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Patent
D837754
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Priority
Apr 28 2017
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Filed
Apr 28 2017
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Issued
Jan 08 2019
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Expiry
Jan 08 2034
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Assg.orig
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Entity
unknown
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5
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19
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n/a
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The ornamental design for a plasma chamber liner, as shown and described.
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FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;
FIG. 2 is a bottom isometric view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a side elevational view thereof;
FIG. 6 is an opposite side elevational view thereof; and,
FIG. 7 is a front elevational view thereof, a rear elevational view being identical.
Shono, Eric Kihara
Patent |
Priority |
Assignee |
Title |
5964947, |
Jul 12 1996 |
Applied Materials, Inc. |
Removable pumping channel liners within a chemical vapor deposition chamber |
6277237, |
Sep 30 1998 |
Lam Research Corporation |
Chamber liner for semiconductor process chambers |
6374871, |
May 25 1999 |
Micron Technology, Inc. |
Liner for use in processing chamber |
7011039, |
Jul 07 2000 |
Applied Materials, Inc |
Multi-purpose processing chamber with removable chamber liner |
8858754, |
May 25 2010 |
Tokyo Electron Limited |
Plasma processing apparatus |
8980005, |
Mar 22 2011 |
Applied Materials, Inc |
Liner assembly for chemical vapor deposition chamber |
20140116366, |
|
|
|
20140322897, |
|
|
|
D658691, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D658692, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D658693, |
Mar 30 2011 |
Tokyo Electron Limited |
Liner for plasma processing apparatus |
D678228, |
Mar 30 2011 |
Tokyo Electron Limited |
Chamber block |
D699692, |
Jan 19 2012 |
Applied Materials, Inc |
Upper liner |
D716239, |
Nov 06 2013 |
Applied Materials, Inc |
Upper chamber liner |
D716240, |
Nov 07 2013 |
Applied Materials, Inc |
Lower chamber liner |
D717746, |
Nov 06 2013 |
Applied Materials, Inc |
Lower chamber liner |
D802545, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Lower chamber for a plasma processing apparatus |
D804436, |
Jun 12 2015 |
HITACHI HIGH-TECH CORPORATION |
Upper chamber for a plasma processing apparatus |
D812578, |
Feb 26 2016 |
HITACHI HIGH-TECH CORPORATION |
Upper chamber for a plasma processing apparatus |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a