the back of the substrate was not washed.

Conditions for the wet treatment liquid feed nozzle were as follows:

Conditions for wet treatment liquid feed nozzle:

Nozzle length: 500 mm

Angle θ₁ of introducing path: 45°

Angle θ₂ of discharging path: 45°

Distance from substrate: 1 mm

Opening section: Diameter 106L in FIG. 20A: 8 mm

• • Diameter 106M in FIG. 20A: 4 mm
  • Diameter 106S in FIG. 20A: 2 mm

Washing conditions were as follows:

Washing conditions:

Washing liquid: Electrolytic cathode ion water (pH: 10)

Washing liquid consumption: 2.5 L/min

Ultrasonic frequency: 1 MHz

Ultrasonic power: 150 W

Substrate feed speed: 20 mm/sec

• • Net washing Time=Opening dia/feed speed=(4 mm)/(20 mm/sec)=20 sec

Number of washing runs: One

After washing, there were observed 156 particles.

Comparative Example 3

A 500 mm×400 mm rectangular glass substrate was prepared as in the Example 3.

The substrate surface was stained by immersing the glass substrate into pure water containing Al₂O₃ particles. The number of particles on the entire surface of the substrate after staining was measured, giving a result of 41,000 particles. Only particles having a size of at least 0.5 μm were measured.

After the aforesaid staining, washing was carried out by the transverse displacement method as shown in FIG. 52B, by the use of the wet treatment liquid feed nozzle shown in FIG. 52A.

Conditions for the wet treatment liquid feed nozzle were as follows:

Conditions for wet treatment liquid feed nozzle:

Nozzle length: 500 mm

Opening section width: 2 mm

Washing conditions were as follows:

Washing conditions:

Washing liquid: Electrolytic cathode ion water (pH: 10)

Washing liquid consumption: 25 L/min

Ultrasonic frequency: 1 MHz

Ultrasonic power: 900 W

Washing time: 20 sec

Number of washing runs: One

After washing, there were observed 640 particles.

The results of the Comparative Example 3 and Example 3 are shown in FIG. 39B. As in clear from comparison of the both, the Example 3 gave a washing liquid consumption of a tenth that in the conventional art, and achieved a cleanliness about four times as high. The ultrasonic power was 1/6.

EXAMPLE 4

Spin washing was carried out in this Example.

A six-inch circular glass substrate was provided.

The substrate surface was stained by immersing the glass substrate into pure water containing Al₂O₃ particles. The number of particles on the entire surface of the substrate after staining was measured, giving a result of 20,000 particles. Only particles having a size of at least 0.5 μm were measured.

After the aforesaid staining, washing was carried out by the rotating displacement method by the use of the wet treatment liquid feed nozzle shown in FIG. 19.

Conditions for the wet treatment liquid feed nozzle were as follows:

Conditions for wet treatment liquid feed nozzle:

Nozzle length: 152 mm

Angle θ₁ of introducing path: 30°

Angle θ₂ of discharging path: 30°

Distance between substrate and opening section: 1 mm

Opening section width: 20 mm

Diameter 106L in FIG. 20A: 8 mm

Diameter 106M in FIG. 20A: 4 mm

Diameter 106S in FIG. 20A: 2 mm

Washing conditions were as follows:

Washing conditions:

Washing liquid: Electrolytic ion water

Washing liquid consumption: 1 L/min

Ultrasonic frequency: 1 MHz

Ultrasonic power: 60 W

Washing time: 10 sec

Revolutions: 300 rpm

After washing, there were observed five particles.

Comparative Example 4

A six-inch circular glass substrate was provided as in the Example 4.

The substrate surface was stained by immersing the glass substrate into pure water containing Al₂O₃ particles. The number of particles on the entire surface of the substrate after staining was measured, giving a result of 19,930 particles. Only particles having a size of at least 0.5 μm were measured.

After the aforesaid staining, spin washing was carried out by the use of the wet treatment liquid feed nozzle shown in FIG. 52A.

Conditions for the wet treatment liquid feed nozzle were as follows:

Conditions for wet treatment liquid feed nozzle:

Nozzle length: 152 mm

Opening section: 2 mm

Washing conditions were as follows:

Washing conditions:

Washing liquid: Electrolytic cathode ion water

Washing liquid consumption: 10 L/min

Ultrasonic frequency: 1 MHz

Ultrasonic power: 300 W

Washing time: 10 sec

Revolutions: 300 rpm

After washing, there were observed 32 particles.

The results of the Comparative Example 4 and the Example 4 are shown in FIG. 39A. As in clear comparison of the Comparative Example 4 and the Example 4, even in rotating washing, the Example 4 gave a washing liquid consumption of a tenth that in the conventional art, an ultrasonic power of a fifth, and a cleanliness about six times as high.

Now, a first embodiment of the fluid treatment apparatus of the invention is illustrated in FIGS. 40 and 41.

FIG. 40 is a sectional side view of the fluid treatment apparatus. FIG. 41(A) is a bottom view, and FIG. 41B is a plan view.

