A method for fabricating a semiconductor memory device with a vertical channel transistor includes forming a plurality of pillars each having a hard mask pattern thereon over a substrate, each of the plurality of pillars comprising an upper pillar and a lower pillar; forming a surround type gate electrode surrounding the lower pillar; forming an insulation layer filling a space between the pillars; forming a preliminary trench by primarily etching the insulation layer using a mask pattern for a word line until a portion of the upper pillar is exposed; forming a buffer layer over a resultant structure including the preliminary trench except on a bottom of the preliminary trench; and forming a trench for a word line by secondarily etching the insulation layer until the surround type gate electrode is exposed.
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0. 16. A method for fabricating a semiconductor memory device with a vertical channel transistor, the method comprising:
forming a plurality of pillars on a substrate, each of the plurality of pillars having a first hard mask pattern;
forming an insulation layer filling a space between adjacent ones of the plurality of pillars;
forming, between the adjacent ones of the plurality of pillars, a preliminary trench by etching the insulation layer to a first depth using a second hard mask pattern corresponding to a region where a word line is to be formed;
forming a buffer layer on top of the first hard mask pattern and sidewalls of the preliminary trench; and
forming a trench by etching the insulation layer to a second depth that is greater than the first depth.
1. A method of fabricating a semiconductor memory device with a vertical channel transistor, the method comprising:
forming a plurality of pillars on a substrate, each of the plurality of pillars comprising an upper pillar and a lower pillar and having a first hard mask pattern on the upper pillar;
forming a surround type gate electrode surrounding the lower pillar;
forming an insulation layer filling a space between the pillars;
forming a preliminary trench by etching the insulation layer using a second hard mask pattern for a word line, corresponding to a region where a word line is to be formed, until a portion of the upper pillar is exposed;
forming a buffer layer on top of the first hard mask and sidewalls of the preliminary trench; and
forming a trench for a word line by etching the insulation layer until a portion of the surround type gate electrode is exposed.
2. The method of
3. The method of
4. The method of
recessing the lower pillar to a predetermined depth through an isotropic etch process;
forming a conductive layer for a gate electrode over a resultant structure; and
performing an etch-back process on the conductive layer until the substrate is exposed.
5. The method of
6. The method of
forming the insulation layer over a resultant structure where the pillar and the surround type gate electrode are formed; and
planarizing the insulation layer until the first hard mask pattern is exposed.
8. The method of
9. The method of
10. The method of
11. The method of
forming the buffer layer over a resultant structure after forming a preliminary trench; and
removing a portion of the buffer layer on a bottom of the preliminary trench.
13. The method of claim 11 12, wherein the buffer layer is formed of one material selected from the group consisting of ozone-undoped silicate glass (O3-USG), boro-phospho silicate glass (BPSG) and plasma enhanced tetra ethyl ortho silicate (PETEOS).
14. The method of claim 1 11, wherein removing the portion of the buffer layer is performed using wet etching.
15. The method of
removing the buffer layer after forming the trench for the word line; and
partially filling the trench with a conductive layer to form a word line.
0. 17. The method of claim 16, wherein forming the plurality of pillars comprises forming a spacer over sidewalls of the first hard mask pattern and an upper portion of each of the plurality of pillars.
0. 18. The method of claim 17, wherein the first hard mask pattern and the spacer comprise a nitride layer.
0. 19. The method of claim 16, further comprising forming a gate electrode and a gate dielectric layer for each of the plurality of pillars with the gate dielectric being located between the gate electrode and a respective pillar of the plurality of pillars.
0. 20. The method of claim 16, wherein forming the insulation layer filling the space between the adjacent ones of the plurality of pillars comprises:
forming the insulation layer over a resultant structure after forming of the plurality of pillars on the substrate; and
planarizing the insulation layer until the first hard mask pattern is exposed.
0. 21. The method of claim 16, wherein the insulation layer is formed of an oxide.
0. 22. The method of claim 16, wherein the second hard mask pattern is formed of an amorphous carbon.
0. 23. The method of claim 22, further comprising after forming the preliminary trench, removing the second hard mask pattern using a removal process.
0. 24. The method of claim 16, wherein forming the buffer layer on top of the first hard mask and sidewalls of the preliminary trench comprises:
forming the buffer layer over a resultant structure after forming a preliminary trench; and
removing a portion of the buffer layer on a bottom of the preliminary trench.
0. 25. The method of claim 16, wherein the buffer layer is formed of an insulation material.
0. 26. The method of claim 25, wherein the buffer layer is formed of one material selected from the group consisting of ozone-undoped silicate glass (O3-USG), boro-phospho silicate glass (BPSG) and plasma enhanced tetra ethyl ortho silicate (PETEOS).
0. 27. The method of claim 24, wherein removing the portion of the buffer layer is performed using wet etching.
0. 28. The method of claim 16, further comprising:
removing the buffer layer after forming the trench and
partially filling the trench with a conductive layer.
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The present invention claims priority of Korean patent application number 2007-0136437, filed on Dec. 24, 2007, which is incorporated by reference in its entirety.
The present invention relates to semiconductor device fabrication technology, and more particularly, to a method for fabricating a semiconductor device with a vertical channel transistor.
As the integration degree of a semiconductor device increases, a channel length of a transistor is gradually reduced, causing device characteristics to be deteriorated due to a short channel effect. To avoid the short channel effect, there have been proposed various methods of reducing a depth of a junction region or relatively increasing a channel length by recessing a channel region of a transistor.
However, there is an increasing demand for a smaller-sized transistor as the integration density of a semiconductor memory device such as a dynamic random access memory (DRAM) approaches gigabit scale. Recently, a transistor of a DRAM requires a device area of 4F2 (F: minimum feature size). Therefore, it is difficult to meet the requirement for a device area despite the scaling-down of a channel length in a typical planar transistor structure where a gate electrode is formed over a substrate and junction regions are formed at both sides of the gate electrode.
To meet such a requirement for a limited device area, a vertical channel transistor has been suggested, which will be described in detail with reference to
Buried bit lines 101, surrounding the pillar P and extending in the first direction, are formed in the substrate 100 between columns of the pillars P arranged in the first direction. The buried bit lines 101 are isolated from each other by a trench T for device isolation.
A surround type gate electrode (not shown) surrounding the pillar P is formed on a circumferential surface of the pillar P. A word line 102 is formed such that it is electrically connected to the surround type gate electrode and extends in the second direction. A storage electrode 104 is formed on top of the pillar P. A contact plug 103 may be interposed between the pillar P and the storage electrode 104.
In the vertical channel transistor where a channel is formed vertically with respect to a surface of the substrate, a channel length can be increased without being limited to a device area, thus preventing the short channel effect. However, there is a limitation in a process for forming the word line 102, resulting in a device failure. Hereinafter, one method for fabricating the vertical channel transistor in the substrate and the limitation thereof will be described in detail with reference to
Referring to
An oxide layer 204 is formed over a resultant structure, and then planarized through chemical mechanical polishing (CMP) process until the first hard mask pattern 201 is exposed. After a second hard mask 205 is formed on the planarized resultant structure, a photoresist pattern 207 is formed over the hard mask 205 for the purpose of forming a word line. An anti-reflective layer 206 may be formed under the photoresist pattern 207 to prevent reflection during photo exposure process.
Referring to
Referring to
During the dry etching of the oxide layer 204 and the etch-back process of the conductive layer for the word line, the first hard mask pattern 201 and the spacer 202 may be lost due to the misalignment between the second hard mask pattern 205A and the first hard mask pattern 201 and the pillar P. This, in accordance with this less preferred technique, may cause an upper portion of the pillar P to be attacked and lost (see “A” in
Hence, it is required to develop a new, more preferred fabrication technique capable of preventing the pillar P from being attacked by minimizing the losses of the hard mask pattern 201 and the spacer 202 even though the misalignment occurs due to an overlay error of a mask.
At least one preferred embodiment of the present invention is therefore directed to providing a method for fabricating a semiconductor device with a vertical channel transistor, which can minimize losses of a hard mask pattern and a spacer to prevent a pillar from being damaged, by dividing a process of forming a trench for a word line into two sub processes and performing a process of forming a buffer layer between the two sub processes.
In accordance with an aspect of the present invention, there is provided a method for fabricating a semiconductor memory device with a vertical channel transistor. The method includes forming a plurality of pillars each having a hard mask pattern thereon over a substrate, each of the plurality of pillars comprising an upper pillar and a lower pillar; forming a surround type gate electrode surrounding the lower pillar; forming an insulation layer filling a space between the pillars; forming a preliminary trench by primarily etching the insulation layer using a mask pattern for a word line until a portion of the upper pillar is exposed; forming a buffer layer over a resultant structure including the preliminary trench except on a bottom of the preliminary trench; and forming a trench for a word line by secondarily etching the insulation layer until the surround type gate electrode is exposed.
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
Referring to
Then, the second hard mask pattern 307 is removed. If the second hard mask pattern 307 is formed of an amorphous carbon, the second hard mask pattern 307 can be removed easily through a removal process using oxygen (O2) plasma.
Referring to
Referring to
Referring to
Although not shown herein, a conductive layer is filled into the trench 308B to form a word line (not shown) extending in the second direction and electrically connecting the surround type gate electrode 304.
In the above preferred method of forming the semiconductor memory device with the vertical channel transistor, the process of forming the trench for a word line comprises the first and second dry etching processes, and the buffer layer 309 is formed after the formation of the preliminary trench 308 by the first dry etching process. Accordingly, the trench 308B for a word line is formed in a state that the hard mask pattern 301 and the spacer 302 are protected by the buffer layer 309. This makes it possible to effectively prevent the upper pillar Pa from being damaged or lost as could occur with the less preferred technique.
As described above, in accordance with the preferred embodiment of present invention, a process of forming a trench for a word line comprises two sub processes, and a process of forming a buffer layer is performed between the two sub processes. Consequently, it is possible to minimize losses of a hard mask pattern and spacer, thereby preventing damage or loss of a pillar.
While the present invention has been described with respect to the specific embodiments, it will be apparent to those skilled in the art that various changes and modifications may be made without departing from the spirit and scope of the invention as defined in the following claims.
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