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Patent
D658691
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Priority
Mar 30 2011
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Filed
Aug 30 2011
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Issued
May 01 2012
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Expiry
May 01 2026
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Assg.orig
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Entity
unknown
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15
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39
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n/a
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The ornamental design for a liner for plasma processing apparatus, as shown and described.
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FIG. 1 is a front view of a liner for plasma processing apparatus showing our new design;
FIG. 2 is a rear view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a left side view thereof;
FIG. 7 is a sectional view taken along line 7-7 of FIG. 1 thereof;
FIG. 8 is a sectional view taken along line 8-8 of FIG. 1 thereof; and,
FIG. 9 is a perspective view thereof.
Ueda, Atsushi, Yamashita, Jun, Ban, Masakazu, Suzuki, Kouki
Patent |
Priority |
Assignee |
Title |
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Aug 19 2011 |
D P WAGNER MANUFACTURING, LLC |
Wall shield |
D694790, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
D694791, |
Sep 20 2011 |
Tokyo Electron Limited |
Baffle plate for manufacturing semiconductor |
D711331, |
Nov 07 2013 |
Applied Materials, Inc |
Upper chamber liner |
D716239, |
Nov 06 2013 |
Applied Materials, Inc |
Upper chamber liner |
D716240, |
Nov 07 2013 |
Applied Materials, Inc |
Lower chamber liner |
D717746, |
Nov 06 2013 |
Applied Materials, Inc |
Lower chamber liner |
D802545, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Lower chamber for a plasma processing apparatus |
D802790, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Cover ring for a plasma processing apparatus |
D826300, |
Sep 30 2016 |
|
Rotably mounted thermal plasma burner for thermalspraying |
D837754, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
D838681, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
D842259, |
Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
D909439, |
Nov 30 2018 |
FERROTEC USA CORPORATION |
Two-piece crucible cover |
D925481, |
Dec 06 2018 |
KOKUSAI ELECTRIC CORPORATION |
Inlet liner for substrate processing apparatus |
Patent |
Priority |
Assignee |
Title |
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Can lip protector |
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Tokyo Electron Limited |
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Inner wall shield for a process chamber for manufacturing semiconductors |
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NICHIAS CO , LTD ; Honda Giken Kogyo Kabushiki Kaisha |
Metal ring gasket |
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ENTERPRISES INTERNATIONAL, INC |
Guide bushing for a wire tying machine |
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Societe des Produits Nestle S A |
Susceptor ring |
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Combined fan assembly and shroud |
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HITACHI HIGH-TECH CORPORATION |
Grounded electrode for a plasma processing apparatus |
D557226, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Electrode cover for a plasma processing apparatus |
D557425, |
Aug 25 2005 |
HITACHI HIGH-TECH CORPORATION |
Cover ring for a plasma processing apparatus |
D559994, |
Mar 30 2005 |
Tokyo Electron Limited |
Cover ring |
D593585, |
Jul 29 2005 |
Tokyo Electron Limited |
Top panel for microwave introduction window of a plasma processing apparatus |
D605206, |
May 07 2008 |
Komatsu Ltd |
Fan shroud for construction machinery |
D610176, |
Aug 26 2008 |
Tokyo Electron Limited |
Coater cup |
D616390, |
Mar 06 2009 |
Tokyo Electron Limited |
Quartz cover for manufacturing semiconductor wafers |
D638951, |
Nov 13 2009 |
DIASORIN ITALIA S P A |
Sample processing disk cover |
D645486, |
Mar 31 2010 |
Tokyo Electron Limited |
Dielectric window for plasma processing device |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a