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Patent
D882536
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Priority
Apr 28 2017
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Filed
Apr 28 2017
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Issued
Apr 28 2020
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Expiry
Apr 28 2035
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Assg.orig
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Entity
unknown
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0
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11
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n/a
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The ornamental design for a plasma source liner, as shown and described.
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FIG. 1 is an isometric top view of a plasma source liner.
FIG. 2 is an isometric bottom view thereof.
FIG. 3 is a top plan view thereof.
FIG. 4 is a bottom plan view thereof.
FIG. 5 is a side elevational view thereof, the other side elevational view being identical.
FIG. 6 is an end elevational view thereof, the other side elevational view being identical.
FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3; and,
FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 5.
The oblique hatching shown in FIGS. 7 and 8 represents a refractory material.
Shono, Eric Kihara
Patent |
Priority |
Assignee |
Title |
Patent |
Priority |
Assignee |
Title |
20040166612, |
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D799439, |
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D838681, |
Apr 28 2017 |
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D840365, |
Jan 31 2017 |
HITACHI HIGH-TECH CORPORATION |
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D842259, |
Apr 28 2017 |
Applied Materials, Inc |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a