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Patent
D925481
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Priority
Dec 06 2018
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Filed
Jun 04 2019
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Issued
Jul 20 2021
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Expiry
Jul 20 2036
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Assg.orig
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Entity
unknown
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0
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41
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n/a
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The ornamental design for an inlet liner for substrate processing apparatus, as shown and described.
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FIG. 1 is a front, top and right side perspective view of an inlet liner for substrate processing apparatus showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a cross-sectional view take along line 8-8 in FIG. 6.
The broken line arrow shows the association of the two sides of the cross sectional view in FIG. 8 and forms no part of the claimed design.
Kagaya, Toru, Ebata, Shinya
Patent |
Priority |
Assignee |
Title |
Patent |
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HITACHI HIGH-TECH CORPORATION |
Cover ring for a plasma processing apparatus |
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Apr 28 2017 |
Applied Materials, Inc |
Plasma chamber liner |
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JP1509912, |
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JP1598442, |
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Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a