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The ornamental design for a measurement scanner for semi-conductor, as shown. |
FIG. 1 is a front, top and right side elevational perspective view of measurement scanner for semi-conductor showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a right elevational view thereof;
FIG. 4 is a top plan elevational view thereof;
FIG. 5 is a bottom plan elevational view thereof;
FIG. 6 is a rear elevational view thereof; and,
FIG. 7 is a left elevational view thereof.
Wada, Toshihiko, Ohtaka, Tadashi, Hashimoto, Nobuyoshi
Patent | Priority | Assignee | Title |
Patent | Priority | Assignee | Title |
D332616, | Jan 26 1990 | Hitachi, Ltd. | Electronic microscope |
D352910, | Nov 27 1992 | Hitachi, Ltd. | Processing machine for electron beam lithography system |
Executed on | Assignor | Assignee | Conveyance | Frame | Reel | Doc |
Jul 12 1994 | WADA, TOSHIHIKO | Hitachi, LTD | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007370 | /0331 | |
Jul 12 1994 | OHTAKA, TADASHI | Hitachi, LTD | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007370 | /0331 | |
Jul 12 1994 | HASHIMOTO, NOBUYOSHI | Hitachi, LTD | ASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS | 007370 | /0331 | |
Jul 26 1994 | Hitachi, Ltd. | (assignment on the face of the patent) | / |
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