PTO
Wrapper
PDF
|
Dossier
Espace
Google
|
|
Patent
D600659
|
Priority
Sep 12 2006
|
Filed
Mar 09 2007
|
Issued
Sep 22 2009
|
Expiry
Sep 22 2023
|
|
Assg.orig
|
|
Entity
unknown
|
27
|
10
|
n/a
|
|
|
The ornamental design for a process tub for manufacturing semiconductor wafers, as shown and described.
|
FIG. 1 is a perspective view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a top view thereof;
FIG. 5 is a bottom view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a left side view thereof;
FIG. 8 is a sectional view thereof along line 8—8 of FIG. 4;
FIG. 9 is a sectional view thereof along line 9—9 of FIG. 4;
FIG. 10 is a sectional view thereof along line 10—10 of FIG. 4; and,
FIG. 11 is a sectional view thereof along line 11—11 of FIG. 2.
The broken lines are shown for illustrative purpose only and form no part of the claimed design.
Matsuura, Hiroyuki, Shimada, Koichi
Patent |
Priority |
Assignee |
Title |
11542601, |
Feb 09 2016 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and method of manufacturing semiconductor device |
D618638, |
May 09 2008 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D655258, |
Oct 21 2010 |
Tokyo Electron Limited |
Side wall for reactor for manufacturing semiconductor |
D655262, |
Oct 21 2010 |
Tokyo Electron Limited |
Side wall for reactor for manufacturing semiconductor |
D711843, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D719114, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D720308, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
D720309, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
D720707, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D724551, |
Nov 18 2011 |
Tokyo Electron Limited |
Inner tube for process tube for manufacturing semiconductor wafers |
D725053, |
Nov 18 2011 |
Tokyo Electron Limited |
Outer tube for process tube for manufacturing semiconductor wafers |
D725055, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D739832, |
Jun 28 2013 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D742339, |
Mar 12 2014 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D748594, |
Mar 12 2014 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D770993, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D772824, |
Feb 25 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D778457, |
Feb 23 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D778458, |
Feb 23 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D790490, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D791090, |
Sep 04 2015 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D842823, |
Aug 10 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D842824, |
Aug 09 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D853979, |
Dec 27 2017 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D901406, |
Mar 20 2019 |
KOKUSAI ELECTRIC CORPORATION |
Inner tube of reactor for semiconductor fabrication |
D931823, |
Jan 29 2020 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
D986826, |
Mar 10 2020 |
KOKUSAI ELECTRIC CORPORATION |
Reaction tube |
Patent |
Priority |
Assignee |
Title |
5618349, |
Jul 24 1993 |
Yamaha Corporation |
Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity |
5948300, |
Sep 12 1997 |
Kokusai Semiconductor Equipment Corporation |
Process tube with in-situ gas preheating |
6251189, |
Feb 18 1999 |
KOKUSAI ELECTRIC CORPORATION |
Substrate processing apparatus and substrate processing method |
6538237, |
Jan 08 2002 |
Taiwan Semiconductor Manufacturing Co., Ltd |
Apparatus for holding a quartz furnace |
20020014483, |
|
|
|
D404368, |
Aug 20 1997 |
Tokyo Electron Limited |
Outer tube for use in a semiconductor wafer heat processing apparatus |
D405062, |
Aug 20 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
D406113, |
Jan 31 1997 |
Tokyo Electron Limited |
Processing tube for use in a semiconductor wafer heat processing apparatus |
D520467, |
Nov 04 2003 |
Tokyo Electron Limited |
Process tube for semiconductor device manufacturing apparatus |
D521464, |
Nov 04 2003 |
Tokyo Electron Limited |
Process tube for semiconductor device manufacturing apparatus |
Date |
Maintenance Fee Events |
n/a
Date |
Maintenance Schedule |
n/a