Patent
   D521465
Priority
Nov 04 2003
Filed
Apr 29 2004
Issued
May 23 2006
Expiry
May 23 2020
Assg.orig
Entity
unknown
11
8
n/a
The ornamental design for a process tube for semiconductor device manufacturing apparatus, as shown and described.

FIG. 1 is an isometric view of a process tube for semiconductor device manufacturing apparatus of the present invention;

FIG. 2 is a front view thereof;

FIG. 3 is a rear view thereof;

FIG. 4 is a left side view thereof;

FIG. 5 is a right side view thereof;

FIG. 6 is a top view thereof;

FIG. 7 is a bottom view thereof;

FIG. 8 is a sectional view along line 8—8 shown in FIG. 6;

FIG. 9 is a sectional view along line 9—9 shown in FIG. 6;

FIG. 10 is a sectional view along line 10—10 shown in FIG. 6; and,

FIG. 11 is a sectional view along line 11—11 shown in FIG. 2.

Ishii, Katsutoshi, Matsuura, Hiroyuki

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Patent Priority Assignee Title
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Executed onAssignorAssigneeConveyanceFrameReelDoc
Apr 29 2004Tokyo Electron Limited(assignment on the face of the patent)
Jun 07 2004MATSUURA, HIROYUKITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0155640084 pdf
Jun 09 2004ISHII, KATSUTOSHITokyo Electron LimitedASSIGNMENT OF ASSIGNORS INTEREST SEE DOCUMENT FOR DETAILS 0155640084 pdf
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