Patent
   D882536
Priority
Apr 28 2017
Filed
Apr 28 2017
Issued
Apr 28 2020
Expiry
Apr 28 2035
Assg.orig
Entity
unknown
0
11
n/a
The ornamental design for a plasma source liner, as shown and described.

FIG. 1 is an isometric top view of a plasma source liner.

FIG. 2 is an isometric bottom view thereof.

FIG. 3 is a top plan view thereof.

FIG. 4 is a bottom plan view thereof.

FIG. 5 is a side elevational view thereof, the other side elevational view being identical.

FIG. 6 is an end elevational view thereof, the other side elevational view being identical.

FIG. 7 is a cross-sectional view thereof taken along lines 7-7 of FIG. 3; and,

FIG. 8 is a cross-sectional view thereof taken along lines 8-8 of FIG. 5.

The oblique hatching shown in FIGS. 7 and 8 represents a refractory material.

Shono, Eric Kihara

Patent Priority Assignee Title
Patent Priority Assignee Title
20040166612,
20180347045,
D799439, May 31 2016 Rohm Co., Ltd. Power converting semiconductor module
D802790, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Cover ring for a plasma processing apparatus
D804436, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Upper chamber for a plasma processing apparatus
D818447, Apr 28 2017 Applied Materials, Inc Plasma feedthrough flange
D818968, Jun 16 2016 TRIDONIC GMBH & CO KG Sensor
D837754, Apr 28 2017 Applied Materials, Inc Plasma chamber liner
D838681, Apr 28 2017 Applied Materials, Inc Plasma chamber liner
D840365, Jan 31 2017 HITACHI HIGH-TECH CORPORATION Cover ring for a plasma processing apparatus
D842259, Apr 28 2017 Applied Materials, Inc Plasma chamber liner
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 28 2017Applied Materials, Inc.(assignment on the face of the patent)
Jul 19 2017SHONO, ERIC KIHARAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0431040180 pdf
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