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The ornamental design for a heat insulating cylinder for thermal treatment of semiconductor wafers, as shown and described. |
FIG. 1 is a front elevational view of a heat insulating cylinder for thermal treatment of semiconductor wafers showing our new design;
FIG. 2 is a right side elevational view, the left side elevational view being a mirror image;
FIG. 3 is a top plan view;
FIG. 4 is a bottom plan view; and,
FIG. 5 is a rear elevational view thereof.
Ohkase, Wataru, Nakao, Ken, Sato, Seishiro
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Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Jan 25 1989 | Tel Sagami Limited | (assignment on the face of the patent) | / | |||
Feb 23 1989 | NAKAO, KEN | TEL SAGAMI LIMITED A CORPORATION OF JAPAN | ASSIGNMENT OF ASSIGNORS INTEREST | 005889 | /0681 | |
Feb 23 1989 | SATO, SEISHIRO | TEL SAGAMI LIMITED A CORPORATION OF JAPAN | ASSIGNMENT OF ASSIGNORS INTEREST | 005889 | /0681 | |
Feb 23 1989 | OHKASE, WATARU | TEL SAGAMI LIMITED A CORPORATION OF JAPAN | ASSIGNMENT OF ASSIGNORS INTEREST | 005889 | /0681 |
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