Patent
   D583394
Priority
Dec 15 2006
Filed
Jun 14 2007
Issued
Dec 23 2008
Expiry
Dec 23 2022
Assg.orig
Entity
unknown
9
26
n/a
The ornamental design for a cover for a heater stage of a plasma processing apparatus, as shown and described.

FIG. 1 is a front view of a cover for a heater stage of a plasma processing apparatus showing my new design:

FIG. 2 is a rear view thereof;

FIG. 3 is a right side view thereof;

FIG. 4 is a top plan view thereof,

FIG. 5 is a sectional view taken along line 55 of FIG. 1 thereof;

FIG. 6 is an enlarged view taken along line 66 of FIG. 5 thereof; and,

FIG. 7 is a perspective view thereof.

Ota, Kinya

Patent Priority Assignee Title
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D981970, Mar 04 2021 KOKUSAI ELECTRIC CORPORATION Substrate mounting plate for substrate processing apparatus
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Jun 05 2007OTA, KINYATokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0194300102 pdf
Jun 14 2007Tokyo Electron Limited(assignment on the face of the patent)
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