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Patent
D658691
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Priority
Mar 30 2011
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Filed
Aug 30 2011
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Issued
May 01 2012
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Expiry
May 01 2026
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Assg.orig
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Entity
unknown
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15
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39
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n/a
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The ornamental design for a liner for plasma processing apparatus, as shown and described.
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FIG. 1 is a front view of a liner for plasma processing apparatus showing our new design;
FIG. 2 is a rear view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a left side view thereof;
FIG. 7 is a sectional view taken along line 7-7 of FIG. 1 thereof;
FIG. 8 is a sectional view taken along line 8-8 of FIG. 1 thereof; and,
FIG. 9 is a perspective view thereof.
Ueda, Atsushi, Yamashita, Jun, Ban, Masakazu, Suzuki, Kouki
| Patent |
Priority |
Assignee |
Title |
| D676073, |
Aug 19 2011 |
D P WAGNER MANUFACTURING, LLC |
Wall shield |
| D694790, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
| D694791, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
| D711331, |
Nov 07 2013 |
Applied Materials, Inc |
Upper chamber liner |
| D716239, |
Nov 06 2013 |
Applied Materials, Inc |
Upper chamber liner |
| D716240, |
Nov 07 2013 |
Applied Materials, Inc |
Lower chamber liner |
| D717746, |
Nov 06 2013 |
Applied Materials, Inc |
Lower chamber liner |
| D802545, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Lower chamber for a plasma processing apparatus |
| D802790, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Cover ring for a plasma processing apparatus |
| D826300, |
Sep 30 2016 |
|
Rotably mounted thermal plasma burner for thermalspraying |
| D837754, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
| D838681, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
| D842259, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
| D909439, |
Nov 30 2018 |
FERROTEC USA CORPORATION |
Two-piece crucible cover |
| D925481, |
Dec 06 2018 |
KOKUSAI ELECTRIC CORPORATION |
Inlet liner for substrate processing apparatus |
| Patent |
Priority |
Assignee |
Title |
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Apr 04 1994 |
FORD GLOBAL TECHNOLOGIES, INC A MICHIGAN CORPORATION |
Cooling system for automotive engine |
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May 31 1991 |
Hitachi, LTD |
Plasma processing apparatus having insulator disposed on inner surface of plasma generating chamber |
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Oct 22 1999 |
ROLLS-ROYCE MARINE NORTH AMERICA, INC |
Impeller for marine waterjet propulsion apparatus |
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Dec 07 2001 |
Novellus Systems, Inc. |
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Semiconductor Equipment Technology, Inc |
Shield and cover for target of sputter coating apparatus |
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Tokyo Electron Limited |
Cap for use in a semiconductor wafer heat processing apparatus |
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Tokyo Electron Limited |
Ring for use in a semiconductor wafer heat processing apparatus |
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Jul 12 2000 |
Houston Harvest Gift Products, LLC |
Two-piece lid |
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Feb 15 2000 |
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Securing ring for a flexible bellows of a marine outboard drive |
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|
Can lip protector |
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May 20 2002 |
Tokyo Electron Limited |
Exhaust ring for semiconductor equipment |
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Nov 20 2002 |
Tokyo Electron Limited |
Inner wall shield for a process chamber for manufacturing semiconductors |
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Feb 13 2003 |
NICHIAS CO , LTD ; Honda Giken Kogyo Kabushiki Kaisha |
Metal ring gasket |
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Oct 28 2003 |
ENTERPRISES INTERNATIONAL, INC |
Guide bushing for a wire tying machine |
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Mar 01 2004 |
Societe des Produits Nestle S A |
Susceptor ring |
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Oct 07 2004 |
LEGEND BRANDS, INC |
Combined fan assembly and shroud |
| D556704, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Grounded electrode for a plasma processing apparatus |
| D557226, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
| D557425, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Cover ring for a plasma processing apparatus |
| D559994, |
Mar 30 2005 |
Tokyo Electron Limited |
Cover ring |
| D593585, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
| D605206, |
May 07 2008 |
Komatsu Ltd |
Fan shroud for construction machinery |
| D610176, |
Aug 26 2008 |
Tokyo Electron Limited |
Coater cup |
| D616390, |
Mar 06 2009 |
Tokyo Electron Limited |
Quartz cover for manufacturing semiconductor wafers |
| D638951, |
Nov 13 2009 |
DIASORIN ITALIA S P A |
Sample processing disk cover |
| D645486, |
Mar 31 2010 |
Tokyo Electron Limited |
Dielectric window for plasma processing device |
| Date |
Maintenance Fee Events |
n/a
| Date |
Maintenance Schedule |
n/a