In FIG. 40, 302 is the fluid treatment apparatus. The fluid treatment apparatus 302 comprises a fluid feed nozzle body 350 and light irradiating means 380.

The nozzle body 350 has a fluid treatment path 314 which brings a treatment fluid from an opening 306 into contact with an object to be treated 301 and then brings the treatment fluid back to the opening 306, an introducing path 310 which introduces the treatment fluid into the fluid treatment path 314, and a discharging path 312 which discharges the treatment fluid brought from the fluid treatment path 314 back to the opening 306.

Outside the nozzle body 350, there is provided light irradiating means 380 for irradiating a light onto the object to be treated.

The used treatment fluid 305′ fed from the fluid treatment apparatus 302 to the object to be treated (substrate) 301 is removed from the object to be treated (substrate) 301 without coming into contact with portions other than the portion (opening 306) to which the treatment fluid has been fed. It is therefore possible to irradiate the light onto the treatment fluid free from impurities, thus improving the irradiation efficiency.

The shape of the ceiling 318 near the opening of the nozzle body 350 should preferably be a shape giving a Coanda effect which enables to easily take balance in pressure and permits easy removal of bubbles having entered into, or produced in, the fluid treatment path 314.

As is known from FIG. 41, three parallel introducing paths 310 a re provided in this embodiment.

Three parallel discharging paths 312 are provided, respectively, to correspond to the three introducing paths 310. It is thus possible to achieve a uniform washing efficiency in the longitudinal direction by providing a plurality of introducing and discharging paths in the longitudinal direction (up-down direction In FIG. 41) of the fluid treatment apparatus 302.

The nozzle body 350 is made of a material permitting light transmission.

The angle θ₁ between the introducing path 310 and the substrate 301 can be appropriately selected within a range of from 0 to 90°.

The angle θ₂ between the discharging path 312 and the substrate 301 can be appropriately selected within a range of from 0 to 90°.

The angle θ₁ between the introducing path 310 and the substrate 301 and the angle θ₂ between the discharging path 312 and the substrate 301 are arbitrarily set in view of the contact efficiency of the treatment fluid with the substrate, the discharge efficiency of the treated object, the shape of the fluid treating path, the shape of the opening, and the area thereof.

The distance H2 between the portion of the ceiling the closest to the object to be treated (substrate) 301, facing the object to be treated (substrate), forming the fluid treating path 314, on the one hand, and the portion of the opening 306 the closest to the object to be treated (substrate), on the other hand, should preferably be within a range of from 1 to 50 mm, or more preferably, from 2 to 20 mm. A distance H2 of under 1 mm makes it difficult for the treatment fluid to flow, leading to a lower contact efficiency of the treatment liquid with the substrate and a lower discharge efficiency of the treated object. A distance H2 of over this range results, on the other hand, in the presence of much treatment fluid in the fluid treatment apparatus 302, leading to a larger weight of the fluid treatment apparatus 302, and troubles occur in displacement of the fluid treatment apparatus 302.

H1 (distance between the object to be treated 301 and the opening) should preferably be within a range of from 0.1 to 5 mm, or more preferably, from 1 to 2 mm.

The value of H1 may sometimes vary because of vibration of the transfer machine or an uneven surface of the substrate. It is therefore desirable to provide a sensor for measuring H1 and means for separating or bringing closer the fluid treatment apparatus 302 from or to the object to be treated in response to a signal from the sensor. At least two such length measuring units should preferably be provided at two positions with the nozzle body 350 in between in FIG. 41A. This is with a view to ensuring accurate control of the flow of the treatment fluid while keeping a constant distance between the object to be treated 301 and the opening 306 for the entire fluid treatment apparatus. The length measuring accuracy should preferably be smaller than 0.1 mm. Because the lower limit of the distance between the fluid treatment apparatus and the object to be treated should preferably be 0.1 mm, and this distance should accurately be controlled.

In FIG. 40, 319 is a contact preventing gas ejecting section. The contact preventing gas ejecting section is provided at least in any of the introducing path 310 and the discharging path so that the opening section 306 does not come into contact with the object to be treated 301 upon lifting up the object to be treated 301, because of unbalance between the pressure Pw of the treatment fluid in contact with the open air at the opening 306 and the atmospheric pressure PA. The gas used for this purpose should preferably be nitrogen gas or an inert gas, or may be air free from impurities (particularly water).

A second embodiment of the fluid treatment apparatus of the invention is illustrated in FIG. 42.

In FIG. 42, 302 is the fluid treatment apparatus. The fluid treatment apparatus 302 comprises a nozzle body 350 having light irradiating means 380 and a pressure controlling means 313.

The nozzle body 350 has a fluid treating path 314 which, after bringing the treatment fluid from the opening 306 into contact with the object to be treated 301, brings the treatment fluid back to the opening 306, an introducing path 310 for introducing the treatment fluid to the fluid treating path 314, a discharging path 312 for discharging the treatment fluid brought back to the opening 306 from the fluid treating path 314, and light irradiating means 380 for irradiating a light onto the treatment fluid.

