Patent
   D360599
Priority
Apr 15 1994
Filed
Jul 26 1994
Issued
Jul 25 1995
Expiry
Jul 25 2009
Assg.orig
Entity
unknown
0
2
n/a
The ornamental design for a measurement scanner for semi-conductor, as shown.

FIG. 1 is a front, top and right side elevational perspective view of measurement scanner for semi-conductor showing our new design;

FIG. 2 is a front elevational view thereof;

FIG. 3 is a right elevational view thereof;

FIG. 4 is a top plan elevational view thereof;

FIG. 5 is a bottom plan elevational view thereof;

FIG. 6 is a rear elevational view thereof; and,

FIG. 7 is a left elevational view thereof.

Wada, Toshihiko, Ohtaka, Tadashi, Hashimoto, Nobuyoshi

Patent Priority Assignee Title
Patent Priority Assignee Title
D332616, Jan 26 1990 Hitachi, Ltd. Electronic microscope
D352910, Nov 27 1992 Hitachi, Ltd. Processing machine for electron beam lithography system
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jul 12 1994WADA, TOSHIHIKOHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0073700331 pdf
Jul 12 1994OHTAKA, TADASHIHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0073700331 pdf
Jul 12 1994HASHIMOTO, NOBUYOSHIHitachi, LTDASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0073700331 pdf
Jul 26 1994Hitachi, Ltd.(assignment on the face of the patent)
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