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Patent
D655262
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Priority
Oct 21 2010
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Filed
Apr 13 2011
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Issued
Mar 06 2012
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Expiry
Mar 06 2026
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Assg.orig
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Entity
unknown
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8
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14
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n/a
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The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.
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FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top view thereof; and,
FIG. 7 is a bottom view thereof.
Honma, Manabu, Hishiya, Katsuyuki
Patent |
Priority |
Assignee |
Title |
5676869, |
Nov 07 1994 |
TOKYO ELECTRON LIMITED, A CORPORATION OF JAPAN |
Vertical heat treatment apparatus |
6101844, |
Feb 10 1998 |
AVIZA TECHNOLOGY, INC |
Double wall reaction chamber glassware |
6884297, |
Mar 31 2003 |
WONIK IPS CO , LTD |
Thin film deposition reactor |
6911093, |
Jun 02 2003 |
Bell Semiconductor, LLC |
Lid liner for chemical vapor deposition chamber |
7371998, |
Jul 05 2006 |
Applied Materials Inc |
Thermal wafer processor |
8002895, |
Aug 04 2006 |
Tokyo Electron Limited |
Heat processing apparatus for semiconductor process |
20060124058, |
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20070113783, |
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20070181062, |
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20090159004, |
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|
D586768, |
Oct 12 2006 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D588078, |
Jun 16 2006 |
Tokyo Electron Limited |
Heat dissipation deterrence link for semiconductor manufacture |
D600659, |
Sep 12 2006 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
D611013, |
Mar 28 2008 |
Tokyo Electron Limited |
Process tube for manufacturing semiconductor wafers |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a