Patent
   D655262
Priority
Oct 21 2010
Filed
Apr 13 2011
Issued
Mar 06 2012
Expiry
Mar 06 2026
Assg.orig
Entity
unknown
8
14
n/a
The ornamental design for side wall for reactor for manufacturing semiconductor, as shown and described.

FIG. 1 is front perspective view of a side wall for reactor for manufacturing semiconductor illustrating our new design;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a right side view thereof;

FIG. 5 is a left side view thereof;

FIG. 6 is a top view thereof; and,

FIG. 7 is a bottom view thereof.

Honma, Manabu, Hishiya, Katsuyuki

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Patent Priority Assignee Title
5676869, Nov 07 1994 TOKYO ELECTRON LIMITED, A CORPORATION OF JAPAN Vertical heat treatment apparatus
6101844, Feb 10 1998 AVIZA TECHNOLOGY, INC Double wall reaction chamber glassware
6884297, Mar 31 2003 WONIK IPS CO , LTD Thin film deposition reactor
6911093, Jun 02 2003 Bell Semiconductor, LLC Lid liner for chemical vapor deposition chamber
7371998, Jul 05 2006 Applied Materials Inc Thermal wafer processor
8002895, Aug 04 2006 Tokyo Electron Limited Heat processing apparatus for semiconductor process
20060124058,
20070113783,
20070181062,
20090159004,
D586768, Oct 12 2006 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D588078, Jun 16 2006 Tokyo Electron Limited Heat dissipation deterrence link for semiconductor manufacture
D600659, Sep 12 2006 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D611013, Mar 28 2008 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 13 2011Tokyo Electron Limited(assignment on the face of the patent)
May 17 2011HONMA, MANABUTokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263530461 pdf
May 17 2011HISHIYA, KATSUYUKITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0263530461 pdf
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