Patent
   D838681
Priority
Apr 28 2017
Filed
Apr 28 2017
Issued
Jan 22 2019
Expiry
Jan 22 2034

TERM.DISCL.
Assg.orig
Entity
unknown
6
20
n/a
The ornamental design for a plasma chamber liner, as shown and described.

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;

FIG. 2 is a bottom isometric view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a side elevational view thereof;

FIG. 6 is an opposite side elevational view thereof; and,

FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Shono, Eric Kihara

Patent Priority Assignee Title
D875053, Apr 28 2017 Applied Materials, Inc Plasma connector liner
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D925481, Dec 06 2018 KOKUSAI ELECTRIC CORPORATION Inlet liner for substrate processing apparatus
Patent Priority Assignee Title
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//
Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 28 2017Applied Materials, Inc.(assignment on the face of the patent)
Jul 19 2017SHONO, ERIC KIHARAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0431040025 pdf
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