In this embodiment the pressure control means 313 is provided on the discharging path 312 side so as to take balance between the pressure of the treatment fluid in contact with the open air at opening 306 (including the surface tension of the treatment fluid and the surface tension of the treated surface of the object to be treated) and the atmospheric pressure to ensure flow of the treatment fluid having been in contact with the object to be treated 301 into the discharging path 312 after the fluid treatment.

In this embodiment, the pressure control means 313 comprises a reduced-pressure pump 317 provided on the discharging port 315 side. That is, the pressure of the treatment fluid, and hence, the pressure difference between the atmospheric pressure and the pressure of the treatment fluid in contact with the object to be treated 301, by controlling the sucking pressure of the reduced-pressure pump 317.

More specifically, by the use of the reduced-pressure pump 317 in the pressure control means 313 on the discharging path 312 side, the force of the fluid treating path 314 to suck the treatment fluid is controlled by the reduced-pressure pump 317, thereby taking balance between the pressure of the treatment fluid in contact with the open air at the opening 306 (including the surface tension of the treatment fluid and the surface tension of the treated surface of the object to be treated) and the atmospheric pressure. That is, by assuming that the relationship between the pressure Pw of the treatment fluid in contact with the open air at the opening 306 (including the surface tension of the treatment fluid and the surface tension of the treated surface of the object to be treated) and the atmospheric pressure Pa is Pw≈Pa the treatment fluid fed to the substrate 301 via the opening 306 and in contact with the substrate 301 is discharged into the discharging path 312 without lacking to outside the fluid treatment apparatus 302.

In this embodiment also, the ceiling of the fluid treating path 314 should preferably have a shape producing Coanda effect, which makes it easier to take balance in pressure, and permits easy removal of bubbles entering the fluid treating path 314 or produced bubbles.

The other points are the same as in the foregoing first embodiment.

Now, a third embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 3.

This embodiment permits control, with a simpler system, the balance between the pressure of the treatment fluid in contact with the object to be treated 301 and the atmospheric pressure by the use of light irradiating means 380. This is effective particularly in the case where the treatment fluid is a liquid.

The pressure control means on the discharging path 312 side controls the balance between the pressure of the treatment fluid in contract with the open air at the opening 306 (including t he surface tension of the treatment fluid and the surface tension of the treated surface of the object to be treated) and the atmospheric pressure by controlling, by means of the difference in height, the force of the fluid treating path 314 to suck the treatment fluid brought about by the weight of the treatment fluid itself based on the syphon principle produced by the difference in height between the opening 306 and the discharging path 312 end (end open to the open air).

More specifically, a water discharging unit 327 is connected to the discharging port 315 of the nozzle body 350 via a water discharge piping 325, and the water discharging unit 327 is held by a holder 328. The holder 328 is attached to, for example a strut slidably vertically in the drawing.

A valve 330 is attached to the leading end of the water discharging unit 327. The valve 330 is opened and closed by a valve drive 329.

On the other hand, this embodiment has a controller 322 which drives a robot and the valve drive 329 on the basis of a signal from the pressure sensor 324 for detecting the pressure of the treatment fluid in the introducing path 310. The robot is for moving up and down the holder 328. When the valve 330 is open, the pressure of the treatment fluid in contact with the object to be treated can be controlled through vertical displacement of the water discharging unit 327.

A fourth embodiment of the fluid treatment apparatus of the invention is illustrated in FIG. 43. The same components in FIG. 43 as those in FIG. 40 are assigned the same reference numerals, and description thereof is omitted here.

More particularly, the fluid treatment apparatus is provided with a nozzle body 350, light irradiating means 380 and a attachment guide 385 for detachably attaching the light irradiating means 380.

The light irradiating means 380 can be attached or detached by causing the same along the attachment guide 385 vertically in the drawing.

When carrying out chemicals washing after detaching the light irradiating means 380, for example, an ultrasonic element 316 can be attached to the same position by detaching the light irradiating means.

When attaching the ultrasonic element 316, it should preferably be an ultrasonic element giving an output of an ultrasonic wave of a frequency of at least 19 kHz, or more preferably, a megasonic ultrasonic element of a frequency within a range of from 0.2 to 5 MHz.

The angle θ₃ between the ultrasonic element 316 and the substrate 301 can be appropriately selected within a range of from 0 to 90°, or preferably, from 2 to 45°.

Use of a megasonic ultrasonic element gives a remarkable improving effect of cleanliness.

FIG. 43 illustrates a case where single light irradiating means 380 or a single ultrasonic element 316 is provided. FIG. 44 shows a case where a plurality of light irradiating means 380 or ultrasonic elements 316 are provided. In the example shown in FIG. 44, three light irradiating means 380a, 380b and 380c are arranged longitudinally (in the up-down direction in FIG. 44). Provision of a plurality of light irradiating means as described above permits uniform washing because the light wavelength or the output can appropriately be changed. Similarly, three ultrasonic elements 316a, 316b and 316c may also be arranged longitudinally.

A plurality of light irradiating means 380 or ultrasonic elements may be arranged either longitudinally or in the transverse direction. They may also be arranged both in the longitudinal direction and in the transverse direction.

