Processing machine for electron beam lithography system

Abstract

Description

FIG. 1 is a front, top and right side elevational perspective view of a processing machine for electron beam lithography system showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a left elevational view thereof;

FIG. 4 is a right elevational view thereof;

FIG. 5 is a top plan elevational view thereof;

FIG. 6 is a bottom plan elevational view thereof;

FIG. 7 is a rear elevational view thereof; and,

FIG. 8 is a rear, top and left side perspective view thereof.

Claims

The ornamental design for a processing machine for electron beam lithography system, as shown.