Patent |
Priority |
Assignee |
Title |
4345744, |
May 11 1980 |
TRUMPF GMBH & CO |
Working machine with flame cutter and cooling unit |
4392927, |
Feb 21 1981 |
Heraeus Elektroden GmbH |
Novel electrode |
4423546, |
Sep 04 1981 |
W A WHITNEY CO |
Punch press with automatic tool changer |
4486941, |
Sep 04 1981 |
W A WHITNEY CO |
Punch press with automatic tool changer |
5273957, |
Dec 04 1990 |
Hoechst Aktiengesellschaft |
Thermally sprayed lead-containing thick layers |
7211177, |
Jan 03 2002 |
Bayer Aktiengesellschaft; DE NORA ELETTRODI S P A |
Electrode for electrolysis in acidic media |
7578451, |
Feb 11 2005 |
Sulzer Metco AG |
Apparatus for thermal spraying |
7892609, |
Nov 02 2004 |
Sulzer Metco AG |
Thermal spraying apparatus and also a thermal spraying process |
8871010, |
Mar 23 2011 |
Sulzer Metco AG |
Plasma spray method for the manufacture of an ion conductive membrane |
D275016, |
Mar 17 1982 |
|
Apparatus for cutting by melting |
D490450, |
May 20 2002 |
Tokyo Electron Limited |
Exhaust ring for semiconductor equipment |
D505963, |
Jan 16 2004 |
Victor Equipment Company |
Electrode for a plasma arc torch |
D519135, |
Jan 16 2004 |
Victor Equipment Company |
Tip for a plasma arc torch |
D571383, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D571831, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D571832, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D571833, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of plasma processing apparatus |
D572733, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D582949, |
Dec 15 2006 |
Tokyo Electron Limited |
Cover for a heater stage of a plasma processing apparatus |
D583394, |
Dec 15 2006 |
Tokyo Electron Limited |
Cover for a heater stage of a plasma processing apparatus |
D583395, |
Dec 15 2006 |
Tokyo Electron Limited |
Cover for a heater stage of a plasma processing apparatus |
D593585, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D594485, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D645486, |
Mar 31 2010 |
Tokyo Electron Limited |
Dielectric window for plasma processing device |
D658691, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D658692, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D658693, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D672377, |
Mar 31 2010 |
Tokyo Electron Limited |
Dielectric window for plasma processing device |
D694790, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
D694791, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
D721110, |
May 10 2012 |
OERLIKON METCO US INC |
Plasma gun |
D721749, |
May 10 2012 |
OERLIKON METCO US INC |
Plasma gun |
D775249, |
Apr 01 2015 |
KOIKE SANSO KOGYO CO , LTD |
Inner nozzle for plasma torch |
D776177, |
Oct 13 2015 |
Lincoln Global, Inc. |
Air cooled plasma torch electrode |
D776730, |
Jan 30 2015 |
Komatsu Ltd.; Komatsu Industries Corp. |
Plasma torch cartridge |
D776731, |
Jan 30 2015 |
Komatsu Ltd.; Komatsu Industries Corp. |
Plasma torch cartridge |
D777812, |
Oct 13 2015 |
Lincoln Global, Inc. |
Liquid cooled plasma torch electrode |
D784432, |
Jan 30 2015 |
Komatsu Ltd.; Komatsu Industries Corp. |
Plasma torch electrode |
D796562, |
Apr 11 2016 |
Applied Materials, Inc |
Plasma outlet liner |
D802034, |
Jan 30 2015 |
Komatsu Ltd.; Komatsu Industries Corp. |
Plasma torch electrode |
D804436, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Upper chamber for a plasma processing apparatus |
D812578, |
Feb 26 2016 |
HITACHI HIGH-TECH CORPORATION |
Upper chamber for a plasma processing apparatus |