Single light irradiating means 380 and a plurality of ultrasonic elements 316 may be mixed and may be simultaneously attached.

Now, a fifth embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 45. The fifth embodiment has the same configuration as in the foregoing case shown in FIG. 38, and by using light irradiating means 380 in place of the ultrasonic element 316, there are simultaneously available the advantage presented in the twenty-fifth embodiment in addition to the advantage brought about by light irradiation.

In this embodiment, means for controlling the difference between the pressure of the treatment fluid and the atmospheric pressure comprises a reduced-pressure pump (a water discharge pump in this example) 317 provided in the downstream of the discharging path 312, and a feed pump 333 provided in the upstream of the introducing path 310. It may further comprise a pressure sensor 331 for detecting the pressure of the treatment fluid in contact with the object to be treated 1, and a controller 332 for controlling drive of the reduced-pressure pump 317 and the feed pump 317 in accordance with a signal from the pressure sensor 331.

While the embodiment shown in FIG. 42 is effective when the pressure of the treatment fluid is constant on the introducing port 307 side, the present embodiment, in which the pressure of the treatment fluid on the introducing side is detected, permits achievement of accurate pressure control, giving an excellent cleanliness.

Now, a sixth embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 8. The sixth embodiment has the same configuration as in the foregoing case shown in FIG. 8. Advantages of light irradiation are available by using light irradiating means 380a, 380b and 380c in place of the ultrasonic elements 16a, 16b and 16c. In FIG. 8 the light irradiating means 380a, 380b and 380c are provided on the stepped ceiling portions 40a, 40b and 40c, respectively, including toward the right down, facing the treated surface of the object to be treated 301.

Since, in this embodiment, light irradiating means 380a, 380b and 380c are provided on the right down portions of the ceiling in the same apparatus, the gaps from the object to be treated are substantially uniform, thereby permitting uniform irradiation.

The light irradiating means 380a, 380b and 380c may be composed of light different in output and wavelength.

It suffices to provide at least one light irradiating means, together with ultrasonic elements.

Now, a seventh embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 9. This embodiment has the same configuration as the foregoing embodiment shown in FIG. 9 except that light irradiating means 380 is employed in place of the ultrasonic element 16.

In the fluid treatment apparatus of this embodiment, the output and the wavelength of the light irradiated from the two light irradiating means 380 may be the same or different. The two light irradiating means may irradiate the light either in pulsation alternately at certain time intervals or simultaneously.

An eighth embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 10. This embodiment has the same configuration as in the embodiment shown in FIG. 10 except that light irradiating means 380 is used in place of the ultrasonic element 16.

A ninth embodiment of the fluid treatment apparatus of the invention will be described below with reference to FIG. 16. This embodiment has the same configuration as in the embodiment shown in FIG. 16 except that light irradiating means 380a and 380b are used in place of the ultrasonic elements 16a and 16b.

A tenth embodiment will be described with reference to FIG. 17. The tenth embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 17, except that light irradiating means 380 is used in place of the ultrasonic element 3.

Another embodiment of the invention will be described with reference to FIGS. 21 and 22. This embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 21 and 22, except that light irradiating means 380 is employed in place of the ultrasonic element 116. The present embodiment is suitably applicable when he treatment fluid is a liquid.

An eleventh embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 24. The eleventh embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 24, except that light irradiating means 380 is used in place of the ultrasonic element 116.

The output and the wavelength of irradiation from the two light irradiating means may be the same or different. The two irradiating means may be operated for irradiation in pulsation alternately at certain time intervals or simultaneously.

A twelfth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 25. The twelfth embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 25, except that light irradiating means is used in place of the ultrasonic element 116.

The output and the wavelength of irradiation from the two light irradiating means may be the same or different. The two irradiating means may be operated for irradiation in pulsation alternately at certain time intervals or simultaneously.

A thirteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 28. The thirteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 28A and 28B, except that light irradiating means 380 is employed in place of the ultrasonic element 116, and entanglement of the air is prevented by providing an auxiliary path.

A fourteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIGS. 29A and 29B. The fourteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 29A and 29B, except that light irradiating means 380 is employed in place of the ultrasonic element 116.

A fifteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIGS. 30A and 30B. The fifteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 30A and 30B, except that light irradiating means 380 is used in place of the ultrasonic element 116. In the present embodiment, there stands a relationship Ly=0 as shown in the embodiment of FIG. 14, i.e., the treatment fluid flows in contact with the object to be treated in the parallel flow section.

A sixteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 32. The sixteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 32, except that light irradiating means 380 is used in place of the ultrasonic element 116, and an inner extension 270 is made of a material different from that for introducing sections 110a and 110b.

A seventeenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 33A. The seventeenth embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 33A, except that light irradiating means 380 is used in place of the ultrasonic element 116.

As in the variation shown in FIG. 33B, portions which may be brought into contact with the other components on the outer periphery of the object to be treated 1 (for example, the portion on which no semiconductor device is formed) should preferably be brought into contact with a sealing member 280 of the fluid treatment apparatus. In FIG. 33B, the reference numeral 380 represents light irradiating means.

An eighteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIGS. 34A and 34B. The eighteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 34A and 34B, except that light irradiating means 380 is employed in place of the ultrasonic element 116.

An nineteenth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIG. 35. The nineteenth embodiment has the same configuration as that of the foregoing embodiment shown in FIG. 35, except that light irradiating means 380a and 3806 are used in place of the ultrasonic elements 116a and 116b.

The present embodiment is quite similar to the twenty-second embodiment, except that light irradiating means 380 is used in place of the ultrasonic elements 116a and 116b.

An twentieth embodiment of the fluid treatment apparatus of the invention will be described with reference to FIGS. 36A and 36B. The twentieth embodiment has the same configuration as that of the foregoing embodiment shown in FIGS. 36A and 36B, except that light irradiating means 380a, 380b and 380c are employed in place of the ultrasonic elements 116a, 116b and 116c.

FIG. 46 illustrates the twentieth embodiment of the fluid treatment apparatus of the invention.

In FIG. 46,

Reference numeral 301 is an object to be treated;

Reference numeral 302 is a fluid treatment apparatus;

Reference numeral 304 is a treatment fluid before use;

Reference numeral 305 is a treatment fluid after use;

Reference numeral 306 is an opening;

Reference numeral 307 is an introducing port;

Reference numeral 310 is an introducing path;

Reference numeral 312 is a discharging path;

Reference numeral 314 is a fluid treatment path;

Reference numeral 315 is a discharging port;

Reference numeral 319 is a contact preventing gas ejecting section;

Reference numeral 316 is an ultrasonic element;

Reference numeral 380 is light irradiating means;

Reference numeral H1 is a distance between the opening and the treated surface of the object to be treated; Reference numeral H2 is a distance between the ceiling of the fluid treatment section and the opening;

Reference numeral θ₁ is an angle between the introducing path and the treated surface;

Reference numeral θ₂ is an angle between the discharging path and the treated surface;

Reference numeral θ₃ is an angle between the ceiling of the fluid treatment section and the treated surface;

Reference numeral PA is the atmospheric pressure; and

Reference numeral Pw is the pressure of the treatment fluid.

This is an embodiment in which light irradiating means 380 and an ultrasonic element 316 are simultaneously provided. In the case shown in FIG. 46, the light irradiating means 380 and the ultrasonic element 316 are provided adjacent to each other. However, when simultaneously providing the light irradiating means 380 and the ultrasonic element 316, the arrangement id not limited to that shown in FIG. 46, but as shown in FIG. 9A the light irradiating means 380 may be provided on one side and the ultrasonic element 16 may be provided on the other side, with the discharging path 12 in between. In FIG. 46, one of the two light irradiating means 380 presented in the foregoing twelfth, thirteenth, sixteenth, seventeenth, eighteenth and nineteenth embodiments of the fluid treatment apparatus of the invention may be replaced by an ultrasonic element.

It is needless to mention that any other arrangement may be adopted.

When generating a chemically active species by irradiating a light to a fluid, for example, the light may fail to reach a large depth (the position of the object to be treated 301 is the deepest in the cases shown in FIG. 46). As a result, the concentration distribution of the active species may sometimes be the densest near the light irradiating means 380 and the thinnest on the surface of the object to be treated 301 where it is desired to achieve the densest concentration.

Although the cause is not necessarily clear, the present invention found that imparting an ultrasonic wave together with irradiation of the light made it available the densest concentration near the surface of the object to be treated.

It is therefore possible to increase the concentration of the active species on the surface of the object to be treated by providing the light irradiating means 380 and the ultrasonic element 316, and simultaneously operating the both.

FIG. 47 illustrates a twenty-first embodiment of the fluid treatment apparatus of the invention.

The apparatus of this embodiment comprises a fluid treating path which, after bringing the treatment fluid from the opening 506 into contact with the object to be treated 301, brings the treatment fluid back to the opening 506, an introducing path 510 for introducing the treatment fluid into the fluid treating path, a discharging path 512 for discharging the treatment fluid brought from the fluid treating path 514 back to the opening 506, and liquid sumps 520a and 520b provided around the opening 506. The fluid treating path comprises a gas area GA, a liquid area LA, and a gas-liquid interface BA.

The liquid sumps are continuously formed around the opening 506, so that the liquid sump 520a and the liquid sump 520b in FIG. 47 communicate with each other.

In this embodiment, the discharging path 512 is provided above the liquid sump 520b. The treatment fluid after treatment is therefore discharged only through the liquid sumps.

In this embodiment, the discharging path 512 communicates with the liquid sump 520b through a fine groove 521b. The treatment fluid after treatment collected in the liquid sumps sucked into the discharging path through the fine groove under the effect of capillary action without dropping and discharged.

A twenty-second embodiment of the fluid treatment apparatus of the invention is illustrated in FIG. 48.

