Patent
   D405062
Priority
Aug 20 1997
Filed
Feb 05 1998
Issued
Feb 02 1999
Expiry
Feb 02 2013
Assg.orig
Entity
unknown
31
10
n/a
I claim the ornamental design for processing tube for use in a semiconductor wafer heat processing apparatus, as shown and described.

FIG. 1 a perspective view of a processing tube for use in a semiconductor wafer heat processing apparatus;

FIG. 2 a front elevational view thereof;

FIG. 3 a top plan view thereof;

FIG. 4 a bottom plan view thereof;

FIG. 5 a rear elevational view thereof;

FIG. 6 a left side view thereof;

FIG. 7 a right side view thereof;

FIG. 8 a cross-sectional view taken along line VIII-VIII in FIG. 3;

FIG. 9 a cross-sectional view taken along line IX-IX in FIG. 2; and,

FIG. 10 a cross-sectional view taken along line X-X in FIG. 3.

Shimazu, Tomohisa

Patent Priority Assignee Title
D520467, Nov 04 2003 Tokyo Electron Limited Process tube for semiconductor device manufacturing apparatus
D521464, Nov 04 2003 Tokyo Electron Limited Process tube for semiconductor device manufacturing apparatus
D521465, Nov 04 2003 Tokyo Electron Limited Process tube for semiconductor device manufacturing apparatus
D586768, Oct 12 2006 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D590359, Feb 20 2006 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers or the like
D594488, Apr 20 2007 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D600659, Sep 12 2006 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D619630, May 08 2007 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
D711843, Jun 28 2013 KOKUSAI ELECTRIC CORPORATION Reaction tube
D719114, Jun 28 2013 KOKUSAI ELECTRIC CORPORATION Reaction tube
D720308, Nov 18 2011 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
D720309, Nov 18 2011 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
D720707, Jun 28 2013 KOKUSAI ELECTRIC CORPORATION Reaction tube
D724551, Nov 18 2011 Tokyo Electron Limited Inner tube for process tube for manufacturing semiconductor wafers
D725053, Nov 18 2011 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
D725055, Jun 28 2013 KOKUSAI ELECTRIC CORPORATION Reaction tube
D739832, Jun 28 2013 KOKUSAI ELECTRIC CORPORATION Reaction tube
D742339, Mar 12 2014 KOKUSAI ELECTRIC CORPORATION Reaction tube
D748594, Mar 12 2014 KOKUSAI ELECTRIC CORPORATION Reaction tube
D770993, Sep 04 2015 KOKUSAI ELECTRIC CORPORATION Reaction tube
D772824, Feb 25 2015 KOKUSAI ELECTRIC CORPORATION Reaction tube
D778458, Feb 23 2015 KOKUSAI ELECTRIC CORPORATION Reaction tube
D790490, Sep 04 2015 KOKUSAI ELECTRIC CORPORATION Reaction tube
D791090, Sep 04 2015 KOKUSAI ELECTRIC CORPORATION Reaction tube
D842823, Aug 10 2017 KOKUSAI ELECTRIC CORPORATION Reaction tube
D842824, Aug 09 2017 KOKUSAI ELECTRIC CORPORATION Reaction tube
D853979, Dec 27 2017 KOKUSAI ELECTRIC CORPORATION Reaction tube
D901406, Mar 20 2019 KOKUSAI ELECTRIC CORPORATION Inner tube of reactor for semiconductor fabrication
D919583, Aug 26 2020 Mortarboard with electronic tube display
D931823, Jan 29 2020 KOKUSAI ELECTRIC CORPORATION Reaction tube
D986826, Mar 10 2020 KOKUSAI ELECTRIC CORPORATION Reaction tube
Patent Priority Assignee Title
4587689, Jan 12 1983 Meat packing apparatus
5046909, Jun 29 1989 Applied Materials, Inc. Method and apparatus for handling semiconductor wafers
5314574, Jun 26 1992 Tokyo Electron Kabushiki Kaisha Surface treatment method and apparatus
5320218, Apr 07 1992 MURATEC AUTOMATION CO , LTD Closed container to be used in a clean room
5407449, Mar 10 1992 ASM INTERNATIONAL N V Device for treating micro-circuit wafers
5516732, Dec 04 1992 Tokyo Electron Limited Wafer processing machine vacuum front end method and apparatus
5518360, Nov 16 1990 Kabushiki-Kaisha Watanabe Shoko Wafer carrying device and wafer carrying method
5536128, Oct 21 1988 Renesas Electronics Corporation Method and apparatus for carrying a variety of products
5658115, Sep 05 1991 Hitachi, Ltd. Transfer apparatus
5752796, Jan 24 1996 Brooks Automation, Inc Vacuum integrated SMIF system
//
Executed onAssignorAssigneeConveyanceFrameReelDoc
Feb 05 1998Tokyo Electron Ltd.(assignment on the face of the patent)
Mar 18 1998SHIMAZU, TOMOHISATokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0091260608 pdf
n/a
Date Maintenance Fee Events


n/a
Date Maintenance Schedule