Patent
   D837754
Priority
Apr 28 2017
Filed
Apr 28 2017
Issued
Jan 08 2019
Expiry
Jan 08 2034
Assg.orig
Entity
unknown
5
19
n/a
The ornamental design for a plasma chamber liner, as shown and described.

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;

FIG. 2 is a bottom isometric view thereof;

FIG. 3 is a top plan view thereof;

FIG. 4 is a bottom plan view thereof;

FIG. 5 is a side elevational view thereof;

FIG. 6 is an opposite side elevational view thereof; and,

FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Shono, Eric Kihara

Patent Priority Assignee Title
D875053, Apr 28 2017 Applied Materials, Inc Plasma connector liner
D875054, Apr 28 2017 Applied Materials, Inc Plasma connector liner
D875055, Apr 28 2017 Applied Materials, Inc Plasma connector liner
D882536, Apr 28 2017 Applied Materials, Inc Plasma source liner
D925481, Dec 06 2018 KOKUSAI ELECTRIC CORPORATION Inlet liner for substrate processing apparatus
Patent Priority Assignee Title
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D717746, Nov 06 2013 Applied Materials, Inc Lower chamber liner
D802545, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Lower chamber for a plasma processing apparatus
D804436, Jun 12 2015 HITACHI HIGH-TECH CORPORATION Upper chamber for a plasma processing apparatus
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 28 2017Applied Materials, Inc.(assignment on the face of the patent)
Jul 19 2017SHONO, ERIC KIHARAApplied Materials, IncASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0431040225 pdf
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