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Patent
D901406
Priority
Mar 20 2019
Filed
Sep 09 2019
Issued
Nov 10 2020
Expiry
Nov 10 2035
Assg.orig
Entity
unknown
4
40
n/a
The ornamental design for an inner tube of reactor for semiconductor fabrication, as shown and described.
FIG. 1 is a front, top and right side perspective view of an inner tube of reactor for semiconductor fabrication showing our new design;
FIG. 2 is a front elevational view thereof,
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a right side elevational view thereof;
FIG. 5 is a left side elevational view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2 ; and,
FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 8 .
Kagaya, Toru , Umekawa, Atsushi
Patent
Priority
Assignee
Title
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Date
Maintenance Fee Events
n/a
Date
Maintenance Schedule
n/a