A liquid crystal display includes gate lines, data lines intersecting with the gate lines to define sub-pixels, and a transmission part including transmission lines connected with the data lines to transmit data signals, where at least one pair of the transmission lines are arranged to cross each other, some of the transmission lines cross each other so that a sequence of data signals applied to the data lines can be changed, any of the transmission lines is opened at a crossing point of the transmission lines and the opened portion is connected by a separate conductor, thereby insulating the transmission lines crossing each other from each other, and an additional process for connecting the opened portion is not needed, thereby simplifying a fabrication process for the liquid crystal display.

Patent
   RE43701
Priority
Sep 12 2005
Filed
Jan 20 2011
Issued
Oct 02 2012
Expiry
May 10 2026
Assg.orig
Entity
Large
3
12
all paid
#2# 14. A method of fabricating a liquid crystal display, the method comprising:
forming a plurality of gate lines on a substrate;
forming a plurality of data lines crossing the gate lines on the substrate; and
forming a plurality of transmission line connected with the data lines, at least one pair of the transmission lines being arranged to cross each other.
#2# 1. A liquid crystal display comprising:
a plurality of gate lines formed on a substrate;
a plurality of data lines formed on the substrate and intersecting with the gate lines to define a plurality of sub-pixels; and
a transmission part including a plurality of transmission lines connected with the data lines to transmit a data signal, at least one pair of the transmission lines being arranged to cross each other.
#2# 0. 21. A display device comprising:
a plurality of gate lines disposed on a substrate, wherein the plurality of gate lines extends in a first direction;
a plurality of data lines crossing the plurality of gate lines;
a plurality of main pixels, each main pixel of the plurality of main pixels having 2n sub-pixels, wherein n is an integer greater than 1; and
a transmission part connected with the plurality of data lines, wherein the transmission part transmits a plurality of data signals and includes a first transmission part and a second transmission part,
wherein the first transmission part comprises at least one pair of transmission lines crossing each other and the second transmission part comprises at least one pair of transmission lines which do not cross each other.
#2# 0. 85. A display device comprising:
a gate line disposed on a substrate, wherein the gate line extends in a first direction;
a data line which crosses the gate line;
a plurality of main pixels, each main pixel of the plurality of main pixels having four sub-pixels; and
a transmission part connected to the data line to transmit a data signal and including a first transmission part and a second transmission part,
wherein the first transmission part comprises at least one pair of transmission lines crossing each other and the second transmission part comprises at least one pair of transmission lines which do not cross each other, wherein each main pixel of the plurality of main pixels comprises four sub-pixels two dimensionally arranged in a 2 by 2 matrix on a display area.

narrow wide line width.

Hereinafter, a method of fabricating an LCD having the above construction will be described. FIGS. 7A through 10A are cross-sectional views taken along the line A-A′ of FIG. 1, indicated generally by the reference numerals 700, 800, 900 and 1000, respectively, and FIGS. 7B through 10B are cross-sectional views taken along the line B-B′ of FIG. 1, indicated generally by the reference numerals 750, 850, 950 and 1050, respectively. The cross-sectional views 700, 800, 900 and 1000 taken along the line A-A′, and the cross-sectional views 750, 850, 950 and 1050 taken along the line B-B′, illustrate a method of fabricating an LCD according to an exemplary embodiment of the present disclosure.

Referring to FIGS. 7A and 7B, a gate line 20 and a gate insulating layer 21 covering the gate line 20 are formed on a substrate 10. The substrate 10 can be an insulator substrate, such as a transparent glass substrate or a transparent plastic substrate. The gate line 20 is formed by depositing a metal film using a sputtering, and patterning the deposited metal film. The gate insulating layer 21 can be formed by a chemical vapor deposition using silicon nitride (SiNx) or silicon oxide (SiOx).

Referring to FIGS. 8A and 8B, a data line 30 and transmission lines 40 are formed on the gate insulating layer 21. The data line 30 and the transmission lines 40 connected with the data line 30 are substantially simultaneously formed by depositing and patterning a metal film on an entire surface of the gate insulating layer 21. The transmission lines 40 include an opened transmission line 40a, of which a predetermined portion is opened, and a non-opened transmission line 40b, of which a corresponding predetermined portion is not opened. In a first transmission part 81 of FIG. 1, any of one pair of transmission lines that cross each other is opened at a crossing point, and in a second transmission part 82 of FIG. 1, any of one pair of transmission lines that do not cross each other is opened at a predetermined portion thereof.

A semiconductor layer of an amorphous silicon layer is formed at a crossing point between the gate line 20 and the data line 30 before the data line 30 and the like are formed. In addition, a gate electrode extending from the gate line 20 and a source electrode extending from the data line 30 are formed below and above the semiconductor layer, respectively, so that a thin film transistor is completed.

Referring to FIGS. 9A and 9B, a passivation layer 31 is deposited on an entire surface of the resultant substrate 10 to cover the data line 30 and the transmission lines 40. The passivation layer 31 can be formed by a chemical vapor deposition using silicon nitride or the like, much like the gate insulating layer 21. The passivation layer 31 is then patterned by a photolithography process to form a contact hole 32 at a predetermined portion thereof. The contact hole 32 is used to electrically connect a pixel electrode 50 formed on the passivation layer 31 in a subsequent process with the thin film transistor. In addition to the above contact hole, another contact hole used as a path for electrically connecting the opened portion of the transmission lines 40 is formed during the above patterning process.

Referring to FIGS. 10A and 10B, a transparent conductive layer 50′ is deposited on the passivation layer 31 using IZO or the like. The transparent conductive layer 50′ is filled in the contact hole 32 and is directly contacted with an upper surface of the opened transmission line 40a.

Thereafter, the transparent conductive layer 50′ is patterned to form a conductor 45 connecting the pixel electrode 50 and a conductor 45 connecting the opened portion of the opened transmission line 40a, so that the resultant substrates shown in FIGS. 6A and 6B are completed. The pixel electrode 50 is formed every sub-pixel such that the sub-pixel is separated from an adjacent sub-pixel thereto, and is connected with the thin film transistor through the contact hole. In addition, the transparent conductive layer 50′ is partially remained on the opened portion of the opened transmission line 40a such that the opened portion is electrically connected. To connect the opened portion using the conductor 45 that is different from the IZO or the like, a further process to deposit and pattern a separate metal film is needed before or after the pixel electrode 50 is formed.

An exemplary method of fabricating the LCD according to the present disclosure has been described with reference to the accompanying drawings. Since the above method is one of a variety of methods for fabricating the LCD shown in FIG. 1A, the LCD may be fabricated by alternate methods. Preferably, the fabrication method according to the present disclosure uses the same material as that of the pixel electrode so as to form the conductor for connecting the opened portion of the transmission line such that the opened portion is connected while the pixel electrode is formed, thereby simplifying the fabrication method.

As described above according to exemplary embodiments of the present disclosure, in an LCD having four color sub-pixels, a data signal having the alternate positive polarity and negative polarity can be uniformly applied to sub-pixels with the same color by using transmission lines crossing each other. Accordingly, the picture quality can be prevented from being lowered due to a concentration of the same polarities on a specific portion.

In addition, in forming the transmission lines crossing each other, any of the transmission lines is opened at a crossing point, and the opened portion is electrically connected during the formation of the pixel electrode. Thereby, an additional process for connecting the opened portion is not needed, so that the fabrication process is simplified.

It will be apparent to those of ordinary skill in the pertinent art that various modifications and variations can be made in the exemplary embodiments of the present disclosure. Thus, it is intended that the present invention covers all such modifications and variations that come within the scope of the appended claims and their equivalents.

Kim, Dong-Gyu

Patent Priority Assignee Title
RE45495, Sep 12 2005 Samsung Display Co., Ltd. Liquid crystal display and method of fabricating the same having particular data signal transmission lines
RE48661, Sep 12 2005 Samsung Display Co., Ltd. Liquid crystal display and method of fabricating the same having particular data signal transmission lines
RE50119, Sep 12 2005 Samsung Display Co., Ltd. Liquid crystal display and method of fabricating the same having particular data signal transmission lines
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Sep 04 2012SAMSUNG ELECTRONICS CO , LTD SAMSUNG DISPLAY CO , LTD ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0291510055 pdf
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