The fluid treatment apparatus of this embodiment comprises a fluid treating path 514 which, after bringing the treatment fluid from the opening 506 into contact with the object to be treated 301, brings the treatment fluid back to the opening 506, and introducing path 510 for introducing the treatment fluid into the fluid treating path 514, a discharging path 512 for discharging the treatment fluid brought from the fluid treating path 514 back to the opening 506, a pressure adjusting port 530 for adjusting the position of the gas-liquid interface communicating with the fluid treating path 514, and liquid sumps 520a and 520b provided around the opening 506. The fluid treating path 514 and the discharging path 512 communicate with each other through the liquid sump 520b.

A treatment liquid serving as the treatment fluid is introduced from the introducing path 510 into the fluid treating path 514 and is brought into contact with the object to be treated 301. By applying an appropriate pressure at the pressure adjusting port, when a gas is present in the treatment fluid, the gas is directed toward the pressure adjusting port and leaves the treatment liquid, thus forming a gas area GA and a liquid area LA in the fluid treating path 514. BA is a gas-liquid interface. The gas from the gas area GA is totally or partially discharged through the pressure adjusting port 530 to outside.

In this embodiment, on the other hand, the treatment liquid is collected in the liquid sumps 520a and 520b. The fluid treating path 514 and the discharging path 512 do not communicate directly with each other, but communicate with each other through the liquid sump 520b and a fine groove 521b. The treatment liquid is therefore collected in the liquid sump 520b, sucked up through the fine groove 521b under the effect of capillary action, and discharged from the discharging path 512.

In this embodiment, an ultrasonic element 516 is provided for the purpose of imparting an ultrasonic wave to the treatment liquid. When an ultrasonic wave or a light is applied to the treatment liquid by means of the ultrasonic element 516, and when the treatment liquid is a washing solution, for example, there is available a remarkable improvement of washing effect. Light irradiating means 580 may be provided at the same position in place of the ultrasonic clement 516.

Since the fluid treating path 514 does not communicate directly with the fluid discharging path 512 in this embodiment, the space in the fluid treating path 514 has a close tightness, thus facilitating pressure control in the fluid treating path 514.

FIG. 49 illustrates a twenty-third embodiment of the fluid treatment apparatus of the invention.

This embodiment comprises the embodiment shown in FIG. 48 further provided with light irradiating means 581 arranged on the surface of the ceiling 518 of the fluid treatment apparatus main body between the introducing path 510 and the pressure adjusting port 530.

As described as to the foregoing embodiments, it is possible to conduct sterilization and the like by irradiating a light of an appropriate wavelength to the treatment fluid by the use of the light irradiating means 581. In the present embodiment, the light may be irradiated for the purpose of decomposing the gas in the gas area GA.

The other points are the same as those in the embodiment described with reference to FIG. 48.

Now, embodiments of the washing system will be described.

A washing system is illustrated in FIG. 50.

The washing system of this embodiment is the same as that of the first embodiment of the liquid treatment apparatus of the invention shown in FIG. 40, and comprises gas treatment units 302aF and 302aB communicating with washing units 302bF and 302bB.

More specifically, the washing system of the embodiment comprises a gas treating path 314 which, after bringing the treatment gas from an opening 306 shown in FIG. 40 into contact with the object to be treated 301, brings the treatment gas back to the opening 306, an introducing path 310 for introducing the treatment gas into the gas treating path 314, a discharging path 312 for discharging the treatment gas brought from the gas treating path 314 back to the opening 306, and gas treatment units 302aF and 302aB comprising light irradiating means 380 for irradiating a light onto the treatment gas in the gas treating path 314, which communicate with washing units 302bF and 302bB for washing the object to be treated 301, having been treated by the gas treatment units 302aF and 302aB, with a washing liquid.

This embodiment will be described further in detail below.

When composing a washing system with the use of the gas treatment unit 302 (302aF and 302aB in FIG. 50A) shown in FIG. 40, the openings 306 of the gas treatment units 302aF and 302aB is directed toward the object to be treated 301 as shown in FIG. 50A, and it suffices to provide means for causing relative displacement of the gas treatment units 302aF and 302aB and the object to be treated 301 in the arrow A direction, for example, a roller conveyor (not shown) of the substrate 301.

The washing system has a treatment gas source (not shown) and means (not shown) for feeding the treatment gas from the treatment gas source to the introducing ports 307 of the gas treatment units 302aF and 302aB. A heater, a temperature adjusting unit and a temperature holding unit should preferably be provided at appropriate positions to cope with the necessity to treat the object to be treated at a temperature of 70 to 80° C. as in a stripping step of resist.

With a view to simultaneously conducting gas treatment of both the surface and the back of the object to be treated 301, the gas treatment units 302aF and 302aB are arranged in pair with the object to be treated 301 in between in FIG. 50B.

As shown in FIG. 50B, the pair of gas treatment units 302aF and 302aB are in contact with each other at the both ends thereof to form a tunnel-shaped space, through which the object to be treated 301 travels. Therefore, even when the treatment fluid flows from the end face (a plane perpendicular to the surface of the sheet in the drawing), the flowing treatment fluid can be received by the fluid treatment unit 302aB in the downstream thereof.

