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Patent
D586768
Priority
Oct 12 2006
Filed
Apr 11 2007
Issued
Feb 17 2009
Expiry
Feb 17 2023
Assg.orig
Entity
unknown
33
10
n/a
The ornamental design for a process tube for manufacturing semiconductor wafers, as shown and described.
FIG. 1 is a front view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;
FIG. 2 is a rear view thereof;
FIG. 3 is a right side view thereof;
FIG. 4 is a left side view thereof;
FIG. 5 is a top view thereof;
FIG. 6 is a bottom view thereof;
FIG. 7 is a sectional view thereof along line 7 —7 of FIG. 5 ;
FIG. 8 is a sectional view thereof along line 8 —8 of FIG. 5 ;
FIG. 9 is a sectional view thereof along line 9 —9 of FIG. 1 ; and,
FIG. 10 is a front, perspective view thereof.
In the preferred embodiment, the entire body of the process tube is transparent such that the inside of the tube can be seen. Dash lines show the boundary of the claimed design.
The broken lines define portions of the process tube that form no part of the claimed design.
Inoue, Hisashi , Endo, Atsushi
Patent
Priority
Assignee
Title
11542601 ,
Feb 09 2016
KOKUSAI ELECTRIC CORPORATION
Substrate processing apparatus and method of manufacturing semiconductor device
9816184 ,
Mar 20 2012
Veeco Instruments INC
Keyed wafer carrier
D594488 ,
Apr 20 2007
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
D610559 ,
May 30 2008
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D611013 ,
Mar 28 2008
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
D618638 ,
May 09 2008
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D655258 ,
Oct 21 2010
Tokyo Electron Limited
Side wall for reactor for manufacturing semiconductor
D655262 ,
Oct 21 2010
Tokyo Electron Limited
Side wall for reactor for manufacturing semiconductor
D711843 ,
Jun 28 2013
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D719114 ,
Jun 28 2013
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D720308 ,
Nov 18 2011
Tokyo Electron Limited
Inner tube for process tube for manufacturing semiconductor wafers
D720309 ,
Nov 18 2011
Tokyo Electron Limited
Inner tube for process tube for manufacturing semiconductor wafers
D720707 ,
Jun 28 2013
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D724551 ,
Nov 18 2011
Tokyo Electron Limited
Inner tube for process tube for manufacturing semiconductor wafers
D725053 ,
Nov 18 2011
Tokyo Electron Limited
Outer tube for process tube for manufacturing semiconductor wafers
D725055 ,
Jun 28 2013
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D739832 ,
Jun 28 2013
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D742339 ,
Mar 12 2014
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D744967 ,
Mar 20 2012
Veeco Instruments INC
Spindle key
D748594 ,
Mar 12 2014
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D770993 ,
Sep 04 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D772824 ,
Feb 25 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D776801 ,
Jun 24 2014
Kobe Steel, Ltd
Heat exchanger tube
D778457 ,
Feb 23 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D778458 ,
Feb 23 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D790490 ,
Sep 04 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D791090 ,
Sep 04 2015
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D842823 ,
Aug 10 2017
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D842824 ,
Aug 09 2017
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D853979 ,
Dec 27 2017
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D901406 ,
Mar 20 2019
KOKUSAI ELECTRIC CORPORATION
Inner tube of reactor for semiconductor fabrication
D918669 ,
Mar 18 2019
Storage container
D931823 ,
Jan 29 2020
KOKUSAI ELECTRIC CORPORATION
Reaction tube
Patent
Priority
Assignee
Title
5618349 ,
Jul 24 1993
Yamaha Corporation
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
5948300 ,
Sep 12 1997
Kokusai Semiconductor Equipment Corporation
Process tube with in-situ gas preheating
6251189 ,
Feb 18 1999
KOKUSAI ELECTRIC CORPORATION
Substrate processing apparatus and substrate processing method
6538237 ,
Jan 08 2002
Taiwan Semiconductor Manufacturing Co., Ltd
Apparatus for holding a quartz furnace
20020014483 ,
D404368 ,
Aug 20 1997
Tokyo Electron Limited
Outer tube for use in a semiconductor wafer heat processing apparatus
D405062 ,
Aug 20 1997
Tokyo Electron Limited
Processing tube for use in a semiconductor wafer heat processing apparatus
D406113 ,
Jan 31 1997
Tokyo Electron Limited
Processing tube for use in a semiconductor wafer heat processing apparatus
D520467 ,
Nov 04 2003
Tokyo Electron Limited
Process tube for semiconductor device manufacturing apparatus
D521464 ,
Nov 04 2003
Tokyo Electron Limited
Process tube for semiconductor device manufacturing apparatus
Date
Maintenance Fee Events
n/a
Date
Maintenance Schedule
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