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Patent
D725053
Priority
Nov 18 2011
Filed
May 10 2012
Issued
Mar 24 2015
Expiry
Mar 24 2029
Assg.orig
Entity
unknown
15
31
n/a
The ornamental design for an outer tube for process tube for manufacturing semiconductor wafers, as shown and described.
FIG. 1 is perspective view of an outer tube for process tube for manufacturing semiconductor wafers showing our new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof; and,
FIG. 8 is a cross-sectional view taken along line 8 -8 of FIG. 6 .
The broken lines shown in the drawings represent portions of the outer tube for process tube for manufacturing semiconductor wafers that form no part of the claimed design.
Endo, Atsushi , Kaneko, Hirofumi
Patent
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Title
11092330 ,
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11713773 ,
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D790490 ,
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D791090 ,
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D802546 ,
Jan 08 2016
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D987054 ,
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Patent
Priority
Assignee
Title
4950870 ,
Nov 21 1987
Tokyo Electron Limited
Heat-treating apparatus
5037502 ,
Dec 29 1983
Sharp Kabushiki Kaisha
Process for producing a single-crystal substrate of silicon carbide
5352293 ,
Jan 06 1992
SAMSUNG ELECTRONICS CO , LTD
Tube apparatus for manufacturing semiconductor device
5618349 ,
Jul 24 1993
Yamaha Corporation
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity
5897311 ,
May 31 1995
Tokyo Electron Limited
Support boat for objects to be processed
5948300 ,
Sep 12 1997
Kokusai Semiconductor Equipment Corporation
Process tube with in-situ gas preheating
5968593 ,
Mar 20 1995
KOKUSAI ELECTRIC CO , LTD
Semiconductor manufacturing apparatus
6251189 ,
Feb 18 1999
KOKUSAI ELECTRIC CORPORATION
Substrate processing apparatus and substrate processing method
7311520 ,
Sep 24 2002
Tokyo Electron Limited
Heat treatment apparatus
20020014483 ,
20030221779 ,
20080083372 ,
20080132079 ,
D404368 ,
Aug 20 1997
Tokyo Electron Limited
Outer tube for use in a semiconductor wafer heat processing apparatus
D405062 ,
Aug 20 1997
Tokyo Electron Limited
Processing tube for use in a semiconductor wafer heat processing apparatus
D405429 ,
Jan 31 1997
Tokyo Electron Limited
Processing tube for use in a semiconductor wafer heat processing apparatus
D405431 ,
Aug 20 1997
Tokyo Electron Limited
Tube for use in a semiconductor wafer heat processing apparatus
D406113 ,
Jan 31 1997
Tokyo Electron Limited
Processing tube for use in a semiconductor wafer heat processing apparatus
D417438 ,
Jan 31 1997
Tokyo Electron Limited
Quartz outer tube
D423463 ,
Jan 31 1997
Tokyo Electron Limited
Quartz process tube
D424024 ,
Jan 31 1997
Tokyo Electron Limited
Quartz process tube
D521464 ,
Nov 04 2003
Tokyo Electron Limited
Process tube for semiconductor device manufacturing apparatus
D521465 ,
Nov 04 2003
Tokyo Electron Limited
Process tube for semiconductor device manufacturing apparatus
D556704 ,
Aug 25 2005
HITACHI HIGH-TECH CORPORATION
Grounded electrode for a plasma processing apparatus
D586768 ,
Oct 12 2006
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
D590359 ,
Feb 20 2006
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers or the like
D600659 ,
Sep 12 2006
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
D611013 ,
Mar 28 2008
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
D616396 ,
Mar 12 2009
Tokyo Electron Limited
Pedestal of heat insulating cylinder for manufacturing semiconductor wafers
D618638 ,
May 09 2008
KOKUSAI ELECTRIC CORPORATION
Reaction tube
D619630 ,
May 08 2007
Tokyo Electron Limited
Process tube for manufacturing semiconductor wafers
Date
Maintenance Fee Events
n/a
Date
Maintenance Schedule
n/a