The ornamental design for a toppanel for microwaveintroduction window of a plasmaprocessing apparatus, as shown and described.
FIG. 1 is a front view of a top panel for microwave introduction window of plasma processing apparatus showing our new design;
FIG. 2 is a rear view thereof,
FIG. 3 is a right side view thereof,
FIG. 4 is a left side view thereof,
FIG. 5 is a top plan view thereof,
FIG. 6 is a bottom plan view thereof,
FIG. 7 is a sectional view taken along line 7—7 of FIG. 5;
FIG. 8 is an enlarged sectional view taken along line 8—8 of FIG. 7;
FIG. 9 is a perspective view thereof; and,
FIG. 10 is an enlarged detail view of the circled area 10 in FIG. 9.
The broken line showing of the top panel for microwave introduction window of a plasma processing apparatus is included for the purpose of illustrating portions of the microwave introduction window of a plasma processing apparatus and forms no part of the claimed design.
Microwave window including first and second plates with vertical stepped areas configured for pressure sealing a dielectric plate between the first and second plates
High flow vacuum chamber including equipment modules such as a plasma generating source, vacuum pumping arrangement and/or cantilevered substrate support