Washing units 302bF and 302bB are further provided in the downstream in the travelling direction of the object to be treated 301.

The washing units 302bF and 302bB each comprises a washing treatment path which, after bringing the washing liquid from the opening into contact with the object to be treated, brings the washing liquid back to the opening, an introducing path for introducing the washing liquid into the washing treatment path, another introducing path for introducing the washing liquid brought from the washing treatment path back into the opening into the washing treatment path, and a discharging path for discharging the washing liquid brought from the washing treatment path back into the opening. The system is also provided with pressure control means (not shown). More particularly, the system has the same basic structure as that of the fluid treatment apparatus shown in FIG. 40, except however that the washing unit having an ultrasonic element attached thereto in place of the washing unit except for light irradiating means or the light irradiating means. Any other appropriate washing unit may of course be used.

Further in the downstream of the washing units 302bF and 302bB, there are provided extra-pure water rinsing units 302cF and 302cB for rinsing with extra-pure water, and IPA dryers 302dF and 302dB for IPA (isopropyl alcohol) drying. The extra-pure water rinsing units 302cF and 302cB and the IPA dryers 302dF and 302dB have the same structure as that of the washing units 302bF and 302bB. However, because the washing efficiency is high for the back (lower surface), the ultrasonic element is provided only for the surface (upper surface). When a single treatment fluid is used for all the purposes of treatment, pressure control may be accomplished with a single pressure controller.

The case where the object to be treated 301 travels horizontally is shown in FIG. 50A. FIG. 51 illustrates a case where the object to be treated 301 is moved in the vertical direction (up-down direction). Since, in this case, the surface and the back of the object to be treated have no up-down relationship, the surface and the back are uniformly washed.

Claims

1. A wet treatment method comprising the steps of:

gradually feeding a wet treatment liquid from an introducing port of a wet treatment liquid feed nozzle to a region opposing an object to be wet-treated, the wet treatment liquid feed nozzle opposing the object to be wet-treated and having the introducing port and a discharging port which are open toward the object to be wet-treated, while cause a relative displacement of the object to be wet-treated and the wet treatment liquid feed nozzle, and

gradually discharging the wet treatment liquid fed from said wet treatment liquid feed nozzle to the object to be wet-treated through the discharging port without causing the wet treatment liquid to be in contact with portions other than the portion to which the wet treatment liquid has been fed, by controlling a difference between the pressure of the wet treatment liquid in contact with the object to be wet-treated and the atmospheric pressure so as to prevent the wet treatment liquid from flowing out from the region opposing the object to be wet-treated;

wherein the introducing port and the discharging port are constantly filled with the treatment liquid during treatment of the object to be wet-treated such that the treatment liquid flows continuously and smoothly through the region opposing the object to be wet-treated during a period the object to be wet-treated is partially under an opening section of the wet treatment liquid feed nozzle.

2. The wet treatment method of claim 1 wherein the wet treatment fluid is discharged from a discharging port of the wet treatment liquid feed nozzle, and the step of controlling a difference between the pressure of the treatment liquid in contact with the object to be wet treated and the atmospheric pressure includes:

fluidly coupling a liquid discharge unit with the discharging port; and

vertically displacing the liquid discharge unit.

3. The wet treatment method of claim 1 wherein the wet treatment fluid is gradually fed into an introducing port of the wet treatment nozzle using a feed pump fluidly coupled with the introducing port, and the wet treatment fluid is discharged from a discharging port of the wet treatment liquid feed nozzle using a reduced-pressure pump, wherein the step of controlling a difference between the pressure of the wet treatment liquid in contact with the object to be wet-treated and the atmospheric pressure includes:

detecting the pressure of the wet treatment liquid in contact with at least the object to be wet treated; and

controlling the reduced-pressure pump and the feed pump responsive to the detecting.

4. The wet treatment method of claim 1 further comprising the step of imparting an ultrasonic wave to the wet treatment liquid.

5. The wet treatment method of claim 1 further comprising the step of A wet treatment method comprising the steps of:

gradually feeding a wet treatment liquid from an introducing port of a wet treatment liquid feed nozzle to a region opposing an object to be wet-treated, the wet treatment liquid feed nozzle opposing the object to be wet-treated and having the introducing port and a discharging port which are open toward the object to be wet-treated, while causing a relative displacement of the object to be wet-treated and the wet treatment liquid feed nozzle,

gradually discharging the wet treatment liquid fed from said wet treatment liquid feed nozzle to the object to be wet-treated through the discharging port without causing the wet treatment liquid to be in contact with portions other than the portion to which the wet treatment liquid has been fed, by controlling a difference between the pressure of the wet treatment liquid in contact with the object to be wet-treated and the atmospheric pressure so that the pressure including surface tension of the wet treatment liquid is substantially equal to the atmospheric pressure as to prevent the wet treatment liquid from flowing out from the region opposing the object to be wet-treated; and

ejecting a contact preventing gas at least between the wet treatment liquid feed nozzle and the object to be wet-treated to prevent the wet treatment liquid feed nozzle from contacting the object to be wet treated;

wherein the introducing port and the discharging port are constantly filled with the treatment liquid during treatment of the object to be wet-treated such that the treatment liquid flows continuously and smoothly through the region opposing the object to be wet-treated.

6. The wet treatment method of claim 5 wherein the step of ejecting the contact preventing gas includes ejecting an inert gas between the wet treatment liquid feed nozzle and the object to be wet-treated.

7. The wet treatment of claim 1 further comprising A wet treatment method comprising the steps of:

gradually feeding a wet treatment liquid from an introducing port of a wet treatment liquid feed nozzle to a region opposing an object to be wet-treated, the wet treatment liquid feed nozzle opposing the object to be wet-treated and having the introducing port and a discharging port which are open toward the object to be wet-treated, while causing a relative displacement of the object to be wet-treated and the wet treatment liquid feed nozzle,

gradually discharging the wet treatment liquid fed from said wet treatment liquid feed nozzle to the object to be wet-treated through the discharging port without causing the wet treatment liquid to be in contact with portions other than the portion to which the wet treatment liquid has been fed, by controlling a difference between the pressure of the wet treatment liquid in contact with the object to be wet-treated and the atmospheric pressure so that the pressure including surface tension of the wet treatment liquid is substantially equal to the atmospheric pressure as to prevent the wet treatment liquid from flowing out from the region opposing the object to be wet-treated; and

irradiating light on the wet treatment liquid fed from the wet treatment liquid feed nozzle;

wherein the introducing port and the discharging port are constantly filled with the treatment liquid during treatment of the object to be wet-treated such that the treatment liquid flows continuously and smoothly through the region opposing the object to be wet-treated.

8. The wet treatment method of claim 1 wherein the treatment liquid feed nozzle comprises:

a nozzle assembly which has at least one introducing path having an introducing port for introducing a wet treatment liquid at an end thereof, at least one discharging path having a discharging port for discharging the wet treatment liquid after a wet treatment to outside the wet treatment system, a box-shaped crossing section formed by causing said at least one introducing path and said at least one discharging path to cross at the other ends thereof, the introducing path extending upward from one of the sides of the box-shaped crossing section in the longitudinal direction thereof and the discharging path extending upward from the side of the box-shaped crossing section in the longitudinal direction thereof, and an opening section opening to an object to be wet-treated provided at the bottom side of the crossing section, and pressure control means for controlling a difference between pressure of the wet treatment liquid in contact with the object to be wet-treated and the atmospheric pressure so as to prevent the wet treatment liquid in contact with the object to be wet-treated via said opening section from flowing outside said discharging path.

9. A method of manufacturing a liquid crystal display comprising subjecting a glass substrate to a wet treatment, which comprises:

feeding a liquid for the wet treatment from an introducing port of a feed nozzle to a region of the feed nozzle opposing a surface of the glass substrate such that the liquid contacts the surface;

discharging the liquid from the surface through a discharging port, wherein the introducing port and the discharging port are constantly filled with the treatment liquid during treatment of the object to be wet-treated such that the treatment liquid flows continuously and smoothly through the region of the feed nozzle during a period the object to be wet-treated is partially under an opening section of the wet treatment liquid feed nozzle;

controlling a difference between a pressure of the liquid and an environmental pressure so that the pressure including surface tension of the liquid is substantially equal to the environmental pressure to prevent the liquid from flowing out from the surface; and

changing a relative displacement of the glass substrate to the feed nozzle.

10. The method of claim 9 wherein the wet treatment includes a washing treatment.

11. The method of claim 9 wherein the wet treatment includes an etching treatment.

12. The method of claim 9 wherein the liquid comprises one or more of extra pure water, a cleaning solution, or an etching solution.

13. The method of claim 9 wherein the environmental pressure is atmospheric pressure.

14. A method of manufacturing a semiconductor device comprising subjecting a substrate to a wet treatment, which comprises:

feeding a liquid for the wet treatment from an introducing port of a feed nozzle to a region of the feed nozzle opposing a surface of the substrate such that the liquid contacts the surface;

discharging the liquid from the surface through a discharging port, wherein the introducing port and the discharging port are constantly filled with the treatment liquid during treatment of the object to be wet-treated such that the treatment liquid flows continuously and smoothly through the region of the feed nozzle during a period the object to be wet-treated is partially under an opening section of the wet treatment liquid feed nozzle;

controlling a difference between a pressure of the liquid and an environmental pressure so that the pressure including surface tension of the liquid is substantially equal to the environmental pressure to prevent the liquid from flowing out from the surface; and

changing a relative displacement of the substrate to the feed nozzle.

15. The method of claim 14 wherein the wet treatment includes a washing treatment.

16. The method of claim 14 wherein the wet treatment includes an etching treatment.

17. The method of claim 14 wherein the liquid comprises one or more of ultra pure water, a cleaning solution, or an etching solution.

18. The method of claim 14 wherein the environmental pressure is atmospheric pressure.

19. The method of claim 14 wherein the semiconductor device comprises a solar cell.

20. The method of claim 14 wherein the semiconductor device comprises a liquid crystal display.