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Patent
D804436
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Priority
Jun 12 2015
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Filed
Oct 30 2015
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Issued
Dec 05 2017
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Expiry
Dec 05 2032
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Assg.orig
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Entity
unknown
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31
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14
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n/a
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The ornamental design for an upper chamber for a plasma processing apparatus, as shown and described.
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FIG. 1 is a front and top perspective view of an upper chamber for a plasma processing apparatus according to the design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a left side elevational view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross-sectional view taken along line 8-8 of FIG. 6; and,
FIG. 9 is a partially enlarged view taken along line 9-9 of FIG. 8.
Tauchi, Susumu, Uemura, Takashi, Sato, Kohei
Patent |
Priority |
Assignee |
Title |
11192116, |
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Superior Industries, Inc.; SUPERIOR INDUSTRIES, INC |
Vertical shaft impact crusher rotor floor |
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D931241, |
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D973609, |
Apr 22 2020 |
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Upper shield with showerhead for a process chamber |
ER5584, |
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|
ER8981, |
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Patent |
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D274836, |
Dec 02 1982 |
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Space heater assembly |
D404369, |
Aug 20 1997 |
Tokyo Electron Limited |
Manifold cover for use in a semiconductor wafer heat processing apparatus |
D448729, |
Dec 14 1999 |
Mitsubishi Denki Kabushiki Kaisha |
Stator of AC generator for vehicles |
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Tokyo Electron Limited |
Inner wall shield for a process chamber for manufacturing semiconductors |
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Nov 07 2013 |
Applied Materials, Inc |
Lower chamber liner |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a