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Patent
D600659
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Priority
Sep 12 2006
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Filed
Mar 09 2007
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Issued
Sep 22 2009
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Expiry
Sep 22 2023
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Assg.orig
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Entity
unknown
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36
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10
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n/a
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The ornamental design for a process tub for manufacturing semiconductor wafers, as shown and described.
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FIG. 1 is a perspective view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a top view thereof;
FIG. 5 is a bottom view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a left side view thereof;
FIG. 8 is a sectional view thereof along line 8—8 of FIG. 4;
FIG. 9 is a sectional view thereof along line 9—9 of FIG. 4;
FIG. 10 is a sectional view thereof along line 10—10 of FIG. 4; and,
FIG. 11 is a sectional view thereof along line 11—11 of FIG. 2.
The broken lines are shown for illustrative purpose only and form no part of the claimed design.
Matsuura, Hiroyuki, Shimada, Koichi
| Patent |
Priority |
Assignee |
Title |
| 11542601, |
Feb 09 2016 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and method of manufacturing semiconductor device |
| 11952664, |
Feb 09 2016 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and method of manufacturing semiconductor device |
| D618638, |
May 09 2008 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D655258, |
Oct 21 2010 |
Tokyo Electron Limited |
Side wall for reactor for manufacturing semiconductor |
| D655262, |
Oct 21 2010 |
Tokyo Electron Limited |
Side wall for reactor for manufacturing semiconductor |
| D711843, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D719114, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D720308, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
| D720309, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
| D720707, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D724551, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
| D725053, |
Nov 18 2011 |
Tokyo Electron Limited |
Outer tube for process tube for manufacturing semiconductor wafers |
| D725055, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D739832, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D742339, |
Mar 12 2014 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D748594, |
Mar 12 2014 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D770993, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D772824, |
Feb 25 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D778457, |
Feb 23 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D778458, |
Feb 23 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D790490, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D791090, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D842823, |
Aug 10 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D842824, |
Aug 09 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D853979, |
Dec 27 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D901406, |
Mar 20 2019 |
KOKUSAI ELECTRIC CORPORATION |
Inner tube of reactor for semiconductor fabrication |
| D931823, |
Jan 29 2020 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| D986826, |
Mar 10 2020 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
| ER3440, |
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| ER5461, |
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| ER707, |
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| ER7131, |
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| ER7251, |
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| ER7371, |
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| ER7687, |
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| ER9216, |
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| Patent |
Priority |
Assignee |
Title |
| 5618349, |
Jul 24 1993 |
Yamaha Corporation |
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity |
| 5948300, |
Sep 12 1997 |
Kokusai Semiconductor Equipment Corporation |
Process tube with in-situ gas preheating |
| 6251189, |
Feb 18 1999 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and substrate processing method |
| 6538237, |
Jan 08 2002 |
Taiwan Semiconductor Manufacturing Co., Ltd |
Apparatus for holding a quartz furnace |
| 20020014483, |
|
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|
| D404368, |
Aug 20 1997 |
Tokyo Electron Limited |
Outer tube for use in a semiconductor wafer heat processing apparatus |
| D405062, |
Aug 20 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
| D406113, |
Jan 31 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
| D520467, |
Nov 04 2003 |
Tokyo Electron Limited |
Process tube for semiconductor device manufacturing apparatus |
| D521464, |
Nov 04 2003 |
Tokyo Electron Limited |
Process tube for semiconductor device manufacturing apparatus |
| Date |
Maintenance Fee Events |
n/a
| Date |
Maintenance Schedule